JP2012511106A5 - - Google Patents
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- Publication number
- JP2012511106A5 JP2012511106A5 JP2011539778A JP2011539778A JP2012511106A5 JP 2012511106 A5 JP2012511106 A5 JP 2012511106A5 JP 2011539778 A JP2011539778 A JP 2011539778A JP 2011539778 A JP2011539778 A JP 2011539778A JP 2012511106 A5 JP2012511106 A5 JP 2012511106A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- thin film
- less
- barrier layer
- precursor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12038108P | 2008-12-05 | 2008-12-05 | |
| US61/120,381 | 2008-12-05 | ||
| US16128709P | 2009-03-18 | 2009-03-18 | |
| US61/161,287 | 2009-03-18 | ||
| PCT/US2009/067024 WO2010065966A2 (en) | 2008-12-05 | 2009-12-07 | High rate deposition of thin films with improved barrier layer properties |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2012511106A JP2012511106A (ja) | 2012-05-17 |
| JP2012511106A5 true JP2012511106A5 (enExample) | 2013-01-31 |
Family
ID=42231418
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011539778A Pending JP2012511106A (ja) | 2008-12-05 | 2009-12-07 | 改善されたバリア層の性質を有する薄膜の高速成膜 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20100143710A1 (enExample) |
| EP (1) | EP2364380A4 (enExample) |
| JP (1) | JP2012511106A (enExample) |
| KR (1) | KR20110100618A (enExample) |
| CN (1) | CN102239278A (enExample) |
| BR (1) | BRPI0922795A2 (enExample) |
| WO (1) | WO2010065966A2 (enExample) |
Families Citing this family (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ATE507320T1 (de) | 2006-03-26 | 2011-05-15 | Lotus Applied Technology Llc | Atomlagenabscheidungssystem und verfahren zur beschichtung von flexiblen substraten |
| US8637117B2 (en) | 2009-10-14 | 2014-01-28 | Lotus Applied Technology, Llc | Inhibiting excess precursor transport between separate precursor zones in an atomic layer deposition system |
| US8637123B2 (en) * | 2009-12-29 | 2014-01-28 | Lotus Applied Technology, Llc | Oxygen radical generation for radical-enhanced thin film deposition |
| KR101791033B1 (ko) * | 2010-07-23 | 2017-10-27 | 로터스 어플라이드 테크놀로지, 엘엘씨 | 롤-투-롤 박막 증착을 위한 유연한 웹 기재의 한쪽 측면과 접촉하는 기재 이동 메커니즘 |
| JP5864089B2 (ja) * | 2010-08-25 | 2016-02-17 | 日亜化学工業株式会社 | 発光装置の製造方法 |
| WO2012032343A1 (en) | 2010-09-07 | 2012-03-15 | Sun Chemical B.V. | A carbon dioxide barrier coating |
| JP5682372B2 (ja) * | 2011-02-07 | 2015-03-11 | ソニー株式会社 | 電池用セパレータ、電池用セパレータの製造方法、電池、電池パックおよび電子機器 |
| CN103459665B (zh) * | 2011-03-29 | 2017-02-22 | 凸版印刷株式会社 | 卷绕成膜装置 |
| EP2732071B1 (en) * | 2011-07-11 | 2020-06-03 | Lotus Applied Technology, LLC | Mixed metal oxide barrier films and atomic layer deposition method for making mixed metal oxide barrier films |
| JP5803488B2 (ja) * | 2011-09-22 | 2015-11-04 | 凸版印刷株式会社 | 原子層堆積法によるフレキシブル基板への成膜方法及び成膜装置 |
| CN102514280B (zh) * | 2011-12-12 | 2015-02-04 | 武汉理工大学 | 一种太阳能选择性吸收涂层的制备方法 |
| US20150307989A1 (en) * | 2012-03-23 | 2015-10-29 | Picosun Oy | Atomic layer deposition method and apparatuses |
| WO2013180005A1 (ja) * | 2012-05-31 | 2013-12-05 | 凸版印刷株式会社 | 巻き取り成膜装置 |
| KR101372309B1 (ko) * | 2012-08-07 | 2014-03-13 | (주)씨엔원 | 롤투롤 방식의 원자층 증착 장비 및 원자층 증착 방법 |
