DE69132630T2 - Farbfilter und dessen herstellungsverfahren - Google Patents

Farbfilter und dessen herstellungsverfahren

Info

Publication number
DE69132630T2
DE69132630T2 DE69132630T DE69132630T DE69132630T2 DE 69132630 T2 DE69132630 T2 DE 69132630T2 DE 69132630 T DE69132630 T DE 69132630T DE 69132630 T DE69132630 T DE 69132630T DE 69132630 T2 DE69132630 T2 DE 69132630T2
Authority
DE
Germany
Prior art keywords
color filter
production method
color
filter
production
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69132630T
Other languages
English (en)
Other versions
DE69132630D1 (de
Inventor
Mitsuru Iida
Seitaro Tsutsumi
Takehido Ishida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP16159190A external-priority patent/JP2839936B2/ja
Priority claimed from JP16159090A external-priority patent/JP2933991B2/ja
Priority claimed from JP2161593A external-priority patent/JPH0451204A/ja
Priority claimed from JP16159290A external-priority patent/JP2933992B2/ja
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Publication of DE69132630D1 publication Critical patent/DE69132630D1/de
Application granted granted Critical
Publication of DE69132630T2 publication Critical patent/DE69132630T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters
    • G02F1/133516Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters
    • G02F1/133519Overcoatings

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
DE69132630T 1990-06-20 1991-06-20 Farbfilter und dessen herstellungsverfahren Expired - Fee Related DE69132630T2 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP16159190A JP2839936B2 (ja) 1990-01-12 1990-06-20 カラーフィルター
JP16159090A JP2933991B2 (ja) 1990-06-20 1990-06-20 カラーフィルター
JP2161593A JPH0451204A (ja) 1990-06-20 1990-06-20 カラーフィルターおよびその製造方法
JP16159290A JP2933992B2 (ja) 1990-06-20 1990-06-20 カラーフィルター
PCT/JP1991/000827 WO1991020006A1 (en) 1990-06-20 1991-06-20 Color filter and method of manufacturing the same

Publications (2)

Publication Number Publication Date
DE69132630D1 DE69132630D1 (de) 2001-07-12
DE69132630T2 true DE69132630T2 (de) 2002-02-07

Family

ID=27473736

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69132630T Expired - Fee Related DE69132630T2 (de) 1990-06-20 1991-06-20 Farbfilter und dessen herstellungsverfahren

Country Status (5)

Country Link
US (1) US5278009A (de)
EP (1) EP0571625B1 (de)
KR (1) KR100343080B1 (de)
DE (1) DE69132630T2 (de)
WO (1) WO1991020006A1 (de)

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KR20110077881A (ko) * 2009-12-30 2011-07-07 제일모직주식회사 투명성 및 난연성이 우수한 인계 아크릴계 공중합체 수지 및 그 조성물
KR101805224B1 (ko) * 2010-05-03 2017-12-05 바스프 에스이 저온 적용을 위한 컬러 필터
KR101293787B1 (ko) 2010-07-28 2013-08-06 제일모직주식회사 난연성 및 내열성이 우수한 투명 열가소성 수지 조성물
CN102436142B (zh) 2010-09-29 2013-11-06 第一毛织株式会社 黑色光敏树脂组合物以及使用其的光阻层
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KR101351614B1 (ko) 2010-11-05 2014-02-17 제일모직주식회사 난연 내스크래치성 폴리카보네이트 수지 조성물
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KR101374360B1 (ko) 2010-12-14 2014-03-18 제일모직주식회사 난연 내스크래치성 폴리카보네이트 수지 조성물
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KR101453769B1 (ko) 2010-12-24 2014-10-22 제일모직 주식회사 감광성 수지 조성물 및 이를 이용한 컬러 필터
KR20130002789A (ko) 2011-06-29 2013-01-08 제일모직주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터
KR101400185B1 (ko) 2011-11-29 2014-06-19 제일모직 주식회사 컬러 필터용 감광성 수지 조성물 및 이를 이용하여 제조한 컬러 필터
KR101344786B1 (ko) 2011-12-02 2013-12-26 제일모직주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터
KR20130072954A (ko) 2011-12-22 2013-07-02 제일모직주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터
KR101674990B1 (ko) 2012-12-07 2016-11-10 제일모직 주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터
KR20140076320A (ko) 2012-12-12 2014-06-20 제일모직주식회사 감광성 수지 조성물 및 이를 이용한 블랙 스페이서
KR101664121B1 (ko) 2012-12-13 2016-10-10 제일모직 주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터
KR101609634B1 (ko) 2012-12-26 2016-04-06 제일모직 주식회사 감광성 수지 조성물 및 이를 이용한 차광층
KR20140083620A (ko) 2012-12-26 2014-07-04 제일모직주식회사 차광층용 감광성 수지 조성물 및 이를 이용한 차광층
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KR102154680B1 (ko) 2018-07-02 2020-09-10 삼성에스디아이 주식회사 양자점 함유 경화성 조성물, 이를 이용한 수지막 및 디스플레이 장치
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JPH0224602A (ja) * 1988-07-14 1990-01-26 Toyo Ink Mfg Co Ltd カラーフイルターの製造方法
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WO1991019212A1 (en) * 1990-06-06 1991-12-12 Okuno Chemical Industries Co., Ltd. Color filter overcoating material for liquid crystal display, color filter material, formation of overcoat, and formation of color filter

Also Published As

Publication number Publication date
KR100343080B1 (ko) 2002-12-28
EP0571625A4 (en) 1995-10-25
EP0571625A1 (de) 1993-12-01
KR920702502A (ko) 1992-09-04
DE69132630D1 (de) 2001-07-12
WO1991020006A1 (en) 1991-12-26
US5278009A (en) 1994-01-11
EP0571625B1 (de) 2001-06-06

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