SG71056A1 - Benzotriazole uv absorbers having enhanced durability - Google Patents
Benzotriazole uv absorbers having enhanced durabilityInfo
- Publication number
- SG71056A1 SG71056A1 SG1997003966A SG1997003966A SG71056A1 SG 71056 A1 SG71056 A1 SG 71056A1 SG 1997003966 A SG1997003966 A SG 1997003966A SG 1997003966 A SG1997003966 A SG 1997003966A SG 71056 A1 SG71056 A1 SG 71056A1
- Authority
- SG
- Singapore
- Prior art keywords
- benzotriazole
- absorbers
- enhanced durability
- durability
- enhanced
- Prior art date
Links
- 239000006096 absorbing agent Substances 0.000 title 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 title 1
- 239000012964 benzotriazole Substances 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/32—Radiation-absorbing paints
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
- C08K5/3472—Five-membered rings
- C08K5/3475—Five-membered rings condensed with carbocyclic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D249/00—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
- C07D249/16—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms condensed with carbocyclic rings or ring systems
- C07D249/18—Benzotriazoles
- C07D249/20—Benzotriazoles with aryl radicals directly attached in position 2
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
- C07F9/6515—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having three nitrogen atoms as the only ring hetero atoms
- C07F9/6518—Five-membered rings
- C07F9/65188—Five-membered rings condensed with carbocyclic rings or carbocyclic ring systems
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
- C08K5/3472—Five-membered rings
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
- C09D133/04—Homopolymers or copolymers of esters
- C09D133/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D161/00—Coating compositions based on condensation polymers of aldehydes or ketones; Coating compositions based on derivatives of such polymers
- C09D161/20—Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen
- C09D161/26—Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen of aldehydes with heterocyclic compounds
- C09D161/28—Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen of aldehydes with heterocyclic compounds with melamine
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
- C09D175/04—Polyurethanes
- C09D175/14—Polyurethanes having carbon-to-carbon unsaturated bonds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/48—Stabilisers against degradation by oxygen, light or heat
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Polymers & Plastics (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Paints Or Removers (AREA)
- Hydrogenated Pyridines (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US74514696A | 1996-11-07 | 1996-11-07 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG71056A1 true SG71056A1 (en) | 2000-03-21 |
Family
ID=24995448
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG1997003966A SG71056A1 (en) | 1996-11-07 | 1997-11-06 | Benzotriazole uv absorbers having enhanced durability |
Country Status (20)
Country | Link |
---|---|
JP (1) | JP4126364B2 (no) |
KR (1) | KR100488744B1 (no) |
CN (1) | CN1091127C (no) |
