TW200506504A - Photoactive compounds - Google Patents

Photoactive compounds

Info

Publication number
TW200506504A
TW200506504A TW093111558A TW93111558A TW200506504A TW 200506504 A TW200506504 A TW 200506504A TW 093111558 A TW093111558 A TW 093111558A TW 93111558 A TW93111558 A TW 93111558A TW 200506504 A TW200506504 A TW 200506504A
Authority
TW
Taiwan
Prior art keywords
photoactive compounds
compounds
photoactive
relates
present
Prior art date
Application number
TW093111558A
Other languages
English (en)
Inventor
M Dalil Rahman
Francis M Houlihan
Original Assignee
Clariant Int Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Clariant Int Ltd filed Critical Clariant Int Ltd
Publication of TW200506504A publication Critical patent/TW200506504A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C07C381/12—Sulfonium compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Indole Compounds (AREA)
TW093111558A 2003-05-16 2004-04-26 Photoactive compounds TW200506504A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/439,753 US7358408B2 (en) 2003-05-16 2003-05-16 Photoactive compounds

Publications (1)

Publication Number Publication Date
TW200506504A true TW200506504A (en) 2005-02-16

Family

ID=33417884

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093111558A TW200506504A (en) 2003-05-16 2004-04-26 Photoactive compounds

Country Status (7)

Country Link
US (4) US7358408B2 (zh)
EP (1) EP1641750A2 (zh)
JP (1) JP2007505946A (zh)
KR (1) KR20060009360A (zh)
CN (1) CN100363343C (zh)
TW (1) TW200506504A (zh)
WO (1) WO2004101490A2 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI753986B (zh) * 2017-01-04 2022-02-01 德商默克專利有限公司 化學增幅型正型光阻組成物及使用其之圖案形成方法

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US8088548B2 (en) * 2007-10-23 2012-01-03 Az Electronic Materials Usa Corp. Bottom antireflective coating compositions
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US8632948B2 (en) * 2009-09-30 2014-01-21 Az Electronic Materials Usa Corp. Positive-working photoimageable bottom antireflective coating
JP5820688B2 (ja) 2011-03-23 2015-11-24 株式会社Kri 多糖類の溶解に用いられる溶媒ならびに該溶媒を用いた成形体および多糖類誘導体の製造方法
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TWI731961B (zh) 2016-04-19 2021-07-01 德商馬克專利公司 正向感光材料及形成正向凸紋影像之方法
KR102261808B1 (ko) 2016-08-09 2021-06-07 리지필드 액퀴지션 환경적으로 안정한 후막성 화학증폭형 레지스트

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI753986B (zh) * 2017-01-04 2022-02-01 德商默克專利有限公司 化學增幅型正型光阻組成物及使用其之圖案形成方法

Also Published As

Publication number Publication date
CN100363343C (zh) 2008-01-23
US20040229155A1 (en) 2004-11-18
US20080261147A1 (en) 2008-10-23
WO2004101490A2 (en) 2004-11-25
JP2007505946A (ja) 2007-03-15
CN1791573A (zh) 2006-06-21
KR20060009360A (ko) 2006-01-31
US20080096127A1 (en) 2008-04-24
WO2004101490A3 (en) 2005-01-06
US20080058542A1 (en) 2008-03-06
US7358408B2 (en) 2008-04-15
EP1641750A2 (en) 2006-04-05

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