CN1833054B - 用于电解沉积铜涂层的含水的酸性溶液与方法及该溶液的用途 - Google Patents

用于电解沉积铜涂层的含水的酸性溶液与方法及该溶液的用途 Download PDF

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Publication number
CN1833054B
CN1833054B CN200480022211XA CN200480022211A CN1833054B CN 1833054 B CN1833054 B CN 1833054B CN 200480022211X A CN200480022211X A CN 200480022211XA CN 200480022211 A CN200480022211 A CN 200480022211A CN 1833054 B CN1833054 B CN 1833054B
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China
Prior art keywords
solution
group
acid
poly
solution according
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Expired - Fee Related
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CN200480022211XA
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English (en)
Chinese (zh)
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CN1833054A (zh
Inventor
沃尔夫冈·达姆斯
卡尔·克里斯蒂安·费尔斯
京特·鲍尔
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Atotech Deutschland GmbH and Co KG
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Atotech Deutschland GmbH and Co KG
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Publication of CN1833054A publication Critical patent/CN1833054A/zh
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/38—Electroplating: Baths therefor from solutions of copper

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Chemically Coating (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Paints Or Removers (AREA)
CN200480022211XA 2003-08-08 2004-07-28 用于电解沉积铜涂层的含水的酸性溶液与方法及该溶液的用途 Expired - Fee Related CN1833054B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10337669.0 2003-08-08
DE10337669A DE10337669B4 (de) 2003-08-08 2003-08-08 Wässrige, saure Lösung und Verfahren zum galvanischen Abscheiden von Kupferüberzügen sowie Verwendung der Lösung
PCT/EP2004/008492 WO2005014891A2 (en) 2003-08-08 2004-07-28 Aqueous, acidic solution and method for electrolytically depositing copper coatings as well as use of said solution

Publications (2)

Publication Number Publication Date
CN1833054A CN1833054A (zh) 2006-09-13
CN1833054B true CN1833054B (zh) 2011-09-07

Family

ID=34112129

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200480022211XA Expired - Fee Related CN1833054B (zh) 2003-08-08 2004-07-28 用于电解沉积铜涂层的含水的酸性溶液与方法及该溶液的用途

Country Status (14)

Country Link
US (1) US20080142370A1 (OSRAM)
EP (1) EP1651801B1 (OSRAM)
JP (1) JP4586020B2 (OSRAM)
KR (1) KR101105938B1 (OSRAM)
CN (1) CN1833054B (OSRAM)
AT (1) ATE384808T1 (OSRAM)
BR (1) BRPI0413376A (OSRAM)
CA (1) CA2532445C (OSRAM)
DE (2) DE10337669B4 (OSRAM)
ES (1) ES2298799T3 (OSRAM)
MX (1) MXPA06001555A (OSRAM)
MY (1) MY138397A (OSRAM)
TW (1) TW200512318A (OSRAM)
WO (1) WO2005014891A2 (OSRAM)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4750486B2 (ja) * 2005-07-06 2011-08-17 株式会社Adeka 電解銅メッキ用添加剤、該添加剤を含有する電解銅メッキ浴及び該メッキ浴を使用する電解銅メッキ方法
DE502008003271D1 (de) * 2008-04-28 2011-06-01 Autotech Deutschland Gmbh Wässriges saures Bad und Verfahren zum elektrolytischen Abschneiden von Kupfer
US8262894B2 (en) * 2009-04-30 2012-09-11 Moses Lake Industries, Inc. High speed copper plating bath
CN101899687A (zh) * 2010-08-03 2010-12-01 济南德锡科技有限公司 单剂染料型光亮酸性镀铜添加剂及其制备方法和应用
JP2012127003A (ja) 2010-12-15 2012-07-05 Rohm & Haas Electronic Materials Llc 銅層を均一にする電気めっき方法
CN103834972B (zh) * 2014-02-10 2017-01-18 东莞华威铜箔科技有限公司 4微米无载体电解铜箔用添加剂、制备方法及其应用
CN110295382B (zh) * 2019-03-22 2021-07-13 苏州昕皓新材料科技有限公司 酸铜整平剂及其应用、铜电镀溶液及其制备方法
CN110541179B (zh) * 2019-09-23 2020-07-21 深圳市创智成功科技有限公司 用于晶圆级封装超级tsv铜互连材料的电镀铜溶液及电镀方法
CN110846694B (zh) * 2019-12-31 2020-12-08 天长市飞龙金属制品有限公司 一种镀锌液

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1001054A2 (en) * 1998-11-05 2000-05-17 C. Uyemura & Co, Ltd Tin-copper alloy electroplating bath and plating process therewith
EP1300487A1 (en) * 2001-10-02 2003-04-09 Shipley Co. L.L.C. Plating bath and method for depositing a metal layer on a substrate
EP1300486A1 (en) * 2001-10-02 2003-04-09 Shipley Co. L.L.C. Plating bath and method for depositing a metal layer on a substrate

