JPS64784A - Excimer laser device - Google Patents

Excimer laser device

Info

Publication number
JPS64784A
JPS64784A JP62159138A JP15913887A JPS64784A JP S64784 A JPS64784 A JP S64784A JP 62159138 A JP62159138 A JP 62159138A JP 15913887 A JP15913887 A JP 15913887A JP S64784 A JPS64784 A JP S64784A
Authority
JP
Japan
Prior art keywords
fluoride
window
reflection
thin films
reflection protective
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62159138A
Other languages
Japanese (ja)
Other versions
JPH0828542B2 (en
JPH01784A (en
Inventor
Masaaki Kaneko
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP15913887A priority Critical patent/JPH0828542B2/en
Publication of JPH01784A publication Critical patent/JPH01784A/en
Publication of JPS64784A publication Critical patent/JPS64784A/en
Publication of JPH0828542B2 publication Critical patent/JPH0828542B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Lasers (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

PURPOSE:To obtain an excimer laser device which has reflection protective films of a long life and can be put to a practical use by a method wherein the single layer or multilayer reflection protective films all whose layers are made of fluoride are provided on both the surfaces of a window through which an oscillated laser beam is transmitted out of a housing. CONSTITUTION:A window for taking out a laser beam is provided in a housing and the window has a reflection of 3.6% (fluorite)-4.1% (quartz). In order to avoid the reflection, reflection protective films are provided on both the surfaces of the window. The reflection protective film is made of fluoride. As the fluoride, one or more among neodymium fluoride (refractive index n=1.67), magnesium fluoride (n=1.43), thorium fluoride (n= 1.59), strontium fluoride (n=1.46), lanthanum fluoride (n= 1.59) and so forth are selected in accordance with optical design. In order to manufacture the window, for instance, NdF3 thin films (nd=1.66) with optical film thicknesses of lambda/4 are formed by vacuum evaporation on both the front and rear surfaces of the window material composed of a fluorite substrate (nd=1.47) as high refractive index thin films and, successively, MgF2 thin films (nd=1.405) with optical film thicknesses of lambda/4 are formed by vacuum evaporation as low refractive index thin films to build up double-layer reflection protective films (designed reference wavelength lambda=248nm).
JP15913887A 1987-02-27 1987-06-26 Excimer laser device Expired - Fee Related JPH0828542B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15913887A JPH0828542B2 (en) 1987-02-27 1987-06-26 Excimer laser device

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP4491087 1987-02-27
JP62-44910 1987-02-27
JP15913887A JPH0828542B2 (en) 1987-02-27 1987-06-26 Excimer laser device

Publications (3)

Publication Number Publication Date
JPH01784A JPH01784A (en) 1989-01-05
JPS64784A true JPS64784A (en) 1989-01-05
JPH0828542B2 JPH0828542B2 (en) 1996-03-21

Family

ID=26384881

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15913887A Expired - Fee Related JPH0828542B2 (en) 1987-02-27 1987-06-26 Excimer laser device

Country Status (1)

Country Link
JP (1) JPH0828542B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01223786A (en) * 1988-03-02 1989-09-06 Shinetsu Sekiei Kk Laser oscillator
DE10248707A1 (en) * 2002-10-18 2004-05-13 Tuilaser Ag Highly reflective mirror for an excimer laser comprises a substrate, a first highly reflective layer system formed on the inner side of the substrate, and a second highly reflective layer system formed on the outer side of the substrate
JP2004233474A (en) * 2003-01-29 2004-08-19 Mitsubishi Heavy Ind Ltd Optical system, usage of optical device using the optical system

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01223786A (en) * 1988-03-02 1989-09-06 Shinetsu Sekiei Kk Laser oscillator
DE10248707A1 (en) * 2002-10-18 2004-05-13 Tuilaser Ag Highly reflective mirror for an excimer laser comprises a substrate, a first highly reflective layer system formed on the inner side of the substrate, and a second highly reflective layer system formed on the outer side of the substrate
JP2004233474A (en) * 2003-01-29 2004-08-19 Mitsubishi Heavy Ind Ltd Optical system, usage of optical device using the optical system

Also Published As

Publication number Publication date
JPH0828542B2 (en) 1996-03-21

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees