DE69015941T2 - Epoxyacrylat-Harze und fotosensitive Harzzusammensetzungen. - Google Patents
Epoxyacrylat-Harze und fotosensitive Harzzusammensetzungen.Info
- Publication number
- DE69015941T2 DE69015941T2 DE69015941T DE69015941T DE69015941T2 DE 69015941 T2 DE69015941 T2 DE 69015941T2 DE 69015941 T DE69015941 T DE 69015941T DE 69015941 T DE69015941 T DE 69015941T DE 69015941 T2 DE69015941 T2 DE 69015941T2
- Authority
- DE
- Germany
- Prior art keywords
- photosensitive resin
- resin compositions
- epoxy acrylate
- acrylate resins
- resins
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F20/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
- C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
- C08F299/026—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from the reaction products of polyepoxides and unsaturated monocarboxylic acids, their anhydrides, halogenides or esters with low molecular weight
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/14—Polycondensates modified by chemical after-treatment
- C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
- C08G59/1438—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing oxygen
- C08G59/1455—Monocarboxylic acids, anhydrides, halides, or low-molecular-weight esters thereof
- C08G59/1461—Unsaturated monoacids
- C08G59/1466—Acrylic or methacrylic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
- C08L63/10—Epoxy resins modified by unsaturated compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S525/00—Synthetic resins or natural rubbers -- part of the class 520 series
- Y10S525/922—Polyepoxide polymer having been reacted to yield terminal ethylenic unsaturation
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25994289 | 1989-10-06 | ||
JP1-323829A JPH0735426B2 (ja) | 1989-10-06 | 1989-12-15 | 感光性樹脂組成物 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69015941D1 DE69015941D1 (de) | 1995-02-23 |
DE69015941T2 true DE69015941T2 (de) | 1995-08-31 |
Family
ID=26544369
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69015941T Expired - Fee Related DE69015941T2 (de) | 1989-10-06 | 1990-08-07 | Epoxyacrylat-Harze und fotosensitive Harzzusammensetzungen. |
Country Status (3)
Country | Link |
---|---|
US (1) | US5196296A (de) |
EP (1) | EP0421086B1 (de) |
DE (1) | DE69015941T2 (de) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5880171A (en) * | 1989-05-01 | 1999-03-09 | 2C Optics, Inc. | Fast curing polymeric compositions for ophthalmic lenses and apparatus for preparing lenses |
DE69132630T2 (de) * | 1990-06-20 | 2002-02-07 | Dainippon Printing Co Ltd | Farbfilter und dessen herstellungsverfahren |
US5264323A (en) * | 1992-04-10 | 1993-11-23 | Eastman Kodak Company | Photographic developing solution and use thereof in the high contrast development of nucleated photographic elements |
KR100228293B1 (ko) * | 1992-06-19 | 1999-11-01 | 아사무라 타카싯 | 컬러필터 및 그의 소재와 수지 |
KR100290514B1 (ko) * | 1992-09-29 | 2001-09-17 | 후지다 히로미찌 | 감광성착색조성물,그리고색필터및색필터의제조방법 |
AU665124B2 (en) * | 1992-11-16 | 1995-12-14 | Sola International Holdings Ltd | Cross-linkable polymeric composition |
CA2102378A1 (en) * | 1992-11-16 | 1994-05-17 | Huan K. Toh | Cross-linkable polymeric composition |
US5700850A (en) | 1993-08-05 | 1997-12-23 | Kimberly-Clark Worldwide | Colorant compositions and colorant stabilizers |
