EA201490968A1 - Барьерный слой для щелочных металлов на основе sioc - Google Patents

Барьерный слой для щелочных металлов на основе sioc

Info

Publication number
EA201490968A1
EA201490968A1 EA201490968A EA201490968A EA201490968A1 EA 201490968 A1 EA201490968 A1 EA 201490968A1 EA 201490968 A EA201490968 A EA 201490968A EA 201490968 A EA201490968 A EA 201490968A EA 201490968 A1 EA201490968 A1 EA 201490968A1
Authority
EA
Eurasian Patent Office
Prior art keywords
depth
sioc
total thickness
basis
barrier layer
Prior art date
Application number
EA201490968A
Other languages
English (en)
Other versions
EA024976B1 (ru
Inventor
Клер Тумазе
Мартин Мельхер
Арно Юиньяр
Рафаэль Ланте
Original Assignee
Сэн-Гобэн Гласс Франс
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Сэн-Гобэн Гласс Франс filed Critical Сэн-Гобэн Гласс Франс
Publication of EA201490968A1 publication Critical patent/EA201490968A1/ru
Publication of EA024976B1 publication Critical patent/EA024976B1/ru

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3441—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising carbon, a carbide or oxycarbide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C23C16/325—Silicon carbide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/152—Deposition methods from the vapour phase by cvd
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/152—Deposition methods from the vapour phase by cvd
    • C03C2218/153—Deposition methods from the vapour phase by cvd by plasma-enhanced cvd
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/154—Deposition methods from the vapour phase by sputtering
    • C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264—Up to 3 mils
    • Y10T428/265—1 mil or less

Abstract

Изобретение относится к остеклению, содержащему прозрачную стеклянную подложку, содержащую ионы по меньшей мере одного щелочного металла, и прозрачный слой оксикарбида кремния (SiOC) общей толщиной Е с (a) глубокой зоной с высоким содержанием углерода, идущей от глубины Рдо глубины Р, где атомное отношение С/Si больше или равно 0,5, и (b) поверхностной зоной с низким содержанием углерода, идущей от глубины Pдо глубины Р, где атомное отношение С/Si меньше или равно 0,4, где P<P<P<Pи (P-P)+(Р-Р)<Е, причем расстояние между Pи Рсоставляет от 10 до 70% общей толщины Е слоя оксикарбида кремния, и расстояние между Ри Рсоставляет от 10 до 70% общей толщины Е слоя оксикарбида кремния.
EA201490968A 2011-11-16 2012-11-14 Барьерный слой для щелочных металлов на основе sioc EA024976B1 (ru)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1160418A FR2982608B1 (fr) 2011-11-16 2011-11-16 Couche barriere aux metaux alcalins a base de sioc
PCT/FR2012/052622 WO2013072623A1 (fr) 2011-11-16 2012-11-14 Couche barriere aux metaux alcalins a base de sioc

Publications (2)

Publication Number Publication Date
EA201490968A1 true EA201490968A1 (ru) 2014-08-29
EA024976B1 EA024976B1 (ru) 2016-11-30

Family

ID=47291136

Family Applications (1)

Application Number Title Priority Date Filing Date
EA201490968A EA024976B1 (ru) 2011-11-16 2012-11-14 Барьерный слой для щелочных металлов на основе sioc

Country Status (18)

