ATE210641T1 - Sulfoniumsalze und verfahren zu ihrer herstellung - Google Patents
Sulfoniumsalze und verfahren zu ihrer herstellungInfo
- Publication number
- ATE210641T1 ATE210641T1 AT99305552T AT99305552T ATE210641T1 AT E210641 T1 ATE210641 T1 AT E210641T1 AT 99305552 T AT99305552 T AT 99305552T AT 99305552 T AT99305552 T AT 99305552T AT E210641 T1 ATE210641 T1 AT E210641T1
- Authority
- AT
- Austria
- Prior art keywords
- sulfonium salt
- prior
- art
- photoacid generator
- prepare
- Prior art date
Links
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 title abstract 6
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 150000008064 anhydrides Chemical class 0.000 abstract 1
- 150000001491 aromatic compounds Chemical class 0.000 abstract 1
- 239000003153 chemical reaction reagent Substances 0.000 abstract 1
- 239000003999 initiator Substances 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 238000005580 one pot reaction Methods 0.000 abstract 1
- 150000002894 organic compounds Chemical class 0.000 abstract 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract 1
- 238000006116 polymerization reaction Methods 0.000 abstract 1
- -1 sulfoxide compound Chemical class 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
- C07C381/12—Sulfonium compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Glass Compositions (AREA)
- Curing Cements, Concrete, And Artificial Stone (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019980028833A KR100279497B1 (ko) | 1998-07-16 | 1998-07-16 | 술포늄 염의 제조방법 |
| EP98307103 | 1998-09-03 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE210641T1 true ATE210641T1 (de) | 2001-12-15 |
Family
ID=26151423
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT99305552T ATE210641T1 (de) | 1998-07-16 | 1999-07-13 | Sulfoniumsalze und verfahren zu ihrer herstellung |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP0972761B1 (de) |
| AT (1) | ATE210641T1 (de) |
| DE (1) | DE69900570T2 (de) |
| ES (1) | ES2169938T3 (de) |
| PT (1) | PT972761E (de) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| PT105584B (pt) * | 2011-03-28 | 2013-08-30 | Hovione Farmaciencia S A | Reagentes electrofílicos de alquilação, a sua preparação e usos |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6664022B1 (en) * | 2000-08-25 | 2003-12-16 | Shipley Company, L.L.C. | Photoacid generators and photoresists comprising same |
| US7358408B2 (en) * | 2003-05-16 | 2008-04-15 | Az Electronic Materials Usa Corp. | Photoactive compounds |
| CN113264856B (zh) * | 2014-09-26 | 2022-11-22 | 东京应化工业株式会社 | 锍盐、光产酸剂及感光性组合物 |
| US11281099B2 (en) * | 2018-05-28 | 2022-03-22 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern, compound, acid generator, and method of producing compound |
| KR102863079B1 (ko) | 2020-11-27 | 2025-09-19 | 삼성전자주식회사 | 광산발생제, 이를 포함하는 포토레지스트 조성물, 및 상기 광산발생제의 제조방법 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0442158A (ja) * | 1990-06-08 | 1992-02-12 | Hitachi Ltd | 放射線感応性組成物及びそれを用いたパタン形成法 |
| JP2964109B2 (ja) * | 1992-02-18 | 1999-10-18 | 日本電信電話株式会社 | ポジ型レジスト材料 |
| JP3588822B2 (ja) * | 1994-07-07 | 2004-11-17 | Jsr株式会社 | 新規オニウム塩およびそれを含有する感放射線性樹脂 組成物 |
| JP3198845B2 (ja) * | 1994-12-05 | 2001-08-13 | 信越化学工業株式会社 | 化学増幅ポジ型レジスト材料 |
| JP3606291B2 (ja) * | 1995-06-29 | 2005-01-05 | 信越化学工業株式会社 | スルホニウム塩 |
-
1999
- 1999-07-13 AT AT99305552T patent/ATE210641T1/de active
- 1999-07-13 DE DE69900570T patent/DE69900570T2/de not_active Expired - Lifetime
- 1999-07-13 ES ES99305552T patent/ES2169938T3/es not_active Expired - Lifetime
- 1999-07-13 EP EP99305552A patent/EP0972761B1/de not_active Expired - Lifetime
- 1999-07-13 PT PT99305552T patent/PT972761E/pt unknown
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| PT105584B (pt) * | 2011-03-28 | 2013-08-30 | Hovione Farmaciencia S A | Reagentes electrofílicos de alquilação, a sua preparação e usos |
Also Published As
| Publication number | Publication date |
|---|---|
| DE69900570D1 (de) | 2002-01-24 |
| ES2169938T3 (es) | 2002-07-16 |
| PT972761E (pt) | 2002-06-28 |
| DE69900570T2 (de) | 2002-05-29 |
| EP0972761A1 (de) | 2000-01-19 |
| EP0972761B1 (de) | 2001-12-12 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| UEP | Publication of translation of european patent specification |