JP2010196168A5 - - Google Patents
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- Publication number
- JP2010196168A5 JP2010196168A5 JP2010041821A JP2010041821A JP2010196168A5 JP 2010196168 A5 JP2010196168 A5 JP 2010196168A5 JP 2010041821 A JP2010041821 A JP 2010041821A JP 2010041821 A JP2010041821 A JP 2010041821A JP 2010196168 A5 JP2010196168 A5 JP 2010196168A5
- Authority
- JP
- Japan
- Prior art keywords
- coating
- substrate
- optical element
- layer
- range
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000576 coating method Methods 0.000 claims description 47
- 239000011248 coating agent Substances 0.000 claims description 45
- 239000000758 substrate Substances 0.000 claims description 25
- 239000000463 material Substances 0.000 claims description 22
- 230000003287 optical effect Effects 0.000 claims description 21
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 16
- 239000013078 crystal Substances 0.000 claims description 7
- 229910020068 MgAl Inorganic materials 0.000 claims description 6
- 229910001618 alkaline earth metal fluoride Inorganic materials 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 6
- 238000000151 deposition Methods 0.000 claims description 5
- 238000001704 evaporation Methods 0.000 claims description 5
- 150000002500 ions Chemical class 0.000 claims description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims description 4
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 4
- 230000008020 evaporation Effects 0.000 claims description 3
- 238000005137 deposition process Methods 0.000 claims description 2
- 238000010894 electron beam technology Methods 0.000 claims description 2
- 230000004907 flux Effects 0.000 claims description 2
- 239000000203 mixture Substances 0.000 claims description 2
- 239000010410 layer Substances 0.000 claims 19
- 239000005350 fused silica glass Substances 0.000 claims 14
- 229910021486 amorphous silicon dioxide Inorganic materials 0.000 claims 5
- 229910001512 metal fluoride Inorganic materials 0.000 claims 4
- 229910052710 silicon Inorganic materials 0.000 claims 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 2
- 229910052782 aluminium Inorganic materials 0.000 claims 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 2
- 229910052751 metal Inorganic materials 0.000 claims 2
- 239000002184 metal Substances 0.000 claims 2
- 229910052719 titanium Inorganic materials 0.000 claims 2
- 239000010936 titanium Substances 0.000 claims 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 1
- 239000004411 aluminium Substances 0.000 claims 1
- 239000011247 coating layer Substances 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 239000011737 fluorine Substances 0.000 claims 1
- 239000011261 inert gas Substances 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 150000002222 fluorine compounds Chemical group 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/393,287 US8153241B2 (en) | 2009-02-26 | 2009-02-26 | Wide-angle highly reflective mirrors at 193NM |
| US12/393,287 | 2009-02-26 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010196168A JP2010196168A (ja) | 2010-09-09 |
| JP2010196168A5 true JP2010196168A5 (enExample) | 2013-04-11 |
| JP5661296B2 JP5661296B2 (ja) | 2015-01-28 |
Family
ID=42558084
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010041821A Active JP5661296B2 (ja) | 2009-02-26 | 2010-02-26 | １９３ｎｍでの広角高反射ミラー |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US8153241B2 (enExample) |
| JP (1) | JP5661296B2 (enExample) |
| DE (1) | DE102010002359B4 (enExample) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8163632B2 (en) | 2006-12-04 | 2012-04-24 | Carl Zeiss Smt Gmbh | Irradiation with high energy ions for surface structuring and treatment of surface proximal sections of optical elements |