Country Link
US (1) US9012024B2 (ru)
EP (1) EP2780294B1 (ru)
JP (1) JP6050370B2 (ru)
KR (1) KR102000803B1 (ru)
CN (1) CN103974918B (ru)
BR (1) BR112014010220A8 (ru)
CA (1) CA2854052C (ru)
DK (1) DK2780294T3 (ru)
EA (1) EA024976B1 (ru)
ES (1) ES2736923T3 (ru)
FR (1) FR2982608B1 (ru)
HU (1) HUE045009T2 (ru)
IN (1) IN2014MN00825A (ru)
MX (1) MX336859B (ru)
PL (1) PL2780294T3 (ru)
PT (1) PT2780294T (ru)
TR (1) TR201909120T4 (ru)
WO (1) WO2013072623A1 (ru)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106277818A (zh) * 2015-05-11 2017-01-04 杭州合新科技有限公司 一种新型阳光控制镀膜玻璃及其制备工艺
PL3319915T3 (pl) * 2015-07-07 2020-06-15 Agc Glass Europe Szklane podłoże o podwyższonej odporności na warunki atmosferyczne i środki chemiczne
US10428421B2 (en) 2015-08-03 2019-10-01 Asm Ip Holding B.V. Selective deposition on metal or metallic surfaces relative to dielectric surfaces
US9786491B2 (en) 2015-11-12 2017-10-10 Asm Ip Holding B.V. Formation of SiOCN thin films
US9786492B2 (en) 2015-11-12 2017-10-10 Asm Ip Holding B.V. Formation of SiOCN thin films
CN105669044B (zh) * 2015-12-31 2018-05-29 株洲醴陵旗滨玻璃有限公司 一种在线易洁镀膜玻璃及其制备方法
KR102378021B1 (ko) * 2016-05-06 2022-03-23 에이에스엠 아이피 홀딩 비.브이. SiOC 박막의 형성
US10373820B2 (en) 2016-06-01 2019-08-06 Asm Ip Holding B.V. Deposition of organic films
US10453701B2 (en) 2016-06-01 2019-10-22 Asm Ip Holding B.V. Deposition of organic films
US10847529B2 (en) 2017-04-13 2020-11-24 Asm Ip Holding B.V. Substrate processing method and device manufactured by the same
US10504901B2 (en) 2017-04-26 2019-12-10 Asm Ip Holding B.V. Substrate processing method and device manufactured using the same
CN110546302B (zh) 2017-05-05 2022-05-27 Asm Ip 控股有限公司 用于受控形成含氧薄膜的等离子体增强沉积方法
US10991573B2 (en) 2017-12-04 2021-04-27 Asm Ip Holding B.V. Uniform deposition of SiOC on dielectric and metal surfaces
DE102018207101A1 (de) * 2018-05-08 2019-11-14 Robert Bosch Gmbh Verfahren zum Herstellen eines Bodens einer Analysezelle zum Analysieren eines biochemischen Materials und Analysezelle
JP7332709B2 (ja) * 2019-03-19 2023-08-23 アプライド マテリアルズ インコーポレイテッド 疎水性及び疎氷性コーティング
JP7020458B2 (ja) * 2019-07-12 2022-02-16 Ａｇｃ株式会社 膜付きガラス基板及びその製造方法
JPWO2022114027A1 (ru) * 2020-11-30 2022-06-02

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5958065A (ja) * 1982-09-29 1984-04-03 Toray Ind Inc 防曇性被膜
GB8630918D0 (en) 1986-12-24 1987-02-04 Pilkington Brothers Plc Coatings on glass
FR2677639B1 (fr) * 1991-06-14 1994-02-25 Saint Gobain Vitrage Internal Technique de formation par pyrolyse en voie gazeuse d'un revetement essentiellement a base d'oxygene et de silicium.
US5723172A (en) * 1994-03-11 1998-03-03 Dan Sherman Method for forming a protective coating on glass
FR2728559B1 (fr) * 1994-12-23 1997-01-31 Saint Gobain Vitrage Substrats en verre revetus d'un empilement de couches minces a proprietes de reflexion dans l'infrarouge et/ou dans le domaine du rayonnement solaire
FR2736632B1 (fr) 1995-07-12 1997-10-24 Saint Gobain Vitrage Vitrage muni d'une couche conductrice et/ou bas-emissive
FR2738813B1 (fr) * 1995-09-15 1997-10-17 Saint Gobain Vitrage Substrat a revetement photo-catalytique
FR2759362B1 (fr) * 1997-02-10 1999-03-12 Saint Gobain Vitrage Substrat transparent muni d'au moins une couche mince a base de nitrure ou d'oxynitrure de silicium et son procede d'obtention
US7096692B2 (en) * 1997-03-14 2006-08-29 Ppg Industries Ohio, Inc. Visible-light-responsive photoactive coating, coated article, and method of making same
US6379803B1 (en) * 1997-06-03 2002-04-30 Nippon Sheet Glass Co., Ltd. Low-reflectance glass article and process for preparing the same
GB2355273A (en) 1999-10-12 2001-04-18 Pilkington Plc Coating glass
FR2800731B1 (fr) 1999-11-05 2002-01-18 Saint Gobain Vitrage Substrat transparent muni d'une couche en derive de silicium
JP2003221257A (ja) * 2002-01-31 2003-08-05 Nippon Sheet Glass Co Ltd 透明薄膜の成形方法およびそれを備える透明基体
US6679978B2 (en) * 2002-02-22 2004-01-20 Afg Industries, Inc. Method of making self-cleaning substrates
GB2403731A (en) * 2003-07-11 2005-01-12 Pilkington Plc Solar control glazing
US7943246B2 (en) * 2003-07-11 2011-05-17 Pilkington Group Limited Solar control glazing
EP1686595B1 (en) 2003-11-18 2009-12-09 Nippon Sheet Glass Company, Limited Method for producing a transparent base with transparent conductive film,
FR2864844B1 (fr) 2004-01-07 2015-01-16 Saint Gobain Dispositif d'eclairage autonettoyant
US7482060B2 (en) * 2004-07-14 2009-01-27 Agc Flat Glass North America, Inc. Silicon oxycarbide coatings having durable hydrophilic properties
BRPI1009124A2 (pt) * 2009-03-18 2017-11-07 Agc Flat Glass Na Inc revestimento de película delgada e metódo de fabricação do mesmo
FR2956659B1 (fr) * 2010-02-22 2014-10-10 Saint Gobain Substrat verrier revetu de couches a tenue mecanique amelioree

