CH698528B1 - Schiebereinrichtung eines Vakuumprozesssystems. - Google Patents

Schiebereinrichtung eines Vakuumprozesssystems. Download PDF

Info

Publication number
CH698528B1
CH698528B1 CH01997/05A CH19972005A CH698528B1 CH 698528 B1 CH698528 B1 CH 698528B1 CH 01997/05 A CH01997/05 A CH 01997/05A CH 19972005 A CH19972005 A CH 19972005A CH 698528 B1 CH698528 B1 CH 698528B1
Authority
CH
Switzerland
Prior art keywords
valve body
seal member
wall
port
transfer
Prior art date
Application number
CH01997/05A
Other languages
German (de)
English (en)
Inventor
Tsutomu Hiroki
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of CH698528B1 publication Critical patent/CH698528B1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67126—Apparatus for sealing, encapsulating, glassing, decapsulating or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67772—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving removal of lid, door, cover
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K1/00—Lift valves or globe valves, i.e. cut-off apparatus with closure members having at least a component of their opening and closing motion perpendicular to the closing faces
    • F16K1/24—Lift valves or globe valves, i.e. cut-off apparatus with closure members having at least a component of their opening and closing motion perpendicular to the closing faces with valve members that, on opening of the valve, are initially lifted from the seat and next are turned around an axis parallel to the seat
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K3/00—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing
    • F16K3/02—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor
    • F16K3/04—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor with pivoted closure members
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K3/00—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing
    • F16K3/28—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with resilient valve members
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K51/00—Other details not peculiar to particular types of valves or cut-off apparatus
    • F16K51/02—Other details not peculiar to particular types of valves or cut-off apparatus specially adapted for high-vacuum installations
CH01997/05A 2004-12-17 2005-12-16 Schiebereinrichtung eines Vakuumprozesssystems. CH698528B1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004366470A JP4010314B2 (ja) 2004-12-17 2004-12-17 ゲートバルブ装置、処理システム及びシール部材の交換方法

Publications (1)

Publication Number Publication Date
CH698528B1 true CH698528B1 (de) 2009-08-31

Family

ID=36671343

Family Applications (1)

Application Number Title Priority Date Filing Date
CH01997/05A CH698528B1 (de) 2004-12-17 2005-12-16 Schiebereinrichtung eines Vakuumprozesssystems.

Country Status (5)

Country Link
JP (1) JP4010314B2 (ja)
KR (1) KR100756110B1 (ja)
CN (1) CN100383918C (ja)
CH (1) CH698528B1 (ja)
TW (1) TW200629358A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102010053411B4 (de) 2009-12-15 2023-07-06 Vat Holding Ag Vakuumventil

