CH693032A5 - Benzotriazol-UV-Absorptionsmittel mit erhöhter Haltbarkeit. - Google Patents

Benzotriazol-UV-Absorptionsmittel mit erhöhter Haltbarkeit. Download PDF

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Publication number
CH693032A5
CH693032A5 CH02549/97A CH254997A CH693032A5 CH 693032 A5 CH693032 A5 CH 693032A5 CH 02549/97 A CH02549/97 A CH 02549/97A CH 254997 A CH254997 A CH 254997A CH 693032 A5 CH693032 A5 CH 693032A5
Authority
CH
Switzerland
Prior art keywords
carbon atoms
alkyl
chain
tert
phenyl
Prior art date
Application number
CH02549/97A
Other languages
German (de)
English (en)
Inventor
Anthony David Debellis
Revathi Iyengar
Joseph Suhadolnik
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Publication of CH693032A5 publication Critical patent/CH693032A5/de

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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/32Radiation-absorbing paints
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/34Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3472Five-membered rings
    • C08K5/3475Five-membered rings condensed with carbocyclic rings
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D249/00Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
    • C07D249/16Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms condensed with carbocyclic rings or ring systems
    • C07D249/18Benzotriazoles
    • C07D249/20Benzotriazoles with aryl radicals directly attached in position 2
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/547Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
    • C07F9/6515Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having three nitrogen atoms as the only ring hetero atoms
    • C07F9/6518Five-membered rings
    • C07F9/65188Five-membered rings condensed with carbocyclic rings or carbocyclic ring systems
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/34Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3472Five-membered rings
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04Homopolymers or copolymers of esters
    • C09D133/14Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D161/00Coating compositions based on condensation polymers of aldehydes or ketones; Coating compositions based on derivatives of such polymers
    • C09D161/20Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen
    • C09D161/26Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen of aldehydes with heterocyclic compounds
    • C09D161/28Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen of aldehydes with heterocyclic compounds with melamine
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D175/00Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
    • C09D175/04Polyurethanes
    • C09D175/14Polyurethanes having carbon-to-carbon unsaturated bonds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/48Stabilisers against degradation by oxygen, light or heat

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Molecular Biology (AREA)
  • General Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Hydrogenated Pyridines (AREA)
  • Laminated Bodies (AREA)
CH02549/97A 1996-11-07 1997-11-04 Benzotriazol-UV-Absorptionsmittel mit erhöhter Haltbarkeit. CH693032A5 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US74514696A 1996-11-07 1996-11-07

Publications (1)

Publication Number Publication Date
CH693032A5 true CH693032A5 (de) 2003-01-31

Family

ID=24995448

Family Applications (1)

Application Number Title Priority Date Filing Date
CH02549/97A CH693032A5 (de) 1996-11-07 1997-11-04 Benzotriazol-UV-Absorptionsmittel mit erhöhter Haltbarkeit.

Country Status (20)

Country Link
JP (1) JP4126364B2 (no)
KR (1) KR100488744B1 (no)
CN (1) CN1091127C (no)
AT (1) AT407642B (no)
AU (1) AU727301B2 (no)
BE (1) BE1011537A3 (no)
BR (1) BR9705437A (no)
CA (1) CA2220269A1 (no)
CH (1) CH693032A5 (no)
DE (1) DE19748658B4 (no)
DK (1) DK126697A (no)
ES (1) ES2134158B1 (no)
FR (1) FR2755444B1 (no)
GB (1) GB2319035B (no)
IT (1) IT1298471B1 (no)
NL (1) NL1007470C2 (no)
NO (1) NO975104L (no)
SE (1) SE522379C2 (no)
SG (1) SG71056A1 (no)
TW (1) TW467932B (no)

