JP6421114B2 - シリコンオキシカーバイド層を含む複合材料、及び複合材料を形成する方法 - Google Patents

シリコンオキシカーバイド層を含む複合材料、及び複合材料を形成する方法 Download PDF

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JP6421114B2
JP6421114B2 JP2015510287A JP2015510287A JP6421114B2 JP 6421114 B2 JP6421114 B2 JP 6421114B2 JP 2015510287 A JP2015510287 A JP 2015510287A JP 2015510287 A JP2015510287 A JP 2015510287A JP 6421114 B2 JP6421114 B2 JP 6421114B2
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layer
composite material
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substrate
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JP2015523917A5 (enExample
JP2015523917A (ja
Inventor
トーマス ケー． ツォチス，
トーマス ケー． ツォチス，
マーヴィ エー． マトス，
マーヴィ エー． マトス，
アルポナ ラーナデー，
アルポナ ラーナデー，
ローラ エム． マーフィー，
ローラ エム． マーフィー，
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Boeing Co
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Boeing Co
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D179/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09D161/00 - C09D177/00
    • C09D179/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C09D179/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/453—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264—Up to 3 mils
    • Y10T428/265—1 mil or less

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
  • Ceramic Products (AREA)
  • Physical Vapour Deposition (AREA)
  • Carbon And Carbon Compounds (AREA)
JP2015510287A 2012-04-30 2013-03-28 シリコンオキシカーバイド層を含む複合材料、及び複合材料を形成する方法 Active JP6421114B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201261640293P 2012-04-30 2012-04-30
US61/640,293 2012-04-30
US13/833,686 2013-03-15
US13/833,686 US10787591B2 (en) 2012-04-30 2013-03-15 Composites including silicon-oxy-carbide layers and methods of making the same
PCT/US2013/034435 WO2014007894A2 (en) 2012-04-30 2013-03-28 Composites including silicon-oxy-carbide layers and methods of making the same

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2018159930A Division JP2019022984A (ja) 2012-04-30 2018-08-29 シリコンオキシカーバイド層を含む複合材料、及び複合材料を形成する方法

Publications (3)

Publication Number Publication Date
JP2015523917A JP2015523917A (ja) 2015-08-20
JP2015523917A5 JP2015523917A5 (enExample) 2016-05-19
JP6421114B2 true JP6421114B2 (ja) 2018-11-07

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JP2015510287A Active JP6421114B2 (ja) 2012-04-30 2013-03-28 シリコンオキシカーバイド層を含む複合材料、及び複合材料を形成する方法
JP2018159930A Pending JP2019022984A (ja) 2012-04-30 2018-08-29 シリコンオキシカーバイド層を含む複合材料、及び複合材料を形成する方法

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US (1) US10787591B2 (enExample)
EP (2) EP3428311B1 (enExample)
JP (2) JP6421114B2 (enExample)
AU (1) AU2013287214B2 (enExample)
WO (1) WO2014007894A2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9786491B2 (en) 2015-11-12 2017-10-10 Asm Ip Holding B.V. Formation of SiOCN thin films
KR102378021B1 (ko) * 2016-05-06 2022-03-23 에이에스엠 아이피 홀딩 비.브이. SiOC 박막의 형성
US10847529B2 (en) 2017-04-13 2020-11-24 Asm Ip Holding B.V. Substrate processing method and device manufactured by the same
CN114875388A (zh) 2017-05-05 2022-08-09 Asm Ip 控股有限公司 用于受控形成含氧薄膜的等离子体增强沉积方法
KR20190065962A (ko) 2017-12-04 2019-06-12 에이에스엠 아이피 홀딩 비.브이. 유전체와 금속 표면 상에 SiOC의 균일한 증착
US12142479B2 (en) 2020-01-17 2024-11-12 Asm Ip Holding B.V. Formation of SiOCN thin films
US12341005B2 (en) 2020-01-17 2025-06-24 Asm Ip Holding B.V. Formation of SiCN thin films

