CN103974918B - 基于碳SiOC的碱金属阻挡层 - Google Patents

基于碳SiOC的碱金属阻挡层 Download PDF

Info

Publication number
CN103974918B
CN103974918B CN201280056372.5A CN201280056372A CN103974918B CN 103974918 B CN103974918 B CN 103974918B CN 201280056372 A CN201280056372 A CN 201280056372A CN 103974918 B CN103974918 B CN 103974918B
Authority
CN
China
Prior art keywords
layer
carbon
depth
silicon oxycarbide
sio
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201280056372.5A
Other languages
English (en)
Chinese (zh)
Other versions
CN103974918A (zh
Inventor
C·图马泽
M·梅尔赫
A·于尼亚尔
R·兰特
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Saint Gobain Glass France SAS
Original Assignee
Saint Gobain Glass France SAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Saint Gobain Glass France SAS filed Critical Saint Gobain Glass France SAS
Publication of CN103974918A publication Critical patent/CN103974918A/zh
Application granted granted Critical
Publication of CN103974918B publication Critical patent/CN103974918B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3441—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising carbon, a carbide or oxycarbide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C23C16/325—Silicon carbide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/152—Deposition methods from the vapour phase by cvd
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/152—Deposition methods from the vapour phase by cvd
    • C03C2218/153—Deposition methods from the vapour phase by cvd by plasma-enhanced cvd
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/154—Deposition methods from the vapour phase by sputtering
    • C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264—Up to 3 mils
    • Y10T428/265—1 mil or less

Landscapes

  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Surface Treatment Of Glass (AREA)
  • Laminated Bodies (AREA)
  • Glass Compositions (AREA)
CN201280056372.5A 2011-11-16 2012-11-14 基于碳SiOC的碱金属阻挡层 Expired - Fee Related CN103974918B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR1160418A FR2982608B1 (fr) 2011-11-16 2011-11-16 Couche barriere aux metaux alcalins a base de sioc
FR1160418 2011-11-16
PCT/FR2012/052622 WO2013072623A1 (fr) 2011-11-16 2012-11-14 Couche barriere aux metaux alcalins a base de sioc

Publications (2)

Publication Number Publication Date
CN103974918A CN103974918A (zh) 2014-08-06
CN103974918B true CN103974918B (zh) 2016-12-14

Family

ID=47291136

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201280056372.5A Expired - Fee Related CN103974918B (zh) 2011-11-16 2012-11-14 基于碳SiOC的碱金属阻挡层

Country Status (18)