AT (1) | AT407642B (no) |
AU (1) | AU727301B2 (no) |
BE (1) | BE1011537A3 (no) |
BR (1) | BR9705437A (no) |
CA (1) | CA2220269A1 (no) |
CH (1) | CH693032A5 (no) |
DE (1) | DE19748658B4 (no) |
DK (1) | DK126697A (no) |
ES (1) | ES2134158B1 (no) |
FR (1) | FR2755444B1 (no) |
GB (1) | GB2319035B (no) |
IT (1) | IT1298471B1 (no) |
NL (1) | NL1007470C2 (no) |
NO (1) | NO975104L (no) |
SE (1) | SE522379C2 (no) |
SG (1) | SG71056A1 (no) |
TW (1) | TW467932B (no) |
Families Citing this family (50)
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US6166218A (en) * | 1996-11-07 | 2000-12-26 | Ciba Specialty Chemicals Corporation | Benzotriazole UV absorbers having enhanced durability |
EP1046670B1 (en) * | 1999-04-23 | 2003-07-09 | Nippon Mitsubishi Oil Corporation | Ultraviolet absorptive resin composition |
RU2249606C2 (ru) * | 1999-05-03 | 2005-04-10 | Циба Спешиалти Кемикалз Холдинг Инк. | Стабилизированные адгезивные композиции, содержащие высокорастворимые сдвинутые в красную область фотостабильные бензтриазоловые уф-абсорберы и ламинированные изделия, изготовленные из них |
CN1198808C (zh) * | 1999-11-16 | 2005-04-27 | 西巴特殊化学品控股有限公司 | 苯并三唑uv吸收剂的应用 |
AU780351B2 (en) * | 2000-02-01 | 2005-03-17 | Ciba Specialty Chemicals Holding Inc. | Method of content protection with durable UV absorbers |
US6489486B2 (en) * | 2000-02-21 | 2002-12-03 | Roche Vitamins Inc. | 2-hydroxyphenyl benzotriazoles as UV-A/B filters |
US6353113B1 (en) | 2000-08-03 | 2002-03-05 | Ciba Specialty Chemicals Corporation | Process for the preparation of 5-perfluoroalkyl substituted benzotriazole UV absorbers |
US6566507B2 (en) | 2000-08-03 | 2003-05-20 | Ciba Specialty Chemicals Corporation | Processes for the preparation of benzotriazole UV absorbers |
EP1337520B1 (en) * | 2000-11-27 | 2004-12-15 | Ciba SC Holding AG | Substituted 5-aryl and 5-heteroaryl-2-(2-hydroxyphenyl)-2h-benzotriazole derivatives as uv absorbers |
US6649770B1 (en) | 2000-11-27 | 2003-11-18 | Ciba Specialty Chemicals Corporation | Substituted 5-aryl-2-(2-hydroxyphenyl)-2H-benzotriazole UV absorbers, compositions stabilized therewith and process for preparation thereof |
US6930136B2 (en) * | 2001-09-28 | 2005-08-16 | National Starch And Chemical Investment Holding Corporation | Adhesion promoters containing benzotriazoles |
US7057264B2 (en) | 2002-10-18 | 2006-06-06 | National Starch And Chemical Investment Holding Corporation | Curable compounds containing reactive groups: triazine/isocyanurates, cyanate esters and blocked isocyanates |
JP2005320517A (ja) * | 2004-04-06 | 2005-11-17 | Matsushita Electric Works Ltd | 塗料組成物、塗膜付基材、照明器具及びランプ |
US7534823B2 (en) * | 2004-07-07 | 2009-05-19 | Adeka Corporation | Vinyl chloride resin composition |
WO2008102822A1 (ja) | 2007-02-20 | 2008-08-28 | Fujifilm Corporation | 紫外線吸収剤を含む高分子材料 |
WO2008123504A1 (ja) | 2007-03-30 | 2008-10-16 | Fujifilm Corporation | 紫外線吸収剤組成物 |
CN101821273A (zh) | 2007-08-16 | 2010-09-01 | 富士胶片株式会社 | 杂环化合物、紫外线吸收剂、以及含有该紫外线吸收剂的组合物 |
WO2009047982A1 (ja) * | 2007-10-10 | 2009-04-16 | Konica Minolta Opto, Inc. | 光学用アクリル系樹脂フィルム、該光学用アクリル系樹脂フィルムを用いる偏光板及び液晶表示装置 |
US20090214874A1 (en) * | 2008-02-27 | 2009-08-27 | Gm Global Technology Operations, Inc. | Enhanced coating or layer |