Family Cites Families (19)

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Publication number Priority date Publication date Assignee Title
NL291575A (OSRAM) * 1962-04-16
DE1246347B (de) * 1966-03-08 1967-08-03 Schering Ag Saures galvanisches Kupferbad
DE2028803C3 (de) * 1970-06-06 1980-08-14 Schering Ag, 1000 Berlin Und 4619 Bergkamen Polymere Phenazoniumverbindungen
FR2096936A1 (en) * 1970-07-17 1972-03-03 Labolac Tin plating bath additive - 2,4,6-substd phenol for strong bright dep
JPS4916176B1 (OSRAM) * 1970-11-16 1974-04-20
US4000047A (en) * 1972-11-17 1976-12-28 Lea-Ronal, Inc. Electrodeposition of tin, lead and tin-lead alloys
IT1046971B (it) * 1975-03-11 1980-09-10 Oxy Metal Industries Corp Begno per l elettrodeposizione di rame e metodo per prepararlo
DE2746938C2 (de) * 1977-10-17 1987-04-09 Schering AG, 1000 Berlin und 4709 Bergkamen Wäßriges saures Bad zur galvanischen Abscheidung von glänzenden und rißfreien Kupferüberzügen und Verwendung dieses Bades
US4417956A (en) * 1980-07-17 1983-11-29 Electrochemical Products, Inc. Alkaline plating baths and electroplating process
US4376685A (en) * 1981-06-24 1983-03-15 M&T Chemicals Inc. Acid copper electroplating baths containing brightening and leveling additives
FR2510145B1 (fr) * 1981-07-24 1986-02-07 Rhone Poulenc Spec Chim Additif pour bain de cuivrage electrolytique acide, son procede de preparation et son application au cuivrage des circuits imprimes
WO1984001393A1 (en) * 1982-09-30 1984-04-12 Learonal Inc Electrolytic copper plating solutions
AU554236B2 (en) * 1983-06-10 1986-08-14 Omi International Corp. Electrolyte composition and process for electrodepositing copper
US4601847A (en) * 1983-08-22 1986-07-22 Macdermid, Incorporated Composition for use in electroplating of metals
DE4032864A1 (de) * 1990-10-13 1992-04-16 Schering Ag Saures bad zur galvanischen abscheidung von kupferueberzuegen und verfahren unter verwendung dieser kombination
JPH07316876A (ja) * 1994-05-23 1995-12-05 C Uyemura & Co Ltd 電気銅めっき用添加剤及び電気銅めっき浴
AU2233399A (en) * 1998-02-12 1999-08-30 Acm Research, Inc. Plating apparatus and method
US6911068B2 (en) * 2001-10-02 2005-06-28 Shipley Company, L.L.C. Plating bath and method for depositing a metal layer on a substrate
US6736954B2 (en) * 2001-10-02 2004-05-18 Shipley Company, L.L.C. Plating bath and method for depositing a metal layer on a substrate

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1001054A2 (en) * 1998-11-05 2000-05-17 C. Uyemura & Co, Ltd Tin-copper alloy electroplating bath and plating process therewith
EP1300487A1 (en) * 2001-10-02 2003-04-09 Shipley Co. L.L.C. Plating bath and method for depositing a metal layer on a substrate
EP1300486A1 (en) * 2001-10-02 2003-04-09 Shipley Co. L.L.C. Plating bath and method for depositing a metal layer on a substrate

Also Published As

Publication number Publication date
MY138397A (en) 2009-05-29
TW200512318A (en) 2005-04-01
KR101105938B1 (ko) 2012-01-18
JP2007501899A (ja) 2007-02-01
DE10337669A1 (de) 2005-03-03
US20080142370A1 (en) 2008-06-19
MXPA06001555A (es) 2006-05-15
JP4586020B2 (ja) 2010-11-24
WO2005014891A3 (en) 2005-05-26
WO2005014891A2 (en) 2005-02-17
CA2532445A1 (en) 2005-02-17
DE10337669B4 (de) 2006-04-27
DE602004011520D1 (de) 2008-03-13
CA2532445C (en) 2012-03-13
ATE384808T1 (de) 2008-02-15
EP1651801B1 (en) 2008-01-23
CN1833054A (zh) 2006-09-13
DE602004011520T2 (de) 2009-02-05
EP1651801A2 (en) 2006-05-03
BRPI0413376A (pt) 2006-10-17
KR20060058109A (ko) 2006-05-29
ES2298799T3 (es) 2008-05-16

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CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20110907

Termination date: 20190728

CF01 Termination of patent right due to non-payment of annual fee