CN1558963A - 适用于烘箱的自清洁陶瓷层和制造自清洁陶瓷层的方法 - Google Patents
适用于烘箱的自清洁陶瓷层和制造自清洁陶瓷层的方法 Download PDFInfo
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- CN1558963A CN1558963A CNA028188691A CN02818869A CN1558963A CN 1558963 A CN1558963 A CN 1558963A CN A028188691 A CNA028188691 A CN A028188691A CN 02818869 A CN02818869 A CN 02818869A CN 1558963 A CN1558963 A CN 1558963A
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- ceramics powder
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- powder
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- 239000000919 ceramic Substances 0.000 title claims abstract description 64
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 6
- 239000011248 coating agent Substances 0.000 claims abstract description 27
- 238000000576 coating method Methods 0.000 claims abstract description 27
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- 239000011230 binding agent Substances 0.000 claims abstract description 14
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 13
- 239000002105 nanoparticle Substances 0.000 claims abstract description 10
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 9
- 239000000758 substrate Substances 0.000 claims abstract description 8
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 12
- 150000001875 compounds Chemical class 0.000 claims description 12
- 238000006555 catalytic reaction Methods 0.000 claims description 9
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 8
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N iron oxide Inorganic materials [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims description 8
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 8
- NDLPOXTZKUMGOV-UHFFFAOYSA-N oxo(oxoferriooxy)iron hydrate Chemical compound O.O=[Fe]O[Fe]=O NDLPOXTZKUMGOV-UHFFFAOYSA-N 0.000 claims description 8
- 239000000853 adhesive Substances 0.000 claims description 7
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- FAHBNUUHRFUEAI-UHFFFAOYSA-M hydroxidooxidoaluminium Chemical compound O[Al]=O FAHBNUUHRFUEAI-UHFFFAOYSA-M 0.000 claims description 5
- 235000012239 silicon dioxide Nutrition 0.000 claims description 5
- 239000000377 silicon dioxide Substances 0.000 claims description 5
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- 238000002485 combustion reaction Methods 0.000 abstract description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 abstract 1
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- 238000000197 pyrolysis Methods 0.000 description 7
