JP2004531449A5 - - Google Patents
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- Publication number
- JP2004531449A5 JP2004531449A5 JP2002589416A JP2002589416A JP2004531449A5 JP 2004531449 A5 JP2004531449 A5 JP 2004531449A5 JP 2002589416 A JP2002589416 A JP 2002589416A JP 2002589416 A JP2002589416 A JP 2002589416A JP 2004531449 A5 JP2004531449 A5 JP 2004531449A5
- Authority
- JP
- Japan
- Prior art keywords
- layer
- quartz glass
- stabilizing layer
- glass crucible
- produced
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims 14
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 13
- 230000000087 stabilizing effect Effects 0.000 claims 12
- 230000006641 stabilisation Effects 0.000 claims 6
- 238000011105 stabilization Methods 0.000 claims 6
- 239000000203 mixture Substances 0.000 claims 5
- 239000000126 substance Substances 0.000 claims 5
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims 4
- 229910019142 PO4 Inorganic materials 0.000 claims 4
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 claims 4
- 229910052863 mullite Inorganic materials 0.000 claims 4
- 235000021317 phosphate Nutrition 0.000 claims 4
- 239000010452 phosphate Substances 0.000 claims 3
- 229910000449 hafnium oxide Inorganic materials 0.000 claims 2
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims 2
- 229910052761 rare earth metal Inorganic materials 0.000 claims 2
- 229910001404 rare earth metal oxide Inorganic materials 0.000 claims 2
- -1 rare earth phosphate Chemical class 0.000 claims 2
- 229910021332 silicide Inorganic materials 0.000 claims 2
- 239000007921 spray Substances 0.000 claims 2
- 229910001936 tantalum oxide Inorganic materials 0.000 claims 2
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 claims 2
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 claims 1
- 239000002131 composite material Substances 0.000 claims 1
- 239000011521 glass Substances 0.000 claims 1
- 238000002844 melting Methods 0.000 claims 1
- 230000008018 melting Effects 0.000 claims 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 claims 1
- 238000007750 plasma spraying Methods 0.000 claims 1
- 239000000843 powder Substances 0.000 claims 1
- 239000010453 quartz Substances 0.000 claims 1
- 150000004760 silicates Chemical class 0.000 claims 1
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 claims 1
- 238000005507 spraying Methods 0.000 claims 1
- 239000007858 starting material Substances 0.000 claims 1
- 230000003746 surface roughness Effects 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10114698A DE10114698A1 (de) | 2001-03-23 | 2001-03-23 | Bauteil aus Quarzglas sowie Verfahren zur Herstellung desselben |
| PCT/EP2002/003118 WO2002092525A1 (de) | 2001-03-23 | 2002-03-20 | Bauteil aus quarzglas sowie verfahren zur herstellung desselben |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004531449A JP2004531449A (ja) | 2004-10-14 |
| JP2004531449A5 true JP2004531449A5 (enExample) | 2006-01-05 |
| JP4262483B2 JP4262483B2 (ja) | 2009-05-13 |
Family
ID=7679010
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002589416A Expired - Fee Related JP4262483B2 (ja) | 2001-03-23 | 2002-03-20 | 石英ガラスの構成材およびその製造方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US20040115440A1 (enExample) |
| EP (1) | EP1370498B1 (enExample) |
| JP (1) | JP4262483B2 (enExample) |
| KR (1) | KR100837476B1 (enExample) |
| CN (1) | CN1239423C (enExample) |
| DE (2) | DE10114698A1 (enExample) |
| NO (1) | NO20034212L (enExample) |
| WO (1) | WO2002092525A1 (enExample) |
Families Citing this family (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7887923B2 (en) | 2005-03-09 | 2011-02-15 | Evonik Degussa Gmbh | Plasma-sprayed layers of aluminium oxide |
| EP1700926A1 (de) * | 2005-03-09 | 2006-09-13 | Degussa AG | Plasmagespritzte Schichten aus Aluminiumoxid |
| DE102008033946B3 (de) | 2008-07-19 | 2009-09-10 | Heraeus Quarzglas Gmbh & Co. Kg | Quarzglastiegel mit einer Stickstoffdotierung und Verfahren zur Herstellung eines derartigen Tiegels |
| JP5102744B2 (ja) * | 2008-10-31 | 2012-12-19 | ジャパンスーパークォーツ株式会社 | 石英ルツボ製造用モールド |
| DE102009013715B4 (de) | 2009-03-20 | 2013-07-18 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines Quarzglaskörpers, insbesondere eines Quarzglastiegels |
