CN102439741A - 发光二极管装置 - Google Patents
发光二极管装置 Download PDFInfo
- Publication number
- CN102439741A CN102439741A CN2010800015952A CN201080001595A CN102439741A CN 102439741 A CN102439741 A CN 102439741A CN 2010800015952 A CN2010800015952 A CN 2010800015952A CN 201080001595 A CN201080001595 A CN 201080001595A CN 102439741 A CN102439741 A CN 102439741A
- Authority
- CN
- China
- Prior art keywords
- semiconductor layer
- light
- electrical semiconductor
- metal electrode
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 abstract 4
- 239000002184 metal Substances 0.000 abstract 3
- 230000031700 light absorption Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/58—Optical field-shaping elements
- H01L33/60—Reflective elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/38—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/20—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
- H01L33/22—Roughened surfaces, e.g. at the interface between epitaxial layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/44—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
- H01L33/46—Reflective coating, e.g. dielectric Bragg reflector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/40—Materials therefor
- H01L33/405—Reflective materials
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Led Devices (AREA)
Abstract
一种高亮度的垂直型发光二极管装置(300),包括依次沉积的镜面反射层(306),第一电性半导体层(304),活化层(303),第二电性半导体层(302),第二金属电极(301)。第二金属电极(301)两侧分别为高光照射侧(301′)和低光照射侧(301″)。低光照射侧(301″)位于镜面反射层(306)的范围之外。且镜面反射层(306)与第一电性半导体(304)之间接触的面积占第一电性半导体层(304)的面积的75%以上。该结构可以增进电流分散能力,减少金属电极吸光,提高亮度和效率。
Description
PCT国内申请,说明书已公开。
Claims (1)
- PCT国内申请,权利要求书已公开。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW098137664A TWI412161B (zh) | 2009-11-06 | 2009-11-06 | 發光二極體裝置 |
PCT/IB2010/002774 WO2011055202A2 (zh) | 2009-11-06 | 2010-11-01 | 发光二极体装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN102439741A true CN102439741A (zh) | 2012-05-02 |
CN102439741B CN102439741B (zh) | 2013-10-23 |
Family
ID=43970459
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2010800015952A Active CN102439741B (zh) | 2009-11-06 | 2010-11-01 | 发光二极管装置 |
Country Status (7)
Country | Link |
---|---|
US (2) | US8450758B2 (zh) |
EP (1) | EP2498307A4 (zh) |
JP (1) | JP2013508994A (zh) |
KR (1) | KR101250964B1 (zh) |
CN (1) | CN102439741B (zh) |
TW (1) | TWI412161B (zh) |
WO (1) | WO2011055202A2 (zh) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102709446A (zh) * | 2012-06-18 | 2012-10-03 | 东莞市大亮光电有限公司 | 一种小功率直插式led |
CN103456859A (zh) * | 2013-09-05 | 2013-12-18 | 深圳市智讯达光电科技有限公司 | 倒装led芯片的反射层结构及倒装led芯片 |
CN103975451A (zh) * | 2012-07-18 | 2014-08-06 | 世迈克琉明有限公司 | 制造半导体发光器件的方法 |
CN107851688A (zh) * | 2015-08-07 | 2018-03-27 | Lg伊诺特有限公司 | 发光二极管及发光二极管封装 |
CN108365065A (zh) * | 2017-01-26 | 2018-08-03 | 晶元光电股份有限公司 | 发光元件 |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI412161B (zh) | 2009-11-06 | 2013-10-11 | Semileds Optoelectronics Co | 發光二極體裝置 |
US9847372B2 (en) * | 2011-12-01 | 2017-12-19 | Micron Technology, Inc. | Solid state transducer devices with separately controlled regions, and associated systems and methods |
CN104040734B (zh) * | 2012-01-10 | 2018-07-20 | 亮锐控股有限公司 | 通过选择性区域粗糙化控制的led光输出 |
