CN105607424A - 感光性树脂组合物、感光性元件、分隔壁的形成方法、图像显示装置及制造方法和应用 - Google Patents

感光性树脂组合物、感光性元件、分隔壁的形成方法、图像显示装置及制造方法和应用 Download PDF

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Publication number
CN105607424A
CN105607424A CN201610082230.6A CN201610082230A CN105607424A CN 105607424 A CN105607424 A CN 105607424A CN 201610082230 A CN201610082230 A CN 201610082230A CN 105607424 A CN105607424 A CN 105607424A
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CN
China
Prior art keywords
image display
display device
photosensitive polymer
polymer combination
composition
Prior art date
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CN201610082230.6A
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English (en)
Chinese (zh)
Inventor
佐藤真弓
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Resonac Corp
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Hitachi Chemical Co Ltd
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Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Publication of CN105607424A publication Critical patent/CN105607424A/zh
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/165—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on translational movement of particles in a fluid under the influence of an applied field
    • G02F1/166—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on translational movement of particles in a fluid under the influence of an applied field characterised by the electro-optical or magneto-optical effect
    • G02F1/167—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on translational movement of particles in a fluid under the influence of an applied field characterised by the electro-optical or magneto-optical effect by electrophoresis
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Nonlinear Science (AREA)
  • Materials For Photolithography (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Electrochemistry (AREA)
  • Molecular Biology (AREA)
  • Optics & Photonics (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
CN201610082230.6A 2010-06-07 2011-06-03 感光性树脂组合物、感光性元件、分隔壁的形成方法、图像显示装置及制造方法和应用 Pending CN105607424A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2010-130094 2010-06-07
JP2010130094 2010-06-07
CN201180020927.6A CN102859438B (zh) 2010-06-07 2011-06-03 感光性树脂组合物、使用了其的感光性元件、图像显示装置的分隔壁的形成方法、图像显示装置的制造方法和图像显示装置

Related Parent Applications (1)

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CN201180020927.6A Division CN102859438B (zh) 2010-06-07 2011-06-03 感光性树脂组合物、使用了其的感光性元件、图像显示装置的分隔壁的形成方法、图像显示装置的制造方法和图像显示装置

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CN105607424A true CN105607424A (zh) 2016-05-25

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CN201180020927.6A Expired - Fee Related CN102859438B (zh) 2010-06-07 2011-06-03 感光性树脂组合物、使用了其的感光性元件、图像显示装置的分隔壁的形成方法、图像显示装置的制造方法和图像显示装置

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JP (2) JP4924776B2 (ja)
KR (1) KR101486641B1 (ja)
CN (2) CN105607424A (ja)
TW (1) TWI509357B (ja)
WO (1) WO2011155412A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112368611A (zh) * 2018-07-05 2021-02-12 东丽株式会社 树脂组合物、遮光膜、遮光膜的制造方法及带隔壁的基板

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JP6019791B2 (ja) * 2012-06-19 2016-11-02 日立化成株式会社 隔壁形成材料、これを用いた感光性エレメント、隔壁の形成方法及び画像表示装置の製造方法
KR101636178B1 (ko) * 2014-12-30 2016-07-04 동우 화인켐 주식회사 스페이서 형성용 감광성 수지 조성물 및 이로부터 제조되는 스페이서
CN108027675B (zh) * 2015-09-30 2021-10-08 富士胶片株式会社 静电电容型输入装置及其电极保护膜及其膜用组合物、转印薄膜、层叠体、图像显示装置
JP2019148611A (ja) * 2016-07-05 2019-09-05 日立化成株式会社 感光性導電フィルム、導電パターンの製造方法、導電パターン基板及びタッチパネルセンサ
WO2018030202A1 (ja) * 2016-08-08 2018-02-15 Dic株式会社 積層体、メタルメッシュ及びタッチパネル
WO2020137144A1 (ja) * 2018-12-27 2020-07-02 富士フイルム株式会社 感光性転写材料、積層体、タッチパネル、パターン付き基板の製造方法、回路基板の製造方法、及びタッチパネルの製造方法
JPWO2020137284A1 (ja) * 2018-12-27 2021-11-04 富士フイルム株式会社 導電性転写材料、パターンつき基板の製造方法、回路基板の製造方法、積層体、及びタッチパネル
WO2022210799A1 (ja) * 2021-03-29 2022-10-06 株式会社カネカ 基板積層体、イメージセンサ、及び基板積層体の製造方法

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CN101010636A (zh) * 2004-09-06 2007-08-01 富士胶片株式会社 图案形成材料、以及图案形成装置和图案形成方法
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CN101010636A (zh) * 2004-09-06 2007-08-01 富士胶片株式会社 图案形成材料、以及图案形成装置和图案形成方法
JP2007304355A (ja) * 2006-05-11 2007-11-22 Nippon Kayaku Co Ltd 機能素子及びそれに用いられるネガ型感光性樹脂組成物並びに機能素子の製造方法
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Publication number Priority date Publication date Assignee Title
CN112368611A (zh) * 2018-07-05 2021-02-12 东丽株式会社 树脂组合物、遮光膜、遮光膜的制造方法及带隔壁的基板

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Publication number Publication date
KR101486641B1 (ko) 2015-01-26
KR20130040936A (ko) 2013-04-24
TWI509357B (zh) 2015-11-21
TW201219979A (en) 2012-05-16
CN102859438B (zh) 2016-06-08
JP5884337B2 (ja) 2016-03-15
WO2011155412A1 (ja) 2011-12-15
JPWO2011155412A1 (ja) 2013-08-01
JP2012018410A (ja) 2012-01-26
CN102859438A (zh) 2013-01-02
JP4924776B2 (ja) 2012-04-25

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