JP5308647B2 - Levitation transfer coating device - Google Patents

Levitation transfer coating device Download PDF

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JP5308647B2
JP5308647B2 JP2007241742A JP2007241742A JP5308647B2 JP 5308647 B2 JP5308647 B2 JP 5308647B2 JP 2007241742 A JP2007241742 A JP 2007241742A JP 2007241742 A JP2007241742 A JP 2007241742A JP 5308647 B2 JP5308647 B2 JP 5308647B2
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JP2009072650A (en
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芳明 升
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Tokyo Ohka Kogyo Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a floating transfer coater which can stably coat a substrate even during its floating transfer. <P>SOLUTION: A support roller 10 is arranged in parallel with a slit nozzle 9 directly below the slit nozzle 9. The position of the support roller 10 preferably is adjustable in a vertical direction, and its upper end is located at the same height as, or slightly higher than, the upper surface of tables 1-4. Since the lower surface of the substrate W is supported by the support roller 10 in the course of coating by such a constitution, the substrate W will not sink or bend. <P>COPYRIGHT: (C)2009,JPO&amp;INPIT

Description

本発明は、ガラス基板などの基板をテーブルから浮上させた状態で搬送しつつ塗布を行う浮上搬送塗布装置に関する。   The present invention relates to a levitation transport coating apparatus that performs coating while transporting a substrate, such as a glass substrate, levitated from a table.

ガラス基板の表面にレジスト液などの塗布液を塗布する装置として、テーブル上にガラス基板を吸着固定し、このガラス基板上をスリットノズルを移動させつつスリットノズルからガラス基板上面にカーテン状に塗布液を供給するタイプと、スリットノズルを固定し、その下をガラス基板が移動するようにしたタイプとがある。   As a device for applying a coating solution such as a resist solution to the surface of a glass substrate, the glass substrate is adsorbed and fixed on a table, and the slit nozzle is moved on the glass substrate while the slit nozzle is moved onto the glass substrate in a curtain form. There is a type in which the slit nozzle is fixed and a glass substrate is moved under the slit nozzle.

特許文献１には、基板搬入部と塗布処理部と基板搬出部を基板を浮上させて搬送する搬送方向に沿って設けた搬送塗布装置が開示されている。この搬送塗布装置にあっては、エアを噴出して基板を浮上させるステージ（テーブル）の両側に吸着パッドなどからなる基板搬送機構を移動可能に配置し、基板の両側を吸着した状態で搬送するようにしている。   Japanese Patent Application Laid-Open No. 2004-228561 discloses a transport coating apparatus in which a substrate carry-in unit, a coating processing unit, and a substrate carry-out unit are provided along a transport direction in which a substrate is lifted and transported. In this transport coating apparatus, a substrate transport mechanism composed of suction pads and the like is movably disposed on both sides of a stage (table) that jets air to float the substrate, and transports the substrate while adsorbing both sides of the substrate. I am doing so.

特許文献２には、基板を浮上させて搬送しつつ基板上面に塗布液を塗布する装置として、第１の基板搬送部と第２の基板搬送部を設け、第１の基板搬送部によって基板を基板搬入部から塗布処理部まで搬送し、塗布処理部では第１の基板搬送部と第２の基板搬送部とで基板の両側を保持した状態で塗布を行い、塗布終了後は第１の基板搬送部は元の位置に戻り、第２の基板搬送部で塗布後の基板を塗布処理部から基板搬出部まで搬送するようにした装置が提案されている。   In Patent Document 2, a first substrate transport unit and a second substrate transport unit are provided as an apparatus for applying a coating liquid on the upper surface of a substrate while the substrate is floated and transported, and the substrate is moved by the first substrate transport unit. The substrate is transported from the substrate carry-in unit to the coating processing unit, and the coating processing unit performs coating while holding both sides of the substrate by the first substrate transporting unit and the second substrate transporting unit. An apparatus has been proposed in which the transport unit returns to its original position, and the second substrate transport unit transports the coated substrate from the coating processing unit to the substrate unloading unit.

特開２００５−２４３６７０号公報JP 2005-243670 A 特開２００６−２３７４８２号公報JP 2006-237482 A

特許文献１および特許文献２のいずれも基板の側端は吸着パッドなどによって支えられているが、側端部を除いた部分は何も支持されていない。
このような状態で、図４に示すように、想像線の高さまで浮上して搬送されてきた基板の表面に、塗布処理部において上方のスリットノズルから塗布液が供給されると、塗布液が供給されたことによる衝撃や重量変化によって基板の高さが低くなったり、歪んだりし、塗膜の厚さが不均一になる。 In both Patent Document 1 and Patent Document 2, the side edge of the substrate is supported by a suction pad or the like, but nothing is supported except for the side edge.
In this state, as shown in FIG. 4, when the coating liquid is supplied from the upper slit nozzle in the coating processing unit to the surface of the substrate that has been lifted and transported to the height of the imaginary line, the coating liquid is The height of the substrate is lowered or distorted due to the impact or weight change caused by the supply, and the thickness of the coating film becomes non-uniform.