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8047231B2 (en) 2006-06-19 2011-11-01 Nippon Val-Qua Industries, Ltd. Valve element unit and gate valve apparatus
JPWO2008018405A1 (ja) 2006-08-11 2009-12-24 日本バルカー工業株式会社 バルブ装置
KR101324288B1 (ko) * 2006-08-23 2013-11-01 주성엔지니어링(주) 유지보수가 간편한 기판 얼라이너
JP4435799B2 (ja) * 2007-03-19 2010-03-24 東京エレクトロン株式会社 開閉バルブ及び該開閉バルブを備えた処理装置
TWI381470B (zh) * 2007-05-08 2013-01-01 Tokyo Electron Ltd And a treatment device provided with the valve
JP5490435B2 (ja) * 2009-03-31 2014-05-14 東京エレクトロン株式会社 ゲートバルブ装置
JP5389684B2 (ja) * 2010-01-29 2014-01-15 東京エレクトロン株式会社 ゲートバルブ及びそれを用いた基板処理装置
KR101175266B1 (ko) * 2010-04-19 2012-08-21 주성엔지니어링(주) 기판 처리장치
CN103206552A (zh) * 2012-01-16 2013-07-17 中国科学院微电子研究所 真空隔离阀装置
JP5898523B2 (ja) * 2012-02-20 2016-04-06 スタンレー電気株式会社 真空処理装置および真空処理装置を用いた物品の製造方法
CN104109847A (zh) * 2013-04-16 2014-10-22 北京北方微电子基地设备工艺研究中心有限责任公司 一种反应腔室及等离子体加工设备
JP5578382B2 (ja) * 2013-07-31 2014-08-27 株式会社村田製作所 開閉バルブ
CN105369207B (zh) * 2015-12-02 2018-03-30 武汉华星光电技术有限公司 快速更换真空腔体内消耗件的装置与方法
JP2019012670A (ja) * 2017-07-03 2019-01-24 日新イオン機器株式会社 弁体装置、弁体装置モジュール
KR20200087247A (ko) * 2017-11-23 2020-07-20 어플라이드 머티어리얼스, 인코포레이티드 진공 밀봉을 위한 락 밸브, 진공 챔버, 및 진공 프로세싱 시스템
KR102121057B1 (ko) * 2018-06-11 2020-06-16 (주) 엔피홀딩스 실링 부재 교체형 게이트 밸브 시스템과, 실링 플레이트 및 실링 플레이트용 매거진
CN110242758B (zh) * 2018-03-09 2021-02-26 (株）Np控股 密封构件更换型闸阀系统、密封板及密封板用料盒
KR102538656B1 (ko) * 2018-03-09 2023-06-01 (주) 엔피홀딩스 실링 부재 교체형 게이트 밸브 시스템과, 실링 플레이트 및 실링 플레이트용 매거진
JP6958728B2 (ja) * 2018-04-02 2021-11-02 株式会社島津製作所 真空装置および分析装置
JP6412670B1 (ja) * 2018-04-13 2018-10-24 株式会社ブイテックス ゲートバルブ
KR102127189B1 (ko) * 2018-06-20 2020-06-29 (주) 엔피홀딩스 도어 교체형 게이트 밸브 시스템
KR102278560B1 (ko) * 2019-06-13 2021-07-19 (주) 엔피홀딩스 게이트 밸브 시스템 및 이의 제어 방법
WO2019240516A2 (ko) * 2018-06-15 2019-12-19 (주) 엔피홀딩스 게이트 밸브 시스템 및 이의 제어 방법
KR102131284B1 (ko) * 2018-06-20 2020-07-07 (주) 엔피홀딩스 도어 교체형 게이트 밸브 시스템
KR102131285B1 (ko) * 2018-06-15 2020-07-07 (주) 엔피홀딩스 게이트밸브
KR102224594B1 (ko) * 2019-06-20 2021-03-08 (주) 엔피홀딩스 게이트 밸브 시스템
KR102150064B1 (ko) * 2018-07-04 2020-08-31 주식회사 에이씨엔 도어 순환 교체형 게이트 밸브 시스템
CN113130345B (zh) * 2019-12-31 2023-12-08 中微半导体设备(上海)股份有限公司 基片处理系统及其维护方法
US11933416B2 (en) 2021-07-16 2024-03-19 Changxin Memory Technologies, Inc. Gate valve device, cleaning method and mechanical apparatus

Family Cites Families (9)

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US4785962A (en) * 1987-04-20 1988-11-22 Applied Materials, Inc. Vacuum chamber slit valve
JP3335010B2 (ja) * 1994-08-19 2002-10-15 東京エレクトロン株式会社 処理装置
CN1035566C (zh) * 1994-12-28 1997-08-06 浙江大学 双向真空阀
US6267545B1 (en) * 1999-03-29 2001-07-31 Lam Research Corporation Semiconductor processing platform architecture having processing module isolation capabilities
JP2000346238A (ja) * 1999-06-02 2000-12-15 Tokyo Electron Ltd バルブ
TWI290589B (en) * 2000-10-02 2007-12-01 Tokyo Electron Ltd Vacuum processing device
JP3554847B2 (ja) * 2001-07-30 2004-08-18 東京エレクトロン株式会社 熱処理装置
KR100439036B1 (ko) * 2002-08-05 2004-07-03 삼성전자주식회사 반도체 제조설비
KR20040043932A (ko) * 2002-11-20 2004-05-27 삼성전자주식회사 게이트 밸브

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102010053411B4 (de) 2009-12-15 2023-07-06 Vat Holding Ag Vakuumventil

Also Published As

Publication number Publication date
JP4010314B2 (ja) 2007-11-21
KR20060069287A (ko) 2006-06-21
TWI362056B (ja) 2012-04-11
KR100756110B1 (ko) 2007-09-05
TW200629358A (en) 2006-08-16
CN1790617A (zh) 2006-06-21
JP2006170373A (ja) 2006-06-29
CN100383918C (zh) 2008-04-23

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PL Patent ceased