JP2015523917A5 - - Google Patents

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Publication number
JP2015523917A5
JP2015523917A5 JP2015510287A JP2015510287A JP2015523917A5 JP 2015523917 A5 JP2015523917 A5 JP 2015523917A5 JP 2015510287 A JP2015510287 A JP 2015510287A JP 2015510287 A JP2015510287 A JP 2015510287A JP 2015523917 A5 JP2015523917 A5 JP 2015523917A5
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JP
Japan
Prior art keywords
composite material
soc
layer
polymer substrate
soc layer
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JP2015510287A
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English (en)
Japanese (ja)
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JP6421114B2 (ja
JP2015523917A (ja
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Priority claimed from US13/833,686 external-priority patent/US10787591B2/en
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Publication of JP2015523917A publication Critical patent/JP2015523917A/ja
Publication of JP2015523917A5 publication Critical patent/JP2015523917A5/ja
Application granted granted Critical
Publication of JP6421114B2 publication Critical patent/JP6421114B2/ja
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JP2015510287A 2012-04-30 2013-03-28 シリコンオキシカーバイド層を含む複合材料、及び複合材料を形成する方法 Active JP6421114B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201261640293P 2012-04-30 2012-04-30
US61/640,293 2012-04-30
US13/833,686 2013-03-15
US13/833,686 US10787591B2 (en) 2012-04-30 2013-03-15 Composites including silicon-oxy-carbide layers and methods of making the same
PCT/US2013/034435 WO2014007894A2 (en) 2012-04-30 2013-03-28 Composites including silicon-oxy-carbide layers and methods of making the same

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2018159930A Division JP2019022984A (ja) 2012-04-30 2018-08-29 シリコンオキシカーバイド層を含む複合材料、及び複合材料を形成する方法

Publications (3)

Publication Number Publication Date
JP2015523917A JP2015523917A (ja) 2015-08-20
JP2015523917A5 true JP2015523917A5 (enExample) 2016-05-19
JP6421114B2 JP6421114B2 (ja) 2018-11-07

Family

ID=49477561

Family Applications (2)

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JP2015510287A Active JP6421114B2 (ja) 2012-04-30 2013-03-28 シリコンオキシカーバイド層を含む複合材料、及び複合材料を形成する方法
JP2018159930A Pending JP2019022984A (ja) 2012-04-30 2018-08-29 シリコンオキシカーバイド層を含む複合材料、及び複合材料を形成する方法

Family Applications After (1)

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JP2018159930A Pending JP2019022984A (ja) 2012-04-30 2018-08-29 シリコンオキシカーバイド層を含む複合材料、及び複合材料を形成する方法

Country Status (5)

Country Link
US (1) US10787591B2 (enExample)
EP (2) EP3428311B1 (enExample)
JP (2) JP6421114B2 (enExample)
AU (1) AU2013287214B2 (enExample)
WO (1) WO2014007894A2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9786491B2 (en) 2015-11-12 2017-10-10 Asm Ip Holding B.V. Formation of SiOCN thin films
KR102378021B1 (ko) * 2016-05-06 2022-03-23 에이에스엠 아이피 홀딩 비.브이. SiOC 박막의 형성
US10847529B2 (en) 2017-04-13 2020-11-24 Asm Ip Holding B.V. Substrate processing method and device manufactured by the same
KR102805403B1 (ko) 2017-05-05 2025-05-13 에이에스엠 아이피 홀딩 비.브이. 산소 함유 박막의 형성을 제어하기 위한 플라즈마 강화 증착 공정
US10991573B2 (en) 2017-12-04 2021-04-27 Asm Ip Holding B.V. Uniform deposition of SiOC on dielectric and metal surfaces
US12142479B2 (en) 2020-01-17 2024-11-12 Asm Ip Holding B.V. Formation of SiOCN thin films
US12341005B2 (en) 2020-01-17 2025-06-24 Asm Ip Holding B.V. Formation of SiCN thin films

