CN1821876B - 焊锡抗蚀剂油墨组合物 - Google Patents
焊锡抗蚀剂油墨组合物 Download PDFInfo
- Publication number
- CN1821876B CN1821876B CN2006100049136A CN200610004913A CN1821876B CN 1821876 B CN1821876 B CN 1821876B CN 2006100049136 A CN2006100049136 A CN 2006100049136A CN 200610004913 A CN200610004913 A CN 200610004913A CN 1821876 B CN1821876 B CN 1821876B
- Authority
- CN
- China
- Prior art keywords
- composition
- reaction
- resin
- scolding tin
- obtains
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/14—Polycondensates modified by chemical after-treatment
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/285—Permanent coating compositions
- H05K3/287—Photosensitive compositions
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Materials For Photolithography (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Epoxy Resins (AREA)
Abstract
Description
Claims (10)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12558599 | 1999-05-06 | ||
JP125585/1999 | 1999-05-06 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB00807254XA Division CN1313883C (zh) | 1999-05-06 | 2000-05-08 | 印刷线路板 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1821876A CN1821876A (zh) | 2006-08-23 |
CN1821876B true CN1821876B (zh) | 2010-10-06 |
Family
ID=14913828
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2006100049136A Expired - Lifetime CN1821876B (zh) | 1999-05-06 | 2000-05-08 | 焊锡抗蚀剂油墨组合物 |
CNB00807254XA Expired - Fee Related CN1313883C (zh) | 1999-05-06 | 2000-05-08 | 印刷线路板 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB00807254XA Expired - Fee Related CN1313883C (zh) | 1999-05-06 | 2000-05-08 | 印刷线路板 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP3924431B2 (zh) |
CN (2) | CN1821876B (zh) |
HK (1) | HK1048666B (zh) |
TW (1) | TW494276B (zh) |
WO (1) | WO2000068740A1 (zh) |
Families Citing this family (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002234932A (ja) * | 2001-02-09 | 2002-08-23 | Nippon Kayaku Co Ltd | アルカリ水溶液可溶性エポキシカルボキシレート化合物及びそれを用いた感光性樹脂組成物並びにその硬化物 |
JP4713753B2 (ja) * | 2001-03-29 | 2011-06-29 | 太陽ホールディングス株式会社 | 光硬化性熱硬化性樹脂組成物及びその硬化物 |
CA2453237A1 (en) | 2001-07-26 | 2003-02-06 | Ciba Specialty Chemicals Holding Inc. | Photosensitive resin composition |
SG100761A1 (en) * | 2001-09-28 | 2003-12-26 | Nanya Plastics Corp | Photosensitive thermosetting resin composition |
JP4328645B2 (ja) * | 2004-02-26 | 2009-09-09 | 太陽インキ製造株式会社 | 光硬化性・熱硬化性樹脂組成物及びそれを用いたプリント配線板 |
JPWO2006004158A1 (ja) * | 2004-07-07 | 2008-04-24 | 太陽インキ製造株式会社 | 光硬化性・熱硬化性樹脂組成物とそれを用いたドライフィルム、及びその硬化物 |
JP4559892B2 (ja) * | 2005-03-28 | 2010-10-13 | 太陽インキ製造株式会社 | 着色感光性樹脂組成物及びその硬化物 |
KR100787341B1 (ko) * | 2005-09-06 | 2007-12-18 | 다이요 잉키 세이조 가부시키가이샤 | 수지 조성물 및 그의 경화물 및 그것을 이용하여 얻어지는인쇄 배선판 |
JP4849860B2 (ja) * | 2005-10-04 | 2012-01-11 | 太陽ホールディングス株式会社 | 光硬化性・熱硬化性樹脂組成物及びその硬化物並びにそれを用いて得られるプリント配線板 |
JP2007256477A (ja) * | 2006-03-22 | 2007-10-04 | Fujifilm Corp | 光学補償シートの製造方法およびその製造方法により作製された光学補償シートを含む偏光板、および液晶表示装置 |
JP4994922B2 (ja) * | 2007-04-06 | 2012-08-08 | 太陽ホールディングス株式会社 | ソルダーレジスト組成物およびその硬化物 |
JP5189878B2 (ja) * | 2008-04-01 | 2013-04-24 | 関西ペイント株式会社 | 樹脂組成物、レジスト組成物及びレジストパターン形成方法 |
CN105517364B (zh) * | 2014-09-25 | 2018-10-23 | 深南电路有限公司 | 一种用于印刷电路板的电镀金方法 |
CN106318019B (zh) * | 2015-07-06 | 2020-03-17 | 南亚塑胶工业股份有限公司 | 印刷电路板用低介电抗焊光阻油墨组合物 |
US10527936B2 (en) | 2016-06-17 | 2020-01-07 | Nan Ya Plastics Corporation | Low Dk/Df solder resistant composition use for printed circuit board |
JP6892668B2 (ja) * | 2016-10-14 | 2021-06-23 | 互応化学工業株式会社 | 感光性樹脂組成物 |
CN109970953B (zh) * | 2017-12-27 | 2021-04-09 | 太阳油墨(苏州)有限公司 | 固化性树脂组合物、干膜、固化物、及印刷电路板 |
CN111684011B (zh) * | 2018-02-08 | 2023-09-01 | 关西涂料株式会社 | 抗蚀剂组合物和抗蚀膜 |
JP6986476B2 (ja) * | 2018-03-29 | 2021-12-22 | 株式会社タムラ製作所 | 感光性樹脂組成物 |
CN110895381A (zh) * | 2019-11-20 | 2020-03-20 | 深圳市容大感光科技股份有限公司 | 感光阻焊油墨组合物、其用途及含有其的线路板 |
WO2022059304A1 (ja) * | 2020-09-18 | 2022-03-24 | コニカミノルタ株式会社 | 硬化性組成物、ソルダーレジスト用インク及びプリント回路基板 |
