SG136078A1 - Uv cure system - Google Patents
Uv cure systemInfo
- Publication number
- SG136078A1 SG136078A1 SG200701946-6A SG2007019466A SG136078A1 SG 136078 A1 SG136078 A1 SG 136078A1 SG 2007019466 A SG2007019466 A SG 2007019466A SG 136078 A1 SG136078 A1 SG 136078A1
- Authority
- SG
- Singapore
- Prior art keywords
- substrate
- ultraviolet radiation
- support
- lamp
- substrate support
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
- B05D3/061—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using U.V.
- B05D3/065—After-treatment
- B05D3/067—Curing or cross-linking the coating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C71/00—After-treatment of articles without altering their shape; Apparatus therefor
- B29C71/04—After-treatment of articles without altering their shape; Apparatus therefor by wave energy or particle radiation, e.g. for curing or vulcanising preformed articles
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B3/00—Drying solid materials or objects by processes involving the application of heat
- F26B3/28—Drying solid materials or objects by processes involving the application of heat by radiation, e.g. from the sun
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/65—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by treatments performed before or after the formation of the materials
- H10P14/6516—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by treatments performed before or after the formation of the materials of treatments performed after formation of the materials
- H10P14/6536—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by treatments performed before or after the formation of the materials of treatments performed after formation of the materials by exposure to radiation, e.g. visible light
- H10P14/6538—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by treatments performed before or after the formation of the materials of treatments performed after formation of the materials by exposure to radiation, e.g. visible light by exposure to UV light
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0431—Apparatus for thermal treatment
- H10P72/0436—Apparatus for thermal treatment mainly by radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
- B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
- B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
- B29C2035/0827—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using UV radiation
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Life Sciences & Earth Sciences (AREA)
- Microbiology (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Chemical Vapour Deposition (AREA)
- Formation Of Insulating Films (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US78342106P | 2006-03-17 | 2006-03-17 | |
| US81666006P | 2006-06-26 | 2006-06-26 | |
| US81672306P | 2006-06-26 | 2006-06-26 | |
| US88690607P | 2007-01-26 | 2007-01-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG136078A1 true SG136078A1 (en) | 2007-10-29 |
Family
ID=38591674
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG200701946-6A SG136078A1 (en) | 2006-03-17 | 2007-03-15 | Uv cure system |
Country Status (6)
| Country | Link |
|---|---|
| US (3) | US7909595B2 (https=) |
| JP (1) | JP5285864B2 (https=) |
| KR (1) | KR101341540B1 (https=) |
| CN (2) | CN102136411B (https=) |
| SG (1) | SG136078A1 (https=) |
| TW (1) | TWI388692B (https=) |
