JPS55570A - Multilayer antireflection film containing antiabsorption layer - Google Patents
Multilayer antireflection film containing antiabsorption layerInfo
- Publication number
- JPS55570A JPS55570A JP4239679A JP4239679A JPS55570A JP S55570 A JPS55570 A JP S55570A JP 4239679 A JP4239679 A JP 4239679A JP 4239679 A JP4239679 A JP 4239679A JP S55570 A JPS55570 A JP S55570A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- antiabsorption
- glass
- film thickness
- multilayer antireflection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
- H04R1/00—Details of transducers, loudspeakers or microphones
- H04R1/20—Arrangements for obtaining desired frequency or directional characteristics
- H04R1/32—Arrangements for obtaining desired frequency or directional characteristics for obtaining desired directional characteristic only
- H04R1/40—Arrangements for obtaining desired frequency or directional characteristics for obtaining desired directional characteristic only by combining a number of identical transducers
Landscapes
- Health & Medical Sciences (AREA)
- Otolaryngology (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Acoustics & Sound (AREA)
- Signal Processing (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
PURPOSE:To prevent the decrease in transmittance by providing the specific antiabsorption layer between glass and underlying contact layer in the multilayer antireflection film formed by way of the underlying contact layer of metal oxide on the glass containing assymetric metal ions. CONSTITUTION:An antiabsorption layer 1 of film thickness 5mmu or over composed of silicon oxide, selium fluoride, glass for vapor deposition or other is provided on glass 3 containing assymetric metal ions such as Pb<2+>, Sn<2+>. On this are formed an underlying contact layer II of metal oxide such as of, e.g., ZrO2, (film thickness; about lambda/2, lambda is the wavelength of the target light) and a layer I of MgF2 (film thickness; about lambda/4) to provide the multilayer antireflection film. The abovementioned antiabsorption layer 1 prevents the formation of any metal film on the glass 3 surface, prevents the decrease in transmittance, is effective at above film thickness 5mmu and is able to nearly perfectly prevent the decrease in transmittance at above film thickness 10mmu.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4239679A JPS55570A (en) | 1979-04-06 | 1979-04-06 | Multilayer antireflection film containing antiabsorption layer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4239679A JPS55570A (en) | 1979-04-06 | 1979-04-06 | Multilayer antireflection film containing antiabsorption layer |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6747074A Division JPS5442629B2 (en) | 1974-06-12 | 1974-06-12 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS55570A true JPS55570A (en) | 1980-01-05 |
Family
ID=12634897
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4239679A Pending JPS55570A (en) | 1979-04-06 | 1979-04-06 | Multilayer antireflection film containing antiabsorption layer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55570A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6098401A (en) * | 1983-11-02 | 1985-06-01 | Hitachi Ltd | Plastic optical parts |
EP0231112A2 (en) * | 1986-01-28 | 1987-08-05 | Minnesota Mining And Manufacturing Company | Imageable material and process |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3176575A (en) * | 1960-12-19 | 1965-04-06 | Bell & Howell Co | Low reflectance optical member coatings with barrier layer |
-
1979
- 1979-04-06 JP JP4239679A patent/JPS55570A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3176575A (en) * | 1960-12-19 | 1965-04-06 | Bell & Howell Co | Low reflectance optical member coatings with barrier layer |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6098401A (en) * | 1983-11-02 | 1985-06-01 | Hitachi Ltd | Plastic optical parts |
JPH0549962B2 (en) * | 1983-11-02 | 1993-07-27 | Hitachi Ltd | |
EP0231112A2 (en) * | 1986-01-28 | 1987-08-05 | Minnesota Mining And Manufacturing Company | Imageable material and process |
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