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 6
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 6
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- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 3
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- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
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- 239000006004 Quartz sand Substances 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
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- 238000005299 abrasion Methods 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 150000004645 aluminates Chemical class 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
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- XSOKHXFFCGXDJZ-UHFFFAOYSA-N telluride(2-) Chemical compound [Te-2] XSOKHXFFCGXDJZ-UHFFFAOYSA-N 0.000 description 1
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- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
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- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/626—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
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- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
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- C04B20/0036—Microsized or nanosized
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/10—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on aluminium oxide
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- C04B35/117—Composites
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- C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
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- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
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- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/81—Coating or impregnation
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- B82Y40/00—Manufacture or treatment of nanostructures
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- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2205/00—Compositions applicable for the manufacture of vitreous enamels or glazes
- C03C2205/04—Compositions applicable for the manufacture of vitreous enamels or glazes for self-cleaning enamels or glazes
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- C03—GLASS; MINERAL OR SLAG WOOL
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- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
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- C03C2217/44—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the composition of the continuous phase
- C03C2217/45—Inorganic continuous phases
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- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
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- C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
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- C03C2217/47—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase consisting of a specific material
- C03C2217/475—Inorganic materials
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Abstract
本发明涉及一种制造高度多孔的陶瓷层的方法以及将该层涂覆于金属,陶瓷,瓷釉和/或玻璃基底的方法,该方法使用多孔陶瓷颗粒,优选氧化铝,氧化钛和氧化锆,以及一种无机粘合剂体系。所述无机粘合剂体系包含至少一种具有低于100nm的颗粒尺寸的陶瓷纳米颗粒,优选低于50nm且理想地低于25nm,使用水作为溶剂。如此制造的层适合用于自清洁催化活性层,例如,在烘箱,内燃机等等中,且通常用于材料的涂覆,以便极大地增加其比表面,例如用于催化剂载体。
Description
本发明涉及一种制造高孔隙陶瓷层的方法,该陶瓷层可被涂覆于金属,陶瓷,瓷釉和/或玻璃基底,该方法使用多孔陶瓷颗粒,优选氧化铝,氧化钛和氧化锆及一种无机粘合剂体系。该无机粘合剂体系包含至少一种颗粒尺寸低于100nm的陶瓷纳米颗粒,优选低于50nm且特别优选低于25nm,溶剂是水。如此制造的层适用于自清洁催化活性层,例如在烘箱,内燃机等等中,或用于基底的普通涂覆,以便显著地增加其比表面,例如用于催化剂应用。
烘箱包含一个可通过门封闭的烹饪室而且由一个烘箱马弗炉罩所限。在烘制或烤制期间,烹饪室的侧壁会被例如被飞溅油脂或肉汁或类似的东西污染。这种烘制或烤制期间的污染无法防止。因为这个原因,制造商提出了几种方法清洁侧壁,顶部和底部,也就是烹饪室的内部空间。通常区分为催化清洁和热解清洁。
对于热解清洁,烹饪室具有所谓的烤架条,可以通过一个独立的电子控制程序对烤架条控制和加热,且优选安装于烹饪室的顶部。在超过500℃的温度下将有机污物碳化,即完全燃烧(Cepem Cie EuroEquip menager[FR2605391]或Bosch Siemens Haushaltsgerte GmbH[DE2526096])。由于需要高温,热解清洁要求高且昂贵。具有热解清洁的烘箱必须具有合适的保护机构,在热解过程中(由大约320℃,Bosch Siemens Hausgerte GembH[EP 0940631])封闭烹饪室的门以防止烘箱遭受不恰当的操作。因为这些烘箱此外要求更昂贵的加热元件以便能够完全控制高温,热解系统仅仅安装于那些极高价格等级的烘箱中。
考虑到成本,催化系统比热解系统更好,因为污物的催化燃烧发生在较低的温度,也就是低于500℃。Matsushita Elec.Ind.Co.Ltd.[JP03056144]提出烘箱内部衬里具有一个催化活性的覆层,该覆层由一个粘合剂体系和一种催化活性粉组成。使用金属氧化物作为催化剂,优选二氧化锰且使用硅树脂作为粘合剂。据制造商称,这种催化覆层允许内部已经为380℃至400℃的烘箱的自清洁。从其它烘箱制造商处也可以发现一种催化剂和一种粘合剂体系的混合物或一种用于涂覆烘箱内表面的覆层基体。Toshiba[JP60147478]使用氧化锰或铁氧体作为催化剂且使用硅酸钠作为粘合剂相。在一个类似的方法中,SharpKK[JP54135076]使用石英砂或硅酸钠作为粘合剂相且使用氧化铁或氧化铜作为催化剂。这些专利没有给出有关后面两个催化覆层功效的说明。根据上述文献,该覆层的开始(onset)温度,也就是该覆层开始起作用的温度减小到270℃至300℃(Toshiba)和甚至250℃(SharpKK)。在实施这种方法中,催化覆层在低于320℃的温度下开始分解烘箱内部的油脂等,然而,该覆层的功效并不足以彻底完成这种分解。每个烘制或烤制循环之后,未分解的油脂残余物保留在烘箱的内部衬里层之内或之上,因此很短的一段时间之后,该覆层的功能由于浸渍(varnish)被削弱。为了完全的分解,这些体系仍需要通常高于380℃的温度。
最后应提到NGK Insulators Ltd[JP56095022],其使用氧化锰,氧化铜和氧化铁作为催化剂,且使用一种多孔瓷釉作为覆层基体以便增加所用催化剂的数量,还应提到Matsushita[JP02069574],CieEuripeenne pour Equ[FR2040822]和Hoover Ltd[GB1177434]的专利,它们都使用含氟聚合物作为催化剂的载体层以最大程度上减小载体层的表面能并防止粘合。