CN103383986A (zh) * | 2012-05-04 | 2013-11-06 | 旭明光电股份有限公司 | 具有波长转换层的发光二极管晶粒及其制造方法 |
US9530941B2 (en) | 2012-07-18 | 2016-12-27 | Semicon Light Co., Ltd. | Semiconductor light emitting device |
JP5734935B2 (ja) * | 2012-09-20 | 2015-06-17 | 株式会社東芝 | 半導体装置及びその製造方法 |
US9748511B2 (en) * | 2013-05-23 | 2017-08-29 | Oledworks Gmbh | Light-emitting device with alternating arrangement of anode pads and cathode pads |
US9419185B2 (en) | 2014-01-27 | 2016-08-16 | Glo Ab | Method of singulating LED wafer substrates into dice with LED device with Bragg reflector |
JP2016072479A (ja) | 2014-09-30 | 2016-05-09 | 日亜化学工業株式会社 | 発光素子 |
KR102425124B1 (ko) * | 2015-08-24 | 2022-07-26 | 쑤저우 레킨 세미컨덕터 컴퍼니 리미티드 | 발광소자 및 발광소자 패키지 |
US10615094B2 (en) * | 2017-01-28 | 2020-04-07 | Zhanming LI | High power gallium nitride devices and structures |
TWI773587B (zh) * | 2021-11-17 | 2022-08-01 | 友達光電股份有限公司 | 燈板 |
Citations (3)
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CN1717812A (zh) * | 2002-11-29 | 2006-01-04 | 三垦电气株式会社 | 半导体发光元件及其制造方法 |
CN101295760A (zh) * | 2007-04-25 | 2008-10-29 | 日立电线株式会社 | 发光二极管 |
US20100193809A1 (en) * | 2009-02-03 | 2010-08-05 | Industrial Technology Research Institute | Light emitting diode structure, led packaging structure using the same and method of forming the same |
Family Cites Families (28)
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JPH0883927A (ja) * | 1994-09-09 | 1996-03-26 | Shin Etsu Handotai Co Ltd | AlGaInP系発光装置 |
JP2000091638A (ja) * | 1998-09-14 | 2000-03-31 | Matsushita Electric Ind Co Ltd | 窒化ガリウム系化合物半導体発光素子 |
JP2000174339A (ja) * | 1998-12-04 | 2000-06-23 | Mitsubishi Cable Ind Ltd | GaN系半導体発光素子およびGaN系半導体受光素子 |
JP2001177148A (ja) * | 1999-12-16 | 2001-06-29 | Toshiba Corp | 半導体発光素子及びその製造方法 |
JP4754711B2 (ja) * | 2000-06-21 | 2011-08-24 | 昭和電工株式会社 | Iii族窒化物半導体発光ダイオード、発光ダイオードランプ、光源、iii族窒化物半導体発光ダイオード用電極およびその製造方法 |
JP2003197965A (ja) * | 2001-12-25 | 2003-07-11 | Sanken Electric Co Ltd | 半導体発光素子及びその製造方法 |
CN100405619C (zh) * | 2002-01-28 | 2008-07-23 | 日亚化学工业株式会社 | 具有支持衬底的氮化物半导体器件及其制造方法 |
US20050205886A1 (en) * | 2002-11-29 | 2005-09-22 | Sanken Electric Co., Ltd. | Gallium-containing light-emitting semiconductor device and method of fabrication |
JP2005322945A (ja) * | 2003-02-12 | 2005-11-17 | Rohm Co Ltd | 半導体発光素子 |
JP3841092B2 (ja) * | 2003-08-26 | 2006-11-01 | 住友電気工業株式会社 | 発光装置 |
JP2005086137A (ja) * | 2003-09-11 | 2005-03-31 | Mitsubishi Cable Ind Ltd | GaN系発光ダイオード |
JP2005327979A (ja) * | 2004-05-17 | 2005-11-24 | Toshiba Corp | 半導体発光素子および半導体発光装置 |
KR100665120B1 (ko) * | 2005-02-28 | 2007-01-09 | 삼성전기주식회사 | 수직구조 질화물 반도체 발광소자 |
JP2006245379A (ja) * | 2005-03-04 | 2006-09-14 | Stanley Electric Co Ltd | 半導体発光素子 |
JP4956902B2 (ja) * | 2005-03-18 | 2012-06-20 | 三菱化学株式会社 | GaN系発光ダイオードおよびそれを用いた発光装置 |
DE102005025416A1 (de) * | 2005-06-02 | 2006-12-14 | Osram Opto Semiconductors Gmbh | Lumineszenzdiodenchip mit einer Kontaktstruktur |
US7564063B2 (en) * | 2006-03-23 | 2009-07-21 | Eastman Kodak Company | Composite electrode for light-emitting device |
SG140512A1 (en) * | 2006-09-04 | 2008-03-28 | Tinggi Tech Private Ltd | Electrical current distribution in light emitting devices |