Families Citing this family (82)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050250346A1 (en) * | 2004-05-06 | 2005-11-10 | Applied Materials, Inc. | Process and apparatus for post deposition treatment of low k dielectric materials |
| US7777198B2 (en) * | 2005-05-09 | 2010-08-17 | Applied Materials, Inc. | Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation |
| US7622378B2 (en) | 2005-11-09 | 2009-11-24 | Tokyo Electron Limited | Multi-step system and method for curing a dielectric film |
| US7909595B2 (en) * | 2006-03-17 | 2011-03-22 | Applied Materials, Inc. | Apparatus and method for exposing a substrate to UV radiation using a reflector having both elliptical and parabolic reflective sections |
| US7692171B2 (en) * | 2006-03-17 | 2010-04-06 | Andrzei Kaszuba | Apparatus and method for exposing a substrate to UV radiation using asymmetric reflectors |
| US7566891B2 (en) * | 2006-03-17 | 2009-07-28 | Applied Materials, Inc. | Apparatus and method for treating a substrate with UV radiation using primary and secondary reflectors |
| US7547633B2 (en) * | 2006-05-01 | 2009-06-16 | Applied Materials, Inc. | UV assisted thermal processing |
| US20070287091A1 (en) * | 2006-06-12 | 2007-12-13 | Jacobo Victor M | System and method for exposing electronic substrates to UV light |
| US8956457B2 (en) * | 2006-09-08 | 2015-02-17 | Tokyo Electron Limited | Thermal processing system for curing dielectric films |
| US7763869B2 (en) * | 2007-03-23 | 2010-07-27 | Asm Japan K.K. | UV light irradiating apparatus with liquid filter |
| US20090075491A1 (en) * | 2007-09-13 | 2009-03-19 | Tokyo Electron Limited | Method for curing a dielectric film |
| US8186855B2 (en) * | 2007-10-01 | 2012-05-29 | Wassel James J | LED lamp apparatus and method of making an LED lamp apparatus |
| US8322881B1 (en) | 2007-12-21 | 2012-12-04 | Appalachian Lighting Systems, Inc. | Lighting fixture |
| JP5234319B2 (ja) * | 2008-01-21 | 2013-07-10 | ソニー株式会社 | 光造形装置および光造形方法 |
| US20090226694A1 (en) * | 2008-03-06 | 2009-09-10 | Tokyo Electron Limited | POROUS SiCOH-CONTAINING DIELECTRIC FILM AND A METHOD OF PREPARING |
| US7977256B2 (en) | 2008-03-06 | 2011-07-12 | Tokyo Electron Limited | Method for removing a pore-generating material from an uncured low-k dielectric film |
| US20090226695A1 (en) * | 2008-03-06 | 2009-09-10 | Tokyo Electron Limited | Method for treating a dielectric film with infrared radiation |
| US7858533B2 (en) * | 2008-03-06 | 2010-12-28 | Tokyo Electron Limited | Method for curing a porous low dielectric constant dielectric film |
| US8022377B2 (en) * | 2008-04-22 | 2011-09-20 | Applied Materials, Inc. | Method and apparatus for excimer curing |
| US20090305515A1 (en) * | 2008-06-06 | 2009-12-10 | Dustin Ho | Method and apparatus for uv curing with water vapor |
| JP5572623B2 (ja) * | 2008-06-27 | 2014-08-13 | アプライド マテリアルズ インコーポレイテッド | 基板処理チャンバを洗浄する方法 |
| JP5423205B2 (ja) * | 2008-08-29 | 2014-02-19 | 東京エレクトロン株式会社 | 成膜装置 |
| US8895942B2 (en) * | 2008-09-16 | 2014-11-25 | Tokyo Electron Limited | Dielectric treatment module using scanning IR radiation source |
| US20100065758A1 (en) * | 2008-09-16 | 2010-03-18 | Tokyo Electron Limited | Dielectric material treatment system and method of operating |
| CN102159330B (zh) * | 2008-09-16 | 2014-11-12 | 东京毅力科创株式会社 | 电介质材料处理系统和操作方法 |
| WO2010045534A1 (en) * | 2008-10-17 | 2010-04-22 | Atonometrics, Inc. | Ultraviolet light exposure chamber for photovoltaic modules |
