JPS559502A - Substrate for electrophotographic material - Google Patents

Substrate for electrophotographic material

Info

Publication number
JPS559502A
JPS559502A JP8085778A JP8085778A JPS559502A JP S559502 A JPS559502 A JP S559502A JP 8085778 A JP8085778 A JP 8085778A JP 8085778 A JP8085778 A JP 8085778A JP S559502 A JPS559502 A JP S559502A
Authority
JP
Japan
Prior art keywords
electrophotographic material
substrate
transparent
thicknesses
evaporated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8085778A
Other languages
Japanese (ja)
Other versions
JPS6339903B2 (en
Inventor
Takeo Kazami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP8085778A priority Critical patent/JPS559502A/en
Publication of JPS559502A publication Critical patent/JPS559502A/en
Publication of JPS6339903B2 publication Critical patent/JPS6339903B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE: To make the substrate for the electrophotographic material transparent and enable sufficient charging quantity to be obtained by providing two layers of the specific conductive films on the surface of a transparent resin film.
CONSTITUTION: A thin layer of conductive metal oxide such as of SnO2 is evaporated or suputtered to thicknesses 500 to 3000Å on a transparent synthetic resin film of thickness 0.05mm or over. On this is evaporated or sputtered a thin film of Al to thicknesses 200 to 600Å. This enables the electrophotographic material used for such applications where radiation of light from the substrate side is required to be obtained and the electrophotographic material used for overhead projectors and micro photographic films to be prepared.
COPYRIGHT: (C)1980,JPO&Japio
JP8085778A 1978-07-05 1978-07-05 Substrate for electrophotographic material Granted JPS559502A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8085778A JPS559502A (en) 1978-07-05 1978-07-05 Substrate for electrophotographic material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8085778A JPS559502A (en) 1978-07-05 1978-07-05 Substrate for electrophotographic material

Publications (2)

Publication Number Publication Date
JPS559502A true JPS559502A (en) 1980-01-23
JPS6339903B2 JPS6339903B2 (en) 1988-08-08

Family

ID=13730005

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8085778A Granted JPS559502A (en) 1978-07-05 1978-07-05 Substrate for electrophotographic material

Country Status (1)

Country Link
JP (1) JPS559502A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59185207A (en) * 1983-01-21 1984-10-20 アンネミングスベトリ−フ　ルイメス　ウント　バル　アン　バン　デル　ストラ−テン　ベ−．フア−． Paving method and glove used therein
JPS62157613A (en) * 1985-12-27 1987-07-13 株式会社　麗光 Transparent conductor
US4770964A (en) * 1986-12-23 1988-09-13 Xerox Corporation Magnetic imaging member and fabrication process therefor

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59185207A (en) * 1983-01-21 1984-10-20 アンネミングスベトリ−フ　ルイメス　ウント　バル　アン　バン　デル　ストラ−テン　ベ−．フア−． Paving method and glove used therein
JPH0347361B2 (en) * 1983-01-21 1991-07-19 Annemingusubetoriifu Ruimesu Unto Baru An Ban Deru Sutoraaten Bv
JPS62157613A (en) * 1985-12-27 1987-07-13 株式会社　麗光 Transparent conductor
US4770964A (en) * 1986-12-23 1988-09-13 Xerox Corporation Magnetic imaging member and fabrication process therefor

Also Published As

Publication number Publication date
JPS6339903B2 (en) 1988-08-08

Similar Documents

Publication Publication Date Title
JPS5340281A (en) Photo mask material and manufacturtof it
JPS52109926A (en) Metallic image forming material
JPS51147171A (en) Flat surface multilayer cathode
JPS559502A (en) Substrate for electrophotographic material
JPS5596951A (en) Negative for photomask
JPS5590954A (en) Photoconductor
JPS5451832A (en) Photomask material
JPS53120527A (en) Forming method of positive type radiation sensitive material layer
JPS5277728A (en) Electrophotographic light sensitive material
JPS5424983A (en) Weathering resistant film for reflecting heat rays
JPS52121325A (en) Electrophotographic light sensitive material
JPS54151843A (en) Substrate for photosensitive material for zerography
JPS5467429A (en) Metal image formation
JPS5526515A (en) Electrophotographic photoreceptor
ES477340A1 (en) Improvements in or relating to photographic copying material
JPS57208041A (en) Photoconductive target and its manufacture
JPS5647001A (en) Optical system
JPS54156650A (en) High durability mirror
JPS5570845A (en) Projection type mask transfer method and mask used for said method
JPS5375283A (en) Coating of fluororesins
JPS5672448A (en) Electrophotographic receptor
JPS55570A (en) Multilayer antireflection film containing antiabsorption layer
GB1165017A (en) Improvements in and relating to Electrophotography.
JPS51127181A (en) Films having selective transmittance for light
JPS5494055A (en) Optical attenuator