JP2008283096A (ja) * | 2007-05-14 | 2008-11-20 | Hitachi Cable Ltd | 半導体発光素子 |
JP2009021323A (ja) * | 2007-07-11 | 2009-01-29 | Dowa Electronics Materials Co Ltd | 半導体発光素子 |
KR100843426B1 (ko) * | 2007-07-23 | 2008-07-03 | 삼성전기주식회사 | 반도체 발광소자 |
TWI419355B (zh) * | 2007-09-21 | 2013-12-11 | Nat Univ Chung Hsing | 高光取出率的發光二極體晶片及其製造方法 |
JP5474292B2 (ja) * | 2007-11-06 | 2014-04-16 | シャープ株式会社 | 窒化物半導体発光ダイオード素子 |
KR101382836B1 (ko) * | 2007-11-23 | 2014-04-08 | 엘지이노텍 주식회사 | 반도체 발광소자 및 그 제조방법 |
JP2009200178A (ja) * | 2008-02-20 | 2009-09-03 | Hitachi Cable Ltd | 半導体発光素子 |
EP2270881B1 (en) * | 2008-04-30 | 2016-09-28 | LG Innotek Co., Ltd. | Light-emitting element and a production method therefor |
CN101442092B (zh) * | 2008-11-14 | 2011-03-23 | 厦门乾照光电股份有限公司 | 一种高亮度发光二极管及其制造方法 |
TWI412161B (zh) | 2009-11-06 | 2013-10-11 | Semileds Optoelectronics Co | 發光二極體裝置 |
-
2009
- 2009-11-06 TW TW098137664A patent/TWI412161B/zh active
-
2010
- 2010-11-01 EP EP10827984.5A patent/EP2498307A4/en not_active Withdrawn
- 2010-11-01 CN CN2010800015952A patent/CN102439741B/zh active Active
- 2010-11-01 KR KR1020127011705A patent/KR101250964B1/ko not_active IP Right Cessation
- 2010-11-01 WO PCT/IB2010/002774 patent/WO2011055202A2/zh active Application Filing
- 2010-11-01 JP JP2012535951A patent/JP2013508994A/ja active Pending
- 2010-11-03 US US12/939,142 patent/US8450758B2/en active Active
-
2013
- 2013-04-24 US US13/869,218 patent/US10862013B2/en active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1717812A (zh) * | 2002-11-29 | 2006-01-04 | 三垦电气株式会社 | 半导体发光元件及其制造方法 |
CN101295760A (zh) * | 2007-04-25 | 2008-10-29 | 日立电线株式会社 | 发光二极管 |
US20100193809A1 (en) * | 2009-02-03 | 2010-08-05 | Industrial Technology Research Institute | Light emitting diode structure, led packaging structure using the same and method of forming the same |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102709446A (zh) * | 2012-06-18 | 2012-10-03 | 东莞市大亮光电有限公司 | 一种小功率直插式led |
CN103975451A (zh) * | 2012-07-18 | 2014-08-06 | 世迈克琉明有限公司 | 制造半导体发光器件的方法 |
CN103975451B (zh) * | 2012-07-18 | 2016-10-12 | 世迈克琉明有限公司 | 制造半导体发光器件的方法 |
CN103456859A (zh) * | 2013-09-05 | 2013-12-18 | 深圳市智讯达光电科技有限公司 | 倒装led芯片的反射层结构及倒装led芯片 |
CN107851688A (zh) * | 2015-08-07 | 2018-03-27 | Lg伊诺特有限公司 | 发光二极管及发光二极管封装 |
US10636943B2 (en) | 2015-08-07 | 2020-04-28 | Lg Innotek Co., Ltd. | Light emitting diode and light emitting diode package |
CN108365065A (zh) * | 2017-01-26 | 2018-08-03 | 晶元光电股份有限公司 | 发光元件 |
CN108365065B (zh) * | 2017-01-26 | 2021-07-13 | 晶元光电股份有限公司 | 发光元件 |
Also Published As
Publication number | Publication date |
---|---|
US10862013B2 (en) | 2020-12-08 |
US8450758B2 (en) | 2013-05-28 |
EP2498307A2 (en) | 2012-09-12 |
TW201117422A (en) | 2011-05-16 |
US20110114966A1 (en) | 2011-05-19 |
KR101250964B1 (ko) | 2013-04-05 |
WO2011055202A2 (zh) | 2011-05-12 |
KR20120099669A (ko) | 2012-09-11 |
TWI412161B (zh) | 2013-10-11 |
CN102439741B (zh) | 2013-10-23 |
WO2011055202A3 (zh) | 2011-09-01 |
JP2013508994A (ja) | 2013-03-07 |
EP2498307A4 (en) | 2013-12-18 |
US20130277702A1 (en) | 2013-10-24 |
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