CN100363343C - 光活性化合物 - Google Patents

光活性化合物 Download PDF

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Publication number
CN100363343C
CN100363343C CNB2004800133760A CN200480013376A CN100363343C CN 100363343 C CN100363343 C CN 100363343C CN B2004800133760 A CNB2004800133760 A CN B2004800133760A CN 200480013376 A CN200480013376 A CN 200480013376A CN 100363343 C CN100363343 C CN 100363343C
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CN
China
Prior art keywords
atoms
branched alkyl
straight
optionally containing
hydrogen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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CNB2004800133760A
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English (en)
Chinese (zh)
Other versions
CN1791573A (zh
Inventor
M·D·拉曼
F·M·霍利亨
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EMD Performance Materials Corp
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AZ Electronic Materials USA Corp
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Filing date
Publication date
Application filed by AZ Electronic Materials USA Corp filed Critical AZ Electronic Materials USA Corp
Publication of CN1791573A publication Critical patent/CN1791573A/zh
Application granted granted Critical
Publication of CN100363343C publication Critical patent/CN100363343C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C07C381/12—Sulfonium compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Indole Compounds (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CNB2004800133760A 2003-05-16 2004-05-07 光活性化合物 Expired - Fee Related CN100363343C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/439,753 2003-05-16
US10/439,753 US7358408B2 (en) 2003-05-16 2003-05-16 Photoactive compounds

Publications (2)

Publication Number Publication Date
CN1791573A CN1791573A (zh) 2006-06-21
CN100363343C true CN100363343C (zh) 2008-01-23

Family

ID=33417884

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB2004800133760A Expired - Fee Related CN100363343C (zh) 2003-05-16 2004-05-07 光活性化合物

Country Status (7)

Country Link
US (4) US7358408B2 (cg-RX-API-DMAC7.html)
EP (1) EP1641750A2 (cg-RX-API-DMAC7.html)
JP (1) JP2007505946A (cg-RX-API-DMAC7.html)
KR (1) KR20060009360A (cg-RX-API-DMAC7.html)
CN (1) CN100363343C (cg-RX-API-DMAC7.html)
TW (1) TW200506504A (cg-RX-API-DMAC7.html)
WO (1) WO2004101490A2 (cg-RX-API-DMAC7.html)

Families Citing this family (27)

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US20050214674A1 (en) * 2004-03-25 2005-09-29 Yu Sui Positive-working photoimageable bottom antireflective coating
US20050271974A1 (en) * 2004-06-08 2005-12-08 Rahman M D Photoactive compounds
JP2006096742A (ja) * 2004-08-31 2006-04-13 Sanshin Chem Ind Co Ltd スルホニウム化合物
JP4724465B2 (ja) * 2005-05-23 2011-07-13 富士フイルム株式会社 感光性組成物及び該感光性組成物を用いたパターン形成方法
US7521170B2 (en) * 2005-07-12 2009-04-21 Az Electronic Materials Usa Corp. Photoactive compounds
US7255970B2 (en) * 2005-07-12 2007-08-14 Az Electronic Materials Usa Corp. Photoresist composition for imaging thick films
US20070105040A1 (en) * 2005-11-10 2007-05-10 Toukhy Medhat A Developable undercoating composition for thick photoresist layers
US7678528B2 (en) * 2005-11-16 2010-03-16 Az Electronic Materials Usa Corp. Photoactive compounds
US7601482B2 (en) * 2006-03-28 2009-10-13 Az Electronic Materials Usa Corp. Negative photoresist compositions
US7524614B2 (en) * 2006-05-26 2009-04-28 Eastman Kodak Company Negative-working radiation-sensitive compositions and imageable materials
JP4857208B2 (ja) * 2006-11-10 2012-01-18 信越化学工業株式会社 レジスト材料を用いたパターン形成方法
US7491482B2 (en) * 2006-12-04 2009-02-17 Az Electronic Materials Usa Corp. Photoactive compounds
US7390613B1 (en) * 2006-12-04 2008-06-24 Az Electronic Materials Usa Corp. Photoactive compounds
US20080171270A1 (en) * 2007-01-16 2008-07-17 Munirathna Padmanaban Polymers Useful in Photoresist Compositions and Compositions Thereof
US20080187868A1 (en) * 2007-02-07 2008-08-07 Munirathna Padmanaban Photoactive Compounds
US8252503B2 (en) * 2007-08-24 2012-08-28 Az Electronic Materials Usa Corp. Photoresist compositions
US8088548B2 (en) * 2007-10-23 2012-01-03 Az Electronic Materials Usa Corp. Bottom antireflective coating compositions
WO2009091224A2 (en) * 2008-01-18 2009-07-23 Lg Chem, Ltd. Optical film, preparation method of the same, and liquid crystal display comprising the same
US8455176B2 (en) * 2008-11-12 2013-06-04 Az Electronic Materials Usa Corp. Coating composition
US8632948B2 (en) * 2009-09-30 2014-01-21 Az Electronic Materials Usa Corp. Positive-working photoimageable bottom antireflective coating
JP5820688B2 (ja) 2011-03-23 2015-11-24 株式会社Kri 多糖類の溶解に用いられる溶媒ならびに該溶媒を用いた成形体および多糖類誘導体の製造方法
US9012126B2 (en) 2012-06-15 2015-04-21 Az Electronic Materials (Luxembourg) S.A.R.L. Positive photosensitive material
US8906594B2 (en) 2012-06-15 2014-12-09 Az Electronic Materials (Luxembourg) S.A.R.L. Negative-working thick film photoresist
TWI731961B (zh) 2016-04-19 2021-07-01 德商馬克專利公司 正向感光材料及形成正向凸紋影像之方法
KR102261808B1 (ko) 2016-08-09 2021-06-07 리지필드 액퀴지션 환경적으로 안정한 후막성 화학증폭형 레지스트
JP2018109701A (ja) * 2017-01-04 2018-07-12 メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ ＧｍｂＨ 化学増幅型ポジ型フォトレジスト組成物およびそれを用いたパターン形成方法
KR102871189B1 (ko) 2018-09-05 2025-10-14 메르크 파텐트 게엠베하 포지티브형 감광성 물질

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Publication number Priority date Publication date Assignee Title
EP1033624A1 (en) * 1998-08-07 2000-09-06 Clariant International Ltd. Radiation-sensitive composition of chemical amplification type
CA2299856A1 (en) * 1999-03-11 2000-09-11 Goldschmidt Ag Ester-containing iodonium salts and their use for the radiation curing of cationically-curing materials
US20010036591A1 (en) * 1999-12-21 2001-11-01 Reinhard Schulz Iodonium salts as latent acid donors
WO2002019033A2 (en) * 2000-08-25 2002-03-07 Shipley Company, L.L.C. Photoacid generators and photoresists comprising same

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Also Published As

Publication number Publication date
WO2004101490A2 (en) 2004-11-25
US20040229155A1 (en) 2004-11-18
WO2004101490A3 (en) 2005-01-06
US20080058542A1 (en) 2008-03-06
US20080261147A1 (en) 2008-10-23
CN1791573A (zh) 2006-06-21
EP1641750A2 (en) 2006-04-05
TW200506504A (en) 2005-02-16
US7358408B2 (en) 2008-04-15
US20080096127A1 (en) 2008-04-24
JP2007505946A (ja) 2007-03-15
KR20060009360A (ko) 2006-01-31

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Termination date: 20110507