JP4262483B2 - 石英ガラスの構成材およびその製造方法 - Google Patents

石英ガラスの構成材およびその製造方法 Download PDF

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Publication number
JP4262483B2
JP4262483B2 JP2002589416A JP2002589416A JP4262483B2 JP 4262483 B2 JP4262483 B2 JP 4262483B2 JP 2002589416 A JP2002589416 A JP 2002589416A JP 2002589416 A JP2002589416 A JP 2002589416A JP 4262483 B2 JP4262483 B2 JP 4262483B2
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Prior art keywords
layer
quartz glass
glass crucible
stabilizing layer
stabilizing
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Expired - Fee Related
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JP2002589416A
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English (en)
Japanese (ja)
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JP2004531449A5 (enExample
JP2004531449A (ja
Inventor
ヴェルデッカー ヴァルトラウト
ローム ゲルハルト
ライスト ヨハン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Quartz Products Co Ltd
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Shin Etsu Quartz Products Co Ltd
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Publication of JP2004531449A5 publication Critical patent/JP2004531449A5/ja
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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001General methods for coating; Devices therefor
    • C03C17/003General methods for coating; Devices therefor for hollow ware, e.g. containers
    • C03C17/005Coating the outside
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/10Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/10Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
    • C23C4/11Oxides
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/10Crucibles or containers for supporting the melt
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B35/00Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
    • C30B35/002Crucibles or containers

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Surface Treatment Of Glass (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Glass Compositions (AREA)
JP2002589416A 2001-03-23 2002-03-20 石英ガラスの構成材およびその製造方法 Expired - Fee Related JP4262483B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10114698A DE10114698A1 (de) 2001-03-23 2001-03-23 Bauteil aus Quarzglas sowie Verfahren zur Herstellung desselben
PCT/EP2002/003118 WO2002092525A1 (de) 2001-03-23 2002-03-20 Bauteil aus quarzglas sowie verfahren zur herstellung desselben

Publications (3)

Publication Number Publication Date
JP2004531449A JP2004531449A (ja) 2004-10-14
JP2004531449A5 JP2004531449A5 (enExample) 2006-01-05
JP4262483B2 true JP4262483B2 (ja) 2009-05-13

Family

ID=7679010

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002589416A Expired - Fee Related JP4262483B2 (ja) 2001-03-23 2002-03-20 石英ガラスの構成材およびその製造方法

Country Status (8)

Country Link
US (1) US20040115440A1 (enExample)
EP (1) EP1370498B1 (enExample)
JP (1) JP4262483B2 (enExample)
KR (1) KR100837476B1 (enExample)
CN (1) CN1239423C (enExample)
DE (2) DE10114698A1 (enExample)
NO (1) NO20034212L (enExample)
WO (1) WO2002092525A1 (enExample)

