ATE303374T1 - Fluorinated acrylic verbindungen, ihre herstellungsverfahren und diese enthaltende photoresistzusammensetzungen - Google Patents

Fluorinated acrylic verbindungen, ihre herstellungsverfahren und diese enthaltende photoresistzusammensetzungen

Info

Publication number
ATE303374T1
ATE303374T1 AT04003810T AT04003810T ATE303374T1 AT E303374 T1 ATE303374 T1 AT E303374T1 AT 04003810 T AT04003810 T AT 04003810T AT 04003810 T AT04003810 T AT 04003810T AT E303374 T1 ATE303374 T1 AT E303374T1
Authority
AT
Austria
Prior art keywords
compositions containing
production processes
acrylic compounds
photoresist compositions
fluorinated acrylic
Prior art date
Application number
AT04003810T
Other languages
English (en)
Inventor
Atteye Houssein Abdourazak
Thomas John Markley
Original Assignee
Air Prod & Chem
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Prod & Chem filed Critical Air Prod & Chem
Application granted granted Critical
Publication of ATE303374T1 publication Critical patent/ATE303374T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D309/00—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings
    • C07D309/02—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings having no double bonds between ring members or between ring members and non-ring members
    • C07D309/08—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D309/10—Oxygen atoms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0395—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having a backbone with alicyclic moieties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/108—Polyolefin or halogen containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/115—Cationic or anionic

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)
  • Pyrane Compounds (AREA)
AT04003810T 2003-02-20 2004-02-19 Fluorinated acrylic verbindungen, ihre herstellungsverfahren und diese enthaltende photoresistzusammensetzungen ATE303374T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/371,251 US6919160B2 (en) 2003-02-20 2003-02-20 Acrylic compounds for sub-200 nm photoresist compositions and methods for making and using same

Publications (1)

Publication Number Publication Date
ATE303374T1 true ATE303374T1 (de) 2005-09-15

Family

ID=32736454

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04003810T ATE303374T1 (de) 2003-02-20 2004-02-19 Fluorinated acrylic verbindungen, ihre herstellungsverfahren und diese enthaltende photoresistzusammensetzungen

Country Status (5)

Country Link
US (1) US6919160B2 (de)
EP (1) EP1449839B1 (de)
JP (1) JP2004250708A (de)
AT (1) ATE303374T1 (de)
DE (1) DE602004000069T2 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050282985A1 (en) * 2004-06-17 2005-12-22 Hiroshi Koyama Fluorine-atom-containing polymerizable unsaturated-monomer, fluorine-atom-containing polymeric compound and photoresist resin composition
JP4431888B2 (ja) * 2004-10-28 2010-03-17 信越化学工業株式会社 含フッ素重合性化合物、その製造方法、この化合物から得られる高分子化合物、レジスト材料及びこれを用いたパターン形成方法
KR101042460B1 (ko) * 2004-10-28 2011-06-16 신에쓰 가가꾸 고교 가부시끼가이샤 환상 구조를 갖는 불소 함유 단량체, 그의 제조 방법,중합체, 포토레지스트 조성물 및 패턴 형성 방법
JP4636947B2 (ja) * 2005-06-14 2011-02-23 パナソニック株式会社 化学増幅型レジスト材料及びそれを用いたパターン形成方法
US7473749B2 (en) * 2005-06-23 2009-01-06 International Business Machines Corporation Preparation of topcoat compositions and methods of use thereof
JP5031310B2 (ja) * 2006-01-13 2012-09-19 東京応化工業株式会社 レジスト組成物およびレジストパターン形成方法
US7867690B2 (en) 2006-02-17 2011-01-11 Kuraray Co., Ltd. Tertiary alcohol derivative, polymer compound and photoresist composition
CN101981502A (zh) * 2008-05-30 2011-02-23 日立化成工业株式会社 感光性树脂组合物、感光性元件、抗蚀图形的形成方法及印刷电路板的制造方法
JP5572570B2 (ja) * 2011-02-28 2014-08-13 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、並びに、この組成物を用いた感活性光線性又は感放射線性膜及びパターン形成方法
KR102619528B1 (ko) 2015-12-09 2023-12-29 삼성전자주식회사 포토레지스트 조성물, 패턴 형성 방법 및 반도체 장치의 제조 방법

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Publication number Priority date Publication date Assignee Title
US51936A (en) * 1866-01-09 Improvement in rotary pumps
US6291130B1 (en) 1998-07-27 2001-09-18 Fuji Photo Film Co., Ltd. Positive photosensitive composition
IL141803A0 (en) 1998-09-23 2002-03-10 Du Pont Photoresists, polymers and processes for microlithography
KR20020012206A (ko) 1999-05-04 2002-02-15 메리 이. 보울러 플루오르화 중합체, 포토레지스트 및 마이크로리소그래피방법
JP3672780B2 (ja) 1999-11-29 2005-07-20 セントラル硝子株式会社 ポジ型レジスト組成物およびパターン形成方法
KR20010088333A (ko) 2000-02-16 2001-09-26 카나가와 치히로 고분자 화합물, 레지스트 재료 및 패턴 형성 방법
US6406828B1 (en) 2000-02-24 2002-06-18 Shipley Company, L.L.C. Polymer and photoresist compositions
EP1127899A1 (de) 2000-02-25 2001-08-29 Shipley Company LLC Polymer umd Photoresistzusammensetzungen
US6468712B1 (en) 2000-02-25 2002-10-22 Massachusetts Institute Of Technology Resist materials for 157-nm lithography
EP1278786B1 (de) 2000-05-05 2006-01-04 E.I. Du Pont De Nemours And Company Copolymere für photoresistzusammensetzungen und verfahren zur herstellung
TW588221B (en) 2000-09-07 2004-05-21 Shinetsu Chemical Co Polymers, resist compositions and patterning process
WO2002021214A2 (en) 2000-09-08 2002-03-14 Shipley Company, L.L.C. Use of acetal/ketal polymers in photoresist compositions suitable for short wave imaging
WO2002021212A2 (en) 2000-09-08 2002-03-14 Shipley Company, L.L.C. Fluorinated phenolic polymers and photoresist compositions comprising same
US6749986B2 (en) 2000-09-08 2004-06-15 Shipley Company, L.L.C. Polymers and photoresist compositions for short wavelength imaging
WO2002021213A2 (en) 2000-09-08 2002-03-14 Shipley Company, L.L.C. Novel polymers and photoresist compositions for short wavelength imaging
JP4190167B2 (ja) 2000-09-26 2008-12-03 富士フイルム株式会社 ポジ型レジスト組成物

Also Published As

Publication number Publication date
DE602004000069D1 (de) 2005-10-06
US6919160B2 (en) 2005-07-19
EP1449839A3 (de) 2004-09-08
DE602004000069T2 (de) 2006-03-02
EP1449839A2 (de) 2004-08-25
JP2004250708A (ja) 2004-09-09
EP1449839B1 (de) 2005-08-31
US20040175644A1 (en) 2004-09-09

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