Also Published As

Publication number Publication date
BR112014010220A2 (pt) 2017-06-13
CA2854052C (fr) 2020-01-07
PL2780294T3 (pl) 2019-09-30
WO2013072623A1 (fr) 2013-05-23
MX2014005735A (es) 2014-07-09
HUE045009T2 (hu) 2019-12-30
IN2014MN00825A (ru) 2015-04-17
CA2854052A1 (fr) 2013-05-23
EA024976B1 (ru) 2016-11-30
TR201909120T4 (tr) 2019-07-22
ES2736923T3 (es) 2020-01-09
KR102000803B1 (ko) 2019-07-16
BR112014010220A8 (pt) 2017-06-20
MX336859B (es) 2016-02-04
KR20140093235A (ko) 2014-07-25
FR2982608B1 (fr) 2013-11-22
US9012024B2 (en) 2015-04-21
US20140349107A1 (en) 2014-11-27
JP2015506890A (ja) 2015-03-05
CN103974918A (zh) 2014-08-06
EP2780294A1 (fr) 2014-09-24
DK2780294T3 (da) 2019-07-08
PT2780294T (pt) 2019-07-10
FR2982608A1 (fr) 2013-05-17
EP2780294B1 (fr) 2019-03-27
CN103974918B (zh) 2016-12-14
JP6050370B2 (ja) 2016-12-21

Similar Documents

Publication Publication Date Title
EA201490968A1 (ru) Барьерный слой для щелочных металлов на основе sioc
AU2019268204A1 (en) Hot-dip Al-based Alloy Coated Steel Sheet Excellent in Workability
MY170031A (en) Solar control glazing
MA34086B1 (fr) Revêtements antisolaires contenant une couche métallique discontinue
MX362361B (es) Intercapa para vidrio laminado y vidrio laminado.
EP4011843A3 (en) Deep non-frangible stress profiles and methods of making
MX2013012735A (es) Metodo para incrementar las propiedades adhesivas de compuestos adhesivos sensibles a la presion, sobre sustratos por medio de tratamiento con plasma.
EA201690830A1 (ru) Многослойное оконное стекло по меньшей мере с одной химически закаленной пластиной
CL2018001399A1 (es) Método de etiquetar un sustrato
WO2015033177A8 (fr) Procédé de fabrication de pièces d&#39;acier revêtues et durcies a la presse, et tôles prérevêtues permettant la fabrication de ces pièces
FR2982196B1 (fr) Vitrage de signalisation lumineuse pour vehicule
FR2972563B1 (fr) Procédé de traitement d&#39;une couche de nitrure de métal oxydée
BR112015001809A2 (pt) chapa de aço galvanizada por imersão a quente e método de produção da mesma
MY169200A (en) Magnetic-disk glass substrate, magnetic disk and method for manufacturing magnetic-disk glass substrate
MY170159A (en) Organic light emitting diode with light extracting layer
MY168621A (en) Magnetic-disk glass substrate
MY165455A (en) Silicon-nitride-containing separating layer having high hardness
SG162698A1 (en) Method of glass surface fine processing
WO2014206577A8 (de) Verfahren zum laserbohren oder laserschneiden eines werkstücks
MX2016005564A (es) Capa de carrera contra oxidacion.
BR112013017791A2 (pt) vidro com controle solar
SA112330696B1 (ar) مادة ذات أساس زجاجي مستخدمة للخلايا الشمسية
EA201391633A1 (ru) Прозрачная подложка, плакированная пакетом минеральных слоев, один из которых является пористым и покрытым
MY162994A (en) Composition and method for polishing bulk silicon
FR2981646B1 (fr) Vitrage de controle solaire comprenant une couche d&#39;un alliage nicu

Legal Events

Date Code Title Description
MM4A Lapse of a eurasian patent due to non-payment of renewal fees within the time limit in the following designated state(s)

Designated state(s): AM AZ BY KZ KG TJ TM

MM4A Lapse of a eurasian patent due to non-payment of renewal fees within the time limit in the following designated state(s)

Designated state(s): RU