CN106460154A - 透明导电铟掺杂氧化锡 - Google Patents

透明导电铟掺杂氧化锡 Download PDF

Info

Publication number
CN106460154A
CN106460154A CN201580028918.XA CN201580028918A CN106460154A CN 106460154 A CN106460154 A CN 106460154A CN 201580028918 A CN201580028918 A CN 201580028918A CN 106460154 A CN106460154 A CN 106460154A
Authority
CN
China
Prior art keywords
target
tin oxide
indium tin
substrate
sputtering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201580028918.XA
Other languages
English (en)
Chinese (zh)
Inventor
K·K·乌普雷蒂
K·H·拉克达瓦拉
R·谢伦伯格
M·A·艾利
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
PPG Industries Ohio Inc
Original Assignee
PPG Industries Ohio Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by PPG Industries Ohio Inc filed Critical PPG Industries Ohio Inc
Publication of CN106460154A publication Critical patent/CN106460154A/zh
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Physical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Surface Treatment Of Glass (AREA)
CN201580028918.XA 2014-05-30 2015-03-12 透明导电铟掺杂氧化锡 Pending CN106460154A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US14/292,200 US9988707B2 (en) 2014-05-30 2014-05-30 Transparent conducting indium doped tin oxide
US14/292,200 2014-05-30
PCT/US2015/020151 WO2015183374A1 (en) 2014-05-30 2015-03-12 Transparent conducting indium doped tin oxide

Publications (1)

Publication Number Publication Date
CN106460154A true CN106460154A (zh) 2017-02-22

Family

ID=52811205

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201580028918.XA Pending CN106460154A (zh) 2014-05-30 2015-03-12 透明导电铟掺杂氧化锡

Country Status (8)

Country Link
US (2) US9988707B2 (enExample)
EP (1) EP3149220B1 (enExample)
JP (1) JP2017518441A (enExample)
CN (1) CN106460154A (enExample)
CA (1) CA2948259C (enExample)
ES (1) ES2739885T3 (enExample)
RU (1) RU2693982C2 (enExample)
WO (1) WO2015183374A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109811308A (zh) * 2019-01-29 2019-05-28 晟光科技股份有限公司 一种ito导电膜制作工艺

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2645902C2 (ru) * 2016-07-12 2018-02-28 Федеральное государственное бюджетное образовательное учреждение высшего образования "Вятская государственная сельскохозяйственная академия" (ФГБОУ ВО Вятская ГСХА) Способ и устройство электролитического легирования полупроводниковых соединений индием и галлием
US10457148B2 (en) 2017-02-24 2019-10-29 Epic Battery Inc. Solar car
US10587221B2 (en) 2017-04-03 2020-03-10 Epic Battery Inc. Modular solar battery
US11337311B2 (en) 2018-07-06 2022-05-17 Ppg Industries Ohio, Inc. Aircraft window with variable power density heater film
US11489082B2 (en) 2019-07-30 2022-11-01 Epic Battery Inc. Durable solar panels
IT202300016008A1 (it) * 2023-07-28 2025-01-28 3Sun S R L Celle fotovoltaiche multigiunzione

Citations (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63176472A (ja) * 1987-01-13 1988-07-20 Mitsubishi Electric Corp インライン型反応性スパツタ装置
JPH05263228A (ja) * 1992-03-19 1993-10-12 Toshiba Corp スパッタリング装置
US6187150B1 (en) * 1999-02-26 2001-02-13 Kaneka Corporation Method for manufacturing thin film photovoltaic device
GB2361245A (en) * 2000-04-14 2001-10-17 Jk Microtechnology Ltd High conductivity indium-tin-oxide films
US20030035906A1 (en) * 2001-05-09 2003-02-20 Hassan Memarian Transparent conductive stratiform coating of indium tin oxide
CN1572900A (zh) * 2003-05-23 2005-02-02 株式会社爱发科 溅射源、溅射装置和溅射方法
CN101528972A (zh) * 2006-10-24 2009-09-09 株式会社爱发科 薄膜形成方法及薄膜形成装置
CN101622374A (zh) * 2007-03-01 2010-01-06 株式会社爱发科 薄膜形成方法及薄膜形成装置
US20100122900A1 (en) * 2008-11-18 2010-05-20 Guardian Industries Corp ITO-coated article for use with touch panel display assemblies, and/or method of making the same
WO2010090197A1 (ja) * 2009-02-04 2010-08-12 シャープ株式会社 透明導電膜形成体及びその製造方法
US20110139612A1 (en) * 2009-12-11 2011-06-16 Heung-Yeol Na Sputtering apparatus
US20130052458A1 (en) * 2010-05-14 2013-02-28 Kochi University Of Technology Zinc oxide-based conductive multilayer structure, process for producing the same, and electronic device
CN103489505A (zh) * 2013-10-12 2014-01-01 东莞市平波电子有限公司 一种触摸屏用ito导电膜及其制备方法
CN103717782A (zh) * 2011-06-30 2014-04-09 唯景公司 溅射靶和溅射方法