| TWI592310B (zh) * | 2012-10-18 | 2017-07-21 | 凸版印刷股份有限公司 | 積層體、阻氣薄膜及其製造方法 |
| US9631275B2 (en) * | 2012-11-30 | 2017-04-25 | Lg Chem, Ltd. | Device for forming a layer |
| US20140183498A1 (en) * | 2012-12-31 | 2014-07-03 | Saint-Gobain Performance Plastics Corporation | Thin Film Silicon Nitride Barrier Layers On Flexible Substrate |
| US20140322527A1 (en) * | 2013-04-30 | 2014-10-30 | Research & Business Foundation Sungkyunkwan University | Multilayer encapsulation thin-film |
| US20160108524A1 (en) * | 2014-10-17 | 2016-04-21 | Lotus Applied Technology, Llc | High-speed deposition of mixed oxide barrier films |
| EP3234216A2 (en) * | 2014-12-19 | 2017-10-25 | Fujifilm Manufacturing Europe BV | Transparent sheet materials |
| JP5795427B1 (ja) * | 2014-12-26 | 2015-10-14 | 竹本容器株式会社 | 被膜付き樹脂容器の製造方法及び樹脂容器被覆装置 |
| CH710826A1 (de) * | 2015-03-06 | 2016-09-15 | Fofitec Ag | Vorrichtungen und Verfahren zur Abscheidung dünner Schichten auf einer laufenden Folienbahn sowie Folienbahn oder Zuschnitte daraus. |
| KR101704723B1 (ko) * | 2015-04-06 | 2017-02-09 | 연세대학교 산학협력단 | 탄소 박막 소자 및 이의 제조 방법 |
| CN107815665A (zh) * | 2016-09-14 | 2018-03-20 | 中国科学院上海硅酸盐研究所 | 一种二氧化钛薄膜及其制备方法和应用 |
| CN106947957A (zh) * | 2017-03-01 | 2017-07-14 | 秦皇岛博硕光电设备股份有限公司 | 食品/药品容器的加工方法、食品/药品容器用材料及食品/药品容器 |
| EP3641951B1 (en) | 2017-06-22 | 2023-09-20 | The Procter & Gamble Company | Films including a water-soluble layer and a vapor-deposited organic coating |
| US10450119B2 (en) * | 2017-06-22 | 2019-10-22 | The Procter & Gamble Company | Films including a water-soluble layer and a vapor-deposited inorganic coating |
| JP7014291B2 (ja) * | 2018-04-12 | 2022-02-01 | 信越化学工業株式会社 | 光触媒転写フィルム及びその製造方法 |
| CN113454263A (zh) * | 2019-02-20 | 2021-09-28 | 松下知识产权经营株式会社 | 制膜方法、制膜装置及电极箔的制造方法 |
| EP3771751A1 (en) * | 2019-08-02 | 2021-02-03 | AR Metallizing N.V. | Multi-metal layer wvtr barrier products on water vapour and oxygen permeable bio-based substrates |
| CN115685301B (zh) * | 2023-01-04 | 2023-04-07 | 中创智科(绵阳)科技有限公司 | 一种防爆型氚浓度测量仪 |
| CN117301589A (zh) * | 2023-11-02 | 2023-12-29 | 江苏思尔德科技有限公司 | 一种柔性显示用高阻隔膜制备方法 |
Family Cites Families (49)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SE393967B (sv) * | 1974-11-29 | 1977-05-31 | Sateko Oy | Forfarande och for utforande av stroleggning mellan lagren i ett virkespaket |
| US4389973A (en) * | 1980-03-18 | 1983-06-28 | Oy Lohja Ab | Apparatus for performing growth of compound thin films |
| US5256205A (en) * | 1990-05-09 | 1993-10-26 | Jet Process Corporation | Microwave plasma assisted supersonic gas jet deposition of thin film materials |
| DE4228853C2 (de) * | 1991-09-18 | 1993-10-21 | Schott Glaswerke | Optischer Wellenleiter mit einem planaren oder nur geringfügig gewölbten Substrat und Verfahren zu dessen Herstellung sowie Verwendung eines solchen |
| US5686360A (en) * | 1995-11-30 | 1997-11-11 | Motorola | Passivation of organic devices |
| US5817550A (en) * | 1996-03-05 | 1998-10-06 | Regents Of The University Of California | Method for formation of thin film transistors on plastic substrates |
| US6342277B1 (en) * | 1996-08-16 | 2002-01-29 | Licensee For Microelectronics: Asm America, Inc. | Sequential chemical vapor deposition |