JP5428412B2 (ja) | 2008-03-18 | 2014-02-26 | 株式会社リコー | 耐熱性向上剤及び可逆性感熱記録媒体 |
JP5250289B2 (ja) | 2008-03-31 | 2013-07-31 | 富士フイルム株式会社 | 紫外線吸収剤組成物 |
JP5244437B2 (ja) | 2008-03-31 | 2013-07-24 | 富士フイルム株式会社 | 紫外線吸収剤組成物 |
JP2009270062A (ja) | 2008-05-09 | 2009-11-19 | Fujifilm Corp | 紫外線吸収剤組成物 |
WO2011086124A1 (en) * | 2010-01-15 | 2011-07-21 | Dsm Ip Assets B.V. | 2 - phenyl - 1, 2, 3 - benzotriazoles for uv radiation absorbance |
CN102050823A (zh) * | 2010-10-27 | 2011-05-11 | 华东理工大学 | 新型光稳定剂-鸟嘌呤类似物的合成及表征 |
US9808675B2 (en) | 2012-09-13 | 2017-11-07 | Acushnet Company | Golf ball compositions |
US9227109B2 (en) * | 2012-09-13 | 2016-01-05 | Acushnet Company | Golf ball compositions |
JP6430964B2 (ja) | 2013-12-09 | 2018-11-28 | 株式会社Adeka | 塗装性を向上させた被塗装基材 |
TWI483987B (zh) * | 2014-03-10 | 2015-05-11 | Sino Japan Chemical Co Ltd | 液態反應型紫外線吸收劑及其製造方法與應用 |
CN106687550B (zh) * | 2014-08-05 | 2020-08-21 | 三吉油脂株式会社 | 用于向基体赋予紫外线吸收能力和/或高折射率的添加剂及使用该添加剂的树脂部件 |
CN104327002A (zh) * | 2014-09-16 | 2015-02-04 | 德州宏坤医药中间体有限公司 | 苯并三唑类紫外线吸收剂的生产工艺 |
JP6162906B2 (ja) * | 2015-04-30 | 2017-07-12 | 東海光学株式会社 | プラスチックレンズ |
CN106316970A (zh) * | 2016-08-11 | 2017-01-11 | 重庆大学 | 一类具有超热稳定性的含双苯并三氮唑有机染料 |
US10035043B2 (en) | 2016-12-15 | 2018-07-31 | Acushnet Company | Golf ball incorporating highly crosslinked thermoset fluorescent microspheres and methods of making same |
US10252112B2 (en) | 2017-03-20 | 2019-04-09 | Acushnet Company | Golf ball composition |
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US10526296B2 (en) | 2017-06-30 | 2020-01-07 | Johnson & Johnson Vision Care, Inc. | Hydroxyphenyl naphthotriazoles as polymerizable blockers of high energy light |
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US11993037B1 (en) | 2018-03-02 | 2024-05-28 | Johnson & Johnson Vision Care, Inc. | Contact lens displaying improved vision attributes |
US11543683B2 (en) | 2019-08-30 | 2023-01-03 | Johnson & Johnson Vision Care, Inc. | Multifocal contact lens displaying improved vision attributes |
CN108949008A (zh) * | 2018-08-09 | 2018-12-07 | 深圳市前海奇迹新材料有限公司 | 一种钢化玻璃水性uv底漆 |
US11958824B2 (en) | 2019-06-28 | 2024-04-16 | Johnson & Johnson Vision Care, Inc. | Photostable mimics of macular pigment |
CN110606984B (zh) * | 2019-07-29 | 2021-02-19 | 宿迁联盛科技股份有限公司 | 一种光稳定剂及其制备方法 |
EP4435499A2 (en) * | 2019-09-18 | 2024-09-25 | Mitsui Chemicals, Inc. | Benzotriazole compound, light absorber, and resin composition |
CN111205510A (zh) * | 2020-02-13 | 2020-05-29 | 西安工业大学 | 双功能型紫外线吸收剂及其制备方法 |
CN111575097B (zh) * | 2020-06-15 | 2021-04-16 | 清华大学 | 具有光致变粘度的溶液及调控流体粘度的方法 |
CN112079787A (zh) * | 2020-08-27 | 2020-12-15 | 宿迁联盛科技股份有限公司 | 一种硝基重氮盐偶合衍生物的还原工艺 |
US11697048B2 (en) | 2021-08-12 | 2023-07-11 | Acushnet Company | Colored golf ball and method of making same |
CN116178866B (zh) * | 2023-03-08 | 2023-10-13 | 江苏奥天利新材料有限公司 | 一种具有遮阳带的无光学缺陷的pvb中间膜制作方法 |
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US3742243A (en) * | 1971-09-27 | 1973-06-26 | Veeder Industries Inc | Pulse generator |
NL7503046A (nl) * | 1975-03-14 | 1976-09-16 | Philips Nv | Elektrische machine. |
US4226763A (en) * | 1978-06-26 | 1980-10-07 | Ciba-Geigy Corporation | 2-[2-Hydroxy-3,5-di-(.alpha.,α-dimethylbenzyl)-phenyl]-2H-benzotriazole and stabilized compositions |
