DE10114698A1 - Bauteil aus Quarzglas sowie Verfahren zur Herstellung desselben - Google Patents
Bauteil aus Quarzglas sowie Verfahren zur Herstellung desselbenInfo
- Publication number
- DE10114698A1 DE10114698A1 DE10114698A DE10114698A DE10114698A1 DE 10114698 A1 DE10114698 A1 DE 10114698A1 DE 10114698 A DE10114698 A DE 10114698A DE 10114698 A DE10114698 A DE 10114698A DE 10114698 A1 DE10114698 A1 DE 10114698A1
- Authority
- DE
- Germany
- Prior art keywords
- layer
- quartz glass
- stabilizing layer
- stabilizing
- crucible
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 84
- 230000000087 stabilizing effect Effects 0.000 title claims abstract description 54
- 238000000034 method Methods 0.000 claims abstract description 52
- 239000000126 substance Substances 0.000 claims abstract description 26
- 239000000203 mixture Substances 0.000 claims abstract description 19
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 claims abstract description 18
- 229910052863 mullite Inorganic materials 0.000 claims abstract description 18
- 238000004519 manufacturing process Methods 0.000 claims abstract description 13
- 238000007751 thermal spraying Methods 0.000 claims abstract description 13
- 229910019142 PO4 Inorganic materials 0.000 claims abstract description 11
- 229910052761 rare earth metal Inorganic materials 0.000 claims abstract description 7
- -1 rare earth phosphate Chemical class 0.000 claims abstract description 7
- 229910000449 hafnium oxide Inorganic materials 0.000 claims abstract description 5
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 claims abstract description 5
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910001404 rare earth metal oxide Inorganic materials 0.000 claims abstract description 5
- 229910001936 tantalum oxide Inorganic materials 0.000 claims abstract description 5
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 claims abstract description 5
- 230000006641 stabilisation Effects 0.000 claims description 27
- 238000011105 stabilization Methods 0.000 claims description 27
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 23
- 238000010285 flame spraying Methods 0.000 claims description 12
- 239000000843 powder Substances 0.000 claims description 12
- 238000002844 melting Methods 0.000 claims description 11
- 235000021317 phosphate Nutrition 0.000 claims description 10
- 238000007750 plasma spraying Methods 0.000 claims description 8
- 239000007858 starting material Substances 0.000 claims description 5
- 150000003013 phosphoric acid derivatives Chemical class 0.000 claims description 4
- 150000004760 silicates Chemical class 0.000 claims description 4
- 229910021332 silicide Inorganic materials 0.000 claims description 4
- 239000002131 composite material Substances 0.000 claims description 3
- 230000008569 process Effects 0.000 abstract description 11
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 1
- 229910052593 corundum Inorganic materials 0.000 abstract 1
- 239000010452 phosphate Substances 0.000 abstract 1
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 107
- 239000013078 crystal Substances 0.000 description 15
- 229910052906 cristobalite Inorganic materials 0.000 description 10
- 239000000155 melt Substances 0.000 description 9
- 230000008018 melting Effects 0.000 description 9
- 235000012239 silicon dioxide Nutrition 0.000 description 6
- 239000007921 spray Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 5
- 238000002425 crystallisation Methods 0.000 description 5
- 230000008025 crystallization Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 239000010453 quartz Substances 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 238000005507 spraying Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 2
