TW200730261A - Coating apparatus and coating method - Google Patents

Coating apparatus and coating method

Info

Publication number
TW200730261A
TW200730261A TW095137751A TW95137751A TW200730261A TW 200730261 A TW200730261 A TW 200730261A TW 095137751 A TW095137751 A TW 095137751A TW 95137751 A TW95137751 A TW 95137751A TW 200730261 A TW200730261 A TW 200730261A
Authority
TW
Taiwan
Prior art keywords
substrate
coating
value
measurement value
normality
Prior art date
Application number
TW095137751A
Other languages
Chinese (zh)
Other versions
TWI329533B (en
Inventor
Fumihiko Ikeda
Daisuke Ikemoto
Wataru Yoshitomi
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of TW200730261A publication Critical patent/TW200730261A/en
Application granted granted Critical
Publication of TWI329533B publication Critical patent/TWI329533B/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B13/00—Machines or plants for applying liquids or other fluent materials to surfaces of objects or other work by spraying, not covered by groups B05B1/00 - B05B11/00
    • B05B13/02—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work
    • B05B13/04—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work the spray heads being moved during spraying operation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B05D5/12—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain a coating with specific electrical properties
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Coating Apparatus (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

The substrate G transportation is stopped even if the former edge of the substrate is taken to a set position in the vicinity of the right under of the resist nozzle 78,in a word, spreading beginning position, the second measurement inspection is done, and the distance Ld, Le is measured the upper surface and the lower side of the substrate G by the optical distance sensor 162. Next, the thickness measurement value D and the surfacing height measurement value Hb of the substrate G are compared with each setting value or the reference value [D], [Hb], it is judged, it is "Normality" of the comparison error margin ∣︀[D]-D∣︀,∣︀[Hb]-Hb∣︀if both values are in the predetermined tolerance, and, otherwise, judges, "Abnormality".
TW095137751A 2005-10-13 2006-10-13 Coating apparatus and coating method TWI329533B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005298679A JP4673180B2 (en) 2005-10-13 2005-10-13 Coating apparatus and coating method

Publications (2)

Publication Number Publication Date
TW200730261A true TW200730261A (en) 2007-08-16
TWI329533B TWI329533B (en) 2010-09-01

Family

ID=38018634

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095137751A TWI329533B (en) 2005-10-13 2006-10-13 Coating apparatus and coating method

Country Status (4)

Country Link
JP (1) JP4673180B2 (en)
KR (1) KR101276444B1 (en)
CN (1) CN1949079B (en)
TW (1) TWI329533B (en)

Cited By (3)

* Cited by examiner, † Cited by third party
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TWI408731B (en) * 2008-10-16 2013-09-11 Tokyo Electron Ltd Substrate carrier device and substrate carrier method
TWI458565B (en) * 2007-11-08 2014-11-01 Toray Eng Co Ltd Coating machine and coating method
TWI745691B (en) * 2018-05-31 2021-11-11 日商斯庫林集團股份有限公司 Substrate treatment apparatus and substrate treatment method

