CN1949079B - 涂敷装置以及涂敷方法 - Google Patents

涂敷装置以及涂敷方法 Download PDF

Info

Publication number
CN1949079B
CN1949079B CN2006101363563A CN200610136356A CN1949079B CN 1949079 B CN1949079 B CN 1949079B CN 2006101363563 A CN2006101363563 A CN 2006101363563A CN 200610136356 A CN200610136356 A CN 200610136356A CN 1949079 B CN1949079 B CN 1949079B
Authority
CN
China
Prior art keywords
substrate
nozzle
zone
distance sensor
optical distance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN2006101363563A
Other languages
English (en)
Chinese (zh)
Other versions
CN1949079A (zh
Inventor
池田文彦
池本大辅
吉富济
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of CN1949079A publication Critical patent/CN1949079A/zh
Application granted granted Critical
Publication of CN1949079B publication Critical patent/CN1949079B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B13/00—Machines or plants for applying liquids or other fluent materials to surfaces of objects or other work by spraying, not covered by groups B05B1/00 - B05B11/00
    • B05B13/02—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work
    • B05B13/04—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work the spray heads being moved during spraying operation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B05D5/12—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain a coating with specific electrical properties
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Coating Apparatus (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN2006101363563A 2005-10-13 2006-10-13 涂敷装置以及涂敷方法 Active CN1949079B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2005-298679 2005-10-13
JP2005298679A JP4673180B2 (ja) 2005-10-13 2005-10-13 塗布装置及び塗布方法
JP2005298679 2005-10-13

Publications (2)

Publication Number Publication Date
CN1949079A CN1949079A (zh) 2007-04-18
CN1949079B true CN1949079B (zh) 2010-11-03

Family

ID=38018634

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2006101363563A Active CN1949079B (zh) 2005-10-13 2006-10-13 涂敷装置以及涂敷方法

Country Status (4)

Country Link
JP (1) JP4673180B2 (ja)
KR (1) KR101276444B1 (ja)
CN (1) CN1949079B (ja)
TW (1) TWI329533B (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20210020481A1 (en) * 2019-07-16 2021-01-21 The Japan Steel Works, Ltd. Substrate-floatation-type laser processing apparatus and method for measuring floating height