- YXTPWUNVHCYOSP-UHFFFAOYSA-N bis($l^{2}-silanylidene)molybdenum Chemical compound [Si]=[Mo]=[Si] YXTPWUNVHCYOSP-UHFFFAOYSA-N 0.000 description 2
- 238000010283 detonation spraying Methods 0.000 description 2
- 238000010891 electric arc Methods 0.000 description 2
- 230000004927 fusion Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 229910021343 molybdenum disilicide Inorganic materials 0.000 description 2
- 239000008188 pellet Substances 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 229910000164 yttrium(III) phosphate Inorganic materials 0.000 description 2
- UXBZSSBXGPYSIL-UHFFFAOYSA-K yttrium(iii) phosphate Chemical compound [Y+3].[O-]P([O-])([O-])=O UXBZSSBXGPYSIL-UHFFFAOYSA-K 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- LNSPFAOULBTYBI-UHFFFAOYSA-N [O].C#C Chemical compound [O].C#C LNSPFAOULBTYBI-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 229910021486 amorphous silicon dioxide Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 description 1
- TYAVIWGEVOBWDZ-UHFFFAOYSA-K cerium(3+);phosphate Chemical compound [Ce+3].[O-]P([O-])([O-])=O TYAVIWGEVOBWDZ-UHFFFAOYSA-K 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005660 chlorination reaction Methods 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 210000003298 dental enamel Anatomy 0.000 description 1
- 238000004031 devitrification Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 238000007499 fusion processing Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000010309 melting process Methods 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 239000002667 nucleating agent Substances 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 230000035882 stress Effects 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 230000003313 weakening effect Effects 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/003—General methods for coating; Devices therefor for hollow ware, e.g. containers
- C03C17/005—Coating the outside
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
- C23C4/11—Oxides
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/10—Crucibles or containers for supporting the melt
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
- C30B35/002—Crucibles or containers
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Glass Melting And Manufacturing (AREA)
- Surface Treatment Of Glass (AREA)
- Coating By Spraying Or Casting (AREA)
- Glass Compositions (AREA)
Priority Applications (9)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10114698A DE10114698A1 (de) | 2001-03-23 | 2001-03-23 | Bauteil aus Quarzglas sowie Verfahren zur Herstellung desselben |
| DE2002501295 DE50201295D1 (de) | 2001-03-23 | 2002-03-20 | Bauteil aus quarzglas sowie verfahren zur herstellung desselben |
| CNB028071514A CN1239423C (zh) | 2001-03-23 | 2002-03-20 | 石英玻璃坩埚及其制造方法 |
| JP2002589416A JP4262483B2 (ja) | 2001-03-23 | 2002-03-20 | 石英ガラスの構成材およびその製造方法 |
| US10/472,745 US20040115440A1 (en) | 2001-03-23 | 2002-03-20 | Quartz glass component and method for the production thereof |
| EP02753035A EP1370498B1 (de) | 2001-03-23 | 2002-03-20 | Bauteil aus quarzglas sowie verfahren zur herstellung desselben |
| KR1020037012215A KR100837476B1 (ko) | 2001-03-23 | 2002-03-20 | 석영 유리 도가니 및 이를 제조하는 방법 |
| PCT/EP2002/003118 WO2002092525A1 (de) | 2001-03-23 | 2002-03-20 | Bauteil aus quarzglas sowie verfahren zur herstellung desselben |
| NO20034212A NO20034212L (no) | 2001-03-23 | 2003-09-22 | Kvartsglasskomponent og fremstilling derav |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10114698A DE10114698A1 (de) | 2001-03-23 | 2001-03-23 | Bauteil aus Quarzglas sowie Verfahren zur Herstellung desselben |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE10114698A1 true DE10114698A1 (de) | 2002-09-26 |