| DE102010017106A1 (de) * | 2010-05-27 | 2011-12-01 | Carl Zeiss Laser Optics Gmbh | Spiegel mit dielektrischer Beschichtung |
| US20120307353A1 (en) | 2011-05-31 | 2012-12-06 | Horst Schreiber | DURABLE MgO-MgF2 COMPOSITE FILM FOR INFRARED ANTI-REFLECTION COATINGS |
| DE102011054837A1 (de) | 2011-10-26 | 2013-05-02 | Carl Zeiss Laser Optics Gmbh | Optisches Element |
| CN102520471A (zh) * | 2011-12-30 | 2012-06-27 | 中国科学院上海光学精密机械研究所 | 偏振无关宽带反射光栅 |
| US9482790B2 (en) | 2012-05-31 | 2016-11-01 | Corning Incorporated | Silica-modified-fluoride broad angle anti-reflection coatings |
| US9696467B2 (en) * | 2014-01-31 | 2017-07-04 | Corning Incorporated | UV and DUV expanded cold mirrors |
| EP3317886A4 (en) * | 2015-06-30 | 2019-07-24 | Jaiswal, Supriya | COATINGS FOR EXTREME ULTRAVIOLETTE AND SOFT X-RAY OPTICS |
| WO2018013757A2 (en) | 2016-07-14 | 2018-01-18 | Corning Incorporated | Methods of reducing surface roughness of reflectance coatings for duv mirrors |
| US20180024276A1 (en) | 2016-07-21 | 2018-01-25 | Corning Incorporated | Optical elements with stress-balancing coatings |
| LT6505B (lt) * | 2016-08-18 | 2018-04-10 | Valstybinis mokslinių tyrimų institutas Fizinių ir technologijos mokslų centras | Interferencinė danga arba jos dalis iš sluoksnių, pasižyminčių skirtingu porėtumu |
| CN109355629B (zh) * | 2018-11-27 | 2020-12-11 | 杭州科汀光学技术有限公司 | 一种薄膜滤光片的低温制备方法 |
| CN110441844A (zh) * | 2019-06-24 | 2019-11-12 | 东莞理工学院 | 一种10 kW半导体激光器用高反膜及其制备方法 |
| CN111897039B (zh) * | 2020-08-19 | 2021-07-27 | 重庆大学 | 紫外光平面反射镜及其应用以及制备方法 |
| TWI853580B (zh) * | 2020-10-30 | 2024-08-21 | 美商希瑪有限責任公司 | 用於深紫外線光源之光學組件 |
| DE102021206788A1 (de) | 2021-06-30 | 2023-01-05 | Carl Zeiss Smt Gmbh | Verfahren zum Abscheiden einer Schicht, optisches Element und optische Anordnung für den DUV-Wellenlängenbereich |
| CN117991427B (zh) * | 2024-03-13 | 2024-08-09 | 同济大学 | 一种低损耗、高反射率的193nm薄膜及其制备方法 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5689703A (en) * | 1979-12-24 | 1981-07-21 | Agency Of Ind Science & Technol | Manufacture of reflecting mirror for high output laser |
| JPH08220304A (ja) * | 1995-02-13 | 1996-08-30 | Tadahiro Omi | 光学物品及びそれを用いた露光装置又は光学系並びにその製造方法 |
| JP4161387B2 (ja) * | 1997-01-23 | 2008-10-08 | 株式会社ニコン | 多層反射防止膜 |
| JPH11101903A (ja) * | 1997-09-29 | 1999-04-13 | Nikon Corp | エキシマレーザ用高反射鏡 |
| JPH11121841A (ja) * | 1997-10-21 | 1999-04-30 | Canon Inc | レーザー用反射鏡 |
| JP2001074931A (ja) * | 1999-08-31 | 2001-03-23 | Nikon Corp | 光学薄膜及び光学素子及び光学装置 |
| JP3932775B2 (ja) * | 2000-06-21 | 2007-06-20 | 松下電工株式会社 | 光反射体及び反射型照明装置 |
| JP2002348117A (ja) * | 2001-05-28 | 2002-12-04 | Japan Atom Energy Res Inst | 高密度電子励起によるＭｇＡｌ２Ｏ４の非晶質化方法 |
| US7169514B2 (en) * | 2003-12-31 | 2007-01-30 | Intel Corporation | Extreme ultraviolet mask with molybdenum phase shifter |
| WO2005081021A1 (ja) * | 2004-02-24 | 2005-09-01 | Matsushita Electric Works, Ltd. | 光反射体及びこの光反射体を有する照明器具 |
| US7506521B2 (en) * | 2004-12-29 | 2009-03-24 | Corning Incorporated | High transmission synthetic silica glass and method of making same |
| JP4199742B2 (ja) | 2005-02-28 | 2008-12-17 | エルピーダメモリ株式会社 | 遅延回路、及びこれらを備えた半導体装置 |
| US20060222961A1 (en) * | 2005-03-31 | 2006-10-05 | Pei-Yang Yan | Leaky absorber for extreme ultraviolet mask |
| US7465681B2 (en) * | 2006-08-25 | 2008-12-16 | Corning Incorporated | Method for producing smooth, dense optical films |
| EP1965229A3 (en) * | 2007-02-28 | 2008-12-10 | Corning Incorporated | Engineered fluoride-coated elements for laser systems |
-
2009
- 2009-02-26 US US12/393,287 patent/US8153241B2/en active Active
-
2010
- 2010-02-25 DE DE102010002359.0A patent/DE102010002359B4/de active Active
- 2010-02-26 JP JP2010041821A patent/JP5661296B2/ja active Active
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