Country Link
US (1) US9012024B2 (OSRAM)
EP (1) EP2780294B1 (OSRAM)
JP (1) JP6050370B2 (OSRAM)
KR (1) KR102000803B1 (OSRAM)
CN (1) CN103974918B (OSRAM)
BR (1) BR112014010220A8 (OSRAM)
CA (1) CA2854052C (OSRAM)
DK (1) DK2780294T3 (OSRAM)
EA (1) EA024976B1 (OSRAM)
ES (1) ES2736923T3 (OSRAM)
FR (1) FR2982608B1 (OSRAM)
HU (1) HUE045009T2 (OSRAM)
IN (1) IN2014MN00825A (OSRAM)
MX (1) MX336859B (OSRAM)
PL (1) PL2780294T3 (OSRAM)
PT (1) PT2780294T (OSRAM)
TR (1) TR201909120T4 (OSRAM)
WO (1) WO2013072623A1 (OSRAM)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106277818A (zh) * 2015-05-11 2017-01-04 杭州合新科技有限公司 一种新型阳光控制镀膜玻璃及其制备工艺
EP3319915B2 (en) * 2015-07-07 2023-05-17 AGC Glass Europe Glass substrate with increased weathering and chemcial resistance
US10428421B2 (en) 2015-08-03 2019-10-01 Asm Ip Holding B.V. Selective deposition on metal or metallic surfaces relative to dielectric surfaces
US9786491B2 (en) 2015-11-12 2017-10-10 Asm Ip Holding B.V. Formation of SiOCN thin films
US9786492B2 (en) 2015-11-12 2017-10-10 Asm Ip Holding B.V. Formation of SiOCN thin films
CN105669044B (zh) * 2015-12-31 2018-05-29 株洲醴陵旗滨玻璃有限公司 一种在线易洁镀膜玻璃及其制备方法
KR102378021B1 (ko) 2016-05-06 2022-03-23 에이에스엠 아이피 홀딩 비.브이. SiOC 박막의 형성
US10453701B2 (en) 2016-06-01 2019-10-22 Asm Ip Holding B.V. Deposition of organic films
US10373820B2 (en) 2016-06-01 2019-08-06 Asm Ip Holding B.V. Deposition of organic films
US11094535B2 (en) 2017-02-14 2021-08-17 Asm Ip Holding B.V. Selective passivation and selective deposition
US10847529B2 (en) 2017-04-13 2020-11-24 Asm Ip Holding B.V. Substrate processing method and device manufactured by the same
US10504901B2 (en) 2017-04-26 2019-12-10 Asm Ip Holding B.V. Substrate processing method and device manufactured using the same
CN114875388A (zh) 2017-05-05 2022-08-09 Asm Ip 控股有限公司 用于受控形成含氧薄膜的等离子体增强沉积方法
TWI761636B (zh) 2017-12-04 2022-04-21 荷蘭商Ａｓｍ Ｉｐ控股公司 電漿增強型原子層沉積製程及沉積碳氧化矽薄膜的方法
DE102018207101B4 (de) * 2018-05-08 2024-06-13 Robert Bosch Gmbh Verfahren zum Herstellen eines Bodens einer Analysezelle zum Analysieren eines biochemischen Materials und Analysezelle
US11530478B2 (en) * 2019-03-19 2022-12-20 Applied Materials, Inc. Method for forming a hydrophobic and icephobic coating
JP7020458B2 (ja) * 2019-07-12 2022-02-16 Ａｇｃ株式会社 膜付きガラス基板及びその製造方法
US12341005B2 (en) 2020-01-17 2025-06-24 Asm Ip Holding B.V. Formation of SiCN thin films
US12142479B2 (en) 2020-01-17 2024-11-12 Asm Ip Holding B.V. Formation of SiOCN thin films
DE112021004623T5 (de) * 2020-09-04 2023-06-15 AGC Inc. Glasgegenstand
JPWO2022114027A1 (OSRAM) * 2020-11-30 2022-06-02

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5958065A (ja) * 1982-09-29 1984-04-03 Toray Ind Inc 防曇性被膜
GB8630918D0 (en) 1986-12-24 1987-02-04 Pilkington Brothers Plc Coatings on glass
FR2677639B1 (fr) * 1991-06-14 1994-02-25 Saint Gobain Vitrage Internal Technique de formation par pyrolyse en voie gazeuse d'un revetement essentiellement a base d'oxygene et de silicium.
US5723172A (en) * 1994-03-11 1998-03-03 Dan Sherman Method for forming a protective coating on glass
FR2728559B1 (fr) * 1994-12-23 1997-01-31 Saint Gobain Vitrage Substrats en verre revetus d'un empilement de couches minces a proprietes de reflexion dans l'infrarouge et/ou dans le domaine du rayonnement solaire
FR2736632B1 (fr) 1995-07-12 1997-10-24 Saint Gobain Vitrage Vitrage muni d'une couche conductrice et/ou bas-emissive
FR2738813B1 (fr) * 1995-09-15 1997-10-17 Saint Gobain Vitrage Substrat a revetement photo-catalytique
FR2759362B1 (fr) * 1997-02-10 1999-03-12 Saint Gobain Vitrage Substrat transparent muni d'au moins une couche mince a base de nitrure ou d'oxynitrure de silicium et son procede d'obtention
US7096692B2 (en) * 1997-03-14 2006-08-29 Ppg Industries Ohio, Inc. Visible-light-responsive photoactive coating, coated article, and method of making same
US6379803B1 (en) * 1997-06-03 2002-04-30 Nippon Sheet Glass Co., Ltd. Low-reflectance glass article and process for preparing the same
GB2355273A (en) 1999-10-12 2001-04-18 Pilkington Plc Coating glass
FR2800731B1 (fr) 1999-11-05 2002-01-18 Saint Gobain Vitrage Substrat transparent muni d'une couche en derive de silicium
JP2003221257A (ja) * 2002-01-31 2003-08-05 Nippon Sheet Glass Co Ltd 透明薄膜の成形方法およびそれを備える透明基体
US6679978B2 (en) * 2002-02-22 2004-01-20 Afg Industries, Inc. Method of making self-cleaning substrates
BR122015015874B1 (pt) * 2003-07-11 2016-12-27 Pilkington Automotive Ltd vidraça para veículo
GB2403731A (en) * 2003-07-11 2005-01-12 Pilkington Plc Solar control glazing
CN100495588C (zh) 2003-11-18 2009-06-03 日本板硝子株式会社 带有透明导电膜的透明基体的制造方法
FR2864844B1 (fr) 2004-01-07 2015-01-16 Saint Gobain Dispositif d'eclairage autonettoyant
US7482060B2 (en) * 2004-07-14 2009-01-27 Agc Flat Glass North America, Inc. Silicon oxycarbide coatings having durable hydrophilic properties
BRPI1009124A2 (pt) * 2009-03-18 2017-11-07 Agc Flat Glass Na Inc revestimento de película delgada e metódo de fabricação do mesmo
FR2956659B1 (fr) * 2010-02-22 2014-10-10 Saint Gobain Substrat verrier revetu de couches a tenue mecanique amelioree

