JP2004531449A5 - - Google Patents
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- Publication number
- JP2004531449A5 JP2004531449A5 JP2002589416A JP2002589416A JP2004531449A5 JP 2004531449 A5 JP2004531449 A5 JP 2004531449A5 JP 2002589416 A JP2002589416 A JP 2002589416A JP 2002589416 A JP2002589416 A JP 2002589416A JP 2004531449 A5 JP2004531449 A5 JP 2004531449A5
- Authority
- JP
- Japan
- Prior art keywords
- layer
- quartz glass
- stabilizing layer
- glass crucible
- produced
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims 14
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 13
- 230000000087 stabilizing effect Effects 0.000 claims 12
- 230000006641 stabilisation Effects 0.000 claims 6
- 238000011105 stabilization Methods 0.000 claims 6
- 239000000203 mixture Substances 0.000 claims 5
- 239000000126 substance Substances 0.000 claims 5
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims 4
- 229910019142 PO4 Inorganic materials 0.000 claims 4
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 claims 4
- 229910052863 mullite Inorganic materials 0.000 claims 4
- 235000021317 phosphate Nutrition 0.000 claims 4
- 239000010452 phosphate Substances 0.000 claims 3
- 229910000449 hafnium oxide Inorganic materials 0.000 claims 2
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims 2
- 229910052761 rare earth metal Inorganic materials 0.000 claims 2
- 229910001404 rare earth metal oxide Inorganic materials 0.000 claims 2
- -1 rare earth phosphate Chemical class 0.000 claims 2
- 229910021332 silicide Inorganic materials 0.000 claims 2
- 239000007921 spray Substances 0.000 claims 2
- 229910001936 tantalum oxide Inorganic materials 0.000 claims 2
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 claims 2
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 claims 1
- 239000002131 composite material Substances 0.000 claims 1
- 239000011521 glass Substances 0.000 claims 1
- 238000002844 melting Methods 0.000 claims 1
- 230000008018 melting Effects 0.000 claims 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 claims 1
- 238000007750 plasma spraying Methods 0.000 claims 1
- 239000000843 powder Substances 0.000 claims 1
- 239000010453 quartz Substances 0.000 claims 1
- 150000004760 silicates Chemical class 0.000 claims 1
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 claims 1
- 238000005507 spraying Methods 0.000 claims 1
- 239000007858 starting material Substances 0.000 claims 1
- 230000003746 surface roughness Effects 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10114698A DE10114698A1 (de) | 2001-03-23 | 2001-03-23 | Bauteil aus Quarzglas sowie Verfahren zur Herstellung desselben |
| PCT/EP2002/003118 WO2002092525A1 (de) | 2001-03-23 | 2002-03-20 | Bauteil aus quarzglas sowie verfahren zur herstellung desselben |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004531449A JP2004531449A (ja) | 2004-10-14 |
| JP2004531449A5 true JP2004531449A5 (enExample) | 2006-01-05 |
| JP4262483B2 JP4262483B2 (ja) | 2009-05-13 |
Family
ID=7679010
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002589416A Expired - Fee Related JP4262483B2 (ja) | 2001-03-23 | 2002-03-20 | 石英ガラスの構成材およびその製造方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US20040115440A1 (enExample) |
| EP (1) | EP1370498B1 (enExample) |
| JP (1) | JP4262483B2 (enExample) |
| KR (1) | KR100837476B1 (enExample) |
| CN (1) | CN1239423C (enExample) |
| DE (2) | DE10114698A1 (enExample) |
| NO (1) | NO20034212L (enExample) |
| WO (1) | WO2002092525A1 (enExample) |
Families Citing this family (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1700926A1 (de) | 2005-03-09 | 2006-09-13 | Degussa AG | Plasmagespritzte Schichten aus Aluminiumoxid |
| JP4518410B2 (ja) | 2005-03-09 | 2010-08-04 | エボニック デグサ ゲーエムベーハー | プラズマ溶射された酸化アルミニウム層 |
| DE102008033946B3 (de) * | 2008-07-19 | 2009-09-10 | Heraeus Quarzglas Gmbh & Co. Kg | Quarzglastiegel mit einer Stickstoffdotierung und Verfahren zur Herstellung eines derartigen Tiegels |
| JP5102744B2 (ja) * | 2008-10-31 | 2012-12-19 | ジャパンスーパークォーツ株式会社 | 石英ルツボ製造用モールド |
| DE102009013715B4 (de) | 2009-03-20 | 2013-07-18 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines Quarzglaskörpers, insbesondere eines Quarzglastiegels |