| US7964858B2 (en) * | 2008-10-21 | 2011-06-21 | Applied Materials, Inc. | Ultraviolet reflector with coolant gas holes and method |
| US20100096569A1 (en) * | 2008-10-21 | 2010-04-22 | Applied Materials, Inc. | Ultraviolet-transmitting microwave reflector comprising a micromesh screen |
| JP5445044B2 (ja) * | 2008-11-14 | 2014-03-19 | 東京エレクトロン株式会社 | 成膜装置 |
| US8399869B2 (en) * | 2008-12-11 | 2013-03-19 | Osram Gesellschaft Mit Beschraenkter Haftung | UV luminaire having a plurality of UV lamps, particularly for technical product processing |
| US20100193674A1 (en) * | 2009-02-03 | 2010-08-05 | Wkk Distribution, Ltd. | Lamp system producing uniform high intensity ultraviolet light for exposure of photolithographic and other light polymerizable materials |
| US8617347B2 (en) * | 2009-08-06 | 2013-12-31 | Applied Materials, Inc. | Vacuum processing chambers incorporating a moveable flow equalizer |
| US8603292B2 (en) * | 2009-10-28 | 2013-12-10 | Lam Research Corporation | Quartz window for a degas chamber |
| JP5257328B2 (ja) * | 2009-11-04 | 2013-08-07 | 東京エレクトロン株式会社 | 基板処理装置、基板処理方法及び記憶媒体 |
| JP5310512B2 (ja) * | 2009-12-02 | 2013-10-09 | 東京エレクトロン株式会社 | 基板処理装置 |
| JP5553588B2 (ja) * | 2009-12-10 | 2014-07-16 | 東京エレクトロン株式会社 | 成膜装置 |
| US8584612B2 (en) * | 2009-12-17 | 2013-11-19 | Lam Research Corporation | UV lamp assembly of degas chamber having rotary shutters |
| US20110151677A1 (en) * | 2009-12-21 | 2011-06-23 | Applied Materials, Inc. | Wet oxidation process performed on a dielectric material formed from a flowable cvd process |
| WO2011100577A2 (en) * | 2010-02-12 | 2011-08-18 | Procure Treatment Centers, Inc. | Robotic mobile anesthesia system |
| US8242460B2 (en) * | 2010-03-29 | 2012-08-14 | Tokyo Electron Limited | Ultraviolet treatment apparatus |
| JP5909039B2 (ja) * | 2010-04-06 | 2016-04-26 | 株式会社小森コーポレーション | 巻紙印刷機 |
| WO2011152650A2 (ko) * | 2010-05-31 | 2011-12-08 | 주식회사 메가젠임플란트 | 치과용 임플란트의 표면 처리 장치 |
| US8492736B2 (en) | 2010-06-09 | 2013-07-23 | Lam Research Corporation | Ozone plenum as UV shutter or tunable UV filter for cleaning semiconductor substrates |
| WO2012009628A1 (en) * | 2010-07-16 | 2012-01-19 | Nordson Corporation | Lamp systems and methods for generating ultraviolet light |
| CN103109357B (zh) | 2010-10-19 | 2016-08-24 | 应用材料公司 | 用于紫外线纳米固化腔室的石英喷洒器 |
| WO2012053132A1 (ja) * | 2010-10-22 | 2012-04-26 | パナソニック株式会社 | 半導体製造装置、膜の製造方法及び半導体装置の製造方法 |
| US8309421B2 (en) * | 2010-11-24 | 2012-11-13 | Applied Materials, Inc. | Dual-bulb lamphead control methodology |
| CN102121607B (zh) * | 2011-01-11 | 2012-10-24 | 安徽师范大学 | 一种紫外led平面固化装置的设计方案 |
| KR101928348B1 (ko) | 2011-04-08 | 2018-12-12 | 어플라이드 머티어리얼스, 인코포레이티드 | 자외선 처리, 화학적 처리, 및 증착을 위한 장치 및 방법 |
| US20130026381A1 (en) * | 2011-07-25 | 2013-01-31 | Taiwan Semiconductor Manufacturing Company, Ltd. | Dynamic, real time ultraviolet radiation intensity monitor |
| KR101310657B1 (ko) * | 2011-12-27 | 2013-09-24 | 주은유브이텍 주식회사 | 자외선 경화장치 |
| KR101310656B1 (ko) * | 2011-12-27 | 2013-09-24 | 주은유브이텍 주식회사 | 자외선 경화장치 |
| US9287154B2 (en) | 2012-06-01 | 2016-03-15 | Taiwan Semiconductor Manufacturing Co., Ltd. | UV curing system for semiconductors |
| US20150123015A1 (en) * | 2013-11-04 | 2015-05-07 | Nordson Corporation | Apparatus and methods for irradiating substrates with ultraviolet light |
| JP6349208B2 (ja) * | 2014-09-09 | 2018-06-27 | 東京応化工業株式会社 | 紫外線照射装置、紫外線照射方法、基板処理装置、及び基板処理装置の製造方法 |