Families Citing this family (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4758326B2 (ja) * 2006-11-21 2011-08-24 株式会社アルバック 塗布装置
DE102007029725A1 (de) * 2007-06-27 2009-01-08 Siemens Ag Vorrichtung zur Herstellung von Flüssigkeitsschichten mit vorbestimmter Dicke auf einem Träger
JP5188759B2 (ja) * 2007-08-07 2013-04-24 東京応化工業株式会社 塗布装置及び塗布方法
JP5303129B2 (ja) * 2007-09-06 2013-10-02 東京応化工業株式会社 塗布装置及び塗布方法
JP5308647B2 (ja) * 2007-09-19 2013-10-09 東京応化工業株式会社 浮上搬送塗布装置
JP2009101345A (ja) * 2007-10-05 2009-05-14 Toray Ind Inc 塗布方法および塗布装置、並びにプラズマディスプレイ用部材の製造方法およびその製造装置。
JP5148248B2 (ja) * 2007-11-08 2013-02-20 東レエンジニアリング株式会社 塗布装置及び塗布方法
KR100919622B1 (ko) * 2007-12-05 2009-09-30 주식회사 탑 엔지니어링 페이스트 디스펜서의 거리 센서
US20090185186A1 (en) * 2007-12-06 2009-07-23 Applied Materials, Inc. Systems and methods for improving measurement of light transmittance through ink deposited on a substrate
CN101524679B (zh) * 2008-03-07 2010-12-08 富港电子（东莞）有限公司 薄膜的涂布方法
JP2010098125A (ja) * 2008-10-16 2010-04-30 Tokyo Electron Ltd 基板搬送装置及び基板搬送方法
JP5346643B2 (ja) 2009-03-27 2013-11-20 大日本スクリーン製造株式会社 基板塗布装置および基板塗布方法
JP5560273B2 (ja) * 2009-06-08 2014-07-23 中外炉工業株式会社 塗布装置、塗布方法及び電子デバイス
KR101089747B1 (ko) * 2009-07-29 2011-12-07 에이피시스템 주식회사 도포 장치의 제어 방법
JP5528829B2 (ja) * 2010-01-27 2014-06-25 キヤノンマシナリー株式会社 半導体製造装置
JP5608469B2 (ja) * 2010-08-20 2014-10-15 東京応化工業株式会社 塗布装置
JP5502788B2 (ja) * 2011-03-16 2014-05-28 東京エレクトロン株式会社 浮上式塗布装置
JP5398785B2 (ja) * 2011-06-20 2014-01-29 株式会社東芝 スパイラル塗布装置及びスパイラル塗布方法
KR101911700B1 (ko) * 2011-12-28 2018-10-26 주식회사 탑 엔지니어링 도포방법
JP6023440B2 (ja) * 2012-03-12 2016-11-09 東レエンジニアリング株式会社 塗布装置
WO2013158310A2 (en) * 2012-04-17 2013-10-24 Kateeva, Inc. Printhead unit assembly for use with an inkjet printing system
KR101311326B1 (ko) * 2013-01-10 2013-09-27 주식회사 서일에프에이씨스템 Fpcb 검사방법
JP6333065B2 (ja) * 2013-07-09 2018-05-30 東京エレクトロン株式会社 塗布装置
JP6046573B2 (ja) * 2013-08-23 2016-12-21 オリジン電気株式会社 ダイヘッド、塗工液塗布装置、塗工液塗布部材の製造方法及び塗工液塗布方法
JP6230893B2 (ja) * 2013-12-10 2017-11-15 株式会社ヒラノテクシード 間欠塗工装置
JP2015181977A (ja) * 2014-03-20 2015-10-22 東レ株式会社 間隙維持方法、間隙維持装置及び塗布装置
JP2016004737A (ja) * 2014-06-19 2016-01-12 日本精機株式会社 塗布装置及び有機ｅｌ素子の製造方法
CN104385358B (zh) * 2014-09-30 2017-12-05 长园和鹰智能科技有限公司 自动裁剪机及其压痕方法
KR102190687B1 (ko) * 2014-12-08 2020-12-15 엘지디스플레이 주식회사 슬릿코터 시스템
CN104511388B (zh) * 2014-12-29 2017-08-04 深圳市华星光电技术有限公司 光阻涂布设备及光阻涂布方法
JP6450857B2 (ja) 2015-11-26 2019-01-09 富士フイルム株式会社 溶液付着装置及び溶液付着方法
CN106111011B (zh) * 2016-06-24 2018-07-03 常州一步干燥设备有限公司 带有喷嘴高度位置调节装置的密封容器
KR20180009469A (ko) * 2016-07-19 2018-01-29 주식회사 케이씨텍 기판 처리 장치 및 그 제어방법
JP6860356B2 (ja) * 2017-01-20 2021-04-14 株式会社Ｓｃｒｅｅｎホールディングス 塗布装置および塗布方法
JP6883436B2 (ja) * 2017-01-31 2021-06-09 アルファーデザイン株式会社 塗布装置、塗布方法、プログラム
KR101872434B1 (ko) * 2017-02-21 2018-06-28 나노스코프시스템즈 주식회사 두께 측정 장치
JP6890438B2 (ja) * 2017-03-03 2021-06-18 株式会社Ｓｃｒｅｅｎホールディングス 浮上量算出装置、塗布装置および塗布方法
JP7220975B2 (ja) * 2017-04-24 2023-02-13 東京エレクトロン株式会社 基板処理装置及び基板処理方法
US10755955B2 (en) * 2018-02-12 2020-08-25 Applied Materials, Inc. Substrate transfer mechanism to reduce back-side substrate contact
JP6738373B2 (ja) * 2018-05-31 2020-08-12 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
CN108897193A (zh) * 2018-08-04 2018-11-27 伍先春 光阻涂布装置
CN109382304B (zh) * 2018-10-30 2021-12-10 安徽统凌科技新能源有限公司 一种汽车蓄电池内表面防潮涂层工艺
CN109433479B (zh) * 2019-01-11 2020-11-24 深圳市克拉尼声学科技有限公司 一种全自动半导体晶片喷胶机构及其喷胶设备
JP6831406B2 (ja) * 2019-02-08 2021-02-17 株式会社Ｓｃｒｅｅｎホールディングス 塗布装置および塗布方法
KR20230062138A (ko) 2021-10-29 2023-05-09 세메스 주식회사 기판 처리 장치 및 이를 이용한 기판 처리 방법
CN115069468A (zh) * 2022-06-15 2022-09-20 浙江雅阁集成吊顶股份有限公司 一种铝扣板自动压花喷涂设备
CN115970983A (zh) * 2022-12-06 2023-04-18 京东方科技集团股份有限公司 涂胶装置
CN117531672B (zh) * 2024-01-09 2024-03-08 山东中驰电气设备有限公司 一种开关柜钣金外壳的喷塑处理工艺

