DE102010002359B4 - Bei 193 nm stark reflektierender Weitwinkelspiegel und Verfahren zu dessen Herstellung - Google Patents

Bei 193 nm stark reflektierender Weitwinkelspiegel und Verfahren zu dessen Herstellung Download PDF

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Publication number
DE102010002359B4
DE102010002359B4 DE102010002359.0A DE102010002359A DE102010002359B4 DE 102010002359 B4 DE102010002359 B4 DE 102010002359B4 DE 102010002359 A DE102010002359 A DE 102010002359A DE 102010002359 B4 DE102010002359 B4 DE 102010002359B4
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Germany
Prior art keywords
coating
substrate
layer
range
amorphous
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DE102010002359.0A
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German (de)
English (en)
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DE102010002359A1 (de
Inventor
Horst Schreiber
Charlene M. Smith
Jue Wang
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Corning Inc
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Corning Inc
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
    • G02B5/0825—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only
    • G02B5/0833—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only comprising inorganic materials only
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
    • Y10T428/2495—Thickness [relative or absolute]
    • Y10T428/24967—Absolute thicknesses specified
    • Y10T428/24975—No layer or component greater than 5 mils thick
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264—Up to 3 mils
    • Y10T428/265—1 mil or less

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Optical Elements (AREA)
DE102010002359.0A 2009-02-26 2010-02-25 Bei 193 nm stark reflektierender Weitwinkelspiegel und Verfahren zu dessen Herstellung Active DE102010002359B4 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/393,287 US8153241B2 (en) 2009-02-26 2009-02-26 Wide-angle highly reflective mirrors at 193NM
US12/393,287 2009-02-26

Publications (2)

Publication Number Publication Date
DE102010002359A1 DE102010002359A1 (de) 2010-09-16
DE102010002359B4 true DE102010002359B4 (de) 2017-10-26

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DE102010002359.0A Active DE102010002359B4 (de) 2009-02-26 2010-02-25 Bei 193 nm stark reflektierender Weitwinkelspiegel und Verfahren zu dessen Herstellung

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Country Link
US (1) US8153241B2 (enExample)
JP (1) JP5661296B2 (enExample)
DE (1) DE102010002359B4 (enExample)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8163632B2 (en) 2006-12-04 2012-04-24 Carl Zeiss Smt Gmbh Irradiation with high energy ions for surface structuring and treatment of surface proximal sections of optical elements
DE102010017106A1 (de) * 2010-05-27 2011-12-01 Carl Zeiss Laser Optics Gmbh Spiegel mit dielektrischer Beschichtung
US20120307353A1 (en) 2011-05-31 2012-12-06 Horst Schreiber DURABLE MgO-MgF2 COMPOSITE FILM FOR INFRARED ANTI-REFLECTION COATINGS
DE102011054837A1 (de) 2011-10-26 2013-05-02 Carl Zeiss Laser Optics Gmbh Optisches Element
CN102520471A (zh) * 2011-12-30 2012-06-27 中国科学院上海光学精密机械研究所 偏振无关宽带反射光栅
US9482790B2 (en) 2012-05-31 2016-11-01 Corning Incorporated Silica-modified-fluoride broad angle anti-reflection coatings
US9696467B2 (en) * 2014-01-31 2017-07-04 Corning Incorporated UV and DUV expanded cold mirrors
EP3317886A4 (en) * 2015-06-30 2019-07-24 Jaiswal, Supriya COATINGS FOR EXTREME ULTRAVIOLETTE AND SOFT X-RAY OPTICS
WO2018013757A2 (en) 2016-07-14 2018-01-18 Corning Incorporated Methods of reducing surface roughness of reflectance coatings for duv mirrors
US20180024276A1 (en) 2016-07-21 2018-01-25 Corning Incorporated Optical elements with stress-balancing coatings
LT6505B (lt) * 2016-08-18 2018-04-10 Valstybinis mokslinių tyrimų institutas Fizinių ir technologijos mokslų centras Interferencinė danga arba jos dalis iš sluoksnių, pasižyminčių skirtingu porėtumu
CN109355629B (zh) * 2018-11-27 2020-12-11 杭州科汀光学技术有限公司 一种薄膜滤光片的低温制备方法
CN110441844A (zh) * 2019-06-24 2019-11-12 东莞理工学院 一种10 kW半导体激光器用高反膜及其制备方法
CN111897039B (zh) * 2020-08-19 2021-07-27 重庆大学 紫外光平面反射镜及其应用以及制备方法
TWI853580B (zh) * 2020-10-30 2024-08-21 美商希瑪有限責任公司 用於深紫外線光源之光學組件
DE102021206788A1 (de) 2021-06-30 2023-01-05 Carl Zeiss Smt Gmbh Verfahren zum Abscheiden einer Schicht, optisches Element und optische Anordnung für den DUV-Wellenlängenbereich
CN117991427B (zh) * 2024-03-13 2024-08-09 同济大学 一种低损耗、高反射率的193nm薄膜及其制备方法