上記課題を解消するため、本発明に係る浮上搬送塗布装置は、基板を浮上させた状態で搬送しつつ基板表面に塗布液を供給する浮上搬送塗布装置において、前記塗布処理部の上流側には基板搬入部が配置され、前記塗布処理部の下流側には基板搬出部が配置され、これら基板搬入部及び基板搬出部には基板を浮上させるためのエア噴出孔を上面に形成したテーブルが設けられ、また前記基板搬入部と基板搬出部の間に塗布液を供給する塗布処理部が設けられ、前記基板搬入部、塗布処理部及び基板搬出部の両側にレールが配置され、このレールに基板を移動させる搬送機構が設けられ、更に前記塗布処理部には基板の搬送方向と直交する方向に配置されたスリットノズルが昇降可能に設けられ、このスリットノズルの直下には塗布の際に基板の下面を支持する１本のサポートローラが前記スリットノズルと平行に配置されており、前記サポートローラは、上端が前記テーブルの上面よりも高い位置に配置されるように上下方向に位置調整可能であることを特徴とする構成とした。 In order to solve the above problems, a levitation transport coating apparatus according to the present invention is a levitation transport coating apparatus that supplies a coating liquid to a substrate surface while transporting the substrate in a levitated state. A substrate carry-in unit is arranged, a substrate carry-out unit is arranged downstream of the coating processing unit, and a table in which air ejection holes for floating the substrate are formed on the upper surface is provided in the substrate carry-in unit and the substrate carry-out unit. And a coating processing unit for supplying a coating liquid between the substrate carry-in unit and the substrate carry-out unit, and rails are disposed on both sides of the substrate carry-in unit, the coating processing unit, and the substrate carry-out unit. And a slit nozzle arranged in a direction perpendicular to the substrate transport direction is provided in the coating processing section so as to be movable up and down. One support roller supporting the lower surface is arranged in parallel with the slit nozzle, and the support roller can be adjusted in the vertical direction so that the upper end is arranged at a position higher than the upper surface of the table. It was set as the characteristic characterized by this.

具体的な構成としては、塗布処理部の上流側に基板搬入部が配置され、前記塗布処理部の下流側に基板搬出部が配置され、これら基板搬入部及び基板搬出部には基板を浮上させるためのエア噴出孔を上面に形成したテーブルが設けられる。また、別の構成では、これら基板搬入部及び基板搬出部に設けられたテーブルのうち前記塗布処理部寄りの部分にはエア噴出孔の他にエア吸引孔も形成された構成が考えられる。   Specifically, a substrate carry-in unit is disposed upstream of the coating processing unit, a substrate carry-out unit is disposed downstream of the coating processing unit, and the substrate is floated on the substrate carry-in unit and the substrate carry-out unit. There is provided a table in which air ejection holes are formed on the upper surface. In another configuration, a configuration in which an air suction hole is formed in addition to an air ejection hole in a portion near the coating processing unit among the tables provided in the substrate carry-in portion and the substrate carry-out portion.

基板を不定させる手段としては、エアに限らず、例えば静電気を利用して、電気的に基板を浮上させるようにしてもよい。   The means for making the substrate indefinite is not limited to air. For example, static electricity may be used to float the substrate electrically.

また、前記サポートローラはその上端が前記テーブルの上面と同一高さになるか、テーブルの上面よりも若干高い位置にすることが好ましい。そのために、サポートローラについては高さ調整可能とする。   Further, it is preferable that the upper end of the support roller is at the same height as the upper surface of the table or slightly higher than the upper surface of the table. Therefore, the height of the support roller can be adjusted.

本発明に係る浮上搬送塗布装置によれば、浮上搬送中に塗布を行っても基板が沈み込んだり撓んだりすることがなく、安定した状態で塗布を行うことができるので、均一な厚さの塗膜を得ることができる。   According to the levitation conveyance coating apparatus according to the present invention, even if the application is performed during the levitation conveyance, the substrate does not sink or bend, and the application can be performed in a stable state. The coating film can be obtained.

以下に本発明の好適な実施例を添付図面に基づいて説明する。図１は本発明に係る浮上搬送塗布装置の全体斜視図、図２は同浮上搬送塗布装置の平面図、図３は同浮上搬送塗布装置の要部の正面図である。   Preferred embodiments of the present invention will be described below with reference to the accompanying drawings. FIG. 1 is an overall perspective view of a levitation transport coating apparatus according to the present invention, FIG. 2 is a plan view of the levitation transport coating apparatus, and FIG. 3 is a front view of a main part of the levitation transport coating apparatus.