US5854313A (en) * | 1994-09-28 | 1998-12-29 | Takeda Chemical Industries, Ltd. | Fine particles of high heat resistant polymer and epoxy esters |
JPH08269146A (ja) * | 1994-09-28 | 1996-10-15 | Takeda Chem Ind Ltd | 高耐熱性高分子重合体微粒子及びエポキシエステル |
EP0900244A4 (de) * | 1996-05-23 | 2000-05-10 | Sola Int Holdings | Uv härtbare vinylhester mit hohem brechungsindex |
TW571177B (en) * | 1998-10-08 | 2004-01-11 | Toppan Printing Co Ltd | Coloring composition and color filter, electrode substrate, and liquid crystal display device using the same |
US6249034B1 (en) * | 1999-03-29 | 2001-06-19 | Intel Corporation | Microlens formed of negative photoresist |
JP4558178B2 (ja) | 2000-11-30 | 2010-10-06 | 新日鐵化学株式会社 | 光又は熱硬化性樹脂組成物及びプリント配線基板 |
SE0300482D0 (sv) * | 2003-02-21 | 2003-02-21 | Amersham Biosciences Ab | Inorganic beads with hierarchical pore structures |
KR101344792B1 (ko) | 2010-12-17 | 2013-12-24 | 제일모직주식회사 | 하드마스크 조성물, 이를 사용한 패턴 형성 방법 및 상기 패턴을 포함하는 반도체 집적회로 디바이스 |
JP6909791B2 (ja) * | 2016-07-28 | 2021-07-28 | 昭和電工株式会社 | エポキシ(メタ)アクリレート化合物及びこれを含有する硬化性組成物 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5537869B2 (de) * | 1973-02-12 | 1980-09-30 | ||
US4046564A (en) * | 1975-07-16 | 1977-09-06 | Xerox Corporation | Electrophotographic imaging members with photoconductive layer containing electron acceptor monomers or polymers |
JPS52117985A (en) * | 1976-03-30 | 1977-10-03 | Hitachi Chem Co Ltd | Photosensitive polymer composition |
CA1116919A (en) * | 1976-10-27 | 1982-01-26 | Joseph E. Gervay | Flame retardant radiation sensitive element of photopolymerizable composition containing halogen and an acrylonitrile containing polymeric binder |
JPS541018A (en) * | 1977-06-03 | 1979-01-06 | Hitachi Chemical Co Ltd | Flameeresistant photosensitive resin composition for soler resist use |
US4264708A (en) * | 1978-03-31 | 1981-04-28 | E. I. Du Pont De Nemours And Company | Radiation sensitive element having a thin photopolymerizable layer |
FR2435486A1 (fr) * | 1978-09-06 | 1980-04-04 | Lubrizol Corp | Nouveaux polymeres inhibant la formation de mousse et lubrifiants les contenant |
JPS55127097A (en) * | 1979-03-20 | 1980-10-01 | Matsushita Electric Ind Co Ltd | Photocurable resin composition and solder resist |
US4252888A (en) * | 1980-02-26 | 1981-02-24 | Minnesota Mining And Manufacturing Company | Solder mask composition |
US4322490A (en) * | 1980-11-17 | 1982-03-30 | Eastman Kodak Company | Photopolymerizable compositions featuring improved monomers |
US4663412A (en) * | 1984-10-31 | 1987-05-05 | Ecoplastics Limited | Fluorene containing compounds and negative photoresist compositions therefrom |
-
1990
- 1990-07-26 US US07/557,846 patent/US5196296A/en not_active Expired - Lifetime
- 1990-08-07 EP EP90115190A patent/EP0421086B1/de not_active Expired - Lifetime
- 1990-08-07 DE DE69015941T patent/DE69015941T2/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH03205417A (ja) | 1991-09-06 |
US5196296A (en) | 1993-03-23 |
EP0421086B1 (de) | 1995-01-11 |
DE69015941D1 (de) | 1995-02-23 |
EP0421086A3 (en) | 1991-11-06 |
EP0421086A2 (de) | 1991-04-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: NIPPON STEEL CHEMICAL CO., LTD., TOKIO/TOKYO, JP |
|
8328 | Change in the person/name/address of the agent |
Free format text: MEISSNER, BOLTE & PARTNER, 80538 MUENCHEN |
|
8339 | Ceased/non-payment of the annual fee |