Also Published As

Publication number Publication date
CA2854052A1 (fr) 2013-05-23
KR102000803B1 (ko) 2019-07-16
HUE045009T2 (hu) 2019-12-30
ES2736923T3 (es) 2020-01-09
KR20140093235A (ko) 2014-07-25
FR2982608A1 (fr) 2013-05-17
DK2780294T3 (da) 2019-07-08
TR201909120T4 (tr) 2019-07-22
CN103974918A (zh) 2014-08-06
EA024976B1 (ru) 2016-11-30
PT2780294T (pt) 2019-07-10
EA201490968A1 (ru) 2014-08-29
FR2982608B1 (fr) 2013-11-22
IN2014MN00825A (OSRAM) 2015-04-17
EP2780294A1 (fr) 2014-09-24
BR112014010220A2 (pt) 2017-06-13
US9012024B2 (en) 2015-04-21
WO2013072623A1 (fr) 2013-05-23
US20140349107A1 (en) 2014-11-27
PL2780294T3 (pl) 2019-09-30
BR112014010220A8 (pt) 2017-06-20
EP2780294B1 (fr) 2019-03-27
JP6050370B2 (ja) 2016-12-21
MX336859B (es) 2016-02-04
CA2854052C (fr) 2020-01-07
JP2015506890A (ja) 2015-03-05
MX2014005735A (es) 2014-07-09

Similar Documents

Publication Publication Date Title
CN103974918B (zh) 基于碳SiOC的碱金属阻挡层
EP2714608B1 (fr) Substrat verrier transparent portant un revetement de couches successives
CN103619772B (zh) 用于制备包含多孔层的窗玻璃的方法
US20140042422A1 (en) Internal optical extraction layer for oled devices
KR102222549B1 (ko) 질소를 포함하는 투명 전도성 산화물 캡 층 조성물
JP2016530202A (ja) 熱処理可能な被覆ガラス板
CN106458728B (zh) 涂层的平整
CN104024176B (zh) 疏水窗玻璃
JP6293679B2 (ja) 酸化亜鉛コーティングを蒸着させるための化学蒸着過程、導電性ガラス物品を形成するための方法、およびそれによって生成されるコーティングされたガラス物品
CN102834363A (zh) 光催化材料及包括所述材料的玻璃片或光伏电池
JP4541462B2 (ja) ガラス基材上に金属酸化物を主成分とする層を堆積させる方法及びそれによってコーティングされたガラス基材
US20140338749A1 (en) Photocatalytic material and glazing or photovoltaic cell comprising said material
CN103732552A (zh) 提供有多孔涂层的抗反射玻璃板
CN107352814A (zh) 一种福特蓝镀膜玻璃及其制备方法
TW201429908A (zh) 線上低輻射鍍膜玻璃的製造裝置及其製造方法
TH149304B (th) สิ่งเคลือบกระจกแบบไม่ชอบรับน้ำ
RU2574421C2 (ru) Внутренний световыводящий слой для органических светоизлучающих диодов
TWI532872B (zh) Production equipment of silicon dioxide film and its production method
TW201525177A (zh) 複層硬化膜結構及其製法
JP2002348145A (ja) 近赤外線遮断ガラス
JP2017075080A (ja) 遮熱ガラス
WO2015060222A1 (ja) 薄膜付ガラス板およびその製造方法

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20161214

Termination date: 20201114

CF01 Termination of patent right due to non-payment of annual fee