Family
ID=7679010
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE10114698A Withdrawn DE10114698A1 (de) | 2001-03-23 | 2001-03-23 | Bauteil aus Quarzglas sowie Verfahren zur Herstellung desselben |
| DE2002501295 Expired - Lifetime DE50201295D1 (de) | 2001-03-23 | 2002-03-20 | Bauteil aus quarzglas sowie verfahren zur herstellung desselben |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE2002501295 Expired - Lifetime DE50201295D1 (de) | 2001-03-23 | 2002-03-20 | Bauteil aus quarzglas sowie verfahren zur herstellung desselben |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US20040115440A1 (enExample) |
| EP (1) | EP1370498B1 (enExample) |
| JP (1) | JP4262483B2 (enExample) |
| KR (1) | KR100837476B1 (enExample) |
| CN (1) | CN1239423C (enExample) |
| DE (2) | DE10114698A1 (enExample) |
| NO (1) | NO20034212L (enExample) |
| WO (1) | WO2002092525A1 (enExample) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102008033946B3 (de) * | 2008-07-19 | 2009-09-10 | Heraeus Quarzglas Gmbh & Co. Kg | Quarzglastiegel mit einer Stickstoffdotierung und Verfahren zur Herstellung eines derartigen Tiegels |
| DE102009013715A1 (de) | 2009-03-20 | 2010-09-30 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines Quarzglaskörpers, sowie nach dem Verfahren erhaltenes Vorprodukt für einen Quarzglastiegel |
| WO2013182261A1 (de) * | 2012-06-08 | 2013-12-12 | Brennkus Glasfeuerschalen Ohg | Feuerstelle |
| DE102012011793A1 (de) | 2012-06-15 | 2013-12-19 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines Quarzglastiegels |
Families Citing this family (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7887923B2 (en) | 2005-03-09 | 2011-02-15 | Evonik Degussa Gmbh | Plasma-sprayed layers of aluminium oxide |
| EP1700926A1 (de) * | 2005-03-09 | 2006-09-13 | Degussa AG | Plasmagespritzte Schichten aus Aluminiumoxid |
| JP5102744B2 (ja) * | 2008-10-31 | 2012-12-19 | ジャパンスーパークォーツ株式会社 | 石英ルツボ製造用モールド |
| WO2011013695A1 (ja) | 2009-07-31 | 2011-02-03 | ジャパンスーパークォーツ株式会社 | シリコン単結晶引き上げ用シリカガラスルツボ |
| KR101457504B1 (ko) * | 2009-09-09 | 2014-11-03 | 쟈판 스파 쿼츠 가부시키가이샤 | 복합 도가니, 그 제조 방법, 및 실리콘 결정의 제조 방법 |
| JP5128570B2 (ja) * | 2009-10-22 | 2013-01-23 | ジャパンスーパークォーツ株式会社 | 複合ルツボ及びその製造方法 |
| JP5574534B2 (ja) | 2010-12-28 | 2014-08-20 | 株式会社Ｓｕｍｃｏ | 複合ルツボ |
| JP5488519B2 (ja) * | 2011-04-11 | 2014-05-14 | 信越半導体株式会社 | 石英ガラスルツボ及びその製造方法、並びにシリコン単結晶の製造方法 |
| TW201245474A (en) * | 2011-05-12 | 2012-11-16 | Hon Hai Prec Ind Co Ltd | Evaporation source device and a coating method using the same |
| KR101282766B1 (ko) * | 2011-05-16 | 2013-07-05 | (주)세렉트론 | 용융 도가니의 재활용 방법 및 그에 의해 제조된 도가니 |
| DE102012008437B3 (de) * | 2012-04-30 | 2013-03-28 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung synthetischer Quarzglaskörnung |
| SG11201508512PA (en) * | 2013-05-23 | 2015-12-30 | Applied Materials Inc | A coated liner assembly for a semiconductor processing chamber |
| CN108698894A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 在多腔式烘箱中制备石英玻璃体 |
| KR20180094087A (ko) | 2015-12-18 | 2018-08-22 | 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 | 실리카 과립으로부터 실리카 유리 제품의 제조 |
| CN109153593A (zh) | 2015-12-18 | 2019-01-04 | 贺利氏石英玻璃有限两合公司 | 合成石英玻璃粉粒的制备 |
| CN108698883A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 石英玻璃制备中的二氧化硅的喷雾造粒 |
| KR20180095619A (ko) | 2015-12-18 | 2018-08-27 | 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 | 실리카 유리 제조 동안 규소 함량의 증가 |
| WO2017103153A1 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Glasfasern und vorformen aus quarzglas mit geringem oh-, cl- und al-gehalt |
| TWI733723B (zh) | 2015-12-18 | 2021-07-21 | 德商何瑞斯廓格拉斯公司 | 不透明石英玻璃體的製備 |
