NO20034212L - Kvartsglasskomponent og fremstilling derav - Google Patents
Kvartsglasskomponent og fremstilling deravInfo
- Publication number
- NO20034212L NO20034212L NO20034212A NO20034212A NO20034212L NO 20034212 L NO20034212 L NO 20034212L NO 20034212 A NO20034212 A NO 20034212A NO 20034212 A NO20034212 A NO 20034212A NO 20034212 L NO20034212 L NO 20034212L
- Authority
- NO
- Norway
- Prior art keywords
- manufacture
- quartz glass
- glass component
- component
- quartz
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/003—General methods for coating; Devices therefor for hollow ware, e.g. containers
- C03C17/005—Coating the outside
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
- C23C4/11—Oxides
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/10—Crucibles or containers for supporting the melt
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
- C30B35/002—Crucibles or containers
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Glass Melting And Manufacturing (AREA)
- Surface Treatment Of Glass (AREA)
- Glass Compositions (AREA)
- Coating By Spraying Or Casting (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10114698A DE10114698A1 (de) | 2001-03-23 | 2001-03-23 | Bauteil aus Quarzglas sowie Verfahren zur Herstellung desselben |
PCT/EP2002/003118 WO2002092525A1 (de) | 2001-03-23 | 2002-03-20 | Bauteil aus quarzglas sowie verfahren zur herstellung desselben |
Publications (2)
Publication Number | Publication Date |
---|---|
NO20034212D0 NO20034212D0 (no) | 2003-09-22 |
NO20034212L true NO20034212L (no) | 2003-11-05 |
Family
ID=7679010
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NO20034212A NO20034212L (no) | 2001-03-23 | 2003-09-22 | Kvartsglasskomponent og fremstilling derav |
Country Status (8)
Country | Link |
---|---|
US (1) | US20040115440A1 (no) |
EP (1) | EP1370498B1 (no) |
JP (1) | JP4262483B2 (no) |
KR (1) | KR100837476B1 (no) |
CN (1) | CN1239423C (no) |
DE (2) | DE10114698A1 (no) |
NO (1) | NO20034212L (no) |
WO (1) | WO2002092525A1 (no) |
Families Citing this family (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7887923B2 (en) | 2005-03-09 | 2011-02-15 | Evonik Degussa Gmbh | Plasma-sprayed layers of aluminium oxide |
EP1700926A1 (de) | 2005-03-09 | 2006-09-13 | Degussa AG | Plasmagespritzte Schichten aus Aluminiumoxid |
DE102008033946B3 (de) | 2008-07-19 | 2009-09-10 | Heraeus Quarzglas Gmbh & Co. Kg | Quarzglastiegel mit einer Stickstoffdotierung und Verfahren zur Herstellung eines derartigen Tiegels |
JP5102744B2 (ja) * | 2008-10-31 | 2012-12-19 | ジャパンスーパークォーツ株式会社 | 石英ルツボ製造用モールド |
DE102009013715B4 (de) | 2009-03-20 | 2013-07-18 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines Quarzglaskörpers, insbesondere eines Quarzglastiegels |
JP4964351B2 (ja) | 2009-07-31 | 2012-06-27 | ジャパンスーパークォーツ株式会社 | シリコン単結晶引き上げ用シリカガラスルツボ |
JP5058378B2 (ja) * | 2009-09-09 | 2012-10-24 | ジャパンスーパークォーツ株式会社 | 複合ルツボ |
JP5128570B2 (ja) * | 2009-10-22 | 2013-01-23 | ジャパンスーパークォーツ株式会社 | 複合ルツボ及びその製造方法 |
JP5574534B2 (ja) * | 2010-12-28 | 2014-08-20 | 株式会社Sumco | 複合ルツボ |
JP5488519B2 (ja) * | 2011-04-11 | 2014-05-14 | 信越半導体株式会社 | 石英ガラスルツボ及びその製造方法、並びにシリコン単結晶の製造方法 |
