CH630767A5 - Radiation-sensitive element, containing a composition which can be photo-polymerised - Google Patents
Radiation-sensitive element, containing a composition which can be photo-polymerised Download PDFInfo
- Publication number
- CH630767A5 CH630767A5 CH1304577A CH1304577A CH630767A5 CH 630767 A5 CH630767 A5 CH 630767A5 CH 1304577 A CH1304577 A CH 1304577A CH 1304577 A CH1304577 A CH 1304577A CH 630767 A5 CH630767 A5 CH 630767A5
- Authority
- CH
- Switzerland
- Prior art keywords
- composition
- ether
- photopolymerizable
- radiation
- ethylenically unsaturated
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polymerisation Methods In General (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US73597976A | 1976-10-27 | 1976-10-27 | |
| US78090777A | 1977-03-24 | 1977-03-24 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH630767A5 true CH630767A5 (en) | 1982-06-30 |
Family
ID=27112970
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH1304577A CH630767A5 (en) | 1976-10-27 | 1977-10-26 | Radiation-sensitive element, containing a composition which can be photo-polymerised |
Country Status (9)
| Country | Link |
|---|---|
| JP (1) | JPS5356018A (enrdf_load_stackoverflow) |
| CA (1) | CA1116919A (enrdf_load_stackoverflow) |
| CH (1) | CH630767A5 (enrdf_load_stackoverflow) |
| DE (1) | DE2747947C2 (enrdf_load_stackoverflow) |
| FR (1) | FR2369590A1 (enrdf_load_stackoverflow) |
| GB (1) | GB1588368A (enrdf_load_stackoverflow) |
| IT (1) | IT1089005B (enrdf_load_stackoverflow) |
| NL (1) | NL7711723A (enrdf_load_stackoverflow) |
| SE (1) | SE435106B (enrdf_load_stackoverflow) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NO159729C (no) * | 1978-11-01 | 1989-02-01 | Coates Brothers & Co | Fremgangsmaate for fremstilling av et moenster av loddemetall paa et lag elektrisk ledende metall baaret av et ikke-ledende underlag. |
| DE3136818C2 (de) * | 1980-09-19 | 1990-08-02 | Hitachi Chemical Co., Ltd., Tokio/Tokyo | Verwendung eines lichtempfindlichen Gemisches und eines lichtempfindlichen Aufzeichnungsmaterials zur Bildung einer Lötmaske |
| JPS5764734A (en) * | 1980-10-08 | 1982-04-20 | Hitachi Chem Co Ltd | Photosensitive resin composition and photosensitive element |
| DE3114931A1 (de) * | 1981-04-13 | 1982-10-28 | Hoechst Ag, 6000 Frankfurt | Durch strahlung polymerisierbares gemisch und daraus hergestelltes photopolymerisierbares kopiermaterial |
| US4752553A (en) * | 1982-04-01 | 1988-06-21 | M&T Chemicals Inc. | High resolution solder mask photopolymers for screen coating over circuit traces |
| JPS5969752A (ja) * | 1982-10-14 | 1984-04-20 | Sekisui Chem Co Ltd | 光重合可能な画像形成用組成物 |
| JPS63158157U (enrdf_load_stackoverflow) * | 1987-04-07 | 1988-10-17 | ||
| US5196296A (en) * | 1989-10-06 | 1993-03-23 | Nippon Steel Corporation | Epoxy acrylate resins and photosensitive resin compositions therefrom |
| EP0822448B1 (en) * | 1996-08-02 | 2000-11-02 | E.I. Du Pont De Nemours And Company | Flexible, flame-retardant, photoimageable composition for coating printed circuits |
| KR100589067B1 (ko) | 2001-10-30 | 2006-06-14 | 가부시키가이샤 가네카 | 감광성 수지 조성물, 이것을 이용한 감광성 필름 및 적층체 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA614181A (en) * | 1961-02-07 | J. Mcgraw William | Photopolymerizable compositions, elements and processes | |
| US3261686A (en) * | 1963-04-23 | 1966-07-19 | Du Pont | Photopolymerizable compositions and elements |
| DE1950120A1 (de) * | 1968-10-09 | 1970-04-30 | Du Pont | Heterogene fotopolymerisierbare Masse |
| US3682800A (en) * | 1969-07-25 | 1972-08-08 | Toray Industries | Method for producing acrylonitrile copolymers |
| US3657088A (en) * | 1969-12-17 | 1972-04-18 | Bayer Ag | Moulding and coating masses hardenable by uv irradiation |
| GB1312492A (en) * | 1969-12-19 | 1973-04-04 | Mccall Corp | Crosslinked polymers and process therefor |
| US3887450A (en) * | 1971-02-04 | 1975-06-03 | Dynachem Corp | Photopolymerizable compositions containing polymeric binding agents |
| JPS498281A (enrdf_load_stackoverflow) * | 1972-05-11 | 1974-01-24 | ||
| JPS5537869B2 (enrdf_load_stackoverflow) * | 1973-02-12 | 1980-09-30 | ||
| JPS5335722B2 (enrdf_load_stackoverflow) * | 1973-08-29 | 1978-09-28 | ||
| DE2344680A1 (de) * | 1973-09-05 | 1975-03-20 | Bruno Prof Dr Vollmert | Photopolymerisierbare mischung und deren verwendung zur herstellung von reliefdruckplatten |
| JPS5179342A (enrdf_load_stackoverflow) * | 1974-12-26 | 1976-07-10 | Fuji Photo Film Co Ltd |
-
1977
- 1977-10-25 GB GB4444377A patent/GB1588368A/en not_active Expired
- 1977-10-25 CA CA000289448A patent/CA1116919A/en not_active Expired
- 1977-10-26 FR FR7732230A patent/FR2369590A1/fr active Granted
- 1977-10-26 NL NL7711723A patent/NL7711723A/xx not_active Application Discontinuation
- 1977-10-26 IT IT2900877A patent/IT1089005B/it active
- 1977-10-26 SE SE7712054A patent/SE435106B/xx not_active IP Right Cessation
- 1977-10-26 CH CH1304577A patent/CH630767A5/de not_active IP Right Cessation
- 1977-10-26 DE DE19772747947 patent/DE2747947C2/de not_active Expired
- 1977-10-27 JP JP12823777A patent/JPS5356018A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| DE2747947C2 (de) | 1983-12-22 |
| NL7711723A (nl) | 1978-05-02 |
| FR2369590A1 (fr) | 1978-05-26 |
| IT1089005B (it) | 1985-06-10 |
| SE435106B (sv) | 1984-09-03 |
| JPS5356018A (en) | 1978-05-22 |
| GB1588368A (en) | 1981-04-23 |
| SE7712054L (sv) | 1978-04-28 |
| JPS5751655B2 (enrdf_load_stackoverflow) | 1982-11-02 |
| CA1116919A (en) | 1982-01-26 |
| FR2369590B1 (enrdf_load_stackoverflow) | 1981-11-13 |
| DE2747947A1 (de) | 1978-05-03 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PL | Patent ceased | ||
| PL | Patent ceased |