CN102136411B - 紫外固化系统 - Google Patents

紫外固化系统 Download PDF

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Publication number
CN102136411B
CN102136411B CN2010105348732A CN201010534873A CN102136411B CN 102136411 B CN102136411 B CN 102136411B CN 2010105348732 A CN2010105348732 A CN 2010105348732A CN 201010534873 A CN201010534873 A CN 201010534873A CN 102136411 B CN102136411 B CN 102136411B
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CN
China
Prior art keywords
substrate
reflector
radiation
lamp
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN2010105348732A
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English (en)
Chinese (zh)
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CN102136411A (zh
Inventor
胡安·卡洛斯·罗奇-阿尔维斯
托马斯·诺瓦克
戴尔·R·杜·博伊斯
萨尼夫·巴鲁贾
斯科特·A·亨德里克森
达斯廷·W·胡
安德兹·卡祖巴
汤姆·K·乔
希姆·M·萨德
恩德卡·O·米科蒂
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Applied Materials Inc
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Applied Materials Inc
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Publication of CN102136411A publication Critical patent/CN102136411A/zh
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Publication of CN102136411B publication Critical patent/CN102136411B/zh
Expired - Fee Related legal-status Critical Current
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B05D3/061—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using U.V.
    • B05D3/065—After-treatment
    • B05D3/067—Curing or cross-linking the coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C71/00—After-treatment of articles without altering their shape; Apparatus therefor
    • B29C71/04—After-treatment of articles without altering their shape; Apparatus therefor by wave energy or particle radiation, e.g. for curing or vulcanising preformed articles
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B3/00—Drying solid materials or objects by processes involving the application of heat
    • F26B3/28—Drying solid materials or objects by processes involving the application of heat by radiation, e.g. from the sun
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/65—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by treatments performed before or after the formation of the materials
    • H10P14/6516—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by treatments performed before or after the formation of the materials of treatments performed after formation of the materials
    • H10P14/6536—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by treatments performed before or after the formation of the materials of treatments performed after formation of the materials by exposure to radiation, e.g. visible light
    • H10P14/6538—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by treatments performed before or after the formation of the materials of treatments performed after formation of the materials by exposure to radiation, e.g. visible light by exposure to UV light
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0431—Apparatus for thermal treatment
    • H10P72/0436—Apparatus for thermal treatment mainly by radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
    • B29C2035/0827—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using UV radiation

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Microbiology (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)
  • Formation Of Insulating Films (AREA)
CN2010105348732A 2006-03-17 2007-03-19 紫外固化系统 Expired - Fee Related CN102136411B (zh)

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
US78342106P 2006-03-17 2006-03-17
US60/783,421 2006-03-17
US81666006P 2006-06-26 2006-06-26
US81672306P 2006-06-26 2006-06-26
US60/816,660 2006-06-26
US60/816,723 2006-06-26
US88690607P 2007-01-26 2007-01-26
US60/886,906 2007-01-26

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CN2007100874797A Division CN101093786B (zh) 2006-03-17 2007-03-19 紫外固化系统

Publications (2)

Publication Number Publication Date
CN102136411A CN102136411A (zh) 2011-07-27
CN102136411B true CN102136411B (zh) 2013-06-05

Family

ID=38591674

Family Applications (2)

Application Number Title Priority Date Filing Date
CN2010105348732A Expired - Fee Related CN102136411B (zh) 2006-03-17 2007-03-19 紫外固化系统
CN2007100874797A Active CN101093786B (zh) 2006-03-17 2007-03-19 紫外固化系统

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN2007100874797A Active CN101093786B (zh) 2006-03-17 2007-03-19 紫外固化系统

Country Status (6)

Country Link
US (3) US7909595B2 (https=)
JP (1) JP5285864B2 (https=)
KR (1) KR101341540B1 (https=)
CN (2) CN102136411B (https=)
SG (1) SG136078A1 (https=)
TW (1) TWI388692B (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11956884B2 (en) * 2021-05-19 2024-04-09 Draka Comteq B.V. Plasma chemical vapor deposition apparatus

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CN101093786A (zh) 2007-12-26
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US20120003398A1 (en) 2012-01-05
US7589336B2 (en) 2009-09-15
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US8597011B2 (en) 2013-12-03
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US7909595B2 (en) 2011-03-22
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