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US7887923B2 (en) 2005-03-09 2011-02-15 Evonik Degussa Gmbh Plasma-sprayed layers of aluminium oxide
EP1700926A1 (de) * 2005-03-09 2006-09-13 Degussa AG Plasmagespritzte Schichten aus Aluminiumoxid
DE102008033946B3 (de) 2008-07-19 2009-09-10 Heraeus Quarzglas Gmbh & Co. Kg Quarzglastiegel mit einer Stickstoffdotierung und Verfahren zur Herstellung eines derartigen Tiegels
JP5102744B2 (ja) * 2008-10-31 2012-12-19 ジャパンスーパークォーツ株式会社 石英ルツボ製造用モールド
DE102009013715B4 (de) 2009-03-20 2013-07-18 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung eines Quarzglaskörpers, insbesondere eines Quarzglastiegels
WO2011013695A1 (ja) 2009-07-31 2011-02-03 ジャパンスーパークォーツ株式会社 シリコン単結晶引き上げ用シリカガラスルツボ
KR101457504B1 (ko) * 2009-09-09 2014-11-03 쟈판 스파 쿼츠 가부시키가이샤 복합 도가니, 그 제조 방법, 및 실리콘 결정의 제조 방법
JP5128570B2 (ja) * 2009-10-22 2013-01-23 ジャパンスーパークォーツ株式会社 複合ルツボ及びその製造方法
JP5574534B2 (ja) 2010-12-28 2014-08-20 株式会社Sumco 複合ルツボ
JP5488519B2 (ja) * 2011-04-11 2014-05-14 信越半導体株式会社 石英ガラスルツボ及びその製造方法、並びにシリコン単結晶の製造方法
TW201245474A (en) * 2011-05-12 2012-11-16 Hon Hai Prec Ind Co Ltd Evaporation source device and a coating method using the same
KR101282766B1 (ko) * 2011-05-16 2013-07-05 (주)세렉트론 용융 도가니의 재활용 방법 및 그에 의해 제조된 도가니
DE102012008437B3 (de) * 2012-04-30 2013-03-28 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung synthetischer Quarzglaskörnung
DE202012005644U1 (de) * 2012-06-08 2012-09-20 Matthias Brenncke Glasfeuerstelle zur Ermöglichung eines allseitigen Feuererlebnisses ohne das Erfordernis eines hitzebeständigen Untergrundes.
DE102012011793A1 (de) 2012-06-15 2013-12-19 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung eines Quarzglastiegels
SG11201508512PA (en) * 2013-05-23 2015-12-30 Applied Materials Inc A coated liner assembly for a semiconductor processing chamber
CN108698894A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 在多腔式烘箱中制备石英玻璃体
KR20180094087A (ko) 2015-12-18 2018-08-22 헤래우스 크바르츠글라스 게엠베하 & 컴파니 케이지 실리카 과립으로부터 실리카 유리 제품의 제조
CN109153593A (zh) 2015-12-18 2019-01-04 贺利氏石英玻璃有限两合公司 合成石英玻璃粉粒的制备
CN108698883A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 石英玻璃制备中的二氧化硅的喷雾造粒
KR20180095619A (ko) 2015-12-18 2018-08-27 헤래우스 크바르츠글라스 게엠베하 & 컴파니 케이지 실리카 유리 제조 동안 규소 함량의 증가
WO2017103153A1 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Glasfasern und vorformen aus quarzglas mit geringem oh-, cl- und al-gehalt
TWI733723B (zh) 2015-12-18 2021-07-21 德商何瑞斯廓格拉斯公司 不透明石英玻璃體的製備
WO2017103131A1 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Verringern des erdalkalimetallgehalts von siliziumdioxidgranulat durch behandlung von kohlenstoffdotiertem siliziumdioxidgranulat bei hoher temperatur
EP3390303B1 (de) 2015-12-18 2024-02-07 Heraeus Quarzglas GmbH & Co. KG Herstellung von quarzglaskörpern mit taupunktkontrolle im schmelzofen
JP6940235B2 (ja) 2015-12-18 2021-09-22 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 高融点金属の溶融坩堝内での石英ガラス体の調製
CN105861972A (zh) * 2016-04-15 2016-08-17 航天材料及工艺研究所 一种氧化铬-氧化钛基高温高发射率涂层及其制备方法
JP6681303B2 (ja) * 2016-09-13 2020-04-15 クアーズテック株式会社 石英ガラスルツボ及びその製造方法
CN108531980B (zh) * 2018-05-29 2020-12-11 宁夏富乐德石英材料有限公司 改良石英坩埚及其制作方法
JP7157932B2 (ja) * 2019-01-11 2022-10-21 株式会社Sumco シリカガラスルツボの製造装置および製造方法
WO2022131047A1 (ja) * 2020-12-18 2022-06-23 株式会社Sumco 石英ガラスルツボ及びその製造方法並びにシリコン単結晶の製造方法
CN115557710B (zh) * 2022-11-10 2025-09-16 浙江美晶新材料股份有限公司 一种单晶石英坩埚喷涂装置

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Also Published As

Publication number Publication date
DE50201295D1 (de) 2004-11-18
KR20030093256A (ko) 2003-12-06
CN1498196A (zh) 2004-05-19
WO2002092525A1 (de) 2002-11-21
US20040115440A1 (en) 2004-06-17
CN1239423C (zh) 2006-02-01
DE10114698A1 (de) 2002-09-26
NO20034212D0 (no) 2003-09-22
NO20034212L (no) 2003-11-05
EP1370498B1 (de) 2004-10-13
KR100837476B1 (ko) 2008-06-12
EP1370498A1 (de) 2003-12-17
JP2004531449A (ja) 2004-10-14

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