| US5693956A (en) * | 1996-07-29 | 1997-12-02 | Motorola | Inverted oleds on hard plastic substrate |
| US6090442A (en) * | 1997-04-14 | 2000-07-18 | University Technology Corporation | Method of growing films on substrates at room temperatures using catalyzed binary reaction sequence chemistry |
| US6165554A (en) * | 1997-11-12 | 2000-12-26 | Jet Process Corporation | Method for hydrogen atom assisted jet vapor deposition for parylene N and other polymeric thin films |
| US6200893B1 (en) * | 1999-03-11 | 2001-03-13 | Genus, Inc | Radical-assisted sequential CVD |
| US6812157B1 (en) * | 1999-06-24 | 2004-11-02 | Prasad Narhar Gadgil | Apparatus for atomic layer chemical vapor deposition |
| US20040224504A1 (en) * | 2000-06-23 | 2004-11-11 | Gadgil Prasad N. | Apparatus and method for plasma enhanced monolayer processing |
| US6664186B1 (en) * | 2000-09-29 | 2003-12-16 | International Business Machines Corporation | Method of film deposition, and fabrication of structures |
| US7476420B2 (en) * | 2000-10-23 | 2009-01-13 | Asm International N.V. | Process for producing metal oxide films at low temperatures |
| US6689220B1 (en) * | 2000-11-22 | 2004-02-10 | Simplus Systems Corporation | Plasma enhanced pulsed layer deposition |
| KR100421219B1 (ko) * | 2001-06-14 | 2004-03-02 | 삼성전자주식회사 | β-디케톤 리간드를 갖는 유기 금속 착물을 이용한 원자층증착방법 |
| WO2003008110A1 (en) * | 2001-07-18 | 2003-01-30 | The Regents Of The University Of Colorado | A method of depositing an inorganic film on an organic polymer |
| US6820570B2 (en) * | 2001-08-15 | 2004-11-23 | Nobel Biocare Services Ag | Atomic layer deposition reactor |
| US6794220B2 (en) * | 2001-09-05 | 2004-09-21 | Konica Corporation | Organic thin-film semiconductor element and manufacturing method for the same |
| US6932871B2 (en) * | 2002-04-16 | 2005-08-23 | Applied Materials, Inc. | Multi-station deposition apparatus and method |
| TWI278532B (en) * | 2002-06-23 | 2007-04-11 | Asml Us Inc | Method for energy-assisted atomic layer deposition and removal |
| US6827789B2 (en) * | 2002-07-01 | 2004-12-07 | Semigear, Inc. | Isolation chamber arrangement for serial processing of semiconductor wafers for the electronic industry |
| US6797337B2 (en) * | 2002-08-19 | 2004-09-28 | Micron Technology, Inc. | Method for delivering precursors |
| CN1756856B (zh) * | 2003-02-27 | 2011-10-12 | 希莫菲克斯公司 | 电介质阻挡层膜 |
| US7294360B2 (en) * | 2003-03-31 | 2007-11-13 | Planar Systems, Inc. | Conformal coatings for micro-optical elements, and method for making the same |
| US6888172B2 (en) * | 2003-04-11 | 2005-05-03 | Eastman Kodak Company | Apparatus and method for encapsulating an OLED formed on a flexible substrate |
| WO2004105149A1 (en) * | 2003-05-16 | 2004-12-02 | E.I. Dupont De Nemours And Company | Barrier films for plastic substrates fabricated by atomic layer deposition |
| US20040261703A1 (en) * | 2003-06-27 | 2004-12-30 | Jeffrey D. Chinn | Apparatus and method for controlled application of reactive vapors to produce thin films and coatings |
| US7323231B2 (en) * | 2003-10-09 | 2008-01-29 | Micron Technology, Inc. | Apparatus and methods for plasma vapor deposition processes |
