ATE554126T1 - Härtbare zusammensetzung, die eine thiolverbindung enthält - Google Patents

Härtbare zusammensetzung, die eine thiolverbindung enthält

Info

Publication number
ATE554126T1
ATE554126T1 AT07713700T AT07713700T ATE554126T1 AT E554126 T1 ATE554126 T1 AT E554126T1 AT 07713700 T AT07713700 T AT 07713700T AT 07713700 T AT07713700 T AT 07713700T AT E554126 T1 ATE554126 T1 AT E554126T1
Authority
AT
Austria
Prior art keywords
curable composition
formula
thiolen
compound
composition containing
Prior art date
Application number
AT07713700T
Other languages
English (en)
Inventor
Hideo Miyata
Katsuro Urakawa
Haruhiko Ikeda
Yotaro Hattori
Original Assignee
Showa Denko Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko Kk filed Critical Showa Denko Kk
Application granted granted Critical
Publication of ATE554126T1 publication Critical patent/ATE554126T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/81—Unsaturated isocyanates or isothiocyanates
    • C08G18/8108—Unsaturated isocyanates or isothiocyanates having only one isocyanate or isothiocyanate group
    • C08G18/8116—Unsaturated isocyanates or isothiocyanates having only one isocyanate or isothiocyanate group esters of acrylic or alkylacrylic acid having only one isocyanate or isothiocyanate group
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/0275—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with dithiol or polysulfide compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/30—Low-molecular-weight compounds
    • C08G18/38—Low-molecular-weight compounds having heteroatoms other than oxygen
    • C08G18/3855—Low-molecular-weight compounds having heteroatoms other than oxygen having sulfur
    • C08G18/3876—Low-molecular-weight compounds having heteroatoms other than oxygen having sulfur containing mercapto groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/81—Unsaturated isocyanates or isothiocyanates
    • C08G18/8141—Unsaturated isocyanates or isothiocyanates masked
    • C08G18/815—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen
    • C08G18/8158—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen
    • C08G18/8175—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen with esters of acrylic or alkylacrylic acid having only one group containing active hydrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
    • C08G75/02—Polythioethers
    • C08G75/04—Polythioethers from mercapto compounds or metallic derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
    • C08K5/37—Thiols
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J175/00—Adhesives based on polyureas or polyurethanes; Adhesives based on derivatives of such polymers
    • C09J175/04—Polyurethanes
    • C09J175/14—Polyurethanes having carbon-to-carbon unsaturated bonds
    • C09J175/16—Polyurethanes having carbon-to-carbon unsaturated bonds having terminal carbon-to-carbon unsaturated bonds
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Epoxy Resins (AREA)
AT07713700T 2006-01-26 2007-01-25 Härtbare zusammensetzung, die eine thiolverbindung enthält ATE554126T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006017788 2006-01-26
PCT/JP2007/051168 WO2007086461A1 (ja) 2006-01-26 2007-01-25 チオール化合物を含有する硬化性組成物

Publications (1)

Publication Number Publication Date
ATE554126T1 true ATE554126T1 (de) 2012-05-15

Family

ID=38309250

Family Applications (1)

Application Number Title Priority Date Filing Date
AT07713700T ATE554126T1 (de) 2006-01-26 2007-01-25 Härtbare zusammensetzung, die eine thiolverbindung enthält

Country Status (8)

Country Link
US (1) US7888399B2 (de)
EP (1) EP1983017B1 (de)
JP (1) JP5301164B2 (de)
KR (1) KR101293084B1 (de)
CN (1) CN101374886B (de)
AT (1) ATE554126T1 (de)
TW (1) TWI394768B (de)
WO (1) WO2007086461A1 (de)