| US10520251B2 (en) * | 2015-01-15 | 2019-12-31 | Heraeus Noblelight America Llc | UV light curing systems, and methods of designing and operating the same |
| TWI535971B (zh) * | 2015-04-16 | 2016-06-01 | 隆達電子股份有限公司 | 車用燈具 |
| US9433973B1 (en) * | 2015-06-15 | 2016-09-06 | Taiwan Semiconductor Manufacturing Co., Ltd. | UV curing apparatus |
| DE102015011229B4 (de) * | 2015-08-27 | 2020-07-23 | Süss Microtec Photomask Equipment Gmbh & Co. Kg | Vorrichtung zum Aufbringen eines mit UV-Strahlung beaufschlagten flüssigen Mediums auf ein Substrat |
| CN109075057B (zh) * | 2016-03-09 | 2023-10-20 | 应用材料公司 | 垫结构及制造方法 |
| US10541159B2 (en) * | 2016-05-26 | 2020-01-21 | Applied Materials, Inc. | Processing chamber with irradiance curing lens |
| JP6721420B2 (ja) * | 2016-06-02 | 2020-07-15 | 株式会社ディスコ | 漏れ光検出方法 |
| US20170358446A1 (en) * | 2016-06-13 | 2017-12-14 | Taiwan Semiconductor Manufacturing Co., Ltd. | Wafer processing apparatus and wafer processing method using the same |
| JP6847199B2 (ja) * | 2016-07-22 | 2021-03-24 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | エピの均一性調整を改善するための加熱変調器 |
| US10483010B2 (en) * | 2016-09-07 | 2019-11-19 | Lam Research Ag | Reduction of surface and embedded substrate charge by controlled exposure to vacuum ultraviolet (VUV) light in low-oxygen environment |
| KR102233013B1 (ko) * | 2017-02-10 | 2021-03-26 | 휴렛-팩커드 디벨롭먼트 컴퍼니, 엘.피. | 융합 모듈 |
| WO2018190844A1 (en) * | 2017-04-13 | 2018-10-18 | Hewlett-Packard Development Company, L.P. | Reflective barriers |
| CN112351841B (zh) * | 2018-05-04 | 2023-08-15 | 泽农公司 | 提供均匀光能的反射器 |
| CN109340634A (zh) * | 2018-11-27 | 2019-02-15 | 广州黑格智造信息科技有限公司 | 光固化组件及光固化箱 |
| WO2020113149A1 (en) * | 2018-11-28 | 2020-06-04 | Gold Mine Ideas, Llc | Uv pathogen control device and system |
| US11348784B2 (en) | 2019-08-12 | 2022-05-31 | Beijing E-Town Semiconductor Technology Co., Ltd | Enhanced ignition in inductively coupled plasmas for workpiece processing |
| US11215934B2 (en) * | 2020-01-21 | 2022-01-04 | Applied Materials, Inc. | In-situ light detection methods and apparatus for ultraviolet semiconductor substrate processing |
| EP4131655B1 (en) * | 2020-03-31 | 2025-11-19 | Agc Inc. | Wireless transmission system |
| CN111508872B (zh) * | 2020-04-22 | 2024-03-26 | 北京北方华创微电子装备有限公司 | 光照射装置及半导体加工设备 |
| US11430671B2 (en) * | 2020-07-30 | 2022-08-30 | Taiwan Semiconductor Manufacturing Co., Ltd. | Ozone wafer cleaning module having an ultraviolet lamp module with rotatable reflectors |
| KR102455371B1 (ko) * | 2020-09-14 | 2022-10-17 | 주식회사 유비테크 | Uv램프의 수명이 연장된 uv경화장치 |
| CN115036199B (zh) * | 2021-03-05 | 2026-02-10 | 台湾积体电路制造股份有限公司 | 微波产生器、紫外光源、与基板处理方法 |
| TWI785519B (zh) * | 2021-03-05 | 2022-12-01 | 台灣積體電路製造股份有限公司 | 微波產生器、紫外光源、與基板處理方法 |
| NL2028245B1 (en) * | 2021-05-19 | 2022-12-05 | Draka Comteq Bv | A plasma chemical vapor deposition apparatus |
| KR102322101B1 (ko) * | 2021-06-24 | 2021-11-04 | 주식회사 자이시스 | 반도체 제조 장치 |
| US12583043B2 (en) | 2021-08-31 | 2026-03-24 | Yield Engineering Systems, Inc. | Process chamber with UV irradiance |
| TWI808488B (zh) * | 2021-09-14 | 2023-07-11 | 林獻昇 | 集光束uvled紫外線掃描方法及其裝置 |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3983039A (en) * | 1975-03-03 | 1976-09-28 | Fusion Systems Corporation | Non-symmetrical reflector for ultraviolet curing |
| US4135098A (en) * | 1976-11-05 | 1979-01-16 | Union Carbide Corporation | Method and apparatus for curing coating materials |
| US5440137A (en) * | 1994-09-06 | 1995-08-08 | Fusion Systems Corporation | Screw mechanism for radiation-curing lamp having an adjustable irradiation area |
| US5705232A (en) * | 1994-09-20 | 1998-01-06 | Texas Instruments Incorporated | In-situ coat, bake and cure of dielectric material processing system for semiconductor manufacturing |
| DE10241330A1 (de) * | 2002-02-20 | 2003-09-04 | Geesthacht Gkss Forschung | Spiegelelement für die Reflektion von Röntgenstrahlen |
| US20050064298A1 (en) * | 2003-09-18 | 2005-03-24 | Silverman Peter J. | Multilayer coatings for EUV mask substrates |
Family Cites Families (59)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IT983585B (it) * | 1972-03-22 | 1974-11-11 | Hildebrand R Gmbh | Procedimento e dispositivo per far indurire uno strato applica to su un corpo di supporto |
| JPS5845738A (ja) * | 1981-09-16 | 1983-03-17 | Toshiba Electric Equip Corp | 紫外線照射器具 |
| US4411931A (en) * | 1982-09-29 | 1983-10-25 | Armstrong World Industries, Inc. | Multiple step UV curing process for providing accurately controlled surface texture |
| NL8402124A (nl) * | 1984-07-04 | 1986-02-03 | Philips Nv | Inrichting voor het belichten van een uv hardende laag op een draadvormig lichaam. |
| GB2203757B (en) * | 1987-04-16 | 1991-05-22 | Philips Electronic Associated | Electronic device manufacture |
| JPH01112230A (ja) * | 1987-10-24 | 1989-04-28 | Mitsubishi Rayon Co Ltd | 照射装置 |
| JPH02109338A (ja) * | 1988-10-18 | 1990-04-23 | Fujitsu Ltd | 絶縁膜の安定化処理方法 |
| DE3919334A1 (de) * | 1989-06-13 | 1990-12-20 | Tetsuhiro Kano | Reflektor fuer eine leuchte |
| JPH0360733A (ja) * | 1989-07-27 | 1991-03-15 | Toshiba Lighting & Technol Corp | 紫外線照射装置 |
| JPH03169338A (ja) * | 1989-11-30 | 1991-07-23 | Toshiba Lighting & Technol Corp | 紫外線照射装置 |
| JPH0435842A (ja) * | 1990-05-31 | 1992-02-06 | Brother Ind Ltd | 加工ユニット制御装置 |
| JPH04131460U (ja) * | 1991-05-23 | 1992-12-03 | 大平洋機工株式会社 | 長尺の被塗物の紫外線乾燥装置 |
| US5228206A (en) * | 1992-01-15 | 1993-07-20 | Submicron Systems, Inc. | Cluster tool dry cleaning system |
| US5215588A (en) * | 1992-01-17 | 1993-06-01 | Amtech Systems, Inc. | Photo-CVD system |
| DE4318735A1 (de) | 1993-06-05 | 1994-12-08 | Kammann Maschf Werner | UV-Strahler zum Bestrahlen von Druckfarben auf Objekten und Verfahren zum Trocknen von mit Druckfarbe versehenen Objekten |
| GB2315850B (en) * | 1996-08-02 | 2000-10-04 | Spectral Technology Limited | Lamp assembly |
| US6264802B1 (en) | 1997-06-23 | 2001-07-24 | Alexandr Semenovich Kamrukov | Method and device for UV treatment of liquids, air and surfaces |
| US6098637A (en) * | 1998-03-03 | 2000-08-08 | Applied Materials, Inc. | In situ cleaning of the surface inside a vacuum processing chamber |
| DE19810455C2 (de) * | 1998-03-11 | 2000-02-24 | Michael Bisges | Kaltlicht-UV-Bestrahlungsvorrichtung |
| GB2336240A (en) | 1998-04-09 | 1999-10-13 | Jenton International Limited | Apparatus for emitting light |
| US6284050B1 (en) * | 1998-05-18 | 2001-09-04 | Novellus Systems, Inc. | UV exposure for improving properties and adhesion of dielectric polymer films formed by chemical vapor deposition |
| JP2000005295A (ja) * | 1998-06-22 | 2000-01-11 | Daikin Ind Ltd | 脱臭装置 |
| JP3078528B2 (ja) * | 1998-09-10 | 2000-08-21 | 東京エレクトロン株式会社 | 被処理膜の改質装置 |
| JP2000218156A (ja) * | 1998-11-25 | 2000-08-08 | Hooya Shot Kk | 紫外光照射装置 |