由于加工技术所提供的实际情况,热解清洁在500℃以上的温度非常有效但是太昂贵。这些体系目前仅仅用于极高价格等级的烘箱(所有烘箱的最多10%)。成本上的减少促进了催化清洁的发展。因此在烹饪室的内壁上加衬一个始终包含催化剂的层。合适的催化剂是氧化锰,氧化铁和氧化铜,其中使用耐温聚合物,硅酸钠,石英砂和瓷釉作为催化剂的粘合剂相或者作为层的组分。该催化剂在超过380℃的温度下起作用,这需要安全措施产生了额外的成本。已知仅有少数催化活性覆层的开始温度,也就是层中油脂的分解的开始是250℃至350℃。在这些情形中,在始终低于350℃的烘箱操作期间,大量的残余物残留在覆层之内或之上,因此这些烘箱的内部覆层浸渍得非常迅速。
催化剂服从热力学规则。一种催化剂不能改变一个体系的热力学,而只是降低活化能,即开始反应的趋势。虽然有机污物的燃烧在热力学上只发生在一个较高的温度,但是如果通过一种催化剂引发,则可以在一个较低的温度开始燃烧。并非所有的有机污物成分都在这个低温下分解,这会留下引起烘箱内部的浸渍的残余物,因此在仅仅几个烘制和烤制循环之后,烘箱内部的视觉和触觉外表严重损坏。
本发明的根本目的在于开发一种用于烘箱内部的覆层,该覆层自动消除由烘制和烤制产生的污物,也就是通过使用一个显著小于320℃的温度,其中该覆层的工作温度优选250℃。
通过一种陶瓷组合物(物料),一种多孔陶瓷粉和一种无机粘合剂体系的混合物达到这个目的,该组合物包含至少一种多孔陶瓷粉和一种无机粘合剂体系,该陶瓷粉具有1nm至500m的一次颗粒尺寸,优选50μm至150μm,该粘合剂体系包含至少一种纳米尺度颗粒。
用这种方法,可以制造具有高温稳定性和抗磨损性的多孔陶瓷层。这些层包含有机污物(例如油脂)容易进入的大孔/孔容积,而且也包含有机污物不易进入的由所采用的多孔陶瓷颗粒产生的小孔。该多孔陶瓷层具有很高的吸收性能而且可以将最初在本发明的陶瓷层内部的有机污物(例如油脂和肉汁)输送。污物扩展即分布于一个很大的表面上。在250℃的温度下,该污物几乎全部分解且该覆层中不含催化剂。
粘合剂体系的精确匹配和使用至少一种纳米颗粒作为粘合剂相的实情产生了非常大的承载有机污物的内部表面,该内部表面优选大于20m2/g,特别优选大于70m2/g和特别优选大于120m2/g。另一方面,燃烧需要的反应参与者氧气已经包含在多孔陶瓷部件中,类似于一个储藏器且可以直接得到,因此污物的氧化燃烧开始较早且在250℃下已经大量进行。
获得了用于烘箱的自清洁层的最初产品,该产品在显著低于380℃的温度,优选显著低于320℃下几乎大量除去有机污物。对于清洁烘箱一个新的可能在于无催化剂的活性陶瓷层产品,然而该产品提供了在一个非常大的表面上(由于纳米颗粒)扩展有机污物的可能,而且以层中储藏形式提供了氧化所需的反应参与者。相比可购得的催化清洁体系,本发明的自清洁层的特征此外在于较低温度下显著更高的功效,优选280℃至250℃以避免覆层早期的浸渍。
本发明的陶瓷层其特征在于大量不同尺寸的孔的存在和高内部孔容积。为产生这些孔,本发明的组合物(物料)优选包含两种不同的陶瓷粉颗粒且特别优选三种不同的陶瓷粉颗粒。具体地,所用的陶瓷颗粒是硫族化合物,碳化物或氮化物粉,其中这些粉末的至少一种是纳米尺度的。硫族化合物粉可以是氧化物粉,硫化物粉,硒化物粉或碲化物粉,其中优选氧化物粉。可以使用通常用于粉末烧结的任何粉末。实施例为(可选的为水合的)氧化物例如ZnO,CeO2,SnO2,Al2O3,SiO2,TiO2,In2O3,ZrO2,钇稳定的ZrO2,Fe2O3,Fe3O4,Cu2O或WO3和磷酸盐,硅酸盐,锆酸盐,铝酸盐和锡酸盐,碳化物例如WC,CdC2或SiC,氮化物例如BN,AlN,Si3N4,和Ti3N4,相应的混合氧化物例如金属-锡-氧化物,例如铟-锡-氧化物(ITO)。此外,也可以使用所述粉末组分的混合物。
本发明的组合物(物料)包含一种陶瓷粉,其特征在于主要为内部表面的高比表面,该比表面大于50m2/g,优选大于100m2/g,且特别优选大于150m2/g。这种多孔陶瓷粉具有一个超过500nm的平均颗粒尺寸分布,优选大于1μm且特别优选大于30μm。这种陶瓷粉是一种Si,Al,B,Zn,Zr,Cd,Ti,Ce,Sn,In,La,Fe,Cu,Ta,Nb,V,Mo或W,特别优选Si,Zr,Al,Fe和Ti的氧化物,氢氧化物,硫族化合物,氮化物或碳化物。特别优选使用氧化物。优选的无机固体颗粒是氧化铝,勃姆石,氧化锆,氧化铁,二氧化硅,二氧化钛,硅酸盐,石粉,珍珠岩(perlites)和沸石或这些无机固体的混合物。
本发明的组合物此外包含一种无机粘合剂体系,该粘合剂体系由一种溶剂和至少一种纳米尺度的粉末组成。该纳米尺度粉末的主要部分可以是以结块的形式存在,优选以非结块或基本非结块的形式存在。可以使用任何传统的醇作为溶剂,优选2-丁氧基乙醇,乙醇,1-丙醇,2-丙醇,特别优选水。该陶瓷粉是一种Si,Al,B,Zn,Zr,Cd,Ti,Ce,Sn,In,La,Fe,Cu,Ta,Nb,V,Mo或W,特别优选Si,Zr,Al,Fe和Ti的氧化物,氢氧化物,硫族化合物,氮化物或碳化物。特别优选使用氧化物。优选的无机纳米尺度固体颗粒是氧化铝,勃姆石,氧化锆,氧化铁,二氧化硅,二氧化钛,和针铁矿或这些无机纳米尺度固体的混合物。为调节该无机粘合剂体系的粘度,可以使用任何传统的无机和有机酸和碱,优选盐酸,磷酸,硫酸和硝酸。
可以向本发明的组合物中加入第三种陶瓷粉,可选地用于孔隙率的精确调节。该粉末由陶瓷颗粒组成,该陶瓷颗粒具有10nm至1μm的平均颗粒尺寸分布,优选150nm至600nm。第三种陶瓷粉的材料是Si,Al,B,Zn,Zr,Cd,Ti,Ce,Sn,In,La,Fe,Cu,Ta,Nb,V,Mo或W,特别优选Si,Zr,Al,Fe和Ti的氧化物,氢氧化物,硫族化合物,氮化物或碳化物。特别优选使用氧化物。优选的无机固体颗粒是氧化铝,勃姆石,氧化锆,氧化铁,二氧化硅,二氧化钛,硅酸盐,和石粉。