CN117003933B (zh) * | 2023-08-14 | 2024-01-19 | 江门市金桥新材料有限公司 | 一种无皂聚合阳离子分散体及其制备方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1033389A (zh) * | 1987-11-30 | 1989-06-14 | 太阳油墨制造株式会社 | 光敏热固性树脂组合物及采用这种组合物形成耐焊锡图案的方法 |
CN1147868A (zh) * | 1995-03-13 | 1997-04-16 | 互応化学工业株式会社 | 感光性树脂组合物及其用于涂膜、抗蚀印色、抗蚀保护膜、焊料抗蚀保护膜和印刷电路基片 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3154782B2 (ja) * | 1992-01-06 | 2001-04-09 | 太陽インキ製造株式会社 | レジストインキ組成物及びソルダーレジスト膜形成法 |
JPH09160239A (ja) * | 1995-12-05 | 1997-06-20 | Asahi Chem Res Lab Ltd | ソルダーレジスト樹脂組成物 |
JPH10114852A (ja) * | 1996-10-11 | 1998-05-06 | Nippon Kayaku Co Ltd | 樹脂組成物、レジストインキ組成物及びその硬化物 |
CN1065971C (zh) * | 1996-12-27 | 2001-05-16 | 清华大学 | 有机碱催化的无显影气相光刻胶 |
JPH1114852A (ja) * | 1997-06-20 | 1999-01-22 | Sharp Corp | 光電複合器具 |
JPH1165117A (ja) * | 1997-08-27 | 1999-03-05 | Tamura Kaken Kk | 感光性樹脂組成物及びそれを用いたソルダーレジストインク |
-
2000
- 2000-05-05 TW TW089108638A patent/TW494276B/zh not_active IP Right Cessation
- 2000-05-08 CN CN2006100049136A patent/CN1821876B/zh not_active Expired - Lifetime
- 2000-05-08 WO PCT/JP2000/002936 patent/WO2000068740A1/ja active Application Filing
- 2000-05-08 CN CNB00807254XA patent/CN1313883C/zh not_active Expired - Fee Related
- 2000-05-08 JP JP2000616466A patent/JP3924431B2/ja not_active Expired - Lifetime
-
2003
- 2003-02-04 HK HK03100802.5A patent/HK1048666B/zh not_active IP Right Cessation
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1033389A (zh) * | 1987-11-30 | 1989-06-14 | 太阳油墨制造株式会社 | 光敏热固性树脂组合物及采用这种组合物形成耐焊锡图案的方法 |
US4943516A (en) * | 1987-11-30 | 1990-07-24 | Taiyo Ink Manufacturing Co., Ltd. | Photosensitive thermosetting resin composition and method of forming solder resist pattern by use thereof |
US4943516B1 (zh) * | 1987-11-30 | 1994-01-11 | Taiyo Ink Manufacturing Co.,Ltd. | |
CN1081557A (zh) * | 1987-11-30 | 1994-02-02 | 太阳油墨制造株式会社 | 采用光敏热固性树脂组合物形成耐焊锡图案的方法 |
CN1147868A (zh) * | 1995-03-13 | 1997-04-16 | 互応化学工业株式会社 | 感光性树脂组合物及其用于涂膜、抗蚀印色、抗蚀保护膜、焊料抗蚀保护膜和印刷电路基片 |
Non-Patent Citations (5)
Title |
---|
JP特开平10-114852A 1998.05.06 |
JP特开平10-20493A 1998.01.23 |
JP特开平11-65117A 1999.03.05 |
JP特开平7-301918A 1995.11.14 |
JP特开平9-160239A 1997.06.20 |
Also Published As
Publication number | Publication date |
---|---|
TW494276B (en) | 2002-07-11 |
HK1048666A1 (en) | 2003-04-11 |
CN1364247A (zh) | 2002-08-14 |
CN1821876A (zh) | 2006-08-23 |
JP3924431B2 (ja) | 2007-06-06 |
WO2000068740A1 (fr) | 2000-11-16 |
HK1048666B (zh) | 2007-12-07 |
CN1313883C (zh) | 2007-05-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C56 | Change in the name or address of the patentee |
Owner name: TAIYO HOLDING CO., LTD. Free format text: FORMER NAME: TAIYO INK MANUFACTURING CO., LTD. |
|
CP01 | Change in the name or title of a patent holder |
Address after: Tokyo, Japan Patentee after: Taiyo Holding Co., Ltd. Address before: Tokyo, Japan Patentee before: Taiyo Ink Manufacturing Co., Ltd. Address after: Tokyo, Japan Patentee after: Taiyo Holding Co., Ltd. Address before: Tokyo, Japan Patentee before: Taiyo Ink Manufacturing Co., Ltd. |
|
EE01 | Entry into force of recordation of patent licensing contract |
Application publication date: 20060823 Assignee: Taiyo Ink Mfg.Co., Ltd. Assignor: Taiyo Holding Co., Ltd. Contract record no.: 2011990000116 Denomination of invention: Solder resist ink composition Granted publication date: 20101006 License type: Common License Record date: 20110302 Application publication date: 20060823 Assignee: Taiyo Ink Mfg.Co., Ltd. Assignor: Taiyo Holding Co., Ltd. Contract record no.: 2011990000116 Denomination of invention: Solder resist ink composition Granted publication date: 20101006 License type: Common License Record date: 20110302 |
|
LICC | Enforcement, change and cancellation of record of contracts on the licence for exploitation of a patent or utility model | ||
CX01 | Expiry of patent term |
Granted publication date: 20101006 |
|
CX01 | Expiry of patent term |