JP2015523917A5 - - Google Patents

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Publication number
JP2015523917A5
JP2015523917A5 JP2015510287A JP2015510287A JP2015523917A5 JP 2015523917 A5 JP2015523917 A5 JP 2015523917A5 JP 2015510287 A JP2015510287 A JP 2015510287A JP 2015510287 A JP2015510287 A JP 2015510287A JP 2015523917 A5 JP2015523917 A5 JP 2015523917A5
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JP
Japan
Prior art keywords
composite material
soc
layer
polymer substrate
soc layer
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Application number
JP2015510287A
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English (en)
Japanese (ja)
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JP2015523917A (ja
JP6421114B2 (ja
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Priority claimed from US13/833,686 external-priority patent/US10787591B2/en
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Publication of JP2015523917A publication Critical patent/JP2015523917A/ja
Publication of JP2015523917A5 publication Critical patent/JP2015523917A5/ja
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Publication of JP6421114B2 publication Critical patent/JP6421114B2/ja
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JP2015510287A 2012-04-30 2013-03-28 シリコンオキシカーバイド層を含む複合材料、及び複合材料を形成する方法 Active JP6421114B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201261640293P 2012-04-30 2012-04-30
US61/640,293 2012-04-30
US13/833,686 2013-03-15
US13/833,686 US10787591B2 (en) 2012-04-30 2013-03-15 Composites including silicon-oxy-carbide layers and methods of making the same
PCT/US2013/034435 WO2014007894A2 (en) 2012-04-30 2013-03-28 Composites including silicon-oxy-carbide layers and methods of making the same

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2018159930A Division JP2019022984A (ja) 2012-04-30 2018-08-29 シリコンオキシカーバイド層を含む複合材料、及び複合材料を形成する方法

Publications (3)

Publication Number Publication Date
JP2015523917A JP2015523917A (ja) 2015-08-20
JP2015523917A5 true JP2015523917A5 (enExample) 2016-05-19
JP6421114B2 JP6421114B2 (ja) 2018-11-07

Family

ID=49477561

Family Applications (2)

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JP2015510287A Active JP6421114B2 (ja) 2012-04-30 2013-03-28 シリコンオキシカーバイド層を含む複合材料、及び複合材料を形成する方法
JP2018159930A Pending JP2019022984A (ja) 2012-04-30 2018-08-29 シリコンオキシカーバイド層を含む複合材料、及び複合材料を形成する方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2018159930A Pending JP2019022984A (ja) 2012-04-30 2018-08-29 シリコンオキシカーバイド層を含む複合材料、及び複合材料を形成する方法

Country Status (5)

Country Link
US (1) US10787591B2 (enExample)
EP (2) EP3428311B1 (enExample)
JP (2) JP6421114B2 (enExample)
AU (1) AU2013287214B2 (enExample)
WO (1) WO2014007894A2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9786491B2 (en) 2015-11-12 2017-10-10 Asm Ip Holding B.V. Formation of SiOCN thin films
KR102378021B1 (ko) * 2016-05-06 2022-03-23 에이에스엠 아이피 홀딩 비.브이. SiOC 박막의 형성
US10847529B2 (en) 2017-04-13 2020-11-24 Asm Ip Holding B.V. Substrate processing method and device manufactured by the same
CN114875388A (zh) 2017-05-05 2022-08-09 Asm Ip 控股有限公司 用于受控形成含氧薄膜的等离子体增强沉积方法
KR20190065962A (ko) 2017-12-04 2019-06-12 에이에스엠 아이피 홀딩 비.브이. 유전체와 금속 표면 상에 SiOC의 균일한 증착
US12142479B2 (en) 2020-01-17 2024-11-12 Asm Ip Holding B.V. Formation of SiOCN thin films
US12341005B2 (en) 2020-01-17 2025-06-24 Asm Ip Holding B.V. Formation of SiCN thin films

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