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JP4758326B2 (en) * 2006-11-21 2011-08-24 株式会社アルバック Coating device
DE102007029725A1 (en) * 2007-06-27 2009-01-08 Siemens Ag Device for producing liquid layers of predetermined thickness on a carrier
JP5188759B2 (en) * 2007-08-07 2013-04-24 東京応化工業株式会社 Coating apparatus and coating method
JP5303129B2 (en) * 2007-09-06 2013-10-02 東京応化工業株式会社 Coating apparatus and coating method
JP5308647B2 (en) * 2007-09-19 2013-10-09 東京応化工業株式会社 Levitation transfer coating device
JP2009101345A (en) * 2007-10-05 2009-05-14 Toray Ind Inc Coating method and coating machine, method for manufacturing plasma display member and manufacturing equipment therefor
KR100919622B1 (en) * 2007-12-05 2009-09-30 주식회사 탑 엔지니어링 Distance sensor of paste dispenser
US20090185186A1 (en) * 2007-12-06 2009-07-23 Applied Materials, Inc. Systems and methods for improving measurement of light transmittance through ink deposited on a substrate
CN101524679B (en) * 2008-03-07 2010-12-08 富港电子（东莞）有限公司 Film coating method
JP5346643B2 (en) 2009-03-27 2013-11-20 大日本スクリーン製造株式会社 Substrate coating apparatus and substrate coating method
JP5560273B2 (en) * 2009-06-08 2014-07-23 中外炉工業株式会社 Coating apparatus, coating method, and electronic device
KR101089747B1 (en) * 2009-07-29 2011-12-07 에이피시스템 주식회사 Method for drawing apparatus
JP5528829B2 (en) * 2010-01-27 2014-06-25 キヤノンマシナリー株式会社 Semiconductor manufacturing equipment
JP5608469B2 (en) * 2010-08-20 2014-10-15 東京応化工業株式会社 Coating device
JP5502788B2 (en) * 2011-03-16 2014-05-28 東京エレクトロン株式会社 Floating coating device
JP5398785B2 (en) * 2011-06-20 2014-01-29 株式会社東芝 Spiral coating apparatus and spiral coating method
KR101911700B1 (en) * 2011-12-28 2018-10-26 주식회사 탑 엔지니어링 Applying method
JP6023440B2 (en) * 2012-03-12 2016-11-09 東レエンジニアリング株式会社 Coating device
KR102290660B1 (en) * 2012-04-17 2021-08-18 카티바, 인크. Printhead unit assembly for use with an inkjet printing system
KR101311326B1 (en) * 2013-01-10 2013-09-27 주식회사 서일에프에이씨스템 Method of examination fpcb
JP6333065B2 (en) * 2013-07-09 2018-05-30 東京エレクトロン株式会社 Coating device
JP6046573B2 (en) * 2013-08-23 2016-12-21 オリジン電気株式会社 Die head, coating liquid coating apparatus, coating liquid coating member manufacturing method and coating liquid coating method
JP6230893B2 (en) * 2013-12-10 2017-11-15 株式会社ヒラノテクシード Intermittent coating device
JP2015181977A (en) * 2014-03-20 2015-10-22 東レ株式会社 Clearance maintaining method, clearance maintaining device, and coating device
JP2016004737A (en) * 2014-06-19 2016-01-12 日本精機株式会社 Coating device and method of manufacturing organic el element
CN104385358B (en) * 2014-09-30 2017-12-05 长园和鹰智能科技有限公司 Automatic cutting machines and its creasing method
KR102190687B1 (en) * 2014-12-08 2020-12-15 엘지디스플레이 주식회사 slit coaster system
CN104511388B (en) * 2014-12-29 2017-08-04 深圳市华星光电技术有限公司 Light blockage coating equipment and light blockage coating method
JP6450857B2 (en) * 2015-11-26 2019-01-09 富士フイルム株式会社 Solution adhesion apparatus and solution adhesion method
CN106111011B (en) * 2016-06-24 2018-07-03 常州一步干燥设备有限公司 Sealing container with nozzle height apparatus for adjusting position
KR20180009469A (en) * 2016-07-19 2018-01-29 주식회사 케이씨텍 Substrate treating apparatus and control method thereof
JP6860356B2 (en) * 2017-01-20 2021-04-14 株式会社Ｓｃｒｅｅｎホールディングス Coating device and coating method
JP6883436B2 (en) * 2017-01-31 2021-06-09 アルファーデザイン株式会社 Coating device, coating method, program
KR101872434B1 (en) * 2017-02-21 2018-06-28 나노스코프시스템즈 주식회사 Apparatus for thickness measurement
JP6890438B2 (en) * 2017-03-03 2021-06-18 株式会社Ｓｃｒｅｅｎホールディングス Floating amount calculation device, coating device and coating method
JP7220975B2 (en) * 2017-04-24 2023-02-13 東京エレクトロン株式会社 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
US10755955B2 (en) * 2018-02-12 2020-08-25 Applied Materials, Inc. Substrate transfer mechanism to reduce back-side substrate contact
CN108897193A (en) * 2018-08-04 2018-11-27 伍先春 Light blockage coating device
CN109382304B (en) * 2018-10-30 2021-12-10 安徽统凌科技新能源有限公司 Inner surface moisture-proof coating process for automobile storage battery
CN109433479B (en) * 2019-01-11 2020-11-24 深圳市克拉尼声学科技有限公司 Full-automatic semiconductor wafer spouts gluey mechanism and spouts gluey equipment thereof
JP6831406B2 (en) * 2019-02-08 2021-02-17 株式会社Ｓｃｒｅｅｎホールディングス Coating device and coating method
US11749545B2 (en) * 2019-07-16 2023-09-05 Jsw Aktina System Co., Ltd Substrate-floatation-type laser processing apparatus and method for measuring floating height
KR102699915B1 (en) 2021-10-29 2024-08-27 세메스 주식회사 Substrate Treating Apparatus and Substrate Treating Method Using The Same
CN115069468A (en) * 2022-06-15 2022-09-20 浙江雅阁集成吊顶股份有限公司 Automatic embossing and spraying equipment for aluminum gusset plate
CN115970983A (en) * 2022-12-06 2023-04-18 京东方科技集团股份有限公司 Gluing device
CN117531672B (en) * 2024-01-09 2024-03-08 山东中驰电气设备有限公司 Plastic spraying treatment process for sheet metal shell of switch cabinet

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JP3245813B2 (en) * 1996-11-27 2002-01-15 東京エレクトロン株式会社 Coating film forming equipment
KR101018909B1 (en) * 2002-10-25 2011-03-02 도쿄엘렉트론가부시키가이샤 Substrate alignment apparatus, substrate processing apparatus and substrate transfer apparatus
JP4601914B2 (en) * 2003-04-24 2010-12-22 芝浦メカトロニクス株式会社 Adhesive coating apparatus and adhesive coating method
JP2004335728A (en) * 2003-05-07 2004-11-25 Hoya Corp Apparatus and method for substrate coating
JP4033841B2 (en) * 2004-02-12 2008-01-16 東京エレクトロン株式会社 Floating substrate transfer processing method and apparatus
JP2005251864A (en) * 2004-03-02 2005-09-15 Tokyo Electron Ltd Treatment system

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI458565B (en) * 2007-11-08 2014-11-01 Toray Eng Co Ltd Coating machine and coating method
TWI408731B (en) * 2008-10-16 2013-09-11 Tokyo Electron Ltd Substrate carrier device and substrate carrier method
TWI745691B (en) * 2018-05-31 2021-11-11 日商斯庫林集團股份有限公司 Substrate treatment apparatus and substrate treatment method

Also Published As

Publication number Publication date
KR101276444B1 (en) 2013-06-19
CN1949079B (en) 2010-11-03
CN1949079A (en) 2007-04-18
KR20070041397A (en) 2007-04-18
TWI329533B (en) 2010-09-01
JP4673180B2 (en) 2011-04-20
JP2007105623A (en) 2007-04-26

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