浮上搬送塗布装置は、基板の搬送方向に沿って、基板搬入部Ｓ１、塗布処理部Ｓ２及び基板搬出部Ｓ３が連続して配置されている。基板搬入部Ｓ１には基板を浮上搬送するテーブル１，２が連続して設けられ、基板搬出部Ｓ３には浮上搬送するテーブル３，４が連続して設けられている。   In the levitation transfer coating apparatus, a substrate carry-in unit S1, a coating processing unit S2, and a substrate carry-out unit S3 are sequentially arranged along the substrate transfer direction. Tables 1 and 2 that float and convey the substrate are continuously provided in the substrate carry-in portion S1, and tables 3 and 4 that float and convey are continuously provided in the substrate carry-out portion S3.

前記テーブル１，２の上面には基板Ｗを浮上させるためのエア噴出孔５が形成され、特に塗布処理部Ｓ２寄りのテーブル２上面には基板Ｗの浮上量をコントロールするためのエア吸引孔６が形成されている。これらエア噴出孔３とエア吸引孔４は交互に配置されている。   An air ejection hole 5 for floating the substrate W is formed on the upper surfaces of the tables 1 and 2, and in particular, an air suction hole 6 for controlling the floating amount of the substrate W is formed on the upper surface of the table 2 near the coating processing unit S 2. Is formed. These air ejection holes 3 and air suction holes 4 are arranged alternately.

また、前記テーブル３，４の上面には基板Ｗを浮上させるためのエア噴出孔５が形成され、特に塗布処理部Ｓ２寄りのテーブル３上面にもテーブル２と同様に前記基板Ｗの浮上量をコントロールするためのエア吸引孔６が形成されている。   In addition, air jet holes 5 for floating the substrate W are formed on the upper surfaces of the tables 3 and 4, and in particular, the flying height of the substrate W is also increased on the upper surface of the table 3 near the coating processing unit S 2 as with the table 2. An air suction hole 6 for control is formed.

前記テーブル２，３の間にはスペースが設けられ、このスペースの外側に門型フレーム７が固定されている。この門型フレーム７の内側面にはレール８が設けられ、このレール８に基板Ｗの搬送方向と直交する方向に配置されたスリットノズル９が係合し、モータの駆動などによって昇降可能とされている。   A space is provided between the tables 2 and 3, and a portal frame 7 is fixed outside the space. A rail 8 is provided on the inner side surface of the portal frame 7, and a slit nozzle 9 disposed in a direction orthogonal to the transport direction of the substrate W is engaged with the rail 8 and can be moved up and down by driving a motor or the like. ing.

前記スリットノズル９の直下には、サポートローラ１０がスリットノズル９と平行に配置されている。このサポートローラ１０は好ましくは上下方向に位置調整可能とされ、その上端は前記テーブル１〜４の上面と同一高さになるか、テーブルの上面よりも若干高い位置にする。このような構成とすることで塗布の際に基板Ｗの下面をサポートローラ１０で支持するため、基板Ｗが沈み込んだり撓んだりしない。   A support roller 10 is disposed immediately below the slit nozzle 9 in parallel with the slit nozzle 9. The position of the support roller 10 is preferably adjustable in the vertical direction, and the upper end thereof is at the same height as the upper surface of the tables 1 to 4 or slightly higher than the upper surface of the table. With such a configuration, the lower surface of the substrate W is supported by the support roller 10 during application, so that the substrate W does not sink or bend.

また前記基板搬入部Ｓ１、塗布処理部Ｓ２及び基板搬出部Ｓ３の両側にレール１１，１２を設け、レール１１には搬送機構１３を移動可能に係合し、レール１２には搬送機構１４を移動可能に係合している。   Further, rails 11 and 12 are provided on both sides of the substrate carry-in unit S1, the coating processing unit S2, and the substrate carry-out unit S3. The rail 11 is movably engaged with the rail 11, and the transport mechanism 14 is moved with respect to the rail 12. Engagement possible.

前記搬送機構１３，１４はリニアモータによってレールに非接触状態で移動するとともに、基板の側縁下面を保持する吸着パッド１３ａ，１４ａを備えている。これら吸着パッド１３ａ，１４ａは高さ位置を調整可能とされ、空の状態で戻るときには，処理中の基板Ｗとの干渉を避けるため、吸着パッドを下げた状態で戻るようにしている。 The transport mechanisms 13 and 14 are provided with suction pads 13a and 14a that move in a non-contact state with the rail by a linear motor and hold the lower surface of the side edge of the substrate. The suction pads 13a and 14a can be adjusted in height, and when returning in an empty state, the suction pads are returned in a lowered state in order to avoid interference with the substrate W being processed.

