CN102482208B - 含有磺酸烯丙酯阴离子的离子液体 - Google Patents
含有磺酸烯丙酯阴离子的离子液体 Download PDFInfo
- Publication number
- CN102482208B CN102482208B CN201080036756.1A CN201080036756A CN102482208B CN 102482208 B CN102482208 B CN 102482208B CN 201080036756 A CN201080036756 A CN 201080036756A CN 102482208 B CN102482208 B CN 102482208B
- Authority
- CN
- China
- Prior art keywords
- ion
- group
- allyl ester
- general formula
- carbonatoms
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
- C07C309/01—Sulfonic acids
- C07C309/02—Sulfonic acids having sulfo groups bound to acyclic carbon atoms
- C07C309/20—Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic unsaturated carbon skeleton
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
- C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
- C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D213/06—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom containing only hydrogen and carbon atoms in addition to the ring nitrogen atom
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
- C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
- C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D213/06—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom containing only hydrogen and carbon atoms in addition to the ring nitrogen atom
- C07D213/16—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom containing only hydrogen and carbon atoms in addition to the ring nitrogen atom containing only one pyridine ring
- C07D213/20—Quaternary compounds thereof
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
- C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
- C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D213/60—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D213/62—Oxygen or sulfur atoms
- C07D213/63—One oxygen atom
- C07D213/68—One oxygen atom attached in position 4
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
- C07D233/54—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members
- C07D233/56—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, attached to ring carbon atoms
- C07D233/58—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, attached to ring carbon atoms with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, attached to ring nitrogen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
- C07D295/08—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly bound oxygen or sulfur atoms
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Secondary Cells (AREA)
- Pyridine Compounds (AREA)
- Hybrid Cells (AREA)
- Detergent Compositions (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009200610 | 2009-08-31 | ||
| JP2009-200610 | 2009-08-31 | ||
| PCT/JP2010/064666 WO2011024988A1 (ja) | 2009-08-31 | 2010-08-30 | アリルスルホネートアニオン含有イオン液体 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102482208A CN102482208A (zh) | 2012-05-30 |
| CN102482208B true CN102482208B (zh) | 2014-02-26 |
Family
ID=43628079
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201080036756.1A Expired - Fee Related CN102482208B (zh) | 2009-08-31 | 2010-08-30 | 含有磺酸烯丙酯阴离子的离子液体 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US8546609B2 (OSRAM) |
| EP (1) | EP2474527B1 (OSRAM) |
| JP (1) | JP5682564B2 (OSRAM) |
| KR (1) | KR101788578B1 (OSRAM) |
| CN (1) | CN102482208B (OSRAM) |
| ES (1) | ES2616707T3 (OSRAM) |
| IN (1) | IN2012DN01795A (OSRAM) |
| WO (1) | WO2011024988A1 (OSRAM) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5323221B2 (ja) * | 2011-11-28 | 2013-10-23 | 日本乳化剤株式会社 | イオン性液体並びにこれを含む帯電防止剤、防曇剤、分散剤または乳化剤、潤滑剤、電解液、およびセルロース溶解剤 |
| KR101922893B1 (ko) * | 2012-05-14 | 2018-11-28 | 고쿠리츠다이가쿠호우진 도쿄다이가쿠 | 신규 그래핀 나노분산액 및 그 조제 방법 |
| JP6122949B2 (ja) * | 2013-04-26 | 2017-04-26 | 国立大学法人 東京大学 | 新規グラフェンナノ分散液及びその調製方法 |
| JP6516728B2 (ja) * | 2014-04-17 | 2019-05-22 | 株式会社Adeka | 層状物質含有液及びその製造方法 |
| CN104324585A (zh) * | 2014-11-05 | 2015-02-04 | 朱忠良 | 一种利用离子液体净化高炉烟气的方法 |
