JPS55110127A - Preparation of plastic antireflection film - Google Patents

Preparation of plastic antireflection film

Info

Publication number
JPS55110127A
JPS55110127A JP1823879A JP1823879A JPS55110127A JP S55110127 A JPS55110127 A JP S55110127A JP 1823879 A JP1823879 A JP 1823879A JP 1823879 A JP1823879 A JP 1823879A JP S55110127 A JPS55110127 A JP S55110127A
Authority
JP
Grant status
Application
Patent type
Prior art keywords
silicon
ri
zirconium
antireflection film
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1823879A
Inventor
Makoto Azuma
Yoichi Murayama
Original Assignee
Yoichi Murayama
Teijin Lens Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date

Links

Abstract

PURPOSE: To obtain an antireflection film having improved adhesion, resistance to boiling water and scuffing, by evaporating silicon monoxide and zirconium in the presence of oxygen, and by forming an oxide layer of higher degree than said compound on a plastic base board.
CONSTITUTION: A gas containing oxygen is introduced to evaporate silicon monoxide (which may contain a high-degree silicon oxide) and zirconium or its monoxide in a vacuum system. The vapor is then deposited on a plastic base board, if necessary ion bombarded, by radiofrequency ion plating or vacuum deposition in combination, to form a film of higher degree than said compound. A combination of the compounds provides an antireflection film comprising, e.g. films of silicon oxide of refractive index (RI) about 1.7, zirconium oxide of RI 1.2, and silicon dioxide of RI l.5 on the base film of silicon dioxide.
COPYRIGHT: (C)1980,JPO&Japio
JP1823879A 1979-02-19 1979-02-19 Preparation of plastic antireflection film Pending JPS55110127A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1823879A JPS55110127A (en) 1979-02-19 1979-02-19 Preparation of plastic antireflection film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1823879A JPS55110127A (en) 1979-02-19 1979-02-19 Preparation of plastic antireflection film

Publications (1)

Publication Number Publication Date
JPS55110127A true true JPS55110127A (en) 1980-08-25

Family

ID=11966091

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1823879A Pending JPS55110127A (en) 1979-02-19 1979-02-19 Preparation of plastic antireflection film

Country Status (1)

Country Link
JP (1) JPS55110127A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4361114A (en) * 1980-10-06 1982-11-30 Optical Coating Laboratory, Inc. Method and apparatus for forming thin film oxide layers using reactive evaporation techniques
US4500602A (en) * 1981-08-10 1985-02-19 Ltv Aerospace And Defense Co. Composite protective coating for carbon-carbon substrates
JPS63247349A (en) * 1987-04-01 1988-10-14 Sekisui Chem Co Ltd Manufacture of silicon oxide-coated resin body
WO1991002102A1 (en) * 1989-08-01 1991-02-21 Asahi Glass Company Ltd. Film based on silicon dioxide and production thereof
US5107791A (en) * 1987-12-17 1992-04-28 Toyo Ink Manufacturing Co., Ltd. Process for the manufacture of deposition films and apparatus therefor
US5230923A (en) * 1987-12-17 1993-07-27 Toyo Ink Manufacturing Co., Ltd. Process and apparatus for the substantially continuous manufacture of a silicon oxide deposition film on a flexible plastic film
US5354446A (en) * 1988-03-03 1994-10-11 Asahi Glass Company Ltd. Ceramic rotatable magnetron sputtering cathode target and process for its production
US5399435A (en) * 1988-03-03 1995-03-21 Asahi Glass Company Ltd. Amorphous oxide film and article having such film thereon

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4361114A (en) * 1980-10-06 1982-11-30 Optical Coating Laboratory, Inc. Method and apparatus for forming thin film oxide layers using reactive evaporation techniques
US4500602A (en) * 1981-08-10 1985-02-19 Ltv Aerospace And Defense Co. Composite protective coating for carbon-carbon substrates
JPS63247349A (en) * 1987-04-01 1988-10-14 Sekisui Chem Co Ltd Manufacture of silicon oxide-coated resin body
US5107791A (en) * 1987-12-17 1992-04-28 Toyo Ink Manufacturing Co., Ltd. Process for the manufacture of deposition films and apparatus therefor
US5230923A (en) * 1987-12-17 1993-07-27 Toyo Ink Manufacturing Co., Ltd. Process and apparatus for the substantially continuous manufacture of a silicon oxide deposition film on a flexible plastic film
US5354446A (en) * 1988-03-03 1994-10-11 Asahi Glass Company Ltd. Ceramic rotatable magnetron sputtering cathode target and process for its production
US5399435A (en) * 1988-03-03 1995-03-21 Asahi Glass Company Ltd. Amorphous oxide film and article having such film thereon
WO1991002102A1 (en) * 1989-08-01 1991-02-21 Asahi Glass Company Ltd. Film based on silicon dioxide and production thereof

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