Citations (2)

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Publication number Priority date Publication date Assignee Title
US20050147894A1 (en) * 2003-12-31 2005-07-07 Lee Sang H. Extreme ultraviolet mask with molybdenum phase shifter
US20060222961A1 (en) * 2005-03-31 2006-10-05 Pei-Yang Yan Leaky absorber for extreme ultraviolet mask

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JPS5689703A (en) * 1979-12-24 1981-07-21 Agency Of Ind Science & Technol Manufacture of reflecting mirror for high output laser
JPH08220304A (ja) * 1995-02-13 1996-08-30 Tadahiro Omi 光学物品及びそれを用いた露光装置又は光学系並びにその製造方法
JP4161387B2 (ja) * 1997-01-23 2008-10-08 株式会社ニコン 多層反射防止膜
JPH11101903A (ja) * 1997-09-29 1999-04-13 Nikon Corp エキシマレーザ用高反射鏡
JPH11121841A (ja) * 1997-10-21 1999-04-30 Canon Inc レーザー用反射鏡
JP2001074931A (ja) * 1999-08-31 2001-03-23 Nikon Corp 光学薄膜及び光学素子及び光学装置
JP3932775B2 (ja) * 2000-06-21 2007-06-20 松下電工株式会社 光反射体及び反射型照明装置
JP2002348117A (ja) * 2001-05-28 2002-12-04 Japan Atom Energy Res Inst 高密度電子励起によるＭｇＡｌ２Ｏ４の非晶質化方法
WO2005081021A1 (ja) * 2004-02-24 2005-09-01 Matsushita Electric Works, Ltd. 光反射体及びこの光反射体を有する照明器具
US7506521B2 (en) * 2004-12-29 2009-03-24 Corning Incorporated High transmission synthetic silica glass and method of making same
JP4199742B2 (ja) 2005-02-28 2008-12-17 エルピーダメモリ株式会社 遅延回路、及びこれらを備えた半導体装置
US7465681B2 (en) * 2006-08-25 2008-12-16 Corning Incorporated Method for producing smooth, dense optical films
EP1965229A3 (en) * 2007-02-28 2008-12-10 Corning Incorporated Engineered fluoride-coated elements for laser systems

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050147894A1 (en) * 2003-12-31 2005-07-07 Lee Sang H. Extreme ultraviolet mask with molybdenum phase shifter
US20060222961A1 (en) * 2005-03-31 2006-10-05 Pei-Yang Yan Leaky absorber for extreme ultraviolet mask

Also Published As

Publication number Publication date
US20100215932A1 (en) 2010-08-26
JP5661296B2 (ja) 2015-01-28
DE102010002359A1 (de) 2010-09-16
JP2010196168A (ja) 2010-09-09
US8153241B2 (en) 2012-04-10

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