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US6166218A (en) * 1996-11-07 2000-12-26 Ciba Specialty Chemicals Corporation Benzotriazole UV absorbers having enhanced durability
EP1046670B1 (en) * 1999-04-23 2003-07-09 Nippon Mitsubishi Oil Corporation Ultraviolet absorptive resin composition
CA2372686A1 (en) * 1999-05-03 2000-11-09 Ciba Specialty Chemicals Holding Inc. Stabilized adhesive compositions containing highly soluble, red-shifted, photostable benzotriazole uv absorbers and laminated articles derived therefrom
IL149342A0 (en) 1999-11-16 2002-11-10 Ciba Sc Holding Ag Use of benzontriazole uv absorbers
BR0108013B1 (pt) * 2000-02-01 2011-05-03 método de proteção de conteúdos contra os efeitos prejudiciais de radiação ultravioleta.
US6489486B2 (en) * 2000-02-21 2002-12-03 Roche Vitamins Inc. 2-hydroxyphenyl benzotriazoles as UV-A/B filters
US6566507B2 (en) 2000-08-03 2003-05-20 Ciba Specialty Chemicals Corporation Processes for the preparation of benzotriazole UV absorbers
US6353113B1 (en) 2000-08-03 2002-03-05 Ciba Specialty Chemicals Corporation Process for the preparation of 5-perfluoroalkyl substituted benzotriazole UV absorbers
US6649770B1 (en) 2000-11-27 2003-11-18 Ciba Specialty Chemicals Corporation Substituted 5-aryl-2-(2-hydroxyphenyl)-2H-benzotriazole UV absorbers, compositions stabilized therewith and process for preparation thereof
ES2232683T3 (es) * 2000-11-27 2005-06-01 Ciba Specialty Chemicals Holding Inc. Derivados de 2-(2-hiddroxifenil)-2h-benzotriazoles, sustituidos en posicion 5 por arilo y en posicion 5 por heteroarilo, como absorbentes uv.
US6930136B2 (en) 2001-09-28 2005-08-16 National Starch And Chemical Investment Holding Corporation Adhesion promoters containing benzotriazoles
US7057264B2 (en) 2002-10-18 2006-06-06 National Starch And Chemical Investment Holding Corporation Curable compounds containing reactive groups: triazine/isocyanurates, cyanate esters and blocked isocyanates
JP2005320517A (ja) * 2004-04-06 2005-11-17 Matsushita Electric Works Ltd 塗料組成物、塗膜付基材、照明器具及びランプ
JP4916313B2 (ja) * 2004-07-07 2012-04-11 株式会社Adeka 塩化ビニル系樹脂組成物
JP5308039B2 (ja) 2007-02-20 2013-10-09 富士フイルム株式会社 紫外線吸収剤を含む高分子材料
JP2009067983A (ja) 2007-03-30 2009-04-02 Fujifilm Corp 紫外線吸収剤組成物
KR101569220B1 (ko) 2007-08-16 2015-11-13 후지필름 가부시키가이샤 헤테로시클릭 화합물, 자외선 흡수제, 및 상기 자외선 흡수제를 포함하는 조성물
JPWO2009047982A1 (ja) * 2007-10-10 2011-02-17 コニカミノルタオプト株式会社 光学用アクリル系樹脂フィルム、該光学用アクリル系樹脂フィルムを用いる偏光板及び液晶表示装置
US20090214874A1 (en) * 2008-02-27 2009-08-27 Gm Global Technology Operations, Inc. Enhanced coating or layer
JP5428412B2 (ja) 2008-03-18 2014-02-26 株式会社リコー 耐熱性向上剤及び可逆性感熱記録媒体
JP5244437B2 (ja) 2008-03-31 2013-07-24 富士フイルム株式会社 紫外線吸収剤組成物
JP5250289B2 (ja) 2008-03-31 2013-07-31 富士フイルム株式会社 紫外線吸収剤組成物
JP2009270062A (ja) 2008-05-09 2009-11-19 Fujifilm Corp 紫外線吸収剤組成物
WO2011086127A1 (en) * 2010-01-15 2011-07-21 Dsm Ip Assets B.V. Process to make uv radiation absorbing 2 - phenyl - 1, 2, 3 - benzotriazoles
CN102050823A (zh) * 2010-10-27 2011-05-11 华东理工大学 新型光稳定剂-鸟嘌呤类似物的合成及表征
US9808675B2 (en) 2012-09-13 2017-11-07 Acushnet Company Golf ball compositions
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TWI483987B (zh) * 2014-03-10 2015-05-11 Sino Japan Chemical Co Ltd 液態反應型紫外線吸收劑及其製造方法與應用
CN115584055B (zh) * 2014-08-05 2024-08-13 三吉油脂株式会社 用于向基体赋予紫外线吸收能力和/或高折射率的添加剂及使用该添加剂的树脂部件
CN104327002A (zh) * 2014-09-16 2015-02-04 德州宏坤医药中间体有限公司 苯并三唑类紫外线吸收剂的生产工艺
CN107533242B (zh) * 2015-04-30 2020-06-26 东海光学株式会社 塑料透镜
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Publication number Priority date Publication date Assignee Title
FR2155303A5 (no) * 1971-09-27 1973-05-18 Veeder Industries Inc
FR2304206A1 (fr) * 1975-03-14 1976-10-08 Philips Nv Machine electrique sans collecteur
DE3519901A1 (de) * 1985-06-04 1986-12-04 Papst-Motoren GmbH & Co KG, 7742 St Georgen Motorsteuerung
JPH01133594A (ja) * 1987-11-18 1989-05-25 Secoh Giken Inc 3相半導体電動機
EP0590222A1 (en) * 1992-09-30 1994-04-06 STMicroelectronics S.r.l. Magnetic position sensor
US5640090A (en) * 1995-01-31 1997-06-17 Mitsumi Electric Company, Ltd. Sensor IC
JPH09163706A (ja) * 1995-12-01 1997-06-20 Sharp Corp ホールic及びそれを用いたファンモータ