TW201245474A (en) * | 2011-05-12 | 2012-11-16 | Hon Hai Prec Ind Co Ltd | Evaporation source device and a coating method using the same |
KR101282766B1 (ko) * | 2011-05-16 | 2013-07-05 | (주)세렉트론 | 용융 도가니의 재활용 방법 및 그에 의해 제조된 도가니 |
DE102012008437B3 (de) * | 2012-04-30 | 2013-03-28 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung synthetischer Quarzglaskörnung |
DE202012005644U1 (de) * | 2012-06-08 | 2012-09-20 | Matthias Brenncke | Glasfeuerstelle zur Ermöglichung eines allseitigen Feuererlebnisses ohne das Erfordernis eines hitzebeständigen Untergrundes. |
DE102012011793A1 (de) | 2012-06-15 | 2013-12-19 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines Quarzglastiegels |
SG10201709699RA (en) * | 2013-05-23 | 2017-12-28 | Applied Materials Inc | A coated liner assembly for a semiconductor processing chamber |
WO2017103120A1 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Herstellung einer synthetischen quarzglaskörnung |
KR20180095619A (ko) | 2015-12-18 | 2018-08-27 | 헤래우스 크바르츠글라스 게엠베하 & 컴파니 케이지 | 실리카 유리 제조 동안 규소 함량의 증가 |
US10730780B2 (en) | 2015-12-18 | 2020-08-04 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of a quartz glass body in a multi-chamber oven |
EP3390308B1 (de) | 2015-12-18 | 2024-08-28 | Heraeus Quarzglas GmbH & Co. KG | Glasfasern aus quarzglas mit geringem oh-, cl- und al-gehalt |
WO2017103115A2 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Herstellung eines quarzglaskörpers in einem schmelztiegel aus refraktärmetall |
US11339076B2 (en) | 2015-12-18 | 2022-05-24 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of carbon-doped silicon dioxide granulate as an intermediate in the preparation of quartz glass |
US11053152B2 (en) | 2015-12-18 | 2021-07-06 | Heraeus Quarzglas Gmbh & Co. Kg | Spray granulation of silicon dioxide in the preparation of quartz glass |
JP6881776B2 (ja) | 2015-12-18 | 2021-06-02 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 不透明石英ガラス体の調製 |
WO2017103123A2 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Herstellung von quarzglaskörpern mit taupunktkontrolle im schmelzofen |
TWI794150B (zh) | 2015-12-18 | 2023-03-01 | 德商何瑞斯廓格拉斯公司 | 自二氧化矽顆粒製備石英玻璃體 |
CN105861972A (zh) * | 2016-04-15 | 2016-08-17 | 航天材料及工艺研究所 | 一种氧化铬-氧化钛基高温高发射率涂层及其制备方法 |
JP6681303B2 (ja) * | 2016-09-13 | 2020-04-15 | クアーズテック株式会社 | 石英ガラスルツボ及びその製造方法 |
CN108531980B (zh) * | 2018-05-29 | 2020-12-11 | 宁夏富乐德石英材料有限公司 | 改良石英坩埚及其制作方法 |
JP7157932B2 (ja) * | 2019-01-11 | 2022-10-21 | 株式会社Sumco | シリカガラスルツボの製造装置および製造方法 |
WO2022131047A1 (ja) * | 2020-12-18 | 2022-06-23 | 株式会社Sumco | 石英ガラスルツボ及びその製造方法並びにシリコン単結晶の製造方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4395432A (en) * | 1981-12-16 | 1983-07-26 | Westinghouse Electric Corp. | β-Alumina coating |
WO1997036744A1 (en) * | 1996-03-29 | 1997-10-09 | Billings Garth W | Refractory nitride, carbide, ternary oxide, nitride/oxide, oxide/carbide, oxycarbide, and oxynitride materials and articles |
US6479108B2 (en) * | 2000-11-15 | 2002-11-12 | G.T. Equipment Technologies, Inc. | Protective layer for quartz crucibles used for silicon crystallization |
-
2001