Family Cites Families (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3745149A (en) 1971-09-29 1973-07-10 Nasa Preparation of polyimides from mixtures of monomeric diamines and esters of polycarboxylic acids
US5654396A (en) 1983-09-27 1997-08-05 The Boeing Company Polyimide oligomers
US5081198A (en) 1988-09-28 1992-01-14 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Tough, high performance, addition-type thermoplastic polymers
US5338827A (en) 1990-01-30 1994-08-16 Trw Inc. Polyimide resins useful at high temperatures
US5171822A (en) 1991-02-11 1992-12-15 The United States Of America As Represented By The Administrator Of National Aeronautics And Space Administration Low toxicity high temperature pmr polyimide
JP3232124B2 (ja) * 1992-05-20 2001-11-26 鐘淵化学工業株式会社 硬化性組成物
US5846649A (en) 1994-03-03 1998-12-08 Monsanto Company Highly durable and abrasion-resistant dielectric coatings for lenses
US5412066A (en) 1994-03-03 1995-05-02 Ther United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Phenylethynyl terminated imide oligomers
US5853877A (en) * 1996-05-31 1998-12-29 Hyperion Catalysis International, Inc. Method for disentangling hollow carbon microfibers, electrically conductive transparent carbon microfibers aggregation film amd coating for forming such film
US6214451B1 (en) * 1996-12-10 2001-04-10 Takiron Co., Ltd. Formable antistatic resin molded article
US5826366A (en) * 1997-01-16 1998-10-27 Matibe; Jeffrey T. Illuminated fishing rod
US6194036B1 (en) 1997-10-20 2001-02-27 The Regents Of The University Of California Deposition of coatings using an atmospheric pressure plasma jet
US5939521A (en) * 1998-01-23 1999-08-17 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Polyimides based on 4,4'-bis (4-aminophenoxy)-2,2'or 2,2', 6,6'-substituted biphenyl
US6124035A (en) 1999-04-13 2000-09-26 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration High temperature transfer molding resins
DE19932417A1 (de) * 1999-07-15 2001-01-18 Hoechst Trespaphan Gmbh Papierähnliche Kunststoffolie
JP4066229B2 (ja) * 2001-02-14 2008-03-26 株式会社カネカ 硬化剤、硬化性組成物、光学材料用組成物、光学材料、その製造方法、並びに、それを用いた液晶表示装置及びled
US6841652B2 (en) * 2001-05-17 2005-01-11 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Space environmentally durable polyimides and copolyimides
DE10131156A1 (de) * 2001-06-29 2003-01-16 Fraunhofer Ges Forschung Arikel mit plasmapolymerer Beschichtung und Verfahren zu dessen Herstellung
US6958192B2 (en) 2002-04-05 2005-10-25 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Polyimides from 2,3,3′,4′-biphenyltetracarboxylic dianhydride and aromatic diamines
US7015640B2 (en) 2002-09-11 2006-03-21 General Electric Company Diffusion barrier coatings having graded compositions and devices incorporating the same
US8704211B2 (en) 2004-06-30 2014-04-22 General Electric Company High integrity protective coatings
JP4338495B2 (ja) 2002-10-30 2009-10-07 富士通マイクロエレクトロニクス株式会社 シリコンオキシカーバイド、半導体装置、および半導体装置の製造方法
US7041778B1 (en) 2003-06-05 2006-05-09 The United States Of America As Represented By The Secretary Of The Air Force Processable thermally stable addition polyimide for composite applications
US7960030B2 (en) * 2004-05-14 2011-06-14 Dow Corning Corporation Free films made of cured organopolysiloxane resins, process for production thereof, and laminated films
US20060063015A1 (en) * 2004-09-23 2006-03-23 3M Innovative Properties Company Protected polymeric film
JP2006123306A (ja) * 2004-10-28 2006-05-18 Dainippon Printing Co Ltd ガスバリア性積層体
US8092910B2 (en) * 2005-02-16 2012-01-10 Dow Corning Toray Co., Ltd. Reinforced silicone resin film and method of preparing same
JP2009511290A (ja) 2005-10-05 2009-03-19 ダウ・コーニング・コーポレイション 被覆基板及びその製造方法
US20070196633A1 (en) 2005-11-30 2007-08-23 Coak Craig E Durable transparent coatings for polymeric substrates
US7776404B2 (en) 2006-11-30 2010-08-17 General Electric Company Methods for forming thermal oxidative barrier coatings on organic matrix composite substrates
US7776433B2 (en) 2006-11-30 2010-08-17 General Electric Company Thermal oxidative barrier coatings for organic matrix composite substrates and coated articles
US7776434B2 (en) 2006-05-12 2010-08-17 General Electric Company Organic matrix composite structures and thermal oxidative barrier coating therefor
FR2902422B1 (fr) 2006-06-16 2008-07-25 Saint Gobain Procede de depot par plasma atmopherique d'un revetement hydrophobe/oleophobe a durabilite amelioree
US20100178490A1 (en) * 2007-03-28 2010-07-15 Glenn Cerny Roll-to-roll plasma enhanced chemical vapor deposition method of barrier layers comprising silicon and carbon
JP5222940B2 (ja) 2007-05-01 2013-06-26 エグザテック・リミテッド・ライアビリティー・カンパニー プラズマコーティングのエッジヒーリング及び現場修復
KR101408510B1 (ko) * 2007-05-18 2014-06-17 삼성전자주식회사 표시소자용 연성기판 및 이를 이용한 디스플레이 소자
US8273842B2 (en) * 2007-11-09 2012-09-25 Kaneka Corporation Process for production of cyclic polyorganosiloxane, curing agent, curable composition, and cured product of the curable composition
US7799843B2 (en) * 2008-02-29 2010-09-21 Fujifilm Corporation Film
JP5244622B2 (ja) * 2009-01-08 2013-07-24 三菱樹脂株式会社 ガスバリア性フィルム
US8206794B2 (en) 2009-05-04 2012-06-26 The Boeing Company System and method for applying abrasion-resistant coatings
JP2011039283A (ja) * 2009-08-11 2011-02-24 Konica Minolta Holdings Inc 調光素子
US20120035057A1 (en) * 2010-08-03 2012-02-09 Alexandre Bratkovski Room-temperature superconductive-like diode device

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