Family Cites Families (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3745149A (en) 1971-09-29 1973-07-10 Nasa Preparation of polyimides from mixtures of monomeric diamines and esters of polycarboxylic acids
US5654396A (en) 1983-09-27 1997-08-05 The Boeing Company Polyimide oligomers
US5081198A (en) 1988-09-28 1992-01-14 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Tough, high performance, addition-type thermoplastic polymers
US5338827A (en) 1990-01-30 1994-08-16 Trw Inc. Polyimide resins useful at high temperatures
US5171822A (en) 1991-02-11 1992-12-15 The United States Of America As Represented By The Administrator Of National Aeronautics And Space Administration Low toxicity high temperature pmr polyimide
JP3232124B2 (ja) * 1992-05-20 2001-11-26 鐘淵化学工業株式会社 硬化性組成物
US5412066A (en) 1994-03-03 1995-05-02 Ther United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Phenylethynyl terminated imide oligomers
US5846649A (en) 1994-03-03 1998-12-08 Monsanto Company Highly durable and abrasion-resistant dielectric coatings for lenses
US5853877A (en) * 1996-05-31 1998-12-29 Hyperion Catalysis International, Inc. Method for disentangling hollow carbon microfibers, electrically conductive transparent carbon microfibers aggregation film amd coating for forming such film
WO2004073970A1 (ja) * 1996-12-10 2004-09-02 Makoto Ihira 成形可能な制電性樹脂成形品
US5826366A (en) * 1997-01-16 1998-10-27 Matibe; Jeffrey T. Illuminated fishing rod
US6194036B1 (en) 1997-10-20 2001-02-27 The Regents Of The University Of California Deposition of coatings using an atmospheric pressure plasma jet
US5939521A (en) * 1998-01-23 1999-08-17 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Polyimides based on 4,4'-bis (4-aminophenoxy)-2,2'or 2,2', 6,6'-substituted biphenyl
US6124035A (en) 1999-04-13 2000-09-26 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration High temperature transfer molding resins
DE19932417A1 (de) * 1999-07-15 2001-01-18 Hoechst Trespaphan Gmbh Papierähnliche Kunststoffolie
JP4066229B2 (ja) * 2001-02-14 2008-03-26 株式会社カネカ 硬化剤、硬化性組成物、光学材料用組成物、光学材料、その製造方法、並びに、それを用いた液晶表示装置及びｌｅｄ
US6841652B2 (en) * 2001-05-17 2005-01-11 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Space environmentally durable polyimides and copolyimides
DE10131156A1 (de) * 2001-06-29 2003-01-16 Fraunhofer Ges Forschung Arikel mit plasmapolymerer Beschichtung und Verfahren zu dessen Herstellung
WO2003087194A1 (en) 2002-04-05 2003-10-23 United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Polyimides from 2,3,3',4'-biphenyltetracarboxylic dianhydride and aromatic diamines
US8704211B2 (en) 2004-06-30 2014-04-22 General Electric Company High integrity protective coatings
US7015640B2 (en) 2002-09-11 2006-03-21 General Electric Company Diffusion barrier coatings having graded compositions and devices incorporating the same
JP4338495B2 (ja) 2002-10-30 2009-10-07 富士通マイクロエレクトロニクス株式会社 シリコンオキシカーバイド、半導体装置、および半導体装置の製造方法
US7041778B1 (en) 2003-06-05 2006-05-09 The United States Of America As Represented By The Secretary Of The Air Force Processable thermally stable addition polyimide for composite applications
KR20070012553A (ko) * 2004-05-14 2007-01-25 다우 코닝 도레이 캄파니 리미티드 오가노폴리실록산 수지 경화물로 이루어진 독립 필름, 이의제조방법 및 적층 필름
US20060063015A1 (en) * 2004-09-23 2006-03-23 3M Innovative Properties Company Protected polymeric film
JP2006123306A (ja) * 2004-10-28 2006-05-18 Dainippon Printing Co Ltd ガスバリア性積層体
US8092910B2 (en) * 2005-02-16 2012-01-10 Dow Corning Toray Co., Ltd. Reinforced silicone resin film and method of preparing same
WO2007044181A2 (en) 2005-10-05 2007-04-19 Dow Corning Corporation Coated substrates and methods for their preparation
US20070196633A1 (en) 2005-11-30 2007-08-23 Coak Craig E Durable transparent coatings for polymeric substrates
US7776434B2 (en) 2006-05-12 2010-08-17 General Electric Company Organic matrix composite structures and thermal oxidative barrier coating therefor
US7776404B2 (en) 2006-11-30 2010-08-17 General Electric Company Methods for forming thermal oxidative barrier coatings on organic matrix composite substrates
US7776433B2 (en) 2006-11-30 2010-08-17 General Electric Company Thermal oxidative barrier coatings for organic matrix composite substrates and coated articles
FR2902422B1 (fr) * 2006-06-16 2008-07-25 Saint Gobain Procede de depot par plasma atmopherique d'un revetement hydrophobe/oleophobe a durabilite amelioree
KR20090126273A (ko) * 2007-03-28 2009-12-08 다우 코닝 코포레이션 실리콘 및 탄소를 함유하는 장벽층의 롤투롤 플라즈마 화학 기상 증착법
ATE547236T1 (de) 2007-05-01 2012-03-15 Exatec Llc Kantensanierung und in-situ-reparatur einer plasmabeschichtung
KR101408510B1 (ko) * 2007-05-18 2014-06-17 삼성전자주식회사 표시소자용 연성기판 및 이를 이용한 디스플레이 소자
CN101848914B (zh) * 2007-11-09 2013-09-11 Kaneka株式会社 环状聚有机硅氧烷的制备方法、固化剂、固化性组合物及其固化物
US7799843B2 (en) * 2008-02-29 2010-09-21 Fujifilm Corporation Film
JP5244622B2 (ja) * 2009-01-08 2013-07-24 三菱樹脂株式会社 ガスバリア性フィルム
US8206794B2 (en) 2009-05-04 2012-06-26 The Boeing Company System and method for applying abrasion-resistant coatings
JP2011039283A (ja) * 2009-08-11 2011-02-24 Konica Minolta Holdings Inc 調光素子
US20120035057A1 (en) * 2010-08-03 2012-02-09 Alexandre Bratkovski Room-temperature superconductive-like diode device

Also Published As

Publication number Publication date
WO2014007894A2 (en) 2014-01-09
EP3428311A1 (en) 2019-01-16
JP2019022984A (ja) 2019-02-14
EP3428311B1 (en) 2022-05-04
WO2014007894A3 (en) 2014-03-20
US20130288044A1 (en) 2013-10-31
US10787591B2 (en) 2020-09-29
JP2015523917A (ja) 2015-08-20
AU2013287214A1 (en) 2014-08-28
EP2844783A2 (en) 2015-03-11
EP2844783B1 (en) 2018-08-15
AU2013287214B2 (en) 2016-04-14

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