JP2007022075A5 - - Google Patents

Info

Publication number

JP2007022075A5

JP2007022075A5 JP2006165140A JP2006165140A JP2007022075A5 JP 2007022075 A5 JP2007022075 A5 JP 2007022075A5 JP 2006165140 A JP2006165140 A JP 2006165140A JP 2006165140 A JP2006165140 A JP 2006165140A JP 2007022075 A5 JP2007022075 A5 JP 2007022075A5

Authority

JP

Japan

Prior art keywords

layer structure

clay

layer

structure according

thin film

Prior art date

2006-06-14

Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Pending

Links

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• 239000010409 thin film Substances 0.000 claims description 18
• 239000004927 clay Substances 0.000 claims description 17
• 238000004519 manufacturing process Methods 0.000 claims description 8
• 238000000034 method Methods 0.000 claims description 8
• 239000010408 film Substances 0.000 claims description 7
• 229910010272 inorganic material Inorganic materials 0.000 claims description 4
• 229910052710 silicon Inorganic materials 0.000 claims description 4
• 239000010703 silicon Substances 0.000 claims description 4
• 238000007740 vapor deposition Methods 0.000 claims description 4
• 229910052782 aluminium Inorganic materials 0.000 claims description 2
• XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 2
• 239000011248 coating agent Substances 0.000 claims description 2
• 238000000576 coating method Methods 0.000 claims description 2
• 238000010894 electron beam technology Methods 0.000 claims description 2
• 238000010438 heat treatment Methods 0.000 claims description 2
• 238000010030 laminating Methods 0.000 claims description 2
• 239000002245 particle Substances 0.000 claims description 2
• 238000005268 plasma chemical vapour deposition Methods 0.000 claims description 2
• 238000005245 sintering Methods 0.000 claims description 2
• 238000004544 sputter deposition Methods 0.000 claims description 2
• 238000002230 thermal chemical vapour deposition Methods 0.000 claims description 2
• 239000007789 gas Substances 0.000 claims 5
• XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 3
• 230000004888 barrier function Effects 0.000 claims 3
• 150000002484 inorganic compounds Chemical class 0.000 claims 3
• XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims 2
• GUJOJGAPFQRJSV-UHFFFAOYSA-N dialuminum;dioxosilane;oxygen(2-);hydrate Chemical compound O.[O-2].[O-2].[O-2].[Al+3].[Al+3].O=[Si]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O GUJOJGAPFQRJSV-UHFFFAOYSA-N 0.000 claims 2
• 229910052901 montmorillonite Inorganic materials 0.000 claims 2
• 229910052581 Si3N4 Inorganic materials 0.000 claims 1
• VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
• 229910052910 alkali metal silicate Inorganic materials 0.000 claims 1
• 150000004703 alkoxides Chemical class 0.000 claims 1
• QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
• 230000005540 biological transmission Effects 0.000 claims 1
• 230000015572 biosynthetic process Effects 0.000 claims 1
• VNSBYDPZHCQWNB-UHFFFAOYSA-N calcium;aluminum;dioxido(oxo)silane;sodium;hydrate Chemical compound O.[Na].[Al].[Ca+2].[O-][Si]([O-])=O VNSBYDPZHCQWNB-UHFFFAOYSA-N 0.000 claims 1
• PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims 1
• 229910000271 hectorite Inorganic materials 0.000 claims 1
• KWLMIXQRALPRBC-UHFFFAOYSA-L hectorite Chemical compound [Li+].[OH-].[OH-].[Na+].[Mg+2].O1[Si]2([O-])O[Si]1([O-])O[Si]([O-])(O1)O[Si]1([O-])O2 KWLMIXQRALPRBC-UHFFFAOYSA-L 0.000 claims 1
• 229910052742 iron Inorganic materials 0.000 claims 1
• 229910052751 metal Inorganic materials 0.000 claims 1
• 239000002184 metal Substances 0.000 claims 1
• 239000010445 mica Substances 0.000 claims 1
• 229910052618 mica group Inorganic materials 0.000 claims 1
• 229910000273 nontronite Inorganic materials 0.000 claims 1
• TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims 1
• 239000001301 oxygen Substances 0.000 claims 1
• 229910052760 oxygen Inorganic materials 0.000 claims 1
• 229920001709 polysilazane Polymers 0.000 claims 1
• 229910000275 saponite Inorganic materials 0.000 claims 1
• HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims 1
• 229910010271 silicon carbide Inorganic materials 0.000 claims 1
• HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 1
• 229910052814 silicon oxide Inorganic materials 0.000 claims 1
• -1 stevensite Inorganic materials 0.000 claims 1
• 238000002834 transmittance Methods 0.000 claims 1
• 229910052902 vermiculite Inorganic materials 0.000 claims 1
• 239000010455 vermiculite Substances 0.000 claims 1
• 235000019354 vermiculite Nutrition 0.000 claims 1
• XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
• 238000005229 chemical vapour deposition Methods 0.000 description 1
• 150000001875 compounds Chemical class 0.000 description 1
• 239000011147 inorganic material Substances 0.000 description 1