JPS54156650A - High durability mirror - Google Patents

High durability mirror

Info

Publication number
JPS54156650A
JPS54156650A JP6592378A JP6592378A JPS54156650A JP S54156650 A JPS54156650 A JP S54156650A JP 6592378 A JP6592378 A JP 6592378A JP 6592378 A JP6592378 A JP 6592378A JP S54156650 A JPS54156650 A JP S54156650A
Authority
JP
Japan
Prior art keywords
thin film
oxide
silicon
silicon dioxide
reflecting mirror
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6592378A
Other languages
Japanese (ja)
Other versions
JPS6236202B2 (en
Inventor
Noboru Sugawara
Susumu Ito
Sayoko Amano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP6592378A priority Critical patent/JPS54156650A/en
Publication of JPS54156650A publication Critical patent/JPS54156650A/en
Publication of JPS6236202B2 publication Critical patent/JPS6236202B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Optical Systems Of Projection Type Copiers (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure Or Original Feeding In Electrophotography (AREA)

Abstract

PURPOSE: To enhance durability by providing the specific silicon oxide thin film layers in a reflecting mirror using a metal thin film surface.
CONSTITUTION: Silicon monoxide is evaporated through resistance heating on the metal thin film of about 500 to 1500 Å in film thickness having been formed by evaporating aluminum on, e.g., a glass substrate, thence a thin film containing more than 80% of silicon dioxide is formed thereon through electron gun heating vapor deposition. It is desirable to so provide the thicknesses of the abovementioned both silicon oxide thin films that their respective optical thicknesses become about 1/2 the wavelength used. The thin film containing more than 80% of silicon dioxide is desirably constituted roughly by silicon dioxide; 80 to 90%, boron oxide; 8 to 15%; aluminum oxide; 1 to 4%, sodium oxide; 1 to 4%. The reflecting mirror formed in the abovementioned manner exhibits high durability even under severe conditions such as of use in a copying machine or the like.
COPYRIGHT: (C)1979,JPO&Japio
JP6592378A 1978-05-31 1978-05-31 High durability mirror Granted JPS54156650A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6592378A JPS54156650A (en) 1978-05-31 1978-05-31 High durability mirror

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6592378A JPS54156650A (en) 1978-05-31 1978-05-31 High durability mirror

Publications (2)

Publication Number Publication Date
JPS54156650A true JPS54156650A (en) 1979-12-10
JPS6236202B2 JPS6236202B2 (en) 1987-08-06

Family

ID=13300968

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6592378A Granted JPS54156650A (en) 1978-05-31 1978-05-31 High durability mirror

Country Status (1)

Country Link
JP (1) JPS54156650A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5611403A (en) * 1979-07-07 1981-02-04 Matsushita Electric Works Ltd Reflector
JPS5611402A (en) * 1979-07-07 1981-02-04 Matsushita Electric Works Ltd Reflector
US6798479B2 (en) * 2001-06-19 2004-09-28 Rohm Co., Ltd. Liquid crystal display device and process for making the same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5611403A (en) * 1979-07-07 1981-02-04 Matsushita Electric Works Ltd Reflector
JPS5611402A (en) * 1979-07-07 1981-02-04 Matsushita Electric Works Ltd Reflector
US6798479B2 (en) * 2001-06-19 2004-09-28 Rohm Co., Ltd. Liquid crystal display device and process for making the same

Also Published As

Publication number Publication date
JPS6236202B2 (en) 1987-08-06

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