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WO2009011211A1 (ja) * 2007-07-13 2009-01-22 Showa Denko K.K. 硬化性組成物およびその硬化物
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KR101238178B1 (ko) * 2007-10-29 2013-02-28 히타치가세이가부시끼가이샤 회로 접속 재료, 접속 구조체 및 그의 제조 방법
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JP5677727B2 (ja) * 2009-04-20 2015-02-25 株式会社ブリヂストン チオール基含有接着性樹脂組成物
JP5489616B2 (ja) 2009-09-28 2014-05-14 富士フイルム株式会社 インク組成物及び印刷物成型体の製造方法
CN102107340B (zh) * 2009-12-24 2015-10-21 汉高股份有限及两合公司 一种焊膏组合物、焊膏及一种助焊剂
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EP2371912B1 (de) 2010-03-31 2014-04-30 Fujifilm Corporation Aktive strahlungshärtbare Tintenzusammensetzung, Tintenzusammensetzung zur Tintenstrahlaufzeichnung, Druckmaterial und Verfahren zum Herstellen eines geformten Artikels aus Druckmaterial
JP5647533B2 (ja) * 2010-06-07 2014-12-24 昭和電工株式会社 安定化されたポリエン−ポリチオール系硬化性樹脂組成物
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EP2588448B1 (de) * 2010-07-01 2017-10-18 Samsung Electronics Co., Ltd. Zusammensetzung für einen lichtemittierenden partikel-polymer-verbundstoff, lichtemittierender partikel-polymer-verbundstoff und vorrichtung mit dem lichtemittierenden partikel-polymer-verbundstoff
EP2522684A1 (de) * 2011-05-12 2012-11-14 Recticel Verfahren zur Funktionalisierung eines Thermosatz-Polymerfestmaterials auf Isocyanat-Basis
KR20140098770A (ko) * 2011-11-29 2014-08-08 니타 젤라틴 가부시키가이샤 광경화성 실링용 재료, 실링 방법, 실링재 및 그것을 사용하는 하우징
US9726928B2 (en) 2011-12-09 2017-08-08 Samsung Electronics Co., Ltd. Backlight unit and liquid crystal display including the same
JP6034210B2 (ja) * 2013-02-07 2016-11-30 株式会社有沢製作所 基材処理用組成物、積層基材の製造方法、及び積層基材
JP5794248B2 (ja) * 2013-03-15 2015-10-14 富士ゼロックス株式会社 トナー、液体現像剤、現像剤、現像剤カートリッジ、プロセスカートリッジ、画像形成装置および画像形成方法
JP6460901B2 (ja) * 2015-04-28 2019-01-30 富士フイルム株式会社 硬化性組成物、硬化膜、有機ｅｌ表示装置、液晶表示装置、タッチパネル及びタッチパネル表示装置
JP6582774B2 (ja) * 2015-09-10 2019-10-02 日油株式会社 剥離シート用硬化性樹脂組成物、これを用いた工程基材、及び基材を保護する方法
JP6699145B2 (ja) * 2015-11-30 2020-05-27 味の素株式会社 光および熱硬化性樹脂組成物
EP3428198B1 (de) * 2016-03-07 2020-11-25 Showa Denko K.K. Durch aktive strahlung härtbare zusammensetzung und daraus hergestelltes, gehärtetes produkt
WO2017200082A1 (ja) * 2016-05-20 2017-11-23 昭和電工株式会社 炭素繊維強化樹脂用組成物、炭素繊維強化樹脂組成物、硬化物
JP6235079B2 (ja) * 2016-06-24 2017-11-22 株式会社有沢製作所 基材処理用組成物、積層基材の製造方法、及び積層基材
CN107641200B (zh) * 2017-09-20 2020-12-15 杭州乐一新材料科技有限公司 一种用于3d打印的硫醇‐烯光固化树脂及其制备方法
KR101935031B1 (ko) * 2017-12-28 2019-01-03 에스케이씨 주식회사 플라스틱 광학 렌즈용 폴리티올 조성물
KR20210030895A (ko) * 2018-03-28 2021-03-18 벤자민 룬드 티올-아크릴레이트 중합체, 이의 합성 방법 및 적층식 제조 기술에서의 용도
CN113956477B (zh) * 2020-07-20 2023-10-13 中国石油化工股份有限公司 一种固化组合物及其应用和固化聚合物材料及其制备方法和应用
CN112898565A (zh) * 2021-03-09 2021-06-04 贵州大学 一种基于点击化学制备聚氨酯的方法及聚氨酯

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Also Published As

Publication number Publication date
TW200734364A (en) 2007-09-16
CN101374886B (zh) 2011-08-10
JP5301164B2 (ja) 2013-09-25
WO2007086461A1 (ja) 2007-08-02
KR101293084B1 (ko) 2013-08-05
EP1983017A1 (de) 2008-10-22
TWI394768B (zh) 2013-05-01
JPWO2007086461A1 (ja) 2009-06-18
KR20080088603A (ko) 2008-10-02
CN101374886A (zh) 2009-02-25
US20090023831A1 (en) 2009-01-22
US7888399B2 (en) 2011-02-15
EP1983017B1 (de) 2012-04-18
EP1983017A4 (de) 2010-09-08

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