KR100756110B1 - 게이트 밸브 장치, 처리 시스템 및 밀봉 부재의 교환 방법 - Google Patents

게이트 밸브 장치, 처리 시스템 및 밀봉 부재의 교환 방법 Download PDF

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Publication number
KR100756110B1
KR100756110B1 KR1020050123697A KR20050123697A KR100756110B1 KR 100756110 B1 KR100756110 B1 KR 100756110B1 KR 1020050123697 A KR1020050123697 A KR 1020050123697A KR 20050123697 A KR20050123697 A KR 20050123697A KR 100756110 B1 KR100756110 B1 KR 100756110B1
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KR
South Korea
Prior art keywords
opening
valve body
maintenance
sealing member
gate valve
Prior art date
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KR1020050123697A
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English (en)
Korean (ko)
Other versions
KR20060069287A (ko
Inventor
즈토무 히로키
Original Assignee
동경 엘렉트론 주식회사
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Application filed by 동경 엘렉트론 주식회사 filed Critical 동경 엘렉트론 주식회사
Publication of KR20060069287A publication Critical patent/KR20060069287A/ko
Application granted granted Critical
Publication of KR100756110B1 publication Critical patent/KR100756110B1/ko

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67126—Apparatus for sealing, encapsulating, glassing, decapsulating or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67772—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving removal of lid, door, cover
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K1/00—Lift valves or globe valves, i.e. cut-off apparatus with closure members having at least a component of their opening and closing motion perpendicular to the closing faces
    • F16K1/24—Lift valves or globe valves, i.e. cut-off apparatus with closure members having at least a component of their opening and closing motion perpendicular to the closing faces with valve members that, on opening of the valve, are initially lifted from the seat and next are turned around an axis parallel to the seat
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K3/00—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing
    • F16K3/02—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor
    • F16K3/04—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor with pivoted closure members
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K3/00—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing
    • F16K3/28—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with resilient valve members
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K51/00—Other details not peculiar to particular types of valves or cut-off apparatus
    • F16K51/02—Other details not peculiar to particular types of valves or cut-off apparatus specially adapted for high-vacuum installations

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Details Of Valves (AREA)
  • Sliding Valves (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Lift Valve (AREA)
  • Physical Vapour Deposition (AREA)
KR1020050123697A 2004-12-17 2005-12-15 게이트 밸브 장치, 처리 시스템 및 밀봉 부재의 교환 방법 KR100756110B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2004-00366470 2004-12-17
JP2004366470A JP4010314B2 (ja) 2004-12-17 2004-12-17 ゲートバルブ装置、処理システム及びシール部材の交換方法

Publications (2)

Publication Number Publication Date
KR20060069287A KR20060069287A (ko) 2006-06-21
KR100756110B1 true KR100756110B1 (ko) 2007-09-05

Family

ID=36671343

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020050123697A KR100756110B1 (ko) 2004-12-17 2005-12-15 게이트 밸브 장치, 처리 시스템 및 밀봉 부재의 교환 방법

Country Status (5)

Country Link
JP (1) JP4010314B2 (ja)
KR (1) KR100756110B1 (ja)
CN (1) CN100383918C (ja)
CH (1) CH698528B1 (ja)
TW (1) TW200629358A (ja)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190106535A (ko) * 2018-03-09 2019-09-18 (주) 엔피홀딩스 실링 부재 교체형 게이트 밸브 시스템과, 실링 플레이트 및 실링 플레이트용 매거진
KR20190140336A (ko) * 2018-06-11 2019-12-19 (주) 엔피홀딩스 실링 부재 교체형 게이트 밸브 시스템과, 실링 플레이트 및 실링 플레이트용 매거진
KR20190141987A (ko) * 2018-06-15 2019-12-26 (주) 엔피홀딩스 게이트밸브
KR20190143118A (ko) * 2018-06-20 2019-12-30 (주) 엔피홀딩스 도어 교체형 게이트 밸브 시스템
KR20190143117A (ko) * 2018-06-20 2019-12-30 (주) 엔피홀딩스 도어 교체형 게이트 밸브 시스템
WO2019240516A3 (ko) * 2018-06-15 2020-02-06 (주) 엔피홀딩스 게이트 밸브 시스템 및 이의 제어 방법
KR20200142846A (ko) * 2019-06-13 2020-12-23 (주) 엔피홀딩스 게이트 밸브 시스템 및 이의 제어 방법
KR20200145069A (ko) * 2019-06-20 2020-12-30 (주) 엔피홀딩스 게이트 밸브 시스템