可选地通过加入一种或多种着色无机成分来扩大本发明的组合物。任何传统的无机着色剂可以用作着色成分,优选尖晶石。除纯色以外,几种着色成分的组合允许颜色效果(图案和斑点)的任意调整。
将第三种可选使用的陶瓷粉与同样可选使用的着色粉混合且与溶剂调制成浆料。将多孔陶瓷粉和无机粘合剂体系加入到这种浆料中,由此产生一种陶瓷悬浮体,该悬浮体通过旋转涂层,浸渍涂层,浸入,注浆或优选喷涂至需要的基底上,从而可以涂覆,干燥并随后致密化成一种多孔陶瓷层。对于致密化,使用最高达1200℃的温度,优选400℃至1000℃且特别优选700℃至850℃。
本发明的陶瓷组合物允许将多孔陶瓷层应用于金属,玻璃,瓷釉或陶瓷表面,该层具有20μm至1mm的层厚,优选70μm至600μm。
在本发明的一个具体的实施方案中,可以用催化剂覆盖这些多孔陶瓷层以便容许将这些覆层用于催化反应,例如在化学工业中。
以下实施例说明了本发明,但并不限制本发明:
实施例1
将15.0g氧化铝粉Martoxid MR70(Martinswerk公司)与10.0g尖晶石颜料PK 3060(Ferro公司)混合且与52.0g水调制成浆料。加入70.0g多孔氧化铝(Nabalox NG100,Nabaltec公司)由此获得一种高粘度糊状浆料。添加3.8g的65%硝酸可很大程度上减小粘度从而产生一个可搅动的悬浮液。向该悬浮液中加入26.38g的一种无机粘合剂溶液(40%纳米尺度氧化锆/60%水)。此刻可喷射的悬浮液的粘度可以通过少量的水和/或硝酸任意调整。
本发明涉及一种制造高孔隙陶瓷层以及将该层应用于金属,陶瓷,瓷釉和/或玻璃基底的方法,该方法使用多孔陶瓷颗粒,优选氧化铝,氧化钛和氧化锆,和一种无机粘合剂体系。所述无机粘合剂体系包含至少一种具有颗粒尺寸低于100nm的陶瓷纳米颗粒,优选低于50nm且特别优选低于25nm。溶剂是水。如此制造的覆层适合用于自清洁催化活性层,例如在烘箱,内燃机等等中,或者通常用于基底的涂覆,以便极大地增加其比表面,例如用于催化剂载体。
Claims (15)
1.高度多孔陶瓷层和制造该层的方法,其中将一种多孔陶瓷粉与一种无机粘合剂体系(组合物)混合,该粘合剂体系包含至少一种纳米尺度粉末和一种溶剂,优选水。
2.根据权利要求1的方法,其特征在于该多孔陶瓷粉的具有主要为内部表面的高比表面,该比表面大于50m2/g,优选大于100m2/g,且特别优选大于150m2/g,其中该多孔陶瓷粉具有一个超过500nm的平均颗粒尺寸分布,优选大于1μm且特别优选大于30μm,而且其中优选使用一种氧化物粉作为多孔陶瓷粉且特别优选使用氧化铝,勃姆石,氧化锆,氧化铁,二氧化硅,二氧化钛,硅酸盐,石粉,珍珠岩和沸石或这些无机固体的混合物。
3.根据权利要求1或2的方法,其特征在于多孔陶瓷粉在组合物中的含量是20%至80%重量比,优选50%至80%重量比,始终参照组合物中的固体含量。
4.根据权利要求1至3任何一个的方法,其特征在于使用一种溶剂和无机纳米颗粒的混合物作为无机粘合剂体系,尤其是Al2O3,AlO(OH),ZrO2,TiO2,SiO2,Fe3O4,和SnO2,以及这些纳米颗粒的混合物,其中所使用的纳米颗粒的平均一次颗粒尺寸低于100nm,优选低于50nm且特别优选低于20nm,而且在该粘合剂体系中优选使用醇和/或水作为溶剂,优选2-丁氧基乙醇,乙醇,1-丙醇,2-丙醇。
5.根据权利要求1到4任何一个的方法,其特征在于该陶瓷悬浮液中作为粘合剂存在的纳米尺度颗粒的含量是1至20%重量比,优选5至15%重量比。
6.根据权利要求1至5任何一个的方法,其特征在于该陶瓷组合物(悬浮液,混合物)包含用于精确调整孔隙率的第三种陶瓷粉,其中该第三种陶瓷粉是一种具有10nm至1μm之间的平均颗粒尺寸分布的陶瓷粉,优选150nm至600nm,且其中该第三种陶瓷粉是一种氧化物,优选氧化铝,勃姆石,氧化锆,氧化铁,二氧化硅,二氧化钛,硅酸盐和石粉。
7.根据权利要求6的方法,其特征在于该第三种陶瓷粉在组合物中的含量始终为5至50%重量比,优选为10至30%重量比,始终参照组合物中的固体含量。
8.根据权利要求1至7任何一个的方法,其特征在于向组合物中添加一种或多种无机着色剂,然而其中的无机着色剂优选使用尖晶石,而且其中几种不同有机着色剂的组合允许包括纯色之外的颜色效果(图案和斑点)的任意调整。
9.根据权利要求1至8任何一个的方法,其特征在于通过如旋转覆层,浸渍覆层,浸入,注浆的方法,优选喷涂到需要的陶瓷或金属或上釉的或类似玻璃的基底上,将该组合物涂覆,干燥并且致密化为一种多孔无机层。
10.根据权利要求9的方法,其特征在于该陶瓷层在最高达1200℃的温度致密化,优选200℃至1000℃,且特别优选650℃至850℃。
11.根据权利要求1至10任何一个的方法,其特征在于可以在烘箱中使用该多孔陶瓷覆层作为自清洁层。
12.根据权利要求1至10任何一个的方法,其特征在于使用该多孔陶瓷层作为药物载体,优选用于医疗设备。
13.根据权利要求1至10任何一个的方法,其特征在于使用该多孔陶瓷层作为杀菌物质的载体用于杀菌用途。
14.根据权利要求1至10任何一个的方法,其特征在于该多孔陶瓷层作为香水和香料的载体,优选用于改善室内空气。
15.根据权利要求1至10任何一个的方法,其特征在于该多孔陶瓷层作为一个催化剂的载体,其中可以将以这种方式制造的催化剂层用于化学反应催化,例如在化学工业中。
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-
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- 2001-09-06 DE DE10143837A patent/DE10143837A1/de not_active Withdrawn
