CN1249776C - 衬底处理系统 - Google Patents
衬底处理系统 Download PDFInfo
- Publication number
- CN1249776C CN1249776C CNB021518696A CN02151869A CN1249776C CN 1249776 C CN1249776 C CN 1249776C CN B021518696 A CNB021518696 A CN B021518696A CN 02151869 A CN02151869 A CN 02151869A CN 1249776 C CN1249776 C CN 1249776C
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- CN
- China
- Prior art keywords
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- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
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- 230000007246 mechanism Effects 0.000 claims abstract description 64
- 238000011144 upstream manufacturing Methods 0.000 claims abstract description 28
- 238000010438 heat treatment Methods 0.000 claims description 74
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- 239000012298 atmosphere Substances 0.000 claims description 4
- 239000011261 inert gas Substances 0.000 claims description 3
- WSZPRLKJOJINEP-UHFFFAOYSA-N 1-fluoro-2-[(2-fluoro-2,2-dinitroethoxy)methoxy]-1,1-dinitroethane Chemical compound [O-][N+](=O)C(F)([N+]([O-])=O)COCOCC(F)([N+]([O-])=O)[N+]([O-])=O WSZPRLKJOJINEP-UHFFFAOYSA-N 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 28
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- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 9
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- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
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- 230000015572 biosynthetic process Effects 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 238000001259 photo etching Methods 0.000 description 3
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- 230000005540 biological transmission Effects 0.000 description 2
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- 239000003344 environmental pollutant Substances 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
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- 238000011010 flushing procedure Methods 0.000 description 1
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- 230000002459 sustained effect Effects 0.000 description 1
- 230000007306 turnover Effects 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
- B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
- B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y10S414/14—Wafer cassette transporting
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Nonlinear Science (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP367010/01 | 2001-11-30 | ||
JP367010/2001 | 2001-11-30 | ||
JP2001367010A JP3911624B2 (ja) | 2001-11-30 | 2001-11-30 | 処理システム |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1426087A CN1426087A (zh) | 2003-06-25 |
CN1249776C true CN1249776C (zh) | 2006-04-05 |
Family
ID=19176824
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB021518696A Expired - Fee Related CN1249776C (zh) | 2001-11-30 | 2002-11-29 | 衬底处理系统 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP3911624B2 (ko) |
KR (1) | KR100912280B1 (ko) |
CN (1) | CN1249776C (ko) |
TW (1) | TWI248657B (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101136349B (zh) * | 2006-08-30 | 2010-12-08 | Asm日本子公司 | 衬底传送装置、衬底处理装置和传送衬底的方法 |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101074388B1 (ko) | 2004-12-22 | 2011-10-17 | 엘지디스플레이 주식회사 | 액정표시장치용 제조 장비 |
KR101079487B1 (ko) * | 2005-01-28 | 2011-11-03 | 어플라이드 머티어리얼스, 인코포레이티드 | 기판 캐리어 핸들러의 향상된 동작을 위한 방법 및 장치 |
JP4745040B2 (ja) * | 2005-12-05 | 2011-08-10 | 東京エレクトロン株式会社 | 基板搬送装置及び基板処理装置 |
JP4560022B2 (ja) * | 2006-09-12 | 2010-10-13 | 東京エレクトロン株式会社 | 塗布、現像装置及び塗布、現像装置の制御方法並びに記憶媒体 |
JP6339057B2 (ja) * | 2015-09-29 | 2018-06-06 | 株式会社日立国際電気 | 基板処理装置、半導体装置の製造方法、プログラム |
CN106044229A (zh) * | 2016-07-22 | 2016-10-26 | 京东方科技集团股份有限公司 | 一种掩模板搬运设备及曝光机组系统 |
JP6601360B2 (ja) * | 2016-09-30 | 2019-11-06 | 株式会社ダイフク | 物品搬送設備 |
US10996661B2 (en) * | 2017-01-13 | 2021-05-04 | Fuji Corporation | Manufacturing management device |
JP6655689B1 (ja) * | 2018-09-21 | 2020-02-26 | 株式会社Screenホールディングス | 基板処理装置および基板処理方法 |
JP7142566B2 (ja) * | 2018-12-27 | 2022-09-27 | 東京エレクトロン株式会社 | 基板処理装置および基板処理方法 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07297258A (ja) * | 1994-04-26 | 1995-11-10 | Tokyo Electron Ltd | 板状体の搬送装置 |
JP4045008B2 (ja) * | 1998-03-26 | 2008-02-13 | 大日本スクリーン製造株式会社 | 基板処理装置 |
JPH11260883A (ja) * | 1998-03-09 | 1999-09-24 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
JP2001117064A (ja) * | 1999-10-19 | 2001-04-27 | Tokyo Electron Ltd | 搬送装置の位置合わせ機構および位置合わせ方法、ならびに基板処理装置 |
JP3645492B2 (ja) * | 2000-02-01 | 2005-05-11 | 東京エレクトロン株式会社 | 基板処理装置 |
KR100701893B1 (ko) * | 2000-02-24 | 2007-03-30 | 엘지.필립스 엘시디 주식회사 | 인라인 형태로 구성된 액정표시소자의 검사장치 |
-
2001
- 2001-11-30 JP JP2001367010A patent/JP3911624B2/ja not_active Expired - Fee Related
-
2002
- 2002-11-22 TW TW091134095A patent/TWI248657B/zh not_active IP Right Cessation
- 2002-11-29 KR KR1020020075426A patent/KR100912280B1/ko not_active IP Right Cessation
- 2002-11-29 CN CNB021518696A patent/CN1249776C/zh not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101136349B (zh) * | 2006-08-30 | 2010-12-08 | Asm日本子公司 | 衬底传送装置、衬底处理装置和传送衬底的方法 |
Also Published As
Publication number | Publication date |
---|---|
CN1426087A (zh) | 2003-06-25 |
KR20030044881A (ko) | 2003-06-09 |
TW200302540A (en) | 2003-08-01 |
JP2003168713A (ja) | 2003-06-13 |
TWI248657B (en) | 2006-02-01 |
JP3911624B2 (ja) | 2007-05-09 |
KR100912280B1 (ko) | 2009-08-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20060405 Termination date: 20141129 |
|
EXPY | Termination of patent right or utility model |