CN1655356B - 集成电路器件及其制造方法 - Google Patents
集成电路器件及其制造方法 Download PDFInfo
- Publication number
- CN1655356B CN1655356B CN200510007923.0A CN200510007923A CN1655356B CN 1655356 B CN1655356 B CN 1655356B CN 200510007923 A CN200510007923 A CN 200510007923A CN 1655356 B CN1655356 B CN 1655356B
- Authority
- CN
- China
- Prior art keywords
- wiring
- integrated circuit
- monitoring element
- layer
- temperature monitoring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 33
- 238000000034 method Methods 0.000 title claims description 31
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 claims abstract description 40
- 229910001935 vanadium oxide Inorganic materials 0.000 claims abstract description 40
- 238000012544 monitoring process Methods 0.000 claims description 57
- 229910044991 metal oxide Inorganic materials 0.000 claims description 32
- 150000004706 metal oxides Chemical class 0.000 claims description 32
- 239000000758 substrate Substances 0.000 claims description 29
- 230000004888 barrier function Effects 0.000 claims description 27
- 230000015572 biosynthetic process Effects 0.000 claims description 20
- 238000005530 etching Methods 0.000 claims description 18
- 239000011810 insulating material Substances 0.000 claims description 9
- 229910052751 metal Inorganic materials 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 9
- 239000000203 mixture Substances 0.000 claims description 8
- 239000000956 alloy Substances 0.000 claims description 6
- 229910045601 alloy Inorganic materials 0.000 claims description 6
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 4
- 150000002739 metals Chemical class 0.000 claims description 4
- 229910052715 tantalum Inorganic materials 0.000 claims description 4
- 229910052719 titanium Inorganic materials 0.000 claims description 4
- 229910052721 tungsten Inorganic materials 0.000 claims description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 3
- 229910052731 fluorine Inorganic materials 0.000 claims description 3
- 239000011737 fluorine Substances 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 abstract description 59
- 238000009792 diffusion process Methods 0.000 description 32
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 18
- 229910052710 silicon Inorganic materials 0.000 description 18
- 239000010703 silicon Substances 0.000 description 18
- 230000003071 parasitic effect Effects 0.000 description 9
- 238000005516 engineering process Methods 0.000 description 8
- 238000010586 diagram Methods 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 239000012212 insulator Substances 0.000 description 4
- 208000005189 Embolism Diseases 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 3
- 229920005591 polysilicon Polymers 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 229910052720 vanadium Inorganic materials 0.000 description 3
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 230000000630 rising effect Effects 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910016570 AlCu Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000009933 burial Methods 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 230000001151 other effect Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 238000011946 reduction process Methods 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
- H01C7/10—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material voltage responsive, i.e. varistors
- H01C7/1013—Thin film varistors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N19/00—Integrated devices, or assemblies of multiple devices, comprising at least one thermoelectric or thermomagnetic element covered by groups H10N10/00 - H10N15/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Semiconductor Integrated Circuits (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004032660 | 2004-02-09 | ||
JP2004-032660 | 2004-02-09 | ||
JP2004032660A JP4541717B2 (ja) | 2004-02-09 | 2004-02-09 | 集積回路装置及びその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1655356A CN1655356A (zh) | 2005-08-17 |
CN1655356B true CN1655356B (zh) | 2011-12-14 |
Family
ID=34824214
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN200510007923.0A Expired - Fee Related CN1655356B (zh) | 2004-02-09 | 2005-02-05 | 集成电路器件及其制造方法 |
Country Status (3)
Country | Link |
---|---|
US (1) | US7777288B2 (ja) |
JP (1) | JP4541717B2 (ja) |
CN (1) | CN1655356B (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3810411B2 (ja) * | 2004-01-23 | 2006-08-16 | Necエレクトロニクス株式会社 | 集積回路装置 |
JP2006105811A (ja) * | 2004-10-06 | 2006-04-20 | Fuji Electric Device Technology Co Ltd | 半導体光センサデバイス及び測距方法 |
WO2007091214A1 (en) * | 2006-02-10 | 2007-08-16 | Nxp B.V. | Semiconductor device and method of manufacturing thereof |
US7510323B2 (en) * | 2006-03-14 | 2009-03-31 | International Business Machines Corporation | Multi-layered thermal sensor for integrated circuits and other layered structures |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA991756A (en) * | 1974-04-19 | 1976-06-22 | Richard I. Maran | Semi-conductor thermal protection arrangement |
JPH01199462A (ja) * | 1988-02-04 | 1989-08-10 | Seiko Epson Corp | 半導体装置 |
JPH01302849A (ja) | 1988-05-31 | 1989-12-06 | Fujitsu Ltd | 半導体集積回路装置 |
JPH0290646A (ja) * | 1988-09-28 | 1990-03-30 | Nec Corp | 試験用半導体素子 |
JP3013628B2 (ja) * | 1992-08-19 | 2000-02-28 | 日本電気株式会社 | 半導体装置 |
JP3284731B2 (ja) * | 1994-02-25 | 2002-05-20 | 松下電器産業株式会社 | 配線評価装置およびその使用方法 |
JPH0883823A (ja) * | 1994-09-12 | 1996-03-26 | Sharp Corp | リード接続方法及び接続装置 |
JPH08308321A (ja) * | 1995-05-16 | 1996-11-26 | Iseki & Co Ltd | 施肥装置付苗植機 |
JPH09229778A (ja) | 1996-02-26 | 1997-09-05 | Hitachi Ltd | Ic化温度センサ |
JP3277827B2 (ja) * | 1996-11-19 | 2002-04-22 | 三菱電機株式会社 | 抵抗素子 |
TW454330B (en) * | 1999-05-26 | 2001-09-11 | Matsushita Electronics Corp | Semiconductor apparatus and its manufacturing method |
WO2003046536A1 (en) * | 2001-11-26 | 2003-06-05 | Sony International (Europe) Gmbh | The use of 1d semiconductor materials as chemical sensing materials, produced and operated close to room temperature |
JP2003297994A (ja) * | 2002-03-29 | 2003-10-17 | Hitachi Ltd | 半導体装置およびその製造方法 |
JP3869815B2 (ja) * | 2003-03-31 | 2007-01-17 | Necエレクトロニクス株式会社 | 半導体集積回路装置 |
JP3810411B2 (ja) * | 2004-01-23 | 2006-08-16 | Necエレクトロニクス株式会社 | 集積回路装置 |
JP4620962B2 (ja) * | 2004-03-30 | 2011-01-26 | ルネサスエレクトロニクス株式会社 | 集積回路装置の製造方法及び酸化バナジウム膜の形成方法 |
JP4535367B2 (ja) * | 2004-05-24 | 2010-09-01 | ルネサスエレクトロニクス株式会社 | 集積回路装置 |
-
2004
- 2004-02-09 JP JP2004032660A patent/JP4541717B2/ja not_active Expired - Fee Related
-
2005
- 2005-02-05 CN CN200510007923.0A patent/CN1655356B/zh not_active Expired - Fee Related
- 2005-02-08 US US11/052,215 patent/US7777288B2/en active Active
Non-Patent Citations (2)
Title |
---|
JP特开平10-150153A 1998.06.02 |
同上. |
Also Published As
Publication number | Publication date |
---|---|
US7777288B2 (en) | 2010-08-17 |
CN1655356A (zh) | 2005-08-17 |
JP2005223297A (ja) | 2005-08-18 |
JP4541717B2 (ja) | 2010-09-08 |
US20050173775A1 (en) | 2005-08-11 |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20111214 Termination date: 20160205 |