Family Cites Families (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4132624A (en) 1971-02-05 1979-01-02 Triplex Safety Glass Company Limited Apparatus for producing metal oxide films
JPS5788028A (en) * 1980-11-14 1982-06-01 Asahi Glass Co Ltd Formation of electrically conductive transparent film of indium oxide
JPS5971205A (ja) * 1982-10-15 1984-04-21 株式会社半導体エネルギー研究所 透光性導電膜およびその作製方法
EP0299687B1 (en) 1987-07-17 1993-06-23 LUCAS INDUSTRIES public limited company Transparencies
SU1499573A1 (ru) 1987-09-08 1992-03-07 Предприятие П/Я А-7873 Способ получени прозрачных провод щих пленок на основе оксидов инди и олова
JPH02309511A (ja) * 1989-05-24 1990-12-25 Showa Denko Kk 透明導電膜
RU2075537C1 (ru) * 1992-12-05 1997-03-20 Хайэр Вакуум инд Ко., Лтд. Экзотермическое стекло и способы его изготовления
US5668663A (en) 1994-05-05 1997-09-16 Donnelly Corporation Electrochromic mirrors and devices
US5873989A (en) * 1997-02-06 1999-02-23 Intevac, Inc. Methods and apparatus for linear scan magnetron sputtering
RU2112076C1 (ru) 1997-05-22 1998-05-27 Товарищество с ограниченной ответственностью "ТИКО" Способ нанесения проводящего прозрачного покрытия
JP2000238178A (ja) 1999-02-24 2000-09-05 Teijin Ltd 透明導電積層体
FR2793106B1 (fr) 1999-04-28 2001-06-22 Saint Gobain Vitrage Vitrage multiple isolant, en particulier hublot d'avion, a blindage electromagnetique
RU2181389C2 (ru) * 1999-06-29 2002-04-20 Омский научно-исследовательский институт приборостроения Способ получения прозрачной электропроводящей пленки на основе оксидов индия и олова
DE10023459A1 (de) 2000-05-12 2001-11-15 Balzers Process Systems Gmbh Indium-Zinn-Oxid (ITO)-Schicht und Verfahren zur Herstellung derselben
JP5007777B2 (ja) 2000-05-21 2012-08-22 Ｔｄｋ株式会社 透明導電積層体
JP3889221B2 (ja) 2000-12-05 2007-03-07 独立行政法人科学技術振興機構 Ｉｔｏ透明導電膜形成用塗布液および透明導電膜の形成方法
JP2002350834A (ja) * 2001-03-07 2002-12-04 Ueyama Denki:Kk カラーフィルターの製造方法
US6864555B2 (en) * 2001-09-04 2005-03-08 Eugene Robert Worley Photo detector methods to reduce the disabling effects of displacement current in opto-couplers
JP2003086025A (ja) 2001-09-07 2003-03-20 Sanyo Electric Co Ltd 透明導電膜成膜基板及びその製造方法
JP4320564B2 (ja) 2002-06-28 2009-08-26 日亜化学工業株式会社 透明導電膜形成用組成物、透明導電膜形成用溶液および透明導電膜の形成方法
RU2241065C2 (ru) * 2003-01-27 2004-11-27 Институт солнечно-земной физики СО РАН Способ нанесения проводящего прозрачного покрытия
CN1922541A (zh) * 2004-02-23 2007-02-28 默克专利股份有限公司 用于电光显示器中的透明电极的具有改进的蚀刻性能的双层透明导体方案
JP2005263228A (ja) 2004-03-16 2005-09-29 Toppan Printing Co Ltd 蓋付き容器用紙製カバー
RU2274675C1 (ru) * 2005-02-16 2006-04-20 Валерий Андреевич Попов Способ получения оптически прозрачного электропроводного покрытия и изделие с покрытием, полученное указанным способом (варианты)
KR101395513B1 (ko) 2006-02-23 2014-05-15 피코데온 리미티드 오와이 플라스틱 기재 상의 코팅 및 코팅된 플라스틱 제품
FR2908229B1 (fr) 2006-11-03 2023-04-28 Saint Gobain Couche transparente a haute conductivite electrique avec grille metallique a tenue electrochimique optimisee adaptee pour subir un traitement thermique de type bombage, ou trempe
US8372114B2 (en) 2006-11-13 2013-02-12 Electroformed Stents, Inc. Over-the-wire exclusion device and system for delivery
KR20120108062A (ko) 2007-06-26 2012-10-04 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 아모르퍼스 복합 산화막, 결정질 복합 산화막, 아모르퍼스 복합 산화막의 제조 방법, 결정질 복합 산화막의 제조 방법 및 복합 산화물 소결체
KR101155358B1 (ko) 2007-07-13 2012-06-19 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 복합 산화물 소결체, 아모르퍼스 복합 산화막의 제조 방법, 아모르퍼스 복합 산화막, 결정질 복합 산화막의 제조 방법 및 결정질 복합 산화막
KR20090063946A (ko) 2007-12-14 2009-06-18 삼성코닝정밀유리 주식회사 산화인듐주석 타겟 및 이를 이용한 투명 도전막의 제조방법
US20100028684A1 (en) 2008-07-31 2010-02-04 Jose Mariscal Conductive multilayer stack
US8257830B2 (en) 2008-07-31 2012-09-04 Ppg Industries Ohio, Inc. Electrically conductive protective liner and method of manufacture
US8445373B2 (en) 2009-05-28 2013-05-21 Guardian Industries Corp. Method of enhancing the conductive and optical properties of deposited indium tin oxide (ITO) thin films
CN104213085A (zh) * 2009-11-19 2014-12-17 株式会社爱发科 透明导电膜的制造方法、透明导电膜的制造装置、溅射靶及透明导电膜
US8524337B2 (en) 2010-02-26 2013-09-03 Guardian Industries Corp. Heat treated coated article having glass substrate(s) and indium-tin-oxide (ITO) inclusive coating
EP2437280A1 (en) 2010-09-30 2012-04-04 Applied Materials, Inc. Systems and methods for forming a layer of sputtered material
RU2448197C1 (ru) 2011-04-05 2012-04-20 Российская Федерация, от имени которой выступает Министерство промышленности и торговли Российской Федерации (Минпромторг России) Способ нанесения прозрачного электропроводящего покрытия
JP2024176472A (ja) 2023-06-08 2024-12-19 ソフトバンクグループ株式会社 制御システム、制御方法及び制御プログラム