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2002
- 2002-07-29 KR KR10-2004-7003285A patent/KR20040041602A/ko not_active Application Discontinuation
- 2002-07-29 ES ES02799383T patent/ES2303869T5/es not_active Expired - Lifetime
- 2002-07-29 AU AU2002333160A patent/AU2002333160A1/en not_active Abandoned
- 2002-07-29 EP EP02799383A patent/EP1427870B2/de not_active Expired - Lifetime
- 2002-07-29 BR BR0212371-1A patent/BR0212371A/pt not_active IP Right Cessation
- 2002-07-29 US US10/488,809 patent/US7303784B2/en not_active Expired - Lifetime
- 2002-07-29 PT PT02799383T patent/PT1427870E/pt unknown
- 2002-07-29 CN CNB028188691A patent/CN1276126C/zh not_active Expired - Fee Related
- 2002-07-29 JP JP2003530908A patent/JP2005519829A/ja active Pending
- 2002-07-29 WO PCT/DE2002/002773 patent/WO2003027348A2/de active IP Right Grant
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Cited By (9)
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CN102333824A (zh) * | 2009-02-26 | 2012-01-25 | 巴斯夫欧洲公司 | 金属表面保护涂层及其生产方法 |
CN102367333A (zh) * | 2011-09-01 | 2012-03-07 | 四川科力特硬质合金股份有限公司 | 一种硬质合金真空烧结防粘涂料 |
CN104947027A (zh) * | 2015-06-24 | 2015-09-30 | 安徽再制造工程设计中心有限公司 | MnO2-TiC-Co纳米材料及其制备方法 |
CN109843431A (zh) * | 2016-09-16 | 2019-06-04 | Bsh家用电器有限公司 | 具有自清洁式催化活性表面的家用器具及其操作方法 |
CN109843431B (zh) * | 2016-09-16 | 2022-04-12 | Bsh家用电器有限公司 | 具有自清洁式催化活性表面的家用器具及其操作方法 |
CN110168023A (zh) * | 2017-01-16 | 2019-08-23 | Bsh家用电器有限公司 | 用于自清洁涂层的涂层材料和制备方法 |
CN110143763A (zh) * | 2019-05-30 | 2019-08-20 | 张学新 | 一种高硼硅耐热瓷粉玻璃的生产工艺 |
CN110684381A (zh) * | 2019-10-12 | 2020-01-14 | 虎皇新材料科技集团有限公司 | 一种水性可替代瓷釉底釉涂料及其制备方法 |
CN115279717A (zh) * | 2019-12-12 | 2022-11-01 | 尼蓝宝股份有限公司 | 陶瓷表面改性材料 |
Also Published As
Publication number | Publication date |
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AU2002333160A1 (en) | 2003-04-07 |
WO2003027348A2 (de) | 2003-04-03 |
CN1276126C (zh) | 2006-09-20 |
US20040253432A1 (en) | 2004-12-16 |
EP1427870B2 (de) | 2012-08-29 |
DE50212297D1 (de) | 2008-07-03 |
PT1427870E (pt) | 2008-07-18 |
WO2003027348A3 (de) | 2003-10-02 |
US7303784B2 (en) | 2007-12-04 |
ES2303869T3 (es) | 2008-09-01 |
JP2005519829A (ja) | 2005-07-07 |
ATE396289T1 (de) | 2008-06-15 |
EP1427870B1 (de) | 2008-05-21 |
DE10143837A1 (de) | 2003-03-27 |
EP1427870A2 (de) | 2004-06-16 |
KR20040041602A (ko) | 2004-05-17 |
ES2303869T5 (es) | 2012-11-15 |
BR0212371A (pt) | 2004-12-14 |
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