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5976256A (en) * 1996-11-27 1999-11-02 Tokyo Electron Limited Film coating apparatus
CN1499299A (zh) * 2002-10-25 2004-05-26 东京毅力科创株式会社 基板校准装置，基板处理装置及基板搬运装置
CN1550264A (zh) * 2003-05-07 2004-12-01 Hoya株式会社 基板涂覆装置和基板涂覆方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4601914B2 (ja) * 2003-04-24 2010-12-22 芝浦メカトロニクス株式会社 接着剤の塗布装置及び接着剤の塗布方法
JP4033841B2 (ja) * 2004-02-12 2008-01-16 東京エレクトロン株式会社 浮上式基板搬送処理方法及びその装置
JP2005251864A (ja) * 2004-03-02 2005-09-15 Tokyo Electron Ltd 処理システム

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5976256A (en) * 1996-11-27 1999-11-02 Tokyo Electron Limited Film coating apparatus
CN1499299A (zh) * 2002-10-25 2004-05-26 东京毅力科创株式会社 基板校准装置，基板处理装置及基板搬运装置
CN1550264A (zh) * 2003-05-07 2004-12-01 Hoya株式会社 基板涂覆装置和基板涂覆方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
JP特开2005-228881A 2005.08.25

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20210020481A1 (en) * 2019-07-16 2021-01-21 The Japan Steel Works, Ltd. Substrate-floatation-type laser processing apparatus and method for measuring floating height
US11749545B2 (en) * 2019-07-16 2023-09-05 Jsw Aktina System Co., Ltd Substrate-floatation-type laser processing apparatus and method for measuring floating height

Also Published As

Publication number Publication date
KR101276444B1 (ko) 2013-06-19
KR20070041397A (ko) 2007-04-18
JP4673180B2 (ja) 2011-04-20
TW200730261A (en) 2007-08-16
CN1949079A (zh) 2007-04-18
JP2007105623A (ja) 2007-04-26
TWI329533B (en) 2010-09-01

Similar Documents

Publication Publication Date Title
CN1949079B (zh) 涂敷装置以及涂敷方法
JP4318714B2 (ja) 塗布装置
JP4570545B2 (ja) 基板処理装置及び基板処理方法
TWI445651B (zh) 感測器單元、器械、導軌系統、倉儲系統及管理倉儲之方法
KR101324396B1 (ko) 도포 방법 및 도포 장치
JP4995488B2 (ja) 塗布方法及び塗布装置
CN104081154B (zh) 板状体的翘曲检查装置及其翘曲检查方法
US20080094081A1 (en) Continuous linear scanning of large flat panel media
KR100739310B1 (ko) 도포장치 및 도포방법
CN1757439B (zh) 基板处理装置及基板处理方法
KR20070048697A (ko) 노광 장치, 동작 결정 방법, 기판 처리 시스템 및메인터넌스 관리 방법 및 디바이스 제조 방법
KR20090128328A (ko) 도포 장치 및 도포 방법
TW201723675A (zh) 曝光裝置、曝光方法、平面顯示器之製造方法、及元件製造方法
JP5570464B2 (ja) 浮上式塗布装置
JP2007252971A (ja) 塗布方法及び塗布装置
KR20200115379A (ko) 광학 측정 장치 및 방법
JP4717639B2 (ja) 基板の両面形状測定方法及び装置
KR102308585B1 (ko) 스테이지 측정 지그, 도포 장치 및 스테이지 측정 방법
JP5349770B2 (ja) 塗布装置及び塗布方法
JP2011192676A (ja) 基板処理装置、積層半導体装置製造方法及び積層半導体装置
TWI745691B (zh) 基板處理裝置及基板處理方法
JPH05326363A (ja) 露光装置及び基板の間隔設定方法
JP2006139087A (ja) 描画装置の基板位置ずれ検出機構
TWI441269B (zh) 大型平坦面板媒體之連續線性掃瞄
JP2011154021A (ja) 板厚分布の測定方法

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant