CN101452221A - 光刻工艺窗口模拟的方法和系统 - Google Patents
光刻工艺窗口模拟的方法和系统 Download PDFInfo
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- CN101452221A CN101452221A CNA2008101798297A CN200810179829A CN101452221A CN 101452221 A CN101452221 A CN 101452221A CN A2008101798297 A CNA2008101798297 A CN A2008101798297A CN 200810179829 A CN200810179829 A CN 200810179829A CN 101452221 A CN101452221 A CN 101452221A
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Abstract
Description
Claims (22)
Applications Claiming Priority (2)
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US99254607P | 2007-12-05 | 2007-12-05 | |
US60/992,546 | 2007-12-05 |
Publications (2)
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CN101452221A true CN101452221A (zh) | 2009-06-10 |
CN101452221B CN101452221B (zh) | 2011-04-20 |
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CN2008101798297A Expired - Fee Related CN101452221B (zh) | 2007-12-05 | 2008-12-05 | 光刻工艺窗口模拟的方法和系统 |
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US (3) | US8200468B2 (zh) |
JP (2) | JP5016585B2 (zh) |
KR (1) | KR101043016B1 (zh) |
CN (1) | CN101452221B (zh) |
NL (1) | NL1036189A1 (zh) |
TW (1) | TWI402631B (zh) |
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CN110824829A (zh) * | 2018-08-07 | 2020-02-21 | 中芯国际集成电路制造(上海)有限公司 | 一种建立opc模型的方法以及光学邻近修正方法 |
CN111338179A (zh) * | 2020-04-17 | 2020-06-26 | 中国科学院上海光学精密机械研究所 | 基于多宽度表征的全芯片光源掩模优化关键图形筛选方法 |
CN112655071A (zh) * | 2018-09-12 | 2021-04-13 | 东京毅力科创株式会社 | 学习装置、推断装置以及已学习模型 |
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CN115933328A (zh) * | 2022-12-16 | 2023-04-07 | 武汉宇微光学软件有限公司 | 一种基于凸优化的光刻模型标定方法和系统 |
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CN113508339A (zh) * | 2019-02-27 | 2021-10-15 | Asml荷兰有限公司 | 用于模型校准的改进量规选择 |
CN111338179A (zh) * | 2020-04-17 | 2020-06-26 | 中国科学院上海光学精密机械研究所 | 基于多宽度表征的全芯片光源掩模优化关键图形筛选方法 |
CN111338179B (zh) * | 2020-04-17 | 2021-07-06 | 中国科学院上海光学精密机械研究所 | 基于多宽度表征的全芯片光源掩模优化关键图形筛选方法 |
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US9390206B2 (en) | 2016-07-12 |
JP5756739B2 (ja) | 2015-07-29 |
CN101452221B (zh) | 2011-04-20 |
KR20090059058A (ko) | 2009-06-10 |
US8527255B2 (en) | 2013-09-03 |
US20090157360A1 (en) | 2009-06-18 |
US8200468B2 (en) | 2012-06-12 |
TWI402631B (zh) | 2013-07-21 |
US20140005998A1 (en) | 2014-01-02 |
US20120253774A1 (en) | 2012-10-04 |
KR101043016B1 (ko) | 2011-06-21 |
JP5016585B2 (ja) | 2012-09-05 |
JP2009141352A (ja) | 2009-06-25 |
NL1036189A1 (nl) | 2009-06-08 |
TW200931200A (en) | 2009-07-16 |
JP2012044222A (ja) | 2012-03-01 |
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