CN109180722B - 稳定的金属化合物、它们的组合物以及它们的使用方法 - Google Patents
稳定的金属化合物、它们的组合物以及它们的使用方法 Download PDFInfo
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- CN109180722B CN109180722B CN201811239514.7A CN201811239514A CN109180722B CN 109180722 B CN109180722 B CN 109180722B CN 201811239514 A CN201811239514 A CN 201811239514A CN 109180722 B CN109180722 B CN 109180722B
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- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/28—Titanium compounds
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F3/00—Compounds containing elements of Groups 2 or 12 of the Periodic Table
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- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
- C07F5/06—Aluminium compounds
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- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/24—Lead compounds
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- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
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- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
Abstract
Description
剥离溶液 | 剥离条件 |
85%磷酸 | 2分钟@70℃ |
3%氢氟酸 | 1分钟@25℃ |
10%TMAH | 1分钟@60℃ |
10%过氧化氢 | 1分钟@50℃ |
NH<sub>4</sub>OH/H<sub>2</sub>O<sub>2</sub>/H<sub>2</sub>O 1/4/40 | 30秒@28℃ |
Claims (11)
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CN201380059422.XA CN104781262B (zh) | 2012-12-07 | 2013-12-06 | 稳定的金属化合物、它们的组合物以及它们的使用方法 |
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CN (2) | CN104781262B (zh) |
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JP5889568B2 (ja) | 2011-08-11 | 2016-03-22 | メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングMerck Patent GmbH | 酸化タングステン膜形成用組成物およびそれを用いた酸化タングステン膜の製造法 |
KR101674989B1 (ko) * | 2013-05-21 | 2016-11-22 | 제일모직 주식회사 | 레지스트 하층막용 조성물, 이를 사용한 패턴 형성 방법 및 상기 패턴을 포함하는 반도체 집적회로 디바이스 |
US9201305B2 (en) | 2013-06-28 | 2015-12-01 | Az Electronic Materials (Luxembourg) S.A.R.L. | Spin-on compositions of soluble metal oxide carboxylates and methods of their use |
US9296922B2 (en) * | 2013-08-30 | 2016-03-29 | Az Electronic Materials (Luxembourg) S.A.R.L. | Stable metal compounds as hardmasks and filling materials, their compositions and methods of use |
US9409793B2 (en) | 2014-01-14 | 2016-08-09 | Az Electronic Materials (Luxembourg) S.A.R.L. | Spin coatable metallic hard mask compositions and processes thereof |
US9499698B2 (en) | 2015-02-11 | 2016-11-22 | Az Electronic Materials (Luxembourg)S.A.R.L. | Metal hardmask composition and processes for forming fine patterns on semiconductor substrates |
US10241409B2 (en) * | 2015-12-22 | 2019-03-26 | AZ Electronic Materials (Luxembourg) S.à.r.l. | Materials containing metal oxides, processes for making same, and processes for using same |
US20190129301A1 (en) * | 2016-05-19 | 2019-05-02 | Asml Netherlands B.V. | Resist compositions |
WO2018168221A1 (ja) * | 2017-03-13 | 2018-09-20 | Jsr株式会社 | 感放射線性組成物及びパターン形成方法 |
CN110418811B (zh) | 2017-03-16 | 2022-05-13 | 默克专利股份有限公司 | 光刻组合物及其使用方法 |
KR102399362B1 (ko) * | 2017-09-06 | 2022-05-18 | 메르크 파텐트 게엠베하 | 하드 마스크로서 유용한 스핀-온 무기 산화물 함유 조성물 및 개선된 열적 안정성을 지닌 충전 재료 |
US11276572B2 (en) * | 2017-12-08 | 2022-03-15 | Tokyo Electron Limited | Technique for multi-patterning substrates |
CN113412533A (zh) | 2019-02-22 | 2021-09-17 | 默克专利股份有限公司 | 具有改进的保质期的可用作硬掩膜和填充材料的含无机氧化物组分和炔氧基取代的旋涂碳组分的旋涂组合物 |
JP2022540086A (ja) | 2019-07-08 | 2022-09-14 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツング | 洗浄剤並びにエッジ保護層及び残留金属ハードマスク成分を除去するためのそれの使用 |
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EP2928899B1 (en) | 2020-09-09 |
CN104781262B (zh) | 2018-11-13 |
CN104781262A (zh) | 2015-07-15 |
SG11201502264SA (en) | 2015-04-29 |
KR20150092737A (ko) | 2015-08-13 |
WO2014086982A2 (en) | 2014-06-12 |
KR20200094232A (ko) | 2020-08-06 |
WO2014086982A3 (en) | 2014-08-28 |
EP2928899A2 (en) | 2015-10-14 |
KR102177184B1 (ko) | 2020-11-11 |
CN109180722A (zh) | 2019-01-11 |
JP6430954B2 (ja) | 2018-11-28 |
TWI627231B (zh) | 2018-06-21 |
US20140159278A1 (en) | 2014-06-12 |
JP2016508963A (ja) | 2016-03-24 |
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US9315636B2 (en) | 2016-04-19 |
KR102302645B1 (ko) | 2021-09-15 |
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