| CN102471922B (zh) | 2009-07-31 | 2014-12-10 | 日本超精石英株式会社 | 单晶硅提拉用氧化硅玻璃坩埚 |
| EP2484813B1 (en) * | 2009-09-09 | 2014-11-26 | Japan Super Quartz Corporation | Composite crucible, method for producing same and use thereof |
| JP5128570B2 (ja) * | 2009-10-22 | 2013-01-23 | ジャパンスーパークォーツ株式会社 | 複合ルツボ及びその製造方法 |
| JP5574534B2 (ja) * | 2010-12-28 | 2014-08-20 | 株式会社Ｓｕｍｃｏ | 複合ルツボ |
| JP5488519B2 (ja) * | 2011-04-11 | 2014-05-14 | 信越半導体株式会社 | 石英ガラスルツボ及びその製造方法、並びにシリコン単結晶の製造方法 |
| TW201245474A (en) * | 2011-05-12 | 2012-11-16 | Hon Hai Prec Ind Co Ltd | Evaporation source device and a coating method using the same |
| KR101282766B1 (ko) * | 2011-05-16 | 2013-07-05 | (주)세렉트론 | 용융 도가니의 재활용 방법 및 그에 의해 제조된 도가니 |
| DE102012008437B3 (de) * | 2012-04-30 | 2013-03-28 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung synthetischer Quarzglaskörnung |
| DE202012005644U1 (de) * | 2012-06-08 | 2012-09-20 | Matthias Brenncke | Glasfeuerstelle zur Ermöglichung eines allseitigen Feuererlebnisses ohne das Erfordernis eines hitzebeständigen Untergrundes. |
| DE102012011793A1 (de) | 2012-06-15 | 2013-12-19 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines Quarzglastiegels |
| CN105210173A (zh) * | 2013-05-23 | 2015-12-30 | 应用材料公司 | 用于半导体处理腔室的经涂布的衬里组件 |
| TW201731782A (zh) | 2015-12-18 | 2017-09-16 | 何瑞斯廓格拉斯公司 | 在多腔式爐中製備石英玻璃體 |
| US11952303B2 (en) | 2015-12-18 | 2024-04-09 | Heraeus Quarzglas Gmbh & Co. Kg | Increase in silicon content in the preparation of quartz glass |
| CN109153593A (zh) | 2015-12-18 | 2019-01-04 | 贺利氏石英玻璃有限两合公司 | 合成石英玻璃粉粒的制备 |
| EP3390305B1 (de) | 2015-12-18 | 2023-11-15 | Heraeus Quarzglas GmbH & Co. KG | Herstellung von quarzglaskörpern aus siliziumdioxidgranulat |
| US10676388B2 (en) | 2015-12-18 | 2020-06-09 | Heraeus Quarzglas Gmbh & Co. Kg | Glass fibers and pre-forms made of homogeneous quartz glass |
| CN108698883A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 石英玻璃制备中的二氧化硅的喷雾造粒 |
| KR20180095879A (ko) | 2015-12-18 | 2018-08-28 | 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 | 상승된 온도에서 탄소-도핑된 실리카 과립을 처리하여 실리카 과립의 알칼리 토금속 함량의 감소 |
| EP3390290B1 (de) | 2015-12-18 | 2023-03-15 | Heraeus Quarzglas GmbH & Co. KG | Herstellung eines opaken quarzglaskörpers |
| KR20180095616A (ko) | 2015-12-18 | 2018-08-27 | 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 | 용융 가열로에서 이슬점 조절을 이용한 실리카 유리체의 제조 |
| JP6940235B2 (ja) | 2015-12-18 | 2021-09-22 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 高融点金属の溶融坩堝内での石英ガラス体の調製 |
| CN105861972A (zh) * | 2016-04-15 | 2016-08-17 | 航天材料及工艺研究所 | 一种氧化铬-氧化钛基高温高发射率涂层及其制备方法 |
| JP6681303B2 (ja) * | 2016-09-13 | 2020-04-15 | クアーズテック株式会社 | 石英ガラスルツボ及びその製造方法 |
| CN108531980B (zh) * | 2018-05-29 | 2020-12-11 | 宁夏富乐德石英材料有限公司 | 改良石英坩埚及其制作方法 |
| JP7157932B2 (ja) * | 2019-01-11 | 2022-10-21 | 株式会社Sumco | シリカガラスルツボの製造装置および製造方法 |
| CN116648435A (zh) | 2020-12-18 | 2023-08-25 | 胜高股份有限公司 | 石英玻璃坩埚及其制造方法、以及单晶硅的制造方法 |
| CN115557710B (zh) * | 2022-11-10 | 2025-09-16 | 浙江美晶新材料股份有限公司 | 一种单晶石英坩埚喷涂装置 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4395432A (en) | 1981-12-16 | 1983-07-26 | Westinghouse Electric Corp. | β-Alumina coating |
| WO1997036744A1 (en) * | 1996-03-29 | 1997-10-09 | Billings Garth W | Refractory nitride, carbide, ternary oxide, nitride/oxide, oxide/carbide, oxycarbide, and oxynitride materials and articles |
| AU2001288566A1 (en) * | 2000-11-15 | 2002-05-27 | Gt Equipment Technologies Inc. | A protective layer for quartz crucibles used for silicon crystallization |
-
2001
- 2001-03-23 DE DE10114698A patent/DE10114698A1/de not_active Withdrawn
-
2002
- 2002-03-20 JP JP2002589416A patent/JP4262483B2/ja not_active Expired - Fee Related
- 2002-03-20 WO PCT/EP2002/003118 patent/WO2002092525A1/de not_active Ceased
- 2002-03-20 DE DE2002501295 patent/DE50201295D1/de not_active Expired - Lifetime
- 2002-03-20 US US10/472,745 patent/US20040115440A1/en not_active Abandoned
- 2002-03-20 EP EP02753035A patent/EP1370498B1/de not_active Expired - Lifetime
- 2002-03-20 KR KR1020037012215A patent/KR100837476B1/ko not_active Expired - Fee Related
- 2002-03-20 CN CNB028071514A patent/CN1239423C/zh not_active Expired - Lifetime
-
2003
- 2003-09-22 NO NO20034212A patent/NO20034212L/no not_active Application Discontinuation
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