IN2014MN00825A - - Google Patents

Info

Publication number
IN2014MN00825A
IN2014MN00825A IN825MUN2014A IN2014MN00825A IN 2014MN00825 A IN2014MN00825 A IN 2014MN00825A IN 825MUN2014 A IN825MUN2014 A IN 825MUN2014A IN 2014MN00825 A IN2014MN00825 A IN 2014MN00825A
Authority
IN
India
Prior art keywords
depth
total thickness
silicon oxycarbide
representing
layer
Prior art date
Application number
Inventor
Claire Thoumazet
Martin Melcher
Arnaud Huignard
Raphael Lante
Original Assignee
Saint Gobain
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Saint Gobain filed Critical Saint Gobain
Publication of IN2014MN00825A publication Critical patent/IN2014MN00825A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3441—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising carbon, a carbide or oxycarbide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C23C16/325—Silicon carbide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/152—Deposition methods from the vapour phase by cvd
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/152—Deposition methods from the vapour phase by cvd
    • C03C2218/153—Deposition methods from the vapour phase by cvd by plasma-enhanced cvd
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/154—Deposition methods from the vapour phase by sputtering
    • C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264—Up to 3 mils
    • Y10T428/265—1 mil or less

Abstract

The invention relates to a glazing comprising a transparent glass substrate containing ions of at least one alkali metal, and a transparent layer of silicon oxycarbide (SiOxCy) having total thickness E with (a) a carbon-rich deep area extending from depth P3 to depth P4, where the C:Si atomic ratio is greater than or equal to 0.5, and (b) a superficial area having a low carbon content, extending from depth P1 to depth P2, where the C:Si atomic ratio is lesser than or equal to 0.4, with P1 < P2 < P3 < P4, and (P2-P1) + (P4-P3) < E the distance between Pi and P2 representing between 10 and 70% of total thickness E of the silicon oxycarbide layer and the distance between P3 and P4 representing between 10 and 70% of total thickness E of the silicon oxycarbide layer.
IN825MUN2014 2011-11-16 2012-11-14 IN2014MN00825A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1160418A FR2982608B1 (en) 2011-11-16 2011-11-16 BARRIER LAYER WITH ALKALI METALS BASED ON SIOC
PCT/FR2012/052622 WO2013072623A1 (en) 2011-11-16 2012-11-14 Barrier layer to sioc alkali metals

Publications (1)

Publication Number Publication Date
IN2014MN00825A true IN2014MN00825A (en) 2015-04-17

Family

ID=47291136

Family Applications (1)

Application Number Title Priority Date Filing Date
IN825MUN2014 IN2014MN00825A (en) 2011-11-16 2012-11-14

Country Status (18)

