TR201909120T4 - SIOC esaslı alkali metal bariyer katmanı ve üretim yöntemi. - Google Patents

SIOC esaslı alkali metal bariyer katmanı ve üretim yöntemi. Download PDF

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Publication number
TR201909120T4
TR201909120T4 TR2019/09120T TR201909120T TR201909120T4 TR 201909120 T4 TR201909120 T4 TR 201909120T4 TR 2019/09120 T TR2019/09120 T TR 2019/09120T TR 201909120 T TR201909120 T TR 201909120T TR 201909120 T4 TR201909120 T4 TR 201909120T4
Authority
TR
Turkey
Prior art keywords
alkali metal
sioc
barrier layer
production method
depth
Prior art date
Application number
TR2019/09120T
Other languages
English (en)
Inventor
Thoumazet Claire
Melcher Martin
Huignard Arnaud
Lante Raphael
Original Assignee
Saint Gobain
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Saint Gobain filed Critical Saint Gobain
Publication of TR201909120T4 publication Critical patent/TR201909120T4/tr

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3441—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising carbon, a carbide or oxycarbide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C23C16/325—Silicon carbide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/152—Deposition methods from the vapour phase by cvd
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/152—Deposition methods from the vapour phase by cvd
    • C03C2218/153—Deposition methods from the vapour phase by cvd by plasma-enhanced cvd
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/154—Deposition methods from the vapour phase by sputtering
    • C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264—Up to 3 mils
    • Y10T428/265—1 mil or less

Abstract

Buluş toplam bir E kalınlığında, en az bir alkali metalin iyonlarını ve şeffaf bir silisyum oksikarbür (SiOxCy) katmanı içeren, C/Si atom oranının 0,5'ten yüksek veya buna eşit olduğu, bir P3 derinliğinden bir P4 derinliğine uzanan, karbon bakımından zengin bir derin bölgeye ve C/Si atom oranının 0,5'ten düşük veya buna eşit olduğu, bir P1 derinliğinden bir P2 derinliğine uzanan, karbon bakımından zayıf bir yüzeysel bölgeye sahip şeffaf bir cam substratı içeren bir cam panelle ilgili olup, P1 < P2 < P3 < P4 ve (P2-P1) + (P4-P3) < E'dir, P1 ile P2 arasındaki mesafe, silisyum oksikarbür katmanının toplam kalınlığının E %10 ila 70'ini temsil eder ve P3 ile P4 arasındaki mesafe, silisyum oksikarbür katmanının toplam kalınlığının E %10 ila 70'ini temsil eder.
TR2019/09120T 2011-11-16 2012-11-14 SIOC esaslı alkali metal bariyer katmanı ve üretim yöntemi. TR201909120T4 (tr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR1160418A FR2982608B1 (fr) 2011-11-16 2011-11-16 Couche barriere aux metaux alcalins a base de sioc

Publications (1)

Publication Number Publication Date
TR201909120T4 true TR201909120T4 (tr) 2019-07-22

Family

ID=47291136

Family Applications (1)

Application Number Title Priority Date Filing Date
TR2019/09120T TR201909120T4 (tr) 2011-11-16 2012-11-14 SIOC esaslı alkali metal bariyer katmanı ve üretim yöntemi.

Country Status (18)

Country Link
US (1) US9012024B2 (tr)
EP (1) EP2780294B1 (tr)
JP (1) JP6050370B2 (tr)
KR (1) KR102000803B1 (tr)
CN (1) CN103974918B (tr)
BR (1) BR112014010220A8 (tr)
CA (1) CA2854052C (tr)
DK (1) DK2780294T3 (tr)
EA (1) EA024976B1 (tr)
ES (1) ES2736923T3 (tr)
FR (1) FR2982608B1 (tr)
HU (1) HUE045009T2 (tr)
IN (1) IN2014MN00825A (tr)
MX (1) MX336859B (tr)
PL (1) PL2780294T3 (tr)
PT (1) PT2780294T (tr)
TR (1) TR201909120T4 (tr)
WO (1) WO2013072623A1 (tr)