Patent Citations (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63176472A (ja) * 1987-01-13 1988-07-20 Mitsubishi Electric Corp インライン型反応性スパツタ装置
JPH05263228A (ja) * 1992-03-19 1993-10-12 Toshiba Corp スパッタリング装置
US6187150B1 (en) * 1999-02-26 2001-02-13 Kaneka Corporation Method for manufacturing thin film photovoltaic device
GB2361245A (en) * 2000-04-14 2001-10-17 Jk Microtechnology Ltd High conductivity indium-tin-oxide films
US20030035906A1 (en) * 2001-05-09 2003-02-20 Hassan Memarian Transparent conductive stratiform coating of indium tin oxide
CN1572900A (zh) * 2003-05-23 2005-02-02 株式会社爱发科 溅射源、溅射装置和溅射方法
CN101528972A (zh) * 2006-10-24 2009-09-09 株式会社爱发科 薄膜形成方法及薄膜形成装置
CN101622374A (zh) * 2007-03-01 2010-01-06 株式会社爱发科 薄膜形成方法及薄膜形成装置
US20100122900A1 (en) * 2008-11-18 2010-05-20 Guardian Industries Corp ITO-coated article for use with touch panel display assemblies, and/or method of making the same
WO2010090197A1 (ja) * 2009-02-04 2010-08-12 シャープ株式会社 透明導電膜形成体及びその製造方法
US20110139612A1 (en) * 2009-12-11 2011-06-16 Heung-Yeol Na Sputtering apparatus
US20130052458A1 (en) * 2010-05-14 2013-02-28 Kochi University Of Technology Zinc oxide-based conductive multilayer structure, process for producing the same, and electronic device
CN103717782A (zh) * 2011-06-30 2014-04-09 唯景公司 溅射靶和溅射方法
CN103489505A (zh) * 2013-10-12 2014-01-01 东莞市平波电子有限公司 一种触摸屏用ito导电膜及其制备方法

