JPS5689703A - Manufacture of reflecting mirror for high output laser - Google Patents

Manufacture of reflecting mirror for high output laser

Info

Publication number
JPS5689703A
JPS5689703A JP16789179A JP16789179A JPS5689703A JP S5689703 A JPS5689703 A JP S5689703A JP 16789179 A JP16789179 A JP 16789179A JP 16789179 A JP16789179 A JP 16789179A JP S5689703 A JPS5689703 A JP S5689703A
Authority
JP
Japan
Prior art keywords
sio
refractive index
reflecting mirror
high output
output laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16789179A
Other languages
Japanese (ja)
Inventor
Shuntaro Watabe
Hiroshi Kashiwagi
Tamiji Kuki
Goro Negishi
Yoshiaki Sakurada
Satoru Yoshida
Masahiro Mori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NIPPON SHINKUU KOUGAKU KK
National Institute of Advanced Industrial Science and Technology AIST
Optical Coatings Japan
Original Assignee
NIPPON SHINKUU KOUGAKU KK
Agency of Industrial Science and Technology
Optical Coatings Japan
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NIPPON SHINKUU KOUGAKU KK, Agency of Industrial Science and Technology, Optical Coatings Japan filed Critical NIPPON SHINKUU KOUGAKU KK
Priority to JP16789179A priority Critical patent/JPS5689703A/en
Publication of JPS5689703A publication Critical patent/JPS5689703A/en
Pending legal-status Critical Current

Links

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  • Optical Elements Other Than Lenses (AREA)
  • Optical Filters (AREA)
  • Lasers (AREA)

Abstract

PURPOSE: To obtain a reflecting mirror for high output laser by alternately laminating a higher refractive index oxide substance and a lower refractive index oxide substance on a quartz or calcium fluoride substrate by a vapor depositing method using electron beams or a sputtering method to form a multilayer film followed by heat treatment.
CONSTITUTION: Al2O3, HfO2 or ZrO2 as a higher refractive index substance and SiO2 as a lower refractive index substance are alternately laminated on quartz or CaF2 by a sputtering method or a vapor depositing method using electron beams to form a multilayer film. ≥23 Layers and ≥49 layers are superposed in case of HfO2- SiO2 or ZrO2-SiO2 and Al2O3-SiO2, respectively. The multilayer film is then heat treated at 450W600°C for 10W24hr. Thus, a reflecting mirror for high output laser, especially ultraviolet rays is obtd. by such a simple method as heating.
COPYRIGHT: (C)1981,JPO&Japio
JP16789179A 1979-12-24 1979-12-24 Manufacture of reflecting mirror for high output laser Pending JPS5689703A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16789179A JPS5689703A (en) 1979-12-24 1979-12-24 Manufacture of reflecting mirror for high output laser

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16789179A JPS5689703A (en) 1979-12-24 1979-12-24 Manufacture of reflecting mirror for high output laser

Publications (1)

Publication Number Publication Date
JPS5689703A true JPS5689703A (en) 1981-07-21

Family

ID=15857975

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16789179A Pending JPS5689703A (en) 1979-12-24 1979-12-24 Manufacture of reflecting mirror for high output laser

Country Status (1)

Country Link
JP (1) JPS5689703A (en)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60218601A (en) * 1984-03-30 1985-11-01 スペクトラ‐フイジツクス・インコーポレイテツド Optical thin film interference coating with extremely narrowband for monowavelength laser
JPS62198182A (en) * 1986-02-25 1987-09-01 Komatsu Ltd Excimer laser
JPS62240903A (en) * 1986-04-14 1987-10-21 Toshiba Glass Co Ltd Multi-layered reflection mirror
JPS63208801A (en) * 1987-02-26 1988-08-30 Matsushita Electric Ind Co Ltd Mirror for excimer laser
JPH01161301A (en) * 1987-12-18 1989-06-26 Toshiba Glass Co Ltd Production of reflecting mirror of multilayered film
US4948530A (en) * 1988-09-26 1990-08-14 Patent-Treuhand-Gesellschaft Fur Elektrische Gluhlampen M.B.H. Method to make a reflective coating on high-pressure discharge lamps
US5151819A (en) * 1988-12-12 1992-09-29 General Atomics Barrier for scattering electromagnetic radiation
JPH05283883A (en) * 1992-04-01 1993-10-29 Takuo Nakajima Electromagnetic shield material
WO1996031927A1 (en) * 1995-04-07 1996-10-10 Kabushiki Kaisha Toshiba Ultraviolet laser and method of producing the same
JP2010196168A (en) * 2009-02-26 2010-09-09 Corning Inc WIDE-ANGLE HIGH REFLECTION MIRROR AT 193 nm
JP2013044978A (en) * 2011-08-25 2013-03-04 Mitsubishi Cable Ind Ltd Optical fiber structure for laser beam and method for manufacturing the same

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60218601A (en) * 1984-03-30 1985-11-01 スペクトラ‐フイジツクス・インコーポレイテツド Optical thin film interference coating with extremely narrowband for monowavelength laser
JPS62198182A (en) * 1986-02-25 1987-09-01 Komatsu Ltd Excimer laser
JPS62240903A (en) * 1986-04-14 1987-10-21 Toshiba Glass Co Ltd Multi-layered reflection mirror
JPS63208801A (en) * 1987-02-26 1988-08-30 Matsushita Electric Ind Co Ltd Mirror for excimer laser
JPH01161301A (en) * 1987-12-18 1989-06-26 Toshiba Glass Co Ltd Production of reflecting mirror of multilayered film
US4948530A (en) * 1988-09-26 1990-08-14 Patent-Treuhand-Gesellschaft Fur Elektrische Gluhlampen M.B.H. Method to make a reflective coating on high-pressure discharge lamps
US5151819A (en) * 1988-12-12 1992-09-29 General Atomics Barrier for scattering electromagnetic radiation
JPH05283883A (en) * 1992-04-01 1993-10-29 Takuo Nakajima Electromagnetic shield material
WO1996031927A1 (en) * 1995-04-07 1996-10-10 Kabushiki Kaisha Toshiba Ultraviolet laser and method of producing the same
US5694411A (en) * 1995-04-07 1997-12-02 Kabushiki Kaisha Toshiba Ultraviolet range laser and method for manufacturing the same
JP2010196168A (en) * 2009-02-26 2010-09-09 Corning Inc WIDE-ANGLE HIGH REFLECTION MIRROR AT 193 nm
JP2013044978A (en) * 2011-08-25 2013-03-04 Mitsubishi Cable Ind Ltd Optical fiber structure for laser beam and method for manufacturing the same

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