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Publication number Priority date Publication date Assignee Title
CN106277818A (zh) * 2015-05-11 2017-01-04 杭州合新科技有限公司 一种新型阳光控制镀膜玻璃及其制备工艺
PL3319915T3 (pl) * 2015-07-07 2020-06-15 Agc Glass Europe Szklane podłoże o podwyższonej odporności na warunki atmosferyczne i środki chemiczne
US10428421B2 (en) 2015-08-03 2019-10-01 Asm Ip Holding B.V. Selective deposition on metal or metallic surfaces relative to dielectric surfaces
US9786491B2 (en) 2015-11-12 2017-10-10 Asm Ip Holding B.V. Formation of SiOCN thin films
US9786492B2 (en) 2015-11-12 2017-10-10 Asm Ip Holding B.V. Formation of SiOCN thin films
CN105669044B (zh) * 2015-12-31 2018-05-29 株洲醴陵旗滨玻璃有限公司 一种在线易洁镀膜玻璃及其制备方法
KR102378021B1 (ko) * 2016-05-06 2022-03-23 에이에스엠 아이피 홀딩 비.브이. SiOC 박막의 형성
US10373820B2 (en) 2016-06-01 2019-08-06 Asm Ip Holding B.V. Deposition of organic films
US10453701B2 (en) 2016-06-01 2019-10-22 Asm Ip Holding B.V. Deposition of organic films
US10847529B2 (en) 2017-04-13 2020-11-24 Asm Ip Holding B.V. Substrate processing method and device manufactured by the same
US10504901B2 (en) 2017-04-26 2019-12-10 Asm Ip Holding B.V. Substrate processing method and device manufactured using the same
CN110546302B (zh) 2017-05-05 2022-05-27 Asm Ip 控股有限公司 用于受控形成含氧薄膜的等离子体增强沉积方法
US10991573B2 (en) 2017-12-04 2021-04-27 Asm Ip Holding B.V. Uniform deposition of SiOC on dielectric and metal surfaces
DE102018207101A1 (de) * 2018-05-08 2019-11-14 Robert Bosch Gmbh Verfahren zum Herstellen eines Bodens einer Analysezelle zum Analysieren eines biochemischen Materials und Analysezelle
JP7332709B2 (ja) * 2019-03-19 2023-08-23 アプライド マテリアルズ インコーポレイテッド 疎水性及び疎氷性コーティング
JP7020458B2 (ja) * 2019-07-12 2022-02-16 Ａｇｃ株式会社 膜付きガラス基板及びその製造方法
JPWO2022114027A1 (tr) * 2020-11-30 2022-06-02

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Also Published As

Publication number Publication date
BR112014010220A2 (pt) 2017-06-13
CA2854052C (fr) 2020-01-07
PL2780294T3 (pl) 2019-09-30
WO2013072623A1 (fr) 2013-05-23
MX2014005735A (es) 2014-07-09
HUE045009T2 (hu) 2019-12-30
IN2014MN00825A (tr) 2015-04-17
CA2854052A1 (fr) 2013-05-23
EA024976B1 (ru) 2016-11-30
ES2736923T3 (es) 2020-01-09
KR102000803B1 (ko) 2019-07-16
BR112014010220A8 (pt) 2017-06-20
MX336859B (es) 2016-02-04
KR20140093235A (ko) 2014-07-25
FR2982608B1 (fr) 2013-11-22
EA201490968A1 (ru) 2014-08-29
US9012024B2 (en) 2015-04-21
US20140349107A1 (en) 2014-11-27
JP2015506890A (ja) 2015-03-05
CN103974918A (zh) 2014-08-06
EP2780294A1 (fr) 2014-09-24
DK2780294T3 (da) 2019-07-08
PT2780294T (pt) 2019-07-10
FR2982608A1 (fr) 2013-05-17
EP2780294B1 (fr) 2019-03-27
CN103974918B (zh) 2016-12-14
JP6050370B2 (ja) 2016-12-21

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