CN105593013A - 气体阻隔性膜的制造方法 - Google Patents

气体阻隔性膜的制造方法 Download PDF

Info

Publication number
CN105593013A
CN105593013A CN201480055052.7A CN201480055052A CN105593013A CN 105593013 A CN105593013 A CN 105593013A CN 201480055052 A CN201480055052 A CN 201480055052A CN 105593013 A CN105593013 A CN 105593013A
Authority
CN
China
Prior art keywords
film
barrier layer
layer
gas
barrier
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201480055052.7A
Other languages
English (en)
Chinese (zh)
Inventor
伊东宏明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Konica Minolta Opto Inc
Original Assignee
Konica Minolta Opto Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Opto Inc filed Critical Konica Minolta Opto Inc
Publication of CN105593013A publication Critical patent/CN105593013A/zh
Pending legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/28—Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/16—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers in which all the silicon atoms are connected by linkages other than oxygen atoms
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/60—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which all the silicon atoms are connected by linkages other than oxygen atoms
    • C08G77/62—Nitrogen atoms

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Laminated Bodies (AREA)
  • Chemical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
CN201480055052.7A 2013-10-10 2014-10-10 气体阻隔性膜的制造方法 Pending CN105593013A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013213132 2013-10-10
JP2013-213132 2013-10-10
PCT/JP2014/077268 WO2015053405A1 (ja) 2013-10-10 2014-10-10 ガスバリア性フィルムの製造方法

Publications (1)

Publication Number Publication Date
CN105593013A true CN105593013A (zh) 2016-05-18

Family

ID=52813218

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201480055052.7A Pending CN105593013A (zh) 2013-10-10 2014-10-10 气体阻隔性膜的制造方法

Country Status (3)

Country Link
JP (1) JP6319316B2 (ja)
CN (1) CN105593013A (ja)
WO (1) WO2015053405A1 (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109296870A (zh) * 2017-07-24 2019-02-01 中国科学院化学研究所 一种真空绝热板用阻隔膜及其制备方法和用途
CN109477202A (zh) * 2016-07-28 2019-03-15 柯尼卡美能达株式会社 气体阻隔性膜、使用它的气体阻隔性膜材和使用它们的电子设备、以及气体阻隔性膜的制造方法
CN111373840A (zh) * 2017-11-10 2020-07-03 柯尼卡美能达株式会社 电子器件的制造方法
CN113286701A (zh) * 2018-11-09 2021-08-20 索弗雷什公司 吹塑膜材料及其制造方法和用途
CN113337214A (zh) * 2020-03-03 2021-09-03 中国科学院化学研究所 一种氧阻隔涂层及其制备方法

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102016002011A1 (de) * 2016-02-20 2017-08-24 Universität Kassel Verfahren zur Haftverbesserung von Silikon auf einer thermoplastischen Oberfläche
CN107482131B (zh) * 2017-08-14 2019-05-10 宁波安特弗新材料科技有限公司 一种阻隔膜
KR102141632B1 (ko) * 2017-11-28 2020-08-06 주식회사 엘지화학 배리어 필름

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06299118A (ja) * 1993-04-20 1994-10-25 Tonen Corp コーティング用組成物及びコーティング方法
JPH06306329A (ja) * 1993-02-24 1994-11-01 Tonen Corp コーティング用組成物及びコーティング方法
WO2012067186A1 (ja) * 2010-11-19 2012-05-24 コニカミノルタホールディングス株式会社 ガスバリア性フィルムの製造方法、及びガスバリア性フィルム
WO2012067230A1 (ja) * 2010-11-19 2012-05-24 コニカミノルタホールディングス株式会社 ガスバリア性フィルム、ガスバリア性フィルムの製造方法及び電子デバイス
JP2013122965A (ja) * 2011-12-09 2013-06-20 Asahi Kasei E-Materials Corp ポリシロキサン縮合物を含有する絶縁材料及び該絶縁材料を用いた硬化膜の製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5734675B2 (ja) * 2011-01-17 2015-06-17 三井化学株式会社 積層体およびその製造方法
WO2014119754A1 (ja) * 2013-01-31 2014-08-07 コニカミノルタ株式会社 ガスバリア性フィルムおよびその製造方法、ならびにこれを用いた電子デバイス