| WO2017103131A1 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Verringern des erdalkalimetallgehalts von siliziumdioxidgranulat durch behandlung von kohlenstoffdotiertem siliziumdioxidgranulat bei hoher temperatur |
| EP3390303B1 (de) | 2015-12-18 | 2024-02-07 | Heraeus Quarzglas GmbH & Co. KG | Herstellung von quarzglaskörpern mit taupunktkontrolle im schmelzofen |
| JP6940235B2 (ja) | 2015-12-18 | 2021-09-22 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 高融点金属の溶融坩堝内での石英ガラス体の調製 |
| CN105861972A (zh) * | 2016-04-15 | 2016-08-17 | 航天材料及工艺研究所 | 一种氧化铬-氧化钛基高温高发射率涂层及其制备方法 |
| JP6681303B2 (ja) * | 2016-09-13 | 2020-04-15 | クアーズテック株式会社 | 石英ガラスルツボ及びその製造方法 |
| CN108531980B (zh) * | 2018-05-29 | 2020-12-11 | 宁夏富乐德石英材料有限公司 | 改良石英坩埚及其制作方法 |
| JP7157932B2 (ja) * | 2019-01-11 | 2022-10-21 | 株式会社Sumco | シリカガラスルツボの製造装置および製造方法 |
| WO2022131047A1 (ja) * | 2020-12-18 | 2022-06-23 | 株式会社Sumco | 石英ガラスルツボ及びその製造方法並びにシリコン単結晶の製造方法 |
| CN115557710B (zh) * | 2022-11-10 | 2025-09-16 | 浙江美晶新材料股份有限公司 | 一种单晶石英坩埚喷涂装置 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4395432A (en) * | 1981-12-16 | 1983-07-26 | Westinghouse Electric Corp. | β-Alumina coating |
| WO1997036744A1 (en) * | 1996-03-29 | 1997-10-09 | Billings Garth W | Refractory nitride, carbide, ternary oxide, nitride/oxide, oxide/carbide, oxycarbide, and oxynitride materials and articles |
| US6479108B2 (en) * | 2000-11-15 | 2002-11-12 | G.T. Equipment Technologies, Inc. | Protective layer for quartz crucibles used for silicon crystallization |
-
2001
- 2001-03-23 DE DE10114698A patent/DE10114698A1/de not_active Withdrawn
-
2002
- 2002-03-20 EP EP02753035A patent/EP1370498B1/de not_active Expired - Lifetime
- 2002-03-20 DE DE2002501295 patent/DE50201295D1/de not_active Expired - Lifetime
- 2002-03-20 CN CNB028071514A patent/CN1239423C/zh not_active Expired - Lifetime
- 2002-03-20 KR KR1020037012215A patent/KR100837476B1/ko not_active Expired - Fee Related
- 2002-03-20 JP JP2002589416A patent/JP4262483B2/ja not_active Expired - Fee Related
- 2002-03-20 WO PCT/EP2002/003118 patent/WO2002092525A1/de not_active Ceased
- 2002-03-20 US US10/472,745 patent/US20040115440A1/en not_active Abandoned
-
2003
- 2003-09-22 NO NO20034212A patent/NO20034212L/no not_active Application Discontinuation
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102008033946B3 (de) * | 2008-07-19 | 2009-09-10 | Heraeus Quarzglas Gmbh & Co. Kg | Quarzglastiegel mit einer Stickstoffdotierung und Verfahren zur Herstellung eines derartigen Tiegels |
| EP2145862A1 (de) | 2008-07-19 | 2010-01-20 | Heraeus Quarzglas GmbH & Co. KG | Quarzglastiegel mit einer Stickstoffdotierung und Verfahren zur Herstellung eines derartigen Tiegels |
| DE102009013715A1 (de) | 2009-03-20 | 2010-09-30 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines Quarzglaskörpers, sowie nach dem Verfahren erhaltenes Vorprodukt für einen Quarzglastiegel |
| DE102009013715B4 (de) * | 2009-03-20 | 2013-07-18 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines Quarzglaskörpers, insbesondere eines Quarzglastiegels |
| WO2013182261A1 (de) * | 2012-06-08 | 2013-12-12 | Brennkus Glasfeuerschalen Ohg | Feuerstelle |
| DE102012011793A1 (de) | 2012-06-15 | 2013-12-19 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines Quarzglastiegels |
Also Published As
| Publication number | Publication date |
|---|---|
| DE50201295D1 (de) | 2004-11-18 |
| KR20030093256A (ko) | 2003-12-06 |
| CN1498196A (zh) | 2004-05-19 |
| WO2002092525A1 (de) | 2002-11-21 |
| US20040115440A1 (en) | 2004-06-17 |
| CN1239423C (zh) | 2006-02-01 |
| NO20034212D0 (no) | 2003-09-22 |
| NO20034212L (no) | 2003-11-05 |
| EP1370498B1 (de) | 2004-10-13 |
| KR100837476B1 (ko) | 2008-06-12 |
| JP4262483B2 (ja) | 2009-05-13 |
| EP1370498A1 (de) | 2003-12-17 |
| JP2004531449A (ja) | 2004-10-14 |
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