| US6331480B1 (en) * | 1999-02-18 | 2001-12-18 | Taiwan Semiconductor Manufacturing Company | Method to improve adhesion between an overlying oxide hard mask and an underlying low dielectric constant material |
| US7126687B2 (en) * | 1999-08-09 | 2006-10-24 | The United States Of America As Represented By The Secretary Of The Army | Method and instrumentation for determining absorption and morphology of individual airborne particles |
| US6475930B1 (en) * | 2000-01-31 | 2002-11-05 | Motorola, Inc. | UV cure process and tool for low k film formation |
| GB2360084B (en) * | 2000-03-08 | 2004-04-21 | Nordson Corp | Lamp assembly |
| CN1224074C (zh) * | 2000-04-07 | 2005-10-19 | 诺德森公司 | 带有灯体冷却系统的微波激励的紫外线灯系统 |
| US6614181B1 (en) * | 2000-08-23 | 2003-09-02 | Applied Materials, Inc. | UV radiation source for densification of CVD carbon-doped silicon oxide films |
| US6566278B1 (en) * | 2000-08-24 | 2003-05-20 | Applied Materials Inc. | Method for densification of CVD carbon-doped silicon oxide films through UV irradiation |
| US6323601B1 (en) * | 2000-09-11 | 2001-11-27 | Nordson Corporation | Reflector for an ultraviolet lamp system |
| US6380270B1 (en) | 2000-09-26 | 2002-04-30 | Honeywell International Inc. | Photogenerated nanoporous materials |
| US6559460B1 (en) * | 2000-10-31 | 2003-05-06 | Nordson Corporation | Ultraviolet lamp system and methods |
| GB2407371B (en) * | 2001-02-27 | 2005-09-07 | Nordson Corp | Lamp assembly |
| US6732451B2 (en) | 2001-04-11 | 2004-05-11 | Intermec Ip Corp. | UV curing module for label printer |
| US6756085B2 (en) * | 2001-09-14 | 2004-06-29 | Axcelis Technologies, Inc. | Ultraviolet curing processes for advanced low-k materials |
| DE10204994B4 (de) * | 2002-02-05 | 2006-11-09 | Xtreme Technologies Gmbh | Anordnung zur Überwachung der Energieabstrahlung einer EUV-Strahlungsquelle |
| US6619181B1 (en) * | 2002-05-16 | 2003-09-16 | The United States Of America As Represented By The Secretary Of The Army | Apparatus for reversing the detonability of an explosive in energetic armor |
| US6717161B1 (en) * | 2003-04-30 | 2004-04-06 | Fusion Uv Systems, Inc. | Apparatus and method providing substantially uniform irradiation of surfaces of elongated objects with a high level of irradiance |
| PT1634078E (pt) * | 2003-06-03 | 2008-06-11 | Siemens Healthcare Diagnostics | Analito nativo utilizado como referência em ensaios de escoamento lateral |
| US7119904B2 (en) * | 2004-01-13 | 2006-10-10 | Thermo Electron Scientific Instruments Corporation | Stabilized infrared source for infrared spectrometers |
| JP2005223007A (ja) * | 2004-02-03 | 2005-08-18 | Nikon Corp | 照明光学装置 |
| US7164144B2 (en) * | 2004-03-10 | 2007-01-16 | Cymer Inc. | EUV light source |
| US7227613B2 (en) * | 2004-07-26 | 2007-06-05 | Asml Holding N.V. | Lithographic apparatus having double telecentric illumination |
| US7077547B2 (en) * | 2004-07-29 | 2006-07-18 | Nordson Corporation | Shuttered lamp assembly and method of cooling the lamp assembly |
| DE102004038592A1 (de) * | 2004-08-06 | 2006-03-16 | Ist Metz Gmbh | Bestrahlungsaggregat |
| JP2006114848A (ja) * | 2004-10-18 | 2006-04-27 | Apex Corp | 紫外線照射処理装置、紫外線照射処理方法及び半導体製造装置 |
| JP2006134974A (ja) * | 2004-11-04 | 2006-05-25 | Canon Inc | 露光装置、判定方法及びデバイス製造方法 |
| US7777198B2 (en) | 2005-05-09 | 2010-08-17 | Applied Materials, Inc. | Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation |
| US20060249175A1 (en) | 2005-05-09 | 2006-11-09 | Applied Materials, Inc. | High efficiency UV curing system |
| US20060251827A1 (en) * | 2005-05-09 | 2006-11-09 | Applied Materials, Inc. | Tandem uv chamber for curing dielectric materials |
| JP2007234527A (ja) * | 2006-03-03 | 2007-09-13 | Harison Toshiba Lighting Corp | 照明装置 |
| US7566891B2 (en) * | 2006-03-17 | 2009-07-28 | Applied Materials, Inc. | Apparatus and method for treating a substrate with UV radiation using primary and secondary reflectors |
| US7692171B2 (en) * | 2006-03-17 | 2010-04-06 | Andrzei Kaszuba | Apparatus and method for exposing a substrate to UV radiation using asymmetric reflectors |
| US7909595B2 (en) | 2006-03-17 | 2011-03-22 | Applied Materials, Inc. | Apparatus and method for exposing a substrate to UV radiation using a reflector having both elliptical and parabolic reflective sections |
| US20070287091A1 (en) | 2006-06-12 | 2007-12-13 | Jacobo Victor M | System and method for exposing electronic substrates to UV light |
| US20070295012A1 (en) | 2006-06-26 | 2007-12-27 | Applied Materials, Inc. | Nitrogen enriched cooling air module for uv curing system |
| KR20080027009A (ko) | 2006-09-22 | 2008-03-26 | 에이에스엠지니텍코리아 주식회사 | 원자층 증착 장치 및 그를 이용한 다층막 증착 방법 |
-
2007
- 2007-03-15 US US11/686,901 patent/US7909595B2/en active Active
- 2007-03-15 US US11/686,897 patent/US7589336B2/en active Active
- 2007-03-15 SG SG200701946-6A patent/SG136078A1/en unknown
- 2007-03-16 TW TW096109233A patent/TWI388692B/zh active
- 2007-03-19 CN CN2010105348732A patent/CN102136411B/zh not_active Expired - Fee Related
- 2007-03-19 CN CN2007100874797A patent/CN101093786B/zh active Active
- 2007-03-19 JP JP2007070851A patent/JP5285864B2/ja active Active
- 2007-03-19 KR KR1020070026627A patent/KR101341540B1/ko active Active
-
2010
- 2010-12-22 US US12/976,746 patent/US8597011B2/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3983039A (en) * | 1975-03-03 | 1976-09-28 | Fusion Systems Corporation | Non-symmetrical reflector for ultraviolet curing |
| US4135098A (en) * | 1976-11-05 | 1979-01-16 | Union Carbide Corporation | Method and apparatus for curing coating materials |
| US5440137A (en) * | 1994-09-06 | 1995-08-08 | Fusion Systems Corporation | Screw mechanism for radiation-curing lamp having an adjustable irradiation area |
| US5705232A (en) * | 1994-09-20 | 1998-01-06 | Texas Instruments Incorporated | In-situ coat, bake and cure of dielectric material processing system for semiconductor manufacturing |
| DE10241330A1 (de) * | 2002-02-20 | 2003-09-04 | Geesthacht Gkss Forschung | Spiegelelement für die Reflektion von Röntgenstrahlen |
| US20050064298A1 (en) * | 2003-09-18 | 2005-03-24 | Silverman Peter J. | Multilayer coatings for EUV mask substrates |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI388692B (zh) | 2013-03-11 |
| US20070228289A1 (en) | 2007-10-04 |
| CN102136411A (zh) | 2011-07-27 |
| CN101093786A (zh) | 2007-12-26 |
| KR101341540B1 (ko) | 2013-12-13 |
| CN102136411B (zh) | 2013-06-05 |
| US20120003398A1 (en) | 2012-01-05 |
| US7589336B2 (en) | 2009-09-15 |
| JP2007247068A (ja) | 2007-09-27 |
| US8597011B2 (en) | 2013-12-03 |
| KR20070094574A (ko) | 2007-09-20 |
| US7909595B2 (en) | 2011-03-22 |
| JP5285864B2 (ja) | 2013-09-11 |
| US20070228618A1 (en) | 2007-10-04 |
| CN101093786B (zh) | 2010-12-22 |
| TW200741028A (en) | 2007-11-01 |
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