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06306329A (ja) * 1993-02-24 1994-11-01 Tonen Corp コーティング用組成物及びコーティング方法
JPH06299118A (ja) * 1993-04-20 1994-10-25 Tonen Corp コーティング用組成物及びコーティング方法
WO2012067186A1 (ja) * 2010-11-19 2012-05-24 コニカミノルタホールディングス株式会社 ガスバリア性フィルムの製造方法、及びガスバリア性フィルム
WO2012067230A1 (ja) * 2010-11-19 2012-05-24 コニカミノルタホールディングス株式会社 ガスバリア性フィルム、ガスバリア性フィルムの製造方法及び電子デバイス
JP2013122965A (ja) * 2011-12-09 2013-06-20 Asahi Kasei E-Materials Corp ポリシロキサン縮合物を含有する絶縁材料及び該絶縁材料を用いた硬化膜の製造方法

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109477202A (zh) * 2016-07-28 2019-03-15 柯尼卡美能达株式会社 气体阻隔性膜、使用它的气体阻隔性膜材和使用它们的电子设备、以及气体阻隔性膜的制造方法
CN109296870A (zh) * 2017-07-24 2019-02-01 中国科学院化学研究所 一种真空绝热板用阻隔膜及其制备方法和用途
CN111373840A (zh) * 2017-11-10 2020-07-03 柯尼卡美能达株式会社 电子器件的制造方法
CN111373840B (zh) * 2017-11-10 2022-12-20 柯尼卡美能达株式会社 电子器件的制造方法
CN113286701A (zh) * 2018-11-09 2021-08-20 索弗雷什公司 吹塑膜材料及其制造方法和用途
CN113286701B (zh) * 2018-11-09 2023-11-03 索弗雷什公司 吹塑膜材料及其制造方法和用途
US11873149B2 (en) 2018-11-09 2024-01-16 Sofresh, Inc. Blown film materials and processes for manufacturing thereof and uses thereof
CN113337214A (zh) * 2020-03-03 2021-09-03 中国科学院化学研究所 一种氧阻隔涂层及其制备方法
CN113337214B (zh) * 2020-03-03 2022-07-29 中国科学院化学研究所 一种氧阻隔涂层及其制备方法

Also Published As

Publication number Publication date
JPWO2015053405A1 (ja) 2017-03-09
JP6319316B2 (ja) 2018-05-09
WO2015053405A1 (ja) 2015-04-16

Similar Documents

Publication Publication Date Title
CN105593013A (zh) 气体阻隔性膜的制造方法
CN103269851B (zh) 气体阻隔性膜及电子器件
JP6504284B2 (ja) ガスバリア性フィルム、その製造方法、およびこれを用いた電子デバイス
JP5929775B2 (ja) ガスバリア性フィルムおよびその製造方法、ならびに前記ガスバリア性フィルムを含む電子デバイス
CN104903090B (zh) 气体阻隔性膜
CN103648764B (zh) 气体阻隔性膜及其制造方法
CN104968492A (zh) 气体阻隔性膜
US20130316182A1 (en) Method for producing gas barrier film, gas barrier film, and electronic device
CN105246683A (zh) 阻气性膜及其制造方法
CN103796827A (zh) 气体阻隔性膜、气体阻隔性膜的制造方法及电子器件
JP2019050196A (ja) 電子デバイスおよびその製造方法
CN105451984A (zh) 阻气性膜及其制造方法以及使用该阻气性膜的电子器件
CN106414063B (zh) 阻气性膜及使用其的电子器件
CN105658424A (zh) 气体阻隔性膜
JPWO2016043141A1 (ja) ガスバリア性フィルム
CN105939959A (zh) 改性聚硅氮烷、含有该改性聚硅氮烷的涂布液及使用该涂布液而制造的气体阻隔性膜
WO2014119754A1 (ja) ガスバリア性フィルムおよびその製造方法、ならびにこれを用いた電子デバイス
JP2014141055A (ja) ガスバリア性フィルム
CN105764845B (zh) 功能性膜
CN105579227B (zh) 层叠膜、有机电致发光装置、光电转换装置及液晶显示器
JPWO2017047346A1 (ja) 電子デバイス及び電子デバイスの封止方法
JPWO2015029795A1 (ja) ガスバリア性フィルムの製造方法
WO2014188981A1 (ja) ガスバリア性フィルム
TWI627063B (zh) Gas barrier film and method of manufacturing same

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
WD01 Invention patent application deemed withdrawn after publication
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20160518