| WO2011013695A1 (ja) | 2009-07-31 | 2011-02-03 | ジャパンスーパークォーツ株式会社 | シリコン単結晶引き上げ用シリカガラスルツボ |
| KR101457504B1 (ko) * | 2009-09-09 | 2014-11-03 | 쟈판 스파 쿼츠 가부시키가이샤 | 복합 도가니, 그 제조 방법, 및 실리콘 결정의 제조 방법 |
| JP5128570B2 (ja) * | 2009-10-22 | 2013-01-23 | ジャパンスーパークォーツ株式会社 | 複合ルツボ及びその製造方法 |
| JP5574534B2 (ja) | 2010-12-28 | 2014-08-20 | 株式会社Ｓｕｍｃｏ | 複合ルツボ |
| JP5488519B2 (ja) * | 2011-04-11 | 2014-05-14 | 信越半導体株式会社 | 石英ガラスルツボ及びその製造方法、並びにシリコン単結晶の製造方法 |
| TW201245474A (en) * | 2011-05-12 | 2012-11-16 | Hon Hai Prec Ind Co Ltd | Evaporation source device and a coating method using the same |
| KR101282766B1 (ko) * | 2011-05-16 | 2013-07-05 | (주)세렉트론 | 용융 도가니의 재활용 방법 및 그에 의해 제조된 도가니 |
| DE102012008437B3 (de) * | 2012-04-30 | 2013-03-28 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung synthetischer Quarzglaskörnung |
| DE202012005644U1 (de) * | 2012-06-08 | 2012-09-20 | Matthias Brenncke | Glasfeuerstelle zur Ermöglichung eines allseitigen Feuererlebnisses ohne das Erfordernis eines hitzebeständigen Untergrundes. |
| DE102012011793A1 (de) | 2012-06-15 | 2013-12-19 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines Quarzglastiegels |
| SG11201508512PA (en) * | 2013-05-23 | 2015-12-30 | Applied Materials Inc | A coated liner assembly for a semiconductor processing chamber |
| CN108698894A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 在多腔式烘箱中制备石英玻璃体 |
| KR20180094087A (ko) | 2015-12-18 | 2018-08-22 | 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 | 실리카 과립으로부터 실리카 유리 제품의 제조 |
| CN109153593A (zh) | 2015-12-18 | 2019-01-04 | 贺利氏石英玻璃有限两合公司 | 合成石英玻璃粉粒的制备 |
| CN108698883A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 石英玻璃制备中的二氧化硅的喷雾造粒 |
| KR20180095619A (ko) | 2015-12-18 | 2018-08-27 | 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 | 실리카 유리 제조 동안 규소 함량의 증가 |
| WO2017103153A1 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Glasfasern und vorformen aus quarzglas mit geringem oh-, cl- und al-gehalt |
| TWI733723B (zh) | 2015-12-18 | 2021-07-21 | 德商何瑞斯廓格拉斯公司 | 不透明石英玻璃體的製備 |
| WO2017103131A1 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Verringern des erdalkalimetallgehalts von siliziumdioxidgranulat durch behandlung von kohlenstoffdotiertem siliziumdioxidgranulat bei hoher temperatur |
| EP3390303B1 (de) | 2015-12-18 | 2024-02-07 | Heraeus Quarzglas GmbH & Co. KG | Herstellung von quarzglaskörpern mit taupunktkontrolle im schmelzofen |
| JP6940235B2 (ja) | 2015-12-18 | 2021-09-22 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 高融点金属の溶融坩堝内での石英ガラス体の調製 |
| CN105861972A (zh) * | 2016-04-15 | 2016-08-17 | 航天材料及工艺研究所 | 一种氧化铬-氧化钛基高温高发射率涂层及其制备方法 |
| JP6681303B2 (ja) * | 2016-09-13 | 2020-04-15 | クアーズテック株式会社 | 石英ガラスルツボ及びその製造方法 |
| CN108531980B (zh) * | 2018-05-29 | 2020-12-11 | 宁夏富乐德石英材料有限公司 | 改良石英坩埚及其制作方法 |
| JP7157932B2 (ja) * | 2019-01-11 | 2022-10-21 | 株式会社Sumco | シリカガラスルツボの製造装置および製造方法 |
| WO2022131047A1 (ja) * | 2020-12-18 | 2022-06-23 | 株式会社Sumco | 石英ガラスルツボ及びその製造方法並びにシリコン単結晶の製造方法 |
| CN115557710B (zh) * | 2022-11-10 | 2025-09-16 | 浙江美晶新材料股份有限公司 | 一种单晶石英坩埚喷涂装置 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4395432A (en) * | 1981-12-16 | 1983-07-26 | Westinghouse Electric Corp. | β-Alumina coating |
| WO1997036744A1 (en) * | 1996-03-29 | 1997-10-09 | Billings Garth W | Refractory nitride, carbide, ternary oxide, nitride/oxide, oxide/carbide, oxycarbide, and oxynitride materials and articles |
| US6479108B2 (en) * | 2000-11-15 | 2002-11-12 | G.T. Equipment Technologies, Inc. | Protective layer for quartz crucibles used for silicon crystallization |
-
2001
- 2001-03-23 DE DE10114698A patent/DE10114698A1/de not_active Withdrawn
-
2002
- 2002-03-20 EP EP02753035A patent/EP1370498B1/de not_active Expired - Lifetime
- 2002-03-20 DE DE2002501295 patent/DE50201295D1/de not_active Expired - Lifetime
- 2002-03-20 CN CNB028071514A patent/CN1239423C/zh not_active Expired - Lifetime
- 2002-03-20 KR KR1020037012215A patent/KR100837476B1/ko not_active Expired - Fee Related
- 2002-03-20 JP JP2002589416A patent/JP4262483B2/ja not_active Expired - Fee Related
- 2002-03-20 WO PCT/EP2002/003118 patent/WO2002092525A1/de not_active Ceased
- 2002-03-20 US US10/472,745 patent/US20040115440A1/en not_active Abandoned
-
2003
- 2003-09-22 NO NO20034212A patent/NO20034212L/no not_active Application Discontinuation
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