| US7074719B2 (en) * | 2003-11-28 | 2006-07-11 | International Business Machines Corporation | ALD deposition of ruthenium |
| WO2005074330A1 (en) * | 2004-01-28 | 2005-08-11 | Agency For Science, Technology And Research | Multicolor organic light emitting devices |
| US20050221021A1 (en) * | 2004-03-31 | 2005-10-06 | Tokyo Electron Limited | Method and system for performing atomic layer deposition |
| US7482037B2 (en) * | 2004-08-20 | 2009-01-27 | Micron Technology, Inc. | Methods for forming niobium and/or vanadium containing layers using atomic layer deposition |
| US7399668B2 (en) * | 2004-09-30 | 2008-07-15 | 3M Innovative Properties Company | Method for making electronic devices having a dielectric layer surface treatment |
| JP5464775B2 (ja) * | 2004-11-19 | 2014-04-09 | エイエスエム インターナショナル エヌ.ヴェー. | 低温での金属酸化物膜の製造方法 |
| JP4865214B2 (ja) * | 2004-12-20 | 2012-02-01 | 東京エレクトロン株式会社 | 成膜方法および記憶媒体 |
| US20090194233A1 (en) * | 2005-06-23 | 2009-08-06 | Tokyo Electron Limited | Component for semicondutor processing apparatus and manufacturing method thereof |
| JP2007098679A (ja) * | 2005-09-30 | 2007-04-19 | Dainippon Printing Co Ltd | ガスバリアフィルムおよびその製造方法 |
| ATE507320T1 (de) * | 2006-03-26 | 2011-05-15 | Lotus Applied Technology Llc | Atomlagenabscheidungssystem und verfahren zur beschichtung von flexiblen substraten |
| US20070281105A1 (en) * | 2006-06-02 | 2007-12-06 | Nima Mokhlesi | Atomic Layer Deposition of Oxides Using Krypton as an Ion Generating Feeding Gas |
| US20070281089A1 (en) * | 2006-06-05 | 2007-12-06 | General Electric Company | Systems and methods for roll-to-roll atomic layer deposition on continuously fed objects |
| JP2009540562A (ja) * | 2006-06-05 | 2009-11-19 | ダウ・コーニング・コーポレイション | 電子パッケージ及びその製造方法 |
| US7663312B2 (en) * | 2006-07-24 | 2010-02-16 | Munisamy Anandan | Flexible OLED light source |
| US8187679B2 (en) * | 2006-07-29 | 2012-05-29 | Lotus Applied Technology, Llc | Radical-enhanced atomic layer deposition system and method |
| US20080119098A1 (en) * | 2006-11-21 | 2008-05-22 | Igor Palley | Atomic layer deposition on fibrous materials |
| US7781031B2 (en) * | 2006-12-06 | 2010-08-24 | General Electric Company | Barrier layer, composite article comprising the same, electroactive device, and method |
| WO2009070574A2 (en) * | 2007-11-27 | 2009-06-04 | North Carolina State University | Methods for modification of polymers, fibers and textile media |
| US8945675B2 (en) * | 2008-05-29 | 2015-02-03 | Asm International N.V. | Methods for forming conductive titanium oxide thin films |
-
2009
- 2009-12-07 US US12/632,749 patent/US20100143710A1/en not_active Abandoned
- 2009-12-07 KR KR1020117012495A patent/KR20110100618A/ko not_active Withdrawn
- 2009-12-07 BR BRPI0922795A patent/BRPI0922795A2/pt not_active IP Right Cessation
- 2009-12-07 JP JP2011539778A patent/JP2012511106A/ja active Pending
- 2009-12-07 EP EP09831274A patent/EP2364380A4/en not_active Withdrawn
- 2009-12-07 CN CN2009801486298A patent/CN102239278A/zh active Pending
- 2009-12-07 WO PCT/US2009/067024 patent/WO2010065966A2/en not_active Ceased
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