| WO2019217854A1 (en) * | 2018-05-11 | 2019-11-14 | Wisconsin Alumni Research Foundation | An ionic liquid-based nanoemulsion formulation for the efficient delivery of hydrophilic and hydrophobic therapeutic agents |
| JP7543659B2 (ja) * | 2020-03-03 | 2024-09-03 | 日清紡ホールディングス株式会社 | イオン液体を用いた平滑材料の固定方法 |
| CN115433832B (zh) * | 2021-06-02 | 2024-03-19 | 中国科学院过程工程研究所 | 一种镍、钴协同萃取剂及其用途 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0474896A1 (en) * | 1989-02-20 | 1992-03-18 | Mitsubishi Rayon Company Ltd. | Antistatic thermoplastic resin composition |
| US5629066A (en) * | 1991-06-19 | 1997-05-13 | Teijin Limited | Resin article having anti-static property |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56142528A (en) * | 1980-04-08 | 1981-11-06 | Mitsubishi Chem Ind Ltd | Developing solution for o-quinone diazide photosensitive material |
| JPH02225536A (ja) * | 1989-02-27 | 1990-09-07 | Mitsubishi Rayon Co Ltd | 帯電防止性に優れた合成樹脂成形品及びその製造法 |
| US5175059A (en) | 1990-09-05 | 1992-12-29 | Mitsubishi Rayon Company Ltd. | Synthetic resin molded article having good antistatic property and process for preparation thereof |
| JP2001172614A (ja) * | 1999-12-22 | 2001-06-26 | Takemoto Oil & Fat Co Ltd | 合成高分子フィルム用帯電防止剤及び合成高分子フィルムの帯電防止方法 |
| JP3735516B2 (ja) * | 2000-03-31 | 2006-01-18 | 株式会社東芝 | 燃料電池 |
| JP4271971B2 (ja) | 2003-03-26 | 2009-06-03 | 株式会社日本触媒 | イオン性化合物 |
| JP2004331521A (ja) | 2003-04-30 | 2004-11-25 | Toyo Kasei Kogyo Co Ltd | イオン性液体 |
| JP4424660B2 (ja) | 2004-02-17 | 2010-03-03 | 日華化学株式会社 | イオン性液体からなる難燃性溶媒及びその製造方法 |
| JP2005325052A (ja) | 2004-05-14 | 2005-11-24 | Sanko Kagaku Kogyo Kk | 四級アンモニウムジシアナミドその製造方法及びその用途 |
| JP2007153856A (ja) | 2005-12-08 | 2007-06-21 | Sumitomo Bakelite Co Ltd | 常温溶融塩及びその製造方法 |
| BRPI0603210A (pt) | 2006-08-15 | 2008-04-08 | Petroleo Brasileiro Sa | método de preparação de lìquidos iÈnicos isentos de halogenetos e lìquidos iÈnicos assim preparados |
| CN101511782B (zh) * | 2006-09-12 | 2013-08-07 | 和光纯药工业株式会社 | 磺酸酯的制造方法 |
-
2010
- 2010-08-30 US US13/393,144 patent/US8546609B2/en not_active Expired - Fee Related
- 2010-08-30 IN IN1795DEN2012 patent/IN2012DN01795A/en unknown
- 2010-08-30 KR KR1020127004332A patent/KR101788578B1/ko not_active Expired - Fee Related
- 2010-08-30 CN CN201080036756.1A patent/CN102482208B/zh not_active Expired - Fee Related
- 2010-08-30 WO PCT/JP2010/064666 patent/WO2011024988A1/ja not_active Ceased
- 2010-08-30 EP EP10812034.6A patent/EP2474527B1/en not_active Not-in-force
- 2010-08-30 ES ES10812034.6T patent/ES2616707T3/es active Active
- 2010-08-30 JP JP2011528887A patent/JP5682564B2/ja not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0474896A1 (en) * | 1989-02-20 | 1992-03-18 | Mitsubishi Rayon Company Ltd. | Antistatic thermoplastic resin composition |
| US5629066A (en) * | 1991-06-19 | 1997-05-13 | Teijin Limited | Resin article having anti-static property |
Non-Patent Citations (1)
| Title |
|---|
| JP平2-225536A 1990.09.07 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP2474527A4 (en) | 2014-06-11 |
| US8546609B2 (en) | 2013-10-01 |
| US20120157680A1 (en) | 2012-06-21 |
| KR20120046262A (ko) | 2012-05-09 |
| CN102482208A (zh) | 2012-05-30 |
| KR101788578B1 (ko) | 2017-11-15 |
| IN2012DN01795A (OSRAM) | 2015-06-05 |
| EP2474527A1 (en) | 2012-07-11 |
| JP5682564B2 (ja) | 2015-03-11 |
| EP2474527B1 (en) | 2017-01-25 |
| JPWO2011024988A1 (ja) | 2013-01-31 |
| ES2616707T3 (es) | 2017-06-14 |
| WO2011024988A1 (ja) | 2011-03-03 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CP01 | Change in the name or title of a patent holder |
Address after: Osaka Japan Patentee after: Fujifilm Wako Pure Chemical Industries, Ltd. Address before: Osaka Japan Patentee before: WAKO PURE CHEMICAL INDUSTRIES, Ltd. |
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| CP01 | Change in the name or title of a patent holder | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20140226 |
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| CF01 | Termination of patent right due to non-payment of annual fee |