- 2001-03-23 DE DE10114698A patent/DE10114698A1/de not_active Withdrawn
-
2002
- 2002-03-20 US US10/472,745 patent/US20040115440A1/en not_active Abandoned
- 2002-03-20 JP JP2002589416A patent/JP4262483B2/ja not_active Expired - Fee Related
- 2002-03-20 KR KR1020037012215A patent/KR100837476B1/ko not_active IP Right Cessation
- 2002-03-20 DE DE2002501295 patent/DE50201295D1/de not_active Expired - Lifetime
- 2002-03-20 CN CNB028071514A patent/CN1239423C/zh not_active Expired - Lifetime
- 2002-03-20 WO PCT/EP2002/003118 patent/WO2002092525A1/de active IP Right Grant
- 2002-03-20 EP EP02753035A patent/EP1370498B1/de not_active Expired - Lifetime
-
2003
- 2003-09-22 NO NO20034212A patent/NO20034212L/no not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
WO2002092525A1 (de) | 2002-11-21 |
DE50201295D1 (de) | 2004-11-18 |
CN1239423C (zh) | 2006-02-01 |
EP1370498B1 (de) | 2004-10-13 |
EP1370498A1 (de) | 2003-12-17 |
JP2004531449A (ja) | 2004-10-14 |
CN1498196A (zh) | 2004-05-19 |
KR20030093256A (ko) | 2003-12-06 |
US20040115440A1 (en) | 2004-06-17 |
NO20034212D0 (no) | 2003-09-22 |
JP4262483B2 (ja) | 2009-05-13 |
DE10114698A1 (de) | 2002-09-26 |
KR100837476B1 (ko) | 2008-06-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
NO20034212L (no) | Kvartsglasskomponent og fremstilling derav | |
DK1390389T3 (da) | Cripto-blokerende antistoffer og anvendelser deraf | |
NO20041975D0 (no) | Bicyklisk oksopyridin og oksopyrimidinderivater | |
NO20006376L (no) | Kvartsdigler og deres fremstilling | |
DK1417175T3 (da) | Substituerede dihydro-3-halo-1h-pyrazol-5-carboxylater og fremstillingog anvendelse heraf | |
DE60226928D1 (de) | Polyhydroxyalkanoat-enthaltende Struktur und Herstellungsverfahren hierfür | |
DE60212600D1 (de) | Audiocodierung und decodierung | |
DE60223735D1 (de) | Interferometer und zugehöriges Herstellungsverfahren | |
NO20021786L (no) | Skumdempningsfremgangsmåter og sammensetninger | |
NO20033854L (no) | N-but-3-enyl-norbuprenorfin og fremgangsmåter for anvendelse | |
DE60215897D1 (de) | Intern markiertes Quarzglas und Markierungsverfahren | |
NO20035391D0 (no) | Glassforsterket gipsplate og fremgangsmåte for fremstilling | |
DE60225184D1 (de) | Polyetherketon und herstellungsverfahren dafür | |
DE60231538D1 (de) | Sputtertarget und herstellungsverfahren dafür | |
DE60210535D1 (de) | Vibrator und Herstellungsverfahren desselben | |
DE60220116D1 (de) | Zirkularpolarisierendes optisches Element und zugehöriges Herstellungsverfahren | |
DE60204749D1 (de) | Abtast- und Halteschaltung | |
DE60208383D1 (de) | Perrückenaufkleber und herstellungsverfahren | |
NO20042692L (no) | Sementakselerator og fremgangsmate | |
DE60315169D1 (de) | Optisches mikrosystem und herstellungsverfahren | |
DE60226922D1 (de) | Elektronisches Uhrwerk | |
NO20021569L (no) | Rensete kitiner og fremgangsmåte for deres fremstilling | |
DK1451433T3 (da) | Glassammensætning | |
DE50300769D1 (de) | Erdalkalialuminosilicatglas und verwendung | |
DK1372652T3 (da) | Kombination af docetaxel og flavopiridol |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
FC2A | Withdrawal, rejection or dismissal of laid open patent application |