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8047231B2 (en) 2006-06-19 2011-11-01 Nippon Val-Qua Industries, Ltd. Valve element unit and gate valve apparatus
JPWO2008018405A1 (ja) 2006-08-11 2009-12-24 日本バルカー工業株式会社 バルブ装置
KR101324288B1 (ko) * 2006-08-23 2013-11-01 주성엔지니어링(주) 유지보수가 간편한 기판 얼라이너
JP4435799B2 (ja) * 2007-03-19 2010-03-24 東京エレクトロン株式会社 開閉バルブ及び該開閉バルブを備えた処理装置
TWI381470B (zh) * 2007-05-08 2013-01-01 Tokyo Electron Ltd And a treatment device provided with the valve
JP5490435B2 (ja) * 2009-03-31 2014-05-14 東京エレクトロン株式会社 ゲートバルブ装置
DE102010053411B4 (de) 2009-12-15 2023-07-06 Vat Holding Ag Vakuumventil
JP5389684B2 (ja) * 2010-01-29 2014-01-15 東京エレクトロン株式会社 ゲートバルブ及びそれを用いた基板処理装置
KR101175266B1 (ko) * 2010-04-19 2012-08-21 주성엔지니어링(주) 기판 처리장치
CN103206552A (zh) * 2012-01-16 2013-07-17 中国科学院微电子研究所 真空隔离阀装置
JP5898523B2 (ja) * 2012-02-20 2016-04-06 スタンレー電気株式会社 真空処理装置および真空処理装置を用いた物品の製造方法
CN104109847A (zh) * 2013-04-16 2014-10-22 北京北方微电子基地设备工艺研究中心有限责任公司 一种反应腔室及等离子体加工设备
JP5578382B2 (ja) * 2013-07-31 2014-08-27 株式会社村田製作所 開閉バルブ
CN105369207B (zh) * 2015-12-02 2018-03-30 武汉华星光电技术有限公司 快速更换真空腔体内消耗件的装置与方法
JP2019012670A (ja) * 2017-07-03 2019-01-24 日新イオン機器株式会社 弁体装置、弁体装置モジュール
KR20200087247A (ko) * 2017-11-23 2020-07-20 어플라이드 머티어리얼스, 인코포레이티드 진공 밀봉을 위한 락 밸브, 진공 챔버, 및 진공 프로세싱 시스템
CN110242758B (zh) * 2018-03-09 2021-02-26 (株）Np控股 密封构件更换型闸阀系统、密封板及密封板用料盒
JP6958728B2 (ja) * 2018-04-02 2021-11-02 株式会社島津製作所 真空装置および分析装置
JP6412670B1 (ja) * 2018-04-13 2018-10-24 株式会社ブイテックス ゲートバルブ
KR102150064B1 (ko) * 2018-07-04 2020-08-31 주식회사 에이씨엔 도어 순환 교체형 게이트 밸브 시스템
CN113130345B (zh) * 2019-12-31 2023-12-08 中微半导体设备(上海)股份有限公司 基片处理系统及其维护方法
US11933416B2 (en) 2021-07-16 2024-03-19 Changxin Memory Technologies, Inc. Gate valve device, cleaning method and mechanical apparatus

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20040013295A (ko) * 2002-08-05 2004-02-14 삼성전자주식회사 반도체 제조설비
KR20040043932A (ko) * 2002-11-20 2004-05-27 삼성전자주식회사 게이트 밸브