本発明に係る浮上搬送塗布装置の全体斜視図The whole perspective view of the levitation conveyance application device concerning the present invention 同浮上搬送塗布装置の平面図Top view of the levitation transfer coating device 同浮上搬送塗布装置の要部の正面図Front view of the main part of the levitation transfer coating device 従来の装置の問題点を説明した図A diagram explaining the problems of conventional devices

符号の説明Explanation of symbols

１，２，３，４…テーブル、５…エア噴出孔、６…エア吸引孔、７…門型フレーム、８…レール、９…スリットノズル、１０…サポートローラ、１１，１２…レール、１３，１４…搬送機構、１３ａ，１４ａ…吸着パッド、Ｓ１…基板搬入部、Ｓ２…塗布処理部、Ｓ３…基板搬出部、Ｗ…基板。
1, 2, 3, 4 ... table, 5 ... air ejection hole, 6 ... air suction hole, 7 ... portal frame, 8 ... rail, 9 ... slit nozzle, 10 ... support roller, 11, 12 ... rail, 13, DESCRIPTION OF SYMBOLS 14 ... Conveyance mechanism, 13a, 14a ... Suction pad, S1 ... Substrate carrying-in part, S2 ... Coating processing part, S3 ... Substrate carrying-out part, W ... Substrate.

Claims (4)

基板を浮上させた状態で搬送しつつ基板表面に塗布液を供給する浮上搬送塗布装置において、前記塗布処理部の上流側には基板搬入部が配置され、前記塗布処理部の下流側には基板搬出部が配置され、これら基板搬入部及び基板搬出部には基板を浮上させるためのエア噴出孔を上面に形成したテーブルが設けられ、また前記基板搬入部と基板搬出部の間に塗布液を供給する塗布処理部が設けられ、前記基板搬入部、塗布処理部及び基板搬出部の両側にレールが配置され、このレールに基板を移動させる搬送機構が設けられ、更に前記塗布処理部には基板の搬送方向と直交する方向に配置されたスリットノズルが昇降可能に設けられ、このスリットノズルの直下には塗布の際に基板の下面を支持する１本のサポートローラが前記スリットノズルと平行に配置されており、
前記サポートローラは、上端が前記テーブルの上面よりも高い位置に配置されるように上下方向に位置調整可能である
ことを特徴とする浮上搬送塗布装置。 In a levitation transfer coating apparatus that supplies a coating liquid to a substrate surface while transporting the substrate in a levitated state, a substrate carry-in unit is disposed upstream of the coating processing unit, and a substrate is positioned downstream of the coating processing unit. A carry-out unit is arranged, and a substrate having air blow holes for floating the substrate is provided on the upper surface of the substrate carry-in unit and the substrate carry-out unit, and a coating liquid is supplied between the substrate carry-in unit and the substrate carry-out unit. A coating processing unit is provided, rails are disposed on both sides of the substrate carry-in unit, the coating processing unit, and the substrate carry-out unit, and a transport mechanism for moving the substrate to the rails is provided. Further, the coating processing unit includes a substrate. A slit nozzle arranged in a direction perpendicular to the conveying direction of the substrate is provided so as to be able to move up and down, and immediately below this slit nozzle is a single support roller that supports the lower surface of the substrate during coating. They are arranged in parallel,
The levitation conveyance application apparatus , wherein the support roller is vertically adjustable so that an upper end thereof is disposed at a position higher than an upper surface of the table . 請求項１に記載の浮上搬送塗布装置において、前記搬送機構はレールに対し非接触の状態で移動可能で吸着パッドを備え、この吸着パッドは高さ位置の調整が可能で且つ戻り行程での基板と干渉を避けるべく下がった状態となることが可能であることを特徴とする浮上搬送塗布装置。   2. The levitation transfer coating apparatus according to claim 1, wherein the transfer mechanism is movable in a non-contact state with respect to the rail and includes a suction pad, the height of the suction pad can be adjusted, and the substrate in the return stroke. A levitation transport coating apparatus characterized by being able to be lowered to avoid interference. 請求項１に記載の浮上搬送塗布装置において、前記基板搬入部及び基板搬出部に設けられたテーブルのうち前記塗布処理部寄りの部分にはエア噴出孔の他にエア吸引孔も形成されていることを特徴とする浮上搬送塗布装置。   2. The levitation transfer coating apparatus according to claim 1, wherein an air suction hole is formed in addition to an air ejection hole in a portion near the coating processing unit in a table provided in the substrate carry-in portion and the substrate carry-out portion. A levitation conveyance coating apparatus characterized by the above. 請求項１に記載の浮上搬送塗布装置において、前記基板搬入部及び基板搬出部には基板を浮上させるための静電力発生部材が備えられていることを特徴とする浮上搬送塗布装置。   2. The levitation transfer coating apparatus according to claim 1, wherein the substrate carry-in portion and the substrate carry-out portion are provided with electrostatic force generating members for levitating the substrate.
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