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
叶志镇等: "《半导体薄膜技术与物理》", 30 September 2008, 浙江大学出版社 *
戴达煌等: "《薄膜与涂层现代表面技术》", 31 July 2008, 中南大学出版社 *
雷霆等: "《铅冶金》", 31 August 2012, 北京：冶金工业出版社 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109811308A (zh) * 2019-01-29 2019-05-28 晟光科技股份有限公司 一种ito导电膜制作工艺

Also Published As

Publication number Publication date
JP2017518441A (ja) 2017-07-06
RU2016151659A3 (enExample) 2018-07-05
RU2693982C2 (ru) 2019-07-08
CA2948259A1 (en) 2015-12-03
US20180291497A1 (en) 2018-10-11
CA2948259C (en) 2024-02-20
EP3149220B1 (en) 2019-05-08
US12338525B2 (en) 2025-06-24
ES2739885T3 (es) 2020-02-04
EP3149220A1 (en) 2017-04-05
RU2016151659A (ru) 2018-07-04
US9988707B2 (en) 2018-06-05
WO2015183374A1 (en) 2015-12-03
US20150345006A1 (en) 2015-12-03

Similar Documents

Publication Publication Date Title
US12338525B2 (en) Transparent conducting indium doped tin oxide
TWI381401B (zh) Transparent conductive film and manufacturing method thereof
CN101221935B (zh) 透明导电膜及其制造方法
Cheong et al. Highly flexible transparent thin film heaters based on silver nanowires and aluminum zinc oxides
TWI716486B (zh) 透光性導電膜及調光膜
CN115298762A (zh) 透明导电性薄膜
WO2010101028A1 (ja) 網目状金属微粒子積層フィルム及びその製造方法
Ozbay et al. Surface free energy and wettability properties of transparent conducting oxide-based films with Ag interlayer
KR20200037547A (ko) 금속나노입자가 전사된 투명 면상 발열필름 및 이의 제조방법
CN112384848A (zh) 透光性导电薄膜及调光薄膜
Kim et al. Characteristics of ITO/Ag/ITO hybrid layers prepared by magnetron sputtering for transparent film heaters
JP2016153214A (ja) 導電性フィルム及びそれを用いた電磁波シールドシート
JP6689584B2 (ja) 透明導電性積層体及び透明導電性積層体の製造方法
WO2021187574A1 (ja) 透明導電性フィルムの製造方法
JP2005071901A (ja) 透明導電性積層フィルム
KR20090069886A (ko) 저주파 스퍼터링 장치를 이용하여 제조되는 투명 전극용산화인듐주석 박막 및 그 제조방법
CN111698796A (zh) 一种耐反复刮擦银纳米线薄膜加热器的制备方法
JP7320510B2 (ja) 透明電極付き基板およびその製造方法
JP5821222B2 (ja) 透明導電層積層基材
KR102815123B1 (ko) 투명 도전성 필름
Reddy et al. Development and environmental stability of ITO thin film for spacecraft application
JP7418506B1 (ja) 透明導電性フィルム
KR102695635B1 (ko) 투명 도전성 필름
JP2019181730A (ja) 機能性細線付き基材の製造方法、及び、インクと基材のセット
JP2010248606A (ja) 薄膜積層体の作製方法

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication
RJ01 Rejection of invention patent application after publication

Application publication date: 20170222