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4785962A (en) * 1987-04-20 1988-11-22 Applied Materials, Inc. Vacuum chamber slit valve
JP3335010B2 (ja) * 1994-08-19 2002-10-15 東京エレクトロン株式会社 処理装置
CN1035566C (zh) * 1994-12-28 1997-08-06 浙江大学 双向真空阀
US6267545B1 (en) * 1999-03-29 2001-07-31 Lam Research Corporation Semiconductor processing platform architecture having processing module isolation capabilities
JP2000346238A (ja) * 1999-06-02 2000-12-15 Tokyo Electron Ltd バルブ
TWI290589B (en) * 2000-10-02 2007-12-01 Tokyo Electron Ltd Vacuum processing device
JP3554847B2 (ja) * 2001-07-30 2004-08-18 東京エレクトロン株式会社 熱処理装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20040013295A (ko) * 2002-08-05 2004-02-14 삼성전자주식회사 반도체 제조설비
KR20040043932A (ko) * 2002-11-20 2004-05-27 삼성전자주식회사 게이트 밸브

Cited By (15)

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KR102538656B1 (ko) * 2018-03-09 2023-06-01 (주) 엔피홀딩스 실링 부재 교체형 게이트 밸브 시스템과, 실링 플레이트 및 실링 플레이트용 매거진
KR20190106535A (ko) * 2018-03-09 2019-09-18 (주) 엔피홀딩스 실링 부재 교체형 게이트 밸브 시스템과, 실링 플레이트 및 실링 플레이트용 매거진
KR102121057B1 (ko) * 2018-06-11 2020-06-16 (주) 엔피홀딩스 실링 부재 교체형 게이트 밸브 시스템과, 실링 플레이트 및 실링 플레이트용 매거진
KR20190140336A (ko) * 2018-06-11 2019-12-19 (주) 엔피홀딩스 실링 부재 교체형 게이트 밸브 시스템과, 실링 플레이트 및 실링 플레이트용 매거진
KR102131285B1 (ko) * 2018-06-15 2020-07-07 (주) 엔피홀딩스 게이트밸브
WO2019240516A3 (ko) * 2018-06-15 2020-02-06 (주) 엔피홀딩스 게이트 밸브 시스템 및 이의 제어 방법
KR20190141987A (ko) * 2018-06-15 2019-12-26 (주) 엔피홀딩스 게이트밸브
KR20190143117A (ko) * 2018-06-20 2019-12-30 (주) 엔피홀딩스 도어 교체형 게이트 밸브 시스템
KR102127189B1 (ko) * 2018-06-20 2020-06-29 (주) 엔피홀딩스 도어 교체형 게이트 밸브 시스템
KR102131284B1 (ko) * 2018-06-20 2020-07-07 (주) 엔피홀딩스 도어 교체형 게이트 밸브 시스템
KR20190143118A (ko) * 2018-06-20 2019-12-30 (주) 엔피홀딩스 도어 교체형 게이트 밸브 시스템
KR20200142846A (ko) * 2019-06-13 2020-12-23 (주) 엔피홀딩스 게이트 밸브 시스템 및 이의 제어 방법
KR102278560B1 (ko) * 2019-06-13 2021-07-19 (주) 엔피홀딩스 게이트 밸브 시스템 및 이의 제어 방법
KR20200145069A (ko) * 2019-06-20 2020-12-30 (주) 엔피홀딩스 게이트 밸브 시스템
KR102224594B1 (ko) * 2019-06-20 2021-03-08 (주) 엔피홀딩스 게이트 밸브 시스템

Also Published As

Publication number Publication date
JP4010314B2 (ja) 2007-11-21
KR20060069287A (ko) 2006-06-21
TWI362056B (ja) 2012-04-11
CH698528B1 (de) 2009-08-31
TW200629358A (en) 2006-08-16
CN1790617A (zh) 2006-06-21
JP2006170373A (ja) 2006-06-29
CN100383918C (zh) 2008-04-23

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