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FR2155303A5 (no) * 1971-09-27 1973-05-18 Veeder Industries Inc
FR2304206A1 (fr) * 1975-03-14 1976-10-08 Philips Nv Machine electrique sans collecteur
DE3519901A1 (de) * 1985-06-04 1986-12-04 Papst-Motoren GmbH & Co KG, 7742 St Georgen Motorsteuerung
JPH01133594A (ja) * 1987-11-18 1989-05-25 Secoh Giken Inc 3相半導体電動機
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Also Published As

Publication number Publication date
BR9705437A (pt) 1999-05-18
TW467932B (en) 2001-12-11
ATA187497A (de) 2000-09-15
CN1091127C (zh) 2002-09-18
SG71056A1 (en) 2000-03-21
NO975104L (no) 1998-05-08
DE19748658B4 (de) 2015-08-20
SE522379C2 (sv) 2004-02-03
BE1011537A3 (fr) 1999-10-05
GB2319035A (en) 1998-05-13
CN1183442A (zh) 1998-06-03
IT1298471B1 (it) 2000-01-10
FR2755444B1 (fr) 2004-10-08
JPH10140089A (ja) 1998-05-26
SE9704086L (sv) 1998-05-08
SE9704086D0 (sv) 1997-11-07
GB2319035B (en) 2001-01-10
DK126697A (da) 1998-05-08
GB9723303D0 (en) 1998-01-07
NL1007470C2 (nl) 1998-10-07
NL1007470A1 (nl) 1998-05-11
KR100488744B1 (ko) 2005-11-29
CA2220269A1 (en) 1998-05-07
ES2134158B1 (es) 2000-05-01
ITMI972482A1 (it) 1998-05-07
KR19980042141A (ko) 1998-08-17
AT407642B (de) 2001-05-25
AU727301B2 (en) 2000-12-07
AU4436097A (en) 1998-05-14
ES2134158A1 (es) 1999-09-16
MX9708572A (es) 1998-09-30
FR2755444A1 (fr) 1998-05-07
NO975104D0 (no) 1997-11-05
JP4126364B2 (ja) 2008-07-30
DE19748658A1 (de) 1998-05-14

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