Country Link
US (1) US9012024B2 (en)
EP (1) EP2780294B1 (en)
JP (1) JP6050370B2 (en)
KR (1) KR102000803B1 (en)
CN (1) CN103974918B (en)
BR (1) BR112014010220A8 (en)
CA (1) CA2854052C (en)
DK (1) DK2780294T3 (en)
EA (1) EA024976B1 (en)
ES (1) ES2736923T3 (en)
FR (1) FR2982608B1 (en)
HU (1) HUE045009T2 (en)
IN (1) IN2014MN00825A (en)
MX (1) MX336859B (en)
PL (1) PL2780294T3 (en)
PT (1) PT2780294T (en)
TR (1) TR201909120T4 (en)
WO (1) WO2013072623A1 (en)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106277818A (en) * 2015-05-11 2017-01-04 杭州合新科技有限公司 A kind of Novel sunlight controls coated glass and preparation technology thereof
US10717671B2 (en) * 2015-07-07 2020-07-21 Agc Glass Europe Glass substrate with increased weathering and chemical resistance
US10428421B2 (en) 2015-08-03 2019-10-01 Asm Ip Holding B.V. Selective deposition on metal or metallic surfaces relative to dielectric surfaces
US9786491B2 (en) 2015-11-12 2017-10-10 Asm Ip Holding B.V. Formation of SiOCN thin films
US9786492B2 (en) 2015-11-12 2017-10-10 Asm Ip Holding B.V. Formation of SiOCN thin films
CN105669044B (en) * 2015-12-31 2018-05-29 株洲醴陵旗滨玻璃有限公司 A kind of online easy clean coated glass and preparation method thereof
KR102378021B1 (en) * 2016-05-06 2022-03-23 에이에스엠 아이피 홀딩 비.브이. Formation of SiOC thin films
US10373820B2 (en) 2016-06-01 2019-08-06 Asm Ip Holding B.V. Deposition of organic films
US10453701B2 (en) 2016-06-01 2019-10-22 Asm Ip Holding B.V. Deposition of organic films
US10847529B2 (en) 2017-04-13 2020-11-24 Asm Ip Holding B.V. Substrate processing method and device manufactured by the same
US10504901B2 (en) 2017-04-26 2019-12-10 Asm Ip Holding B.V. Substrate processing method and device manufactured using the same
CN114875388A (en) 2017-05-05 2022-08-09 Asm Ip 控股有限公司 Plasma enhanced deposition method for controlled formation of oxygen-containing films
KR20190065962A (en) 2017-12-04 2019-06-12 에이에스엠 아이피 홀딩 비.브이. UNIFORM DEPOSITION OF SiOC ON DIELECTRIC AND METAL SURFACES
DE102018207101A1 (en) * 2018-05-08 2019-11-14 Robert Bosch Gmbh A method for producing a bottom of an analysis cell for analyzing a biochemical material and analysis cell
DE112020001319T5 (en) * 2019-03-19 2021-12-02 Applied Materials, Inc. Hydrophobic and ice-phobic coating
JP7020458B2 (en) * 2019-07-12 2022-02-16 Ａｇｃ株式会社 Glass substrate with film and its manufacturing method
WO2022114027A1 (en) * 2020-11-30 2022-06-02 Ａｇｃ株式会社 Film-attached glass substrate, and method for manufacturing same

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FR2677639B1 (en) * 1991-06-14 1994-02-25 Saint Gobain Vitrage Internal TECHNIQUE FOR FORMING BY PYROLYSIS IN A GASEOUS WAY A COATING BASED ON OXYGEN AND SILICON.
US5723172A (en) * 1994-03-11 1998-03-03 Dan Sherman Method for forming a protective coating on glass
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FR2759362B1 (en) * 1997-02-10 1999-03-12 Saint Gobain Vitrage TRANSPARENT SUBSTRATE EQUIPPED WITH AT LEAST ONE THIN LAYER BASED ON SILICON NITRIDE OR OXYNITRIDE AND ITS PROCESS FOR OBTAINING IT
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Also Published As

Publication number Publication date
TR201909120T4 (en) 2019-07-22
JP6050370B2 (en) 2016-12-21
WO2013072623A1 (en) 2013-05-23
PT2780294T (en) 2019-07-10
BR112014010220A8 (en) 2017-06-20
KR20140093235A (en) 2014-07-25
MX336859B (en) 2016-02-04
PL2780294T3 (en) 2019-09-30
CA2854052A1 (en) 2013-05-23
CN103974918A (en) 2014-08-06
EA024976B1 (en) 2016-11-30
BR112014010220A2 (en) 2017-06-13
MX2014005735A (en) 2014-07-09
KR102000803B1 (en) 2019-07-16
EA201490968A1 (en) 2014-08-29
FR2982608A1 (en) 2013-05-17
HUE045009T2 (en) 2019-12-30
EP2780294A1 (en) 2014-09-24
CA2854052C (en) 2020-01-07
CN103974918B (en) 2016-12-14
DK2780294T3 (en) 2019-07-08
FR2982608B1 (en) 2013-11-22
US9012024B2 (en) 2015-04-21
ES2736923T3 (en) 2020-01-09
EP2780294B1 (en) 2019-03-27
US20140349107A1 (en) 2014-11-27
JP2015506890A (en) 2015-03-05

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