DE3519901C2 (de) * | 1985-06-04 | 1995-02-16 | Papst Motoren Gmbh & Co Kg | Kollektorloser Gleichstrommotor |
US4868246A (en) * | 1987-08-12 | 1989-09-19 | Pennwalt Corporation | Polymer bound UV stabilizers |
JP2534521B2 (ja) * | 1987-11-18 | 1996-09-18 | 株式会社セコー技研 | 3相半導体電動機 |
EP0453396B1 (de) * | 1990-03-30 | 1995-12-13 | Ciba SC Holding AG | Lackzusammensetzungen |
US5278314A (en) * | 1991-02-12 | 1994-01-11 | Ciba-Geigy Corporation | 5-thio-substituted benzotriazole UV-absorbers |
US5280124A (en) * | 1991-02-12 | 1994-01-18 | Ciba-Geigy Corporation | 5-sulfonyl-substituted benzotriazole UV-absorbers |
CA2099154A1 (en) * | 1992-09-24 | 1994-03-25 | Ronald E. Mac Leay | N-[2-hydroxy-3-(2h-benzotriazol-2-yl)benzyl]oxamides |
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EP0698637A3 (en) * | 1994-08-22 | 1996-07-10 | Ciba Geigy Ag | Polyurethanes stabilized with selected UV absorbers of 5-substituted benzotriazole |
JPH08201490A (ja) * | 1995-01-31 | 1996-08-09 | Mitsumi Electric Co Ltd | センサic |
US5646088A (en) * | 1995-02-16 | 1997-07-08 | Ricoh Co., Ltd. | Thermosensitive recording material and production process thereof |
US5574166A (en) * | 1995-04-19 | 1996-11-12 | Ciba-Geigy Corporation | Crystalline form of 2-(2-hydroxy-3-α-cumyl-5-tert-octylphenyl)-2H-benzotriazole |
EP0750224A3 (en) * | 1995-06-19 | 1997-01-08 | Eastman Kodak Company | 2'-Hydroxyphenyl benzotriazole based UV absorbing polymers with particular substituents and photographic elements containing them |
JPH09163706A (ja) * | 1995-12-01 | 1997-06-20 | Sharp Corp | ホールic及びそれを用いたファンモータ |
-
1997
- 1997-11-04 DE DE19748658.4A patent/DE19748658B4/de not_active Expired - Lifetime
- 1997-11-04 FR FR9713829A patent/FR2755444B1/fr not_active Expired - Fee Related
- 1997-11-04 CH CH02549/97A patent/CH693032A5/de not_active IP Right Cessation
- 1997-11-05 ES ES009702293A patent/ES2134158B1/es not_active Expired - Fee Related
- 1997-11-05 AU AU44360/97A patent/AU727301B2/en not_active Ceased
- 1997-11-05 CA CA002220269A patent/CA2220269A1/en not_active Abandoned
- 1997-11-05 NO NO975104A patent/NO975104L/no unknown
- 1997-11-05 GB GB9723303A patent/GB2319035B/en not_active Expired - Fee Related
- 1997-11-06 BR BR9705437A patent/BR9705437A/pt not_active Application Discontinuation
- 1997-11-06 BE BE9700892A patent/BE1011537A3/fr not_active IP Right Cessation
- 1997-11-06 AT AT0187497A patent/AT407642B/de not_active IP Right Cessation
- 1997-11-06 CN CN97122422A patent/CN1091127C/zh not_active Expired - Lifetime
- 1997-11-06 IT IT97MI002482A patent/IT1298471B1/it active IP Right Grant
- 1997-11-06 SG SG1997003966A patent/SG71056A1/en unknown
- 1997-11-06 NL NL1007470A patent/NL1007470C2/nl not_active IP Right Cessation
- 1997-11-06 KR KR1019970058298A patent/KR100488744B1/ko not_active IP Right Cessation
- 1997-11-07 SE SE9704086A patent/SE522379C2/sv not_active IP Right Cessation
- 1997-11-07 DK DK199701266A patent/DK126697A/da not_active Application Discontinuation
- 1997-11-07 JP JP32209797A patent/JP4126364B2/ja not_active Expired - Lifetime
- 1997-11-19 TW TW086117258A patent/TW467932B/zh active
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