TW200732046A - Apparatus for applying solution and method of measuring quantity of solution - Google Patents
Apparatus for applying solution and method of measuring quantity of solutionInfo
- Publication number
- TW200732046A TW200732046A TW095138195A TW95138195A TW200732046A TW 200732046 A TW200732046 A TW 200732046A TW 095138195 A TW095138195 A TW 095138195A TW 95138195 A TW95138195 A TW 95138195A TW 200732046 A TW200732046 A TW 200732046A
- Authority
- TW
- Taiwan
- Prior art keywords
- solution
- applying
- predetermined direction
- substrate
- placing table
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C13/00—Means for manipulating or holding work, e.g. for separate articles
- B05C13/02—Means for manipulating or holding work, e.g. for separate articles for particular articles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/26—Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Coating Apparatus (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
The invention is to provide an apparatus for applying a solution, in which the precision when the amount of the solution to be supplied from a nozzle is measured can be improved and the efficiency when the measuring work is done can also be improved. The apparatus for applying the solution onto a substrate is provided with: a plurality of application heads 22 which are arranged along the predetermined direction and each of which has the nozzle for applying the solution onto the substrate; a placing table 7 on the upper surface of which the substrate is placed; a first linear motor 8 for relatively moving the placing table and the plurality of application heads to the direction crossing the predetermined direction; a scale 41 for measuring the weight of the solution to be supplied from the plurality of application heads; and a second linear motor 44 for moving the scale independently of the placing table to the predetermined direction or the direction crossing the predetermined direction.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005305532 | 2005-10-20 | ||
JP2006146472A JP4887076B2 (en) | 2006-05-26 | 2006-05-26 | Solution supply apparatus and method |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200732046A true TW200732046A (en) | 2007-09-01 |
TWI311500B TWI311500B (en) | 2009-07-01 |
Family
ID=38178047
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095138195A TWI311500B (en) | 2005-10-20 | 2006-10-17 | Apparatus for applying solution and method of measuring quantity of solution |
Country Status (3)
Country | Link |
---|---|
KR (1) | KR100845880B1 (en) |
CN (1) | CN1974027B (en) |
TW (1) | TWI311500B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI581324B (en) * | 2013-07-09 | 2017-05-01 | 東京威力科創股份有限公司 | Substrate processing system, method of controlling substrate processing system, and storage medium |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5280702B2 (en) * | 2008-02-18 | 2013-09-04 | 武蔵エンジニアリング株式会社 | Application method of liquid material, apparatus and program thereof |
JP5606780B2 (en) * | 2010-04-23 | 2014-10-15 | 芝浦メカトロニクス株式会社 | Semiconductor device manufacturing equipment |
CN103676226B (en) * | 2012-08-31 | 2016-08-10 | 细美事有限公司 | Liquid crystal discharge capacity measuring unit, discharge capacity measuring method and substrate board treatment |
KR101403966B1 (en) * | 2013-01-02 | 2014-06-10 | 주식회사 케이씨텍 | Slit nozzle tuning system |
JP5735035B2 (en) * | 2013-05-13 | 2015-06-17 | 株式会社エナテック | Coating apparatus and coating method |
EP2832454A1 (en) | 2013-07-30 | 2015-02-04 | Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO | Slot-die coating method and apparatus |
KR20160107034A (en) | 2015-03-03 | 2016-09-13 | 세메스 주식회사 | Detecting mehtod and Apparatus for treating substrate |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1227753A (en) * | 1967-07-13 | 1971-04-07 | ||
GB1255090A (en) * | 1969-03-26 | 1971-11-24 | Nippon Kogei Kogyo Company Ltd | Apparatus for electrostatically coating powders on a workpiece |
US5830297A (en) * | 1995-07-24 | 1998-11-03 | Matsushita Electric Industrial Co., Ltd. | Method and apparatus for application of adhesive |
US6209479B1 (en) * | 1998-12-30 | 2001-04-03 | Aeromatic-Fielder Ag | Apparatus for coating tablets |
JP3876684B2 (en) * | 2000-12-21 | 2007-02-07 | セイコーエプソン株式会社 | Color filter manufacturing method, color filter manufacturing device, liquid crystal device manufacturing method, liquid crystal device manufacturing device, EL device manufacturing method, EL device manufacturing device, material ejection method, head control device, electronic apparatus |
-
2006
- 2006-10-17 TW TW095138195A patent/TWI311500B/en active
- 2006-10-19 KR KR1020060101890A patent/KR100845880B1/en active IP Right Grant
- 2006-10-20 CN CN2006100647731A patent/CN1974027B/en active Active
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI581324B (en) * | 2013-07-09 | 2017-05-01 | 東京威力科創股份有限公司 | Substrate processing system, method of controlling substrate processing system, and storage medium |
US9782807B2 (en) | 2013-07-09 | 2017-10-10 | Tokyo Electron Limited | Substrate processing system, method for controlling substrate processing system, and storage medium |
Also Published As
Publication number | Publication date |
---|---|
CN1974027A (en) | 2007-06-06 |
KR20070043642A (en) | 2007-04-25 |
CN1974027B (en) | 2012-06-13 |
TWI311500B (en) | 2009